| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 04/02/1997 | CN1146563A Colour scanner |
| 04/01/1997 | US5617487 Image cutout apparatus |
| 04/01/1997 | US5616927 Frame-supported pellicle for dustproof protection of photomask |
| 03/27/1997 | WO1997011410A1 Black-and-white photothermographic and thermographic elements comprising hydroxamic acid compounds as contrast enhancers |
| 03/27/1997 | WO1997011409A1 Black-and-white photothermographic and thermographic elements comprising acrylonitrile compounds as co-developers |
| 03/27/1997 | WO1997011408A1 Black-and-white photothermographic and thermographic elements comprising n-acyl-hydrazine compounds as contrast enhancers |
| 03/27/1997 | WO1997011407A1 Black-and-white photothermographic and thermographic elements comprising hydrogen atom donor compounds as contrast enhancers |
| 03/27/1997 | WO1997011406A2 Black-and-white photothermografic and thermografic elements comprising amine compounds as contrast enhancers |
| 03/26/1997 | CN1146071A Method for forming fine pattern of semiconductor device |
| 03/25/1997 | US5615316 Printing control method and apparatus |
| 03/25/1997 | US5614420 Method of preventing mask tone error |
| 03/25/1997 | US5614336 High density integrated circuits |
| 03/25/1997 | US5614335 Blanks for halftone phase shift photomasks, halftone phase shift photomasks, and methods for fabricating them |
| 03/19/1997 | EP0763924A2 Method and apparatus for preparing multi-composed images |
| 03/19/1997 | EP0680624B1 Phase shifting mask structure with absorbing/attenuating sidewalls for improved imaging and method of fabricating phase shifters with absorbing/attenuating sidewalls |
| 03/12/1997 | EP0761428A2 Stamp-making apparatus, as well as function changeover mechanism, exposure system and stamp-making object material-detecting device therefor |
| 03/12/1997 | CN1145124A Photomask blanks |
| 03/11/1997 | US5610965 Exposure method |
| 03/11/1997 | US5609993 Process for producing lithographic printing plate, photosensitive plate and aqueous ink composition therefor |
| 03/11/1997 | US5609977 Reflection phase shifting mask and method of forming a pattern using the same |
| 03/06/1997 | WO1997008588A1 Mask structure having offset patterns for alignment |
| 03/05/1997 | EP0654150B1 A flexographic printing element having an ir ablatable layer and process for making a flexographic printing plate |
| 03/04/1997 | US5608576 Projection method and projection system and mask therefor |
| 03/04/1997 | US5607814 Process and element for making a relief image using an IR sensitive layer |
| 03/04/1997 | US5607733 Process for preparing an X-ray mask structure |
| 03/04/1997 | US5607723 Method for making continuous thin diamond film |
| 02/26/1997 | EP0759631A1 Process and apparatus for the fabrication of holes in a layer of photosensitive material, especially for the fabrication of electron sources |
| 02/26/1997 | EP0759576A2 Method for making an optical pellicle |
| 02/26/1997 | EP0759192A1 Process control strip and a method of recording |
| 02/26/1997 | CN1034144C Needle drawing membrane and its making method |
| 02/25/1997 | US5605776 Phase-shifting photomask blank, phase-shifting photomask, and method of manufacturing them |
| 02/25/1997 | US5605775 Photomask used by photolithography and a process of producing same |
| 02/20/1997 | WO1997006469A1 Lithography exposure mask derived from nanocrystal precursors and a method of manufacturing the same |
| 02/19/1997 | CN1143234A Repairing method for color filter and equipment, color filter, liquid crystal displayer, and equipment with liquid crystal displayer |
| 02/19/1997 | CN1143200A Method for producing optical mask |
| 02/18/1997 | US5604586 Color-matching apparatus for the visual on-light evaluation of flexible copies |
| 02/18/1997 | US5604579 Method and apparatus for electronically creating imposition data, including dummy data for original film and platemaking |
| 02/18/1997 | US5604060 Halftone phase shift photomask comprising a single layer of halftone light blocking and phase shifting |
| 02/18/1997 | US5604059 Transparent support plate |
| 02/13/1997 | WO1997005526A1 Lithography systems employing programmable reticles |
| 02/11/1997 | US5602645 Pattern evaluation apparatus and a method of pattern evaluation |
| 02/11/1997 | US5601955 Frame provided with vent and filter |
| 02/11/1997 | US5601954 Attenuated phase shift mask comprising phase shifting layer with parabolically shaped sidewalls |
| 02/06/1997 | WO1997004449A1 Nanometer scale data storage device and associated positioning system |
| 02/06/1997 | WO1997004360A1 Phase shift mask blank and production method therefor |
| 02/05/1997 | EP0535229B1 Mask for shifting phase |
| 02/05/1997 | CN1142124A Scale mask-plate for off-axis lighting |
| 02/05/1997 | CN1142121A Method for forming delicate pattern of semi-conductor device |
