G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
11/1997
11/27/1997	WO1997044709A1 Attenuating embedded phase shift photomask blanks
11/26/1997	CN1166050A Metal layer patterns of semiconductor device and method for forming the same
11/25/1997	US5691115 Exposure method, aligner, and method of manufacturing semiconductor integrated circuit devices
11/25/1997	US5691090 Phase shift mask and manufacturing method thereof and exposure method using phase shift mask
11/25/1997	US5691089 Integrated circuits formed in radiation sensitive material and method of forming same
11/25/1997	US5691088 Dustproofing; frame, transparent polymeric film, skicky adhesive film
11/20/1997	WO1997043694A2 Method of producing a stencil mask
11/20/1997	WO1997043693A1 Method of producing a structured foil and use thereof
11/20/1997	WO1997043690A1 Black-and-white photothermographic and thermographic elements comprising 3-heteroaromatic-substituted acrylonitrile compounds as co-developers
11/20/1997	DE19648063A1 Microlens patterning mask for solid state image sensor
11/19/1997	EP0807851A1 Phase shift mask, blank for phase shift mask, and method of manufacturing phase shift mask
11/18/1997	US5689426 Computer-controlled master reproducer for depositing a master reproduction on a substrate, method for depositing the same, and master reproduction
11/18/1997	US5688617 Phase shift layer-containing photomask, and its production and correction
11/18/1997	US5688415 Localized plasma assisted chemical etching through a mask
11/18/1997	US5688409 Depositing device layer to be patterned above a substrate, depositing photoresist layer, providing a reticle having first layer having first and second phase region, a second layer, exposing phtoresist using stepper, adjusting coherence
11/13/1997	WO1997042547A1 Process and device for preparation of exposed typesetting films for phototypesetting
11/12/1997	EP0806707A1 Microlithographic imaging system
11/12/1997	CN1164673A Pattern structure of photomask
11/11/1997	US5686999 Punch apparatus for improved registration of image receiving material in an image forming device
11/11/1997	US5686984 Projection exposure method and apparatus to determine optical performance of reticle
11/11/1997	US5686209 Lithographic technique used in semiconductor industry
11/11/1997	US5686208 Process for generating a phase level of an alternating aperture phase shifting mask
11/11/1997	US5686207 Method of forming and repairing a mask for photolithography
11/11/1997	US5686206 Method for the repair of lithographic masks
11/06/1997	DE19648075A1 Phase-shift mask
11/05/1997	CN1164049A Method for fabricating light exposure mask
10/1997
10/29/1997	EP0803772A2 An imaging element and a method for producing a lithographic plate therewith
10/29/1997	EP0803771A1 A method for making a lithopgrapic printing plate wherein an imaging element is used that comprises a thermosensitive mask
10/29/1997	EP0803770A1 An imaging element and a method for producing a lithographic plate therewith
10/29/1997	EP0803769A1 Imaging element for making a lithographic printing plate wherein that imaging element comprises a thermosensitive mask
10/28/1997	US5682323 Computer implemented method
10/28/1997	US5682056 Phase shifting mask and method of manufacturing same
10/22/1997	EP0801769A2 Hydrazide compounds useful as co-developers for black-and-white photothermographic elements
10/22/1997	EP0801767A1 Randomised mask for a diffusing screen
10/22/1997	CN1162766A Phase shift mask and method for fabricating the same
10/21/1997	US5679502 Using polymethyl methacrylate as photoresist for proper exposure using synchotron device to provide x-ray beam having required photon energy
10/21/1997	US5679484 Exposure mask, exposure mask substrate, method for fabricating the same, and method for forming pattern based on exposure mask
10/21/1997	US5679483 Embedded phase shifting photomasks and method for manufacturing same
10/21/1997	CA2078748C Screen generation for halftone screening of images using scan line segments of oversized scan lines
10/16/1997	WO1997038355A1 Systems and methods for deposition of dielectric films
10/16/1997	DE19632845A1 Half-tone phase-shifting mask
10/14/1997	US5677092 Process for fabricating phase shift mask and process of semiconductor integrated circuit device
10/14/1997	US5677090 Method of making X-ray mask having reduced stress
10/14/1997	US5677089 Photomask for forming T-gate electrode of the semiconductor device
10/14/1997	US5677041 Integrated circuits formed in radiation sensitive material and method of forming same
10/14/1997	US5676853 Mask for forming features on a semiconductor substrate and a method for forming the mask
10/07/1997	US5675403 Stress-free mount for imaging mask
