| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 02/22/1994 | US5288567 Stencil mask and charged particle beam exposure method and apparatus using the stencil mask |
| 02/22/1994 | US5288368 Electron beam lithography with reduced charging effects |
| 02/17/1994 | WO1994003839A1 Process and element for making a relief image using an ir sensitive layer |
| 02/17/1994 | WO1994003838A1 A flexographic printing element having an ir ablatable layer and process for making a flexographic printing plate |
| 02/17/1994 | WO1994003836A1 Masking film |
| 02/17/1994 | DE4226497A1 Thin etching silicon substrate - to mfr. IMPATT, beam-lead Schottky battery and PIN diodes |
| 02/16/1994 | EP0339020B1 Method of patterning resist for printed wiring board |
| 02/15/1994 | US5286611 Photoresist |
| 02/15/1994 | US5286584 Method of manufacturing a device and group of masks for this method |
| 02/15/1994 | US5286583 Forming thin film on transparent substrate, covering with photoresist, exposing to light of different intensities, developing, etching exposed thin film, eliminating resist in separate steps for each light intensity |
| 02/15/1994 | US5286581 Phase-shift mask and method for making |
| 02/15/1994 | US5286567 Pellicle for photolithographic mask |
| 02/15/1994 | CA2103863A1 Method for preparing high resolution wash-off images and non-photosensitive elements for use therein |
| 02/09/1994 | EP0582353A1 Low stress electrodeposition of gold for X-ray mask fabrication |
| 02/09/1994 | EP0582308A2 Photomask blank and phase shift photomask |
| 02/09/1994 | EP0582001A1 Heat mode recording material and method for obtaining color images |
| 02/08/1994 | US5284725 Photo-mask for manufacture of two-layer tab |
| 02/08/1994 | US5284724 Phase mask for projection lithography and method for the manufacture thereof comprising a selectively etchable phase shift layer directly on substrate |
| 02/02/1994 | EP0581415A2 Electronic high-fidelity screenless conversion system and method using a separable filter |
| 02/02/1994 | EP0581302A2 Method for fabricating photomasks having a phase shift layer |
| 02/02/1994 | EP0581280A2 Pattern forming method |
| 02/01/1994 | US5282926 Method of anisotropically etching monocrystalline, disk-shaped wafers |
| 01/30/1994 | CA2086624A1 Electronic high-fidelity screenless conversion system and method using a separable filter |
| 01/25/1994 | US5281500 Providing photomask, providing phase shifting features raised from surface, terminating in optically clear edge, tapering edge, the edge formed such that null formed by clear edge is spread out and not printed onto photoresist |
| 01/20/1994 | WO1994001808A1 System for detecting a latent image using an alignment apparatus |
| 01/20/1994 | DE4230142C1 Verwendung einer Übertragungsfolie Using a transfer film |
| 01/18/1994 | US5279911 Transparent substrate, light shielding pattern and reflective film |
| 01/13/1994 | DE4221482A1 Verfahren und Vorrichtung zur Lagekontrolle eines Druckbildes auf einer Druckform Method and device for position control of a print image on a printing forme |
| 01/12/1994 | EP0578203A1 Method and apparatus for forming image data metrics from cascaded photographic imaging systems |
| 01/11/1994 | CA1325927C Lightsafe masking film |
| 01/06/1994 | WO1994000802A1 Process and device for monitoring the position of a printed image on a printing block |
| 01/05/1994 | EP0577297A2 Self-aligned method of making phase-shifting lithographic masks having three or more phase-shifts |
| 01/05/1994 | EP0576533A1 Fluid cooled contact mask |
| 01/04/1994 | US5276551 Reticle with phase-shifters and a method of fabricating the same |
| 01/04/1994 | US5275896 Photolithography and photoresists |
| 01/04/1994 | US5275895 Method of manufacturing phase-shifting mask |
| 01/04/1994 | US5275894 Phase shifting mask |
| 12/29/1993 | EP0575849A2 Conformal photomask for three-dimensional printed circuit board technology |
| 12/29/1993 | EP0575483A1 Apparatus and method to merge images rasterized at different resolutions |
| 12/28/1993 | US5273850 Chromeless phase-shift mask and method for making |
| 12/28/1993 | US5273849 Mask repair |
| 12/28/1993 | US5273829 Epitaxial silicon membranes |
| 12/23/1993 | WO1993026039A1 Using a nanochannel glass mask to form semiconductor devices |
| 12/23/1993 | DE4220097A1 Photolithographic mask mfr. for multilayer printed circuit - involves deep-drawing of combined plastic film for laser irradiation of carbon black areas confined to thinner constituent |
| 12/22/1993 | EP0574914A2 Apparatus for automatically making out holder indexing table for plate making |
| 12/22/1993 | CN1079827A Photoenhanced diffusion patterning for organic polymer films |
| 12/21/1993 | US5272744 Reflection mask |
| 12/21/1993 | US5272116 Method for pattern defect correction of a photomask |