| 02/05/1997 | CN1142063A Direct etching technology of etching straightedge |
| 02/04/1997 | CA2077359C X-ray mask and semiconductor device manufacturing method using the same |
| 01/30/1997 | WO1997000777A3 Digital laser imagable lithographic printing plates |
| 01/29/1997 | EP0755781A1 Thin-metal lithographic printing members with visible tracking layers |
| 01/28/1997 | US5597669 Dustproof protection of a photomask |
| 01/28/1997 | US5597668 Patterned filled photo mask generation for integrated circuit manufacturing |
| 01/28/1997 | US5597667 Photomask and photomask blank |
| 01/28/1997 | US5597666 Method for fabrication of a mask |
| 01/22/1997 | EP0599989B1 Infra-red direct write imaging media |
| 01/21/1997 | US5595857 Method of forming a pattern and projection exposure apparatus |
| 01/21/1997 | US5595844 Method of exposing light in a method of fabricating a reticle |
| 01/21/1997 | US5595843 Using horizonatal and vertical lines to locate position of device features, semiconductor, printed circuit manufacture |
| 01/15/1997 | CN1140493A Masks for lithographic patterning using off-axis illumination |
| 01/14/1997 | US5593839 Computer-aided engineering system for design of sequence arrays and lithographic masks |
| 01/14/1997 | US5593808 LAT imaging onto intermediate/receptor elements/"LAT decalcomania" |
| 01/14/1997 | US5593801 Attenuating type phase shifting mask, method of manufacturing thereof and semiconductor device manufactured by using the mask |
| 01/14/1997 | US5593800 Mask manufacturing method and apparatus and device manufacturing method using a mask manufactured by the method or apparatus |
| 01/14/1997 | US5593799 Phase shifting, diffraction grating |
| 01/09/1997 | WO1997000777A2 Digital laser imagable lithographic printing plates |
| 01/09/1997 | CA2198208A1 Digital laser imagable lithographic printing plates |
| 01/08/1997 | EP0752621A1 Frame-supported pellicle for photomask protection |
| 01/08/1997 | EP0752157A1 Group iv semiconductor thin films formed at low temperature using nanocrystal precursors |
| 01/07/1997 | US5592317 Chromium blanks for forming black matrix-screen and color filter for liquid crystal display |
| 01/07/1997 | US5591985 Surface state inspecting system including a scanning optical system for scanning a surface to be inspected with a first light and for simultaneously scanning a diffraction grating with a second light |
| 01/07/1997 | US5591970 Charged beam apparatus |
| 01/07/1997 | US5591550 Phase shift mask and method for forming phase shift mask |
| 01/07/1997 | US5591549 Self aligning fabrication method for sub-resolution phase shift mask |
| 01/02/1997 | DE19625894A1 Lithographic photomask production apparatus for LSI semiconductor manufacture |
| 01/02/1997 | DE19625669A1 Compatibility precision measurement mark for semiconductor photomask manufacture |
| 12/31/1996 | US5590239 Planar uniform heating surface with additional circumscribing ring |
| 12/31/1996 | US5589305 Semiconductors |
| 12/31/1996 | US5589304 Photomask comprising a holding frame and reinforcing member with a ceramic oxide bond |
| 12/31/1996 | US5589303 Substrate with optical mask, photoresists pattern for multilayer element and etching |
| 12/27/1996 | EP0749593A1 Light-sensitive material for photographic and reprographic applications |
| 12/24/1996 | US5587834 Semiconductor device manufacturing method and projection exposure apparatus using the same |
| 12/18/1996 | EP0748689A2 Information transmission system |
| 12/17/1996 | US5585918 Foreign particle inspecting system |
| 12/17/1996 | US5585916 Surface inspecting device |
| 12/17/1996 | US5585210 Mask pattern of a semiconductor device and a method of manufacturing fine patterns using the same |
| 12/10/1996 | US5584036 Process management apparatus and method for a prepress process storing progress status data segmented into job units and process steps of job progress |
| 12/10/1996 | US5583601 Photographic film sandwiches |
| 12/10/1996 | US5582939 Forming a pattern of an opaque light blocker on phase shift layer; etching |
| 12/10/1996 | US5582938 Prevention of ghost images |
| 12/05/1996 | WO1996038803A1 Computer controlled master reproducer for depositing a master reproduction on a substrate |
| 12/05/1996 | WO1996038763A1 Process for producing a structured mask |
| 12/05/1996 | WO1996038254A1 Plasma assisted chemical etching for fabricating flat panel displays |
| 12/05/1996 | DE19622037A1 Semiconductor photomask defect determination |
| 12/05/1996 | CA2222693A1 Computer controlled master reproducer for depositing a master reproduction on a substrate |
| 12/04/1996 | EP0745235A1 Photomask blanks |
| 12/04/1996 | EP0478576B1 Perfluoropolymer coated pellicles |
| 12/03/1996 | US5580700 Pre-purifying, demetallizing the ion exchange resin by washing with water, mineral acid second |
| 11/27/1996 | EP0744659A1 A process for dry lithographic etching |