10/07/1997	US5674661 Imagewise laser exposure of single sheet recording element having crystallization resistant disazo cyan dye dispersed in polymeric binder
10/07/1997	US5674647 Phase shift mask and manufacturing method thereof and exposure method using phase shift mask
10/07/1997	US5674646 Providing transparent layer, forming opaque layer, etching, forming resist layer, exposing, developing resist pattern, removing resist to uncover phase shift region adapted for transmitting exposure light impinging thereon
10/07/1997	US5674624 Highly light-transmitting dust protective film, and dust protective member
10/07/1997	US5674413 Scattering reticle for electron beam systems
09/1997
09/30/1997	US5672760 Obtaining a photoabsorber-containing acrylic polymer by using n-2-hydroxyethyl-n-ethyl aniline to obtain 4-((2-hydroxyethyl)ethylamino)-4'-(trifluoromethylsulfonyl)-tolane which reacts with a polymerizable methacrylic acid
09/30/1997	US5672450 Method of phase shift mask fabrication comprising a tapered edge and phase conflict resolution
09/30/1997	US5672449 Silicon membrane and method of making same
09/30/1997	US5672243 Antireflection coating for highly reflective photolithographic layers comprising chromium oxide or chromium suboxide
09/30/1997	CA2070325C Process and apparatus for controllably separating framed working area from remainder of the membrane
09/25/1997	WO1997035235A1 Improved photomask
09/23/1997	US5670447 35mm format transparencies
09/23/1997	US5670281 Radiation transparent substrate, opaque patterns and transparent patterns
09/23/1997	US5670279 Lithography exposure mask derived from nanocrystal precursors and a method of manufacturing the same
09/23/1997	US5670210 Method of uniformly coating a substrate
09/18/1997	WO1997034196A1 Black-and-white photothermographic and thermographic elements comprising 4-substituted isoxazole compounds as co-developers
09/18/1997	WO1997034195A1 2-substituted malondialdehyde compounds as co-developers for black-and-white photothermographic and thermographic elements
09/16/1997	US5668018 Method for defining a region on a wall of a semiconductor structure
09/16/1997	US5667941 Photolithography, resolution
09/16/1997	US5667919 Attenuated phase shift mask and method of manufacture thereof
09/16/1997	US5667918 Method of lithography using reticle pattern blinders
09/16/1997	US5667726 Highly light-transmitting dust protective film, process for preparation thereof and dust protective member
09/10/1997	CN1159073A Phase shifting mask and method for fabricating the same
09/09/1997	US5666190 Method of performing lithography using cantilever array
09/09/1997	US5665845 Electronic device with a spin-on glass dielectric layer
09/09/1997	US5665645 Method of manufacturing a semiconductor device using reticles
09/09/1997	US5665495 Method for fabricating a semiconductor with a photomask
09/03/1997	EP0792478A1 A process for making a flexographic printing plate
09/02/1997	US5664251 Method of making an aperture plate for a multibeam pattern drawing apparatus
09/02/1997	US5663893 Method for generating proximity correction features for a lithographic mask pattern
09/02/1997	US5663018 Pattern writing method during X-ray mask fabrication
09/02/1997	US5663016 All-polymeric phase shift masks
08/1997
08/26/1997	US5661601 Projection method and projection system and mask therefor
08/26/1997	US5660956 Reticle and method of fabricating reticle
08/26/1997	US5660955 Light shading films pairs formed on substrates improving difference of transmitted light intensity due to refractive index and optical transmissivity differences
08/20/1997	CN2259996Y Printing surface mfg. machine for large flexible forme
08/19/1997	US5659385 Using paper negatives in digital imagesetting
08/19/1997	US5658696 Overlapping of light screen pattern and phase shift film
08/19/1997	US5658695 Ultrafine semiconductor circuit
08/13/1997	EP0788435A2 Digital laser imagable lithographic printing plates
08/13/1997	EP0671025B1 Metal ion reduction in bottom anti-reflective coatings for photoresists
08/12/1997	US5657235 Continuous scale optical proximity correction by mask maker dose modulation
08/12/1997	US5656400 Photomask and pattern forming method employing the same
08/12/1997	US5656399 Process for making an x-ray mask
08/12/1997	US5656398 Absorber in pattern on support frame
08/12/1997	US5656397 Mask having a phase shifter and method of manufacturing same
08/12/1997	US5656342 Free of dust particles
08/06/1997	EP0788028A2 Pellicle
08/06/1997	EP0788027A1 Phase shift mask blank and production method therefor
08/06/1997	EP0787289A1 Automated photomask inspection apparatus and method
08/05/1997	US5654897 Method and structure for improving patterning design for processing
08/05/1997	US5654130 High contrast
08/05/1997	US5654125 Laser apparatus and process of use

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