| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 08/20/1996 | US5547789 Pattern transfer mask |
| 08/20/1996 | US5547788 For projecting pattern through lenses onto semiconductor wafer surface |
| 08/20/1996 | US5547787 Exposure mask, exposure mask substrate, method for fabricating the same, and method for forming pattern based on exposure mask |
| 08/14/1996 | EP0726099A2 Method of removing surface contamination |
| 08/14/1996 | CN1128897A Phase shift mask and method for fabricating same |
| 08/13/1996 | US5546225 High resolution printing technique by using improved mask pattern and improved illumination system |
| 08/13/1996 | US5546181 Optical detector employing an optically-addressed spatial light modulator |
| 08/13/1996 | US5545515 Acrylonitrile compounds as co-developers for black-and-white photothermographic and thermographic elements |
| 08/13/1996 | US5545507 Ultrahigh contrast, resolution, sharpness |
| 08/13/1996 | US5545505 Amine compounds as contrast enhancers for black-and-white photothermographic and thermographic elements |
| 08/13/1996 | US5545498 Atleast one photomask having an effective chip arrangement composed of grid-like pattern |
| 08/06/1996 | US5544213 Mask holding method, mask and mask chuck, exposure apparatus using the mask and the mask chuck, and device production method using the exposure apparatus |
| 08/06/1996 | US5543255 Half-tone type phase shift mask and method for fabrication thereof |
| 08/06/1996 | US5543254 Groove formed by etching to a selective depth a portion of transparent substrate on which edge portion of phase shift film pattern directly coated on the substrate is disposed; free from undesirable photoresist film residues |
| 08/06/1996 | US5543253 Photomask for t-gate formation and process for fabricating the same |
| 08/06/1996 | US5543252 Shifting the phase of the light by depositing silicon dioxide |
| 07/31/1996 | EP0724022A1 Sputter deposition of hydrogenated amorphous carbon film |
| 07/30/1996 | US5541743 Method of and apparatus for generating halftone image with compensation for different dot gain characteristics |
| 07/30/1996 | US5541026 Exposure apparatus and photo mask |
| 07/30/1996 | US5541025 Method and apparatus for designing photomasks |
| 07/30/1996 | US5541023 X-ray mask, method of manufacturing the x-ray mask and exposure method using the x-ray mask |
| 07/30/1996 | CA2090157C Mask for x-ray pattern delineation |
| 07/25/1996 | DE19502624A1 Mask for three-dimensional structuring |
| 07/24/1996 | EP0722581A1 Method for the electronic assembly of printer's forms |
| 07/24/1996 | CN1127192A Print making device |
| 07/23/1996 | US5539568 Method of exposing a light sensitive material |
| 07/23/1996 | US5539567 For projecting an image onto a target |
| 07/23/1996 | US5538833 Biasing chrome images of phase shift mask, overexposing resist to compensate |
| 07/23/1996 | US5538819 Semiconductors |
| 07/23/1996 | US5538818 Reflection Photomask |
| 07/23/1996 | US5538817 Lasers |
| 07/23/1996 | US5538816 Halftone phase shift photomask, halftone phase shift photomask blank, and methods of producing the same |
| 07/23/1996 | US5538815 Method for designing phase-shifting masks with automatization capability |
| 07/23/1996 | US5538151 Glass with oxidizable metal layer over a substrate for semiconductor masks |
| 07/16/1996 | US5537648 Computer implemented method |
| 07/16/1996 | US5537518 Document processing system |
| 07/16/1996 | US5536622 Hydrazide compounds useful as co-developers for black-and-white photothermographic elements |
| 07/16/1996 | US5536619 Heat mode recording material |
| 07/16/1996 | US5536606 Method for making self-aligned rim phase shifting masks for sub-micron lithography |
| 07/16/1996 | US5536605 Method of repairing apertured laser metal mask |
| 07/16/1996 | US5536604 Lithography, semiconductors |
| 07/16/1996 | US5536603 Photoresists; semiconductor integrated circuit device |
| 07/16/1996 | US5536602 Phase shifting mask, manufacturing method thereof, and exposure method using such a phase shifting mask |
| 07/16/1996 | US5536559 Stress-free mount for imaging mask |
| 07/11/1996 | WO1996021174A2 Hydrazide compounds useful as co-developers for black-and-white photothermographic elements |
| 07/11/1996 | CA2207485A1 Hydrazide compounds useful as co-developers for black-and-white photothermographic elements |
| 07/10/1996 | EP0720920A2 Backing layer for laser ablative imaging |
| 07/09/1996 | US5534371 Repaired apertured laser metal mask |
| 07/09/1996 | US5533634 Quantum chromeless lithography |
| 07/04/1996 | DE19548918A1 Belichtungsmaske für Halbleiterelemente Exposure mask for semiconductor elements |
| 07/03/1996 | EP0720057A1 Original form for lithographic plate and process for preparing lithographic plate |
| 07/03/1996 | EP0720051A2 Self-aligned opaque regions for attenuating phase-shifting masks |
| 07/03/1996 | EP0720050A2 Apparatus and method for cleaning photomasks |
| 07/02/1996 | US5533170 Rasterizer for a pattern generation apparatus |
| 07/02/1996 | US5532520 Semiconductor wafer with alignment marks |
| 07/02/1996 | US5532089 Simplified fabrication methods for rim phase-shift masks |
| 06/26/1996 | EP0718691A2 Embedded phase shifting photomasks and method for manufacturing same |
| 06/25/1996 | US5529884 Backing layer for laser ablative imaging |
| 06/25/1996 | US5529862 A plurality of stress-relief opening are formed in the membrane for reducing stress-induced distortion of membrane and mask pattern |
| 06/25/1996 | US5529819 Isolating photomask pattern from particlular impurities |
| 06/19/1996 | EP0717444A2 Programming a logic level within an integrated circuit |
| 06/19/1996 | EP0716933A1 Image dye combination for laser ablative recording element |
| 06/18/1996 | US5528360 Surface-condition inspection apparatus |
| 06/18/1996 | US5527872 Electronic device with a spin-on glass dielectric layer |
| 06/18/1996 | US5527647 Forming halftone pattern on transparent substrate |
| 06/18/1996 | US5527646 Method of forming a micro structure and an x-ray mask |
| 06/18/1996 | US5527645 Systematic method for production of phase-shifting photolithographic masks |
| 06/18/1996 | CA2069813C Optical processing apparatus |
| 06/18/1996 | CA2004193C Molding blank decorating process, use of said process and products thereof |
| 06/11/1996 | US5526094 Exposure apparatus and method |
| 06/05/1996 | DE19545163A1 Phasenschiebermaske zur Bildung von Kontaktlöchern mit Mikroabmessung Phase shift mask for forming contact holes with micro dimension |
| 06/04/1996 | US5523580 Reticle having a number of subfields |
| 06/04/1996 | US5523186 Split and cover technique for phase shifting photolithography |
| 06/04/1996 | US5523185 Method for manufacturing stencil mask |
| 06/04/1996 | US5523184 Chromium pattern formed on a transparent reticle having light exposure energy attenuation |
| 05/30/1996 | WO1996016356A1 A process for making a flexographic printing plate |
| 05/29/1996 | EP0714119A2 Pattern forming process, apparatus for forming said pattern and process for preparing semiconductor device utilizing said pattern forming process |
| 05/29/1996 | EP0713586A1 Ablation transfer onto intermediate receptors |
| 05/29/1996 | CN1123420A Method of manufacturing a photo mask for manufacturing a semiconductor device 21678/01 |
| 05/28/1996 | US5521033 Process for manufacturing semiconductor integrated circuit device, exposure method and mask for the process |
| 05/28/1996 | US5521032 Semiconductors |
| 05/28/1996 | US5521031 Pattern delineating apparatus for use in the EUV spectrum |
| 05/28/1996 | US5520297 Aperture plate and a method of manufacturing the same |
| 05/22/1996 | EP0713142A2 Combined attenuated-alternating phase shifting mask structure and fabrication methods therefor |
| 05/17/1996 | WO1996014602A1 Process for creating an image on film used in screen printing |
| 05/15/1996 | EP0594676A4 Diamond membranes for x-ray lithography |
| 05/14/1996 | US5516605 Photo mask provided with development rate measuring pattern and method for measuring development rate uniformity |
| 05/08/1996 | EP0710890A1 Device fabrication using DUV/EUV pattern delineation |
| 05/08/1996 | EP0620931A4 Improved mask for photolithography. |
| 05/07/1996 | US5514500 Half-tone type phase shift mask and method for fabricating the same |
| 05/07/1996 | US5514499 Phase shifting mask comprising a multilayer structure and method of forming a pattern using the same |
| 05/07/1996 | US5514498 Reticle with phase-shifters and a method of fabricating the same |
| 05/01/1996 | EP0709735A2 Self-aligned alignment marks for phase-shifting masks |
| 04/30/1996 | US5513300 Method and apparatus for producing overlapping image area |
| 04/30/1996 | US5513275 Automated direct patterned wafer inspection |
| 04/30/1996 | US5512395 Image masks for semiconductor lithography |
| 04/30/1996 | US5511477 Method and apparatus for the production of photopolymeric relief printing plates |
| 04/24/1996 | EP0708550A2 Ablation-transfer-imaging using zero order laser beams in a flat-field scanner |
| 04/24/1996 | EP0708367A1 Pattern delineating apparatus for use in the EUV spectrum |
| 04/24/1996 | CN1121189A Pohto mask and method for manufacturing the same |