| 12/21/1993 | US5272024 Mask-structure and process to repair missing or unwanted phase-shifting elements |
| 12/15/1993 | EP0574092A1 Photo-masks |
| 12/14/1993 | US5270796 Apparatus for inspecting a phase shift mask |
| 12/14/1993 | US5270794 Fine structure evaluation apparatus and method |
| 12/14/1993 | US5270733 Material transport that selectively contacts different materials |
| 12/14/1993 | US5270125 Boron nutride membrane in wafer structure |
| 12/14/1993 | US5270078 Method for preparing high resolution wash-off images |
| 12/09/1993 | WO1993024327A1 A method and an apparatus for illuminating points on a medium |
| 12/09/1993 | WO1993024326A1 A method and a device for retaining a thin medium between two bodies |
| 12/09/1993 | DE4318163A1 Repairing white and black defects in light phase displacement structured surfaces - by coating defect area with repair phases slide coating restoring the required phase displacement of the light |
| 12/09/1993 | DE4316114A1 X=ray beam mask used in X=ray lithography - comprises absorber contg. bismuth, titanium and nitrogen, and has amorphous structure |
| 12/08/1993 | EP0573092A1 A method for obtaining an image using a heat mode recording material |
| 12/08/1993 | EP0572943A1 High resolution etching mask |
| 12/07/1993 | US5268255 Photo-setting resist composition, a process for producing a printed circuit board by using the composition, and a printed circuit board obtained by using the composition |
| 12/07/1993 | US5268244 Self-aligned phase shifter formation |
| 12/07/1993 | US5268068 High aspect ratio molybdenum composite mask method |
| 12/07/1993 | CA1324923C Lightsafe masking film |
| 12/01/1993 | EP0571929A2 Dummy diffraction mask |
| 11/30/1993 | US5266424 Method of forming pattern and method of manufacturing photomask using such method |
| 11/30/1993 | US5266183 Method for plating an x-ray mask |
| 11/23/1993 | US5264324 Crosslinked addition polymer, epoxy resin, printed circuit boards |
| 11/18/1993 | EP0569762A1 Pattern formation in photohardenable dielectric layers |
| 11/16/1993 | US5262275 Flexographic printing element having an IR ablatable layer and process for making a flexographic printing plate |
| 11/16/1993 | US5262257 Forming circuit and alignment pattern areas with different materials irradiation with electron beam, multilayer |
| 11/10/1993 | EP0569123A2 Mask for X-ray pattern delineation |
| 11/10/1993 | EP0568853A1 Photoenhanced diffusion patterning for organic polymer films |
| 11/10/1993 | EP0568841A1 Process of photoimaging using ink jet printing |
| 11/09/1993 | US5260175 Method of producing microstructures having regions of different structural height |
| 11/09/1993 | US5260163 Photoenhanced diffusion patterning for organic polymer films |
| 11/09/1993 | US5260153 Aperture pattern printing plate |
| 11/09/1993 | US5260152 Phase shifting mask and method of manufacturing same |
| 11/09/1993 | US5260151 Lithography, miniaturization |
| 11/09/1993 | US5260150 Photo-mask with light shielding film buried in substrate |
| 10/27/1993 | EP0567419A2 A shifter-based rim phase shifting structure and process to fabricate the same |
| 10/27/1993 | EP0567332A2 Formation of microstructures by multiple level deep X-ray lithography with sacrificial metal layers |
| 10/27/1993 | EP0567169A1 Feature biassing and absorptive phase-shifting techniques to improve optical projection imaging |
| 10/27/1993 | CN1077819A Plate for shadow-mask developing and method for manufacture of plate |
| 10/26/1993 | US5256747 Low molecular weight; prepared by pyrolysis; pellicle coating,optics |
| 10/26/1993 | US5256505 Lithographical mask for controlling the dimensions of resist patterns |
| 10/20/1993 | EP0565818A2 Method for photochemically or mechanically producing flexible printing plates |
| 10/20/1993 | EP0565784A1 Method of manufacturing X-ray exposure mask |
| 10/19/1993 | US5254503 Process of making and using micro mask |
| 10/19/1993 | US5254419 Method for dust-proofing in the manufacture of electronic devices and pellicle therefor |
| 10/19/1993 | US5254418 Method of manufacturing photomask |
| 10/19/1993 | US5254375 Apparatus for controllably separating framed working area from remainder of the membrane |
| 10/19/1993 | US5254202 Fabrication of laser ablation masks by wet etching |
| 10/13/1993 | EP0565473A2 Mask structure and process to repair missing or unwanted phase-shifting elements |
| 10/13/1993 | EP0565154A1 Gelatinous drafting material |
| 10/13/1993 | EP0564720A1 Method of manufacturing x-ray exposure mask |
| 10/13/1993 | EP0424375B1 Monolithic channeling mask having amorphous/single crystal construction |
| 10/12/1993 | US5253175 Method for preliminarily printing blank for tapered draw-formed body |
| 10/12/1993 | US5252835 Machining oxide thin-films with an atomic force microscope: pattern and object formation on the nanometer scale |