| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 05/19/1992 | US5115456 Mask for exposing wafer with radiation and its exposing method |
| 05/19/1992 | US5114813 Method of forming stable images in electron beam writable glass compositions |
| 05/19/1992 | CA1300857C Method of producing films and jig for producing the same |
| 05/13/1992 | EP0485274A2 Image data inspecting method and apparatus |
| 05/13/1992 | EP0485062A2 Method of forming a pattern and projection exposure apparatus |
| 05/12/1992 | US5112707 Mask structure for lithography |
| 05/05/1992 | US5111491 X-ray lithography mask and method for producing same |
| 05/05/1992 | US5110698 Method of recording |
| 05/01/1992 | CA2054320A1 Ink composition and process for producing a lithographic printing plate using the same |
| 04/30/1992 | WO1992007032A1 Processless imaging to maximize blue light absorption of an image |
| 04/29/1992 | EP0482821A1 Highly light-transmitting dust protective film, process for preparation thereof and dust protective member |
| 04/28/1992 | CA1299423C Lightsafe masking film |
| 04/21/1992 | CA1299072C Method of cutting an organic membrane |
| 04/17/1992 | CA2053518A1 Highly light-transmitting dust protective film, process for preparation thereof and dust protective member |
| 04/15/1992 | EP0479791A1 Index marking article for superposed sheets |
| 04/14/1992 | US5104481 Forming amorphous silicon on transparent substrate; laser radiation; integrated circuit |
| 04/08/1992 | EP0479358A1 Light mask |
| 04/08/1992 | EP0478576A1 Perfluoropolymer coated pellicles. |
| 04/07/1992 | US5103102 Localized vacuum apparatus and method |
| 04/07/1992 | US5102756 Multilayered structure of base layer, photohardenable material and a layer of softenable material containing photosensitive migration marking material |
| 04/01/1992 | EP0478072A1 Process for making alignment marks for masks |
| 04/01/1992 | EP0477890A2 Processing method and apparatus |
| 04/01/1992 | EP0477443A1 A method for forming plate characters in a half-tone gravure platemaking process |
| 04/01/1992 | EP0477442A1 A method for forming plate characters in a half-tone gravure platemaking process |
| 04/01/1992 | EP0477441A1 A method for forming plate characters in a half-tone gravure platemaking process |
| 03/31/1992 | US5101420 Lithography and masking |
| 03/31/1992 | US5100957 Used in production of semiconductor integrated circuits, polyvinyl acetal thin film |
| 03/31/1992 | US5100503 Silica-based anti-reflective planarizing layer |
| 03/31/1992 | CA1298414C Linewidth loss measurement |
| 03/25/1992 | EP0477035A2 Phase shift layer-containing photomask, and its production and correction |
| 03/25/1992 | EP0476624A1 Method of and apparatus for modifying image |
| 03/24/1992 | US5098815 Process for the production of dielectric layers in planar circuits on ceramics substrates |
| 03/24/1992 | US5098515 Sputtering on a silicon wafer, annealing the composites |
| 03/24/1992 | US5098191 Method of inspecting reticles and apparatus therefor |
| 03/18/1992 | EP0475748A2 Foreign particle detecting apparatus |
| 03/18/1992 | EP0475694A2 Optical mask using phase shift and method of producing the same |
| 03/18/1992 | EP0475099A1 Process for preparing a mask for plate making and the materials therefor |
| 03/17/1992 | US5096801 Coating dispersionof photopolymerization initiator, image forming substance and polymierzable compound in a binder |
| 03/17/1992 | US5096791 Forming and oxidizing thin metal film on top side of substrate, etching away central portion of substrate from back side except for supportive frame surrounding etched portion, pattern delineation by photoresist on oxidized metal membrane |
| 03/17/1992 | CA1297598C Reticle frame assembly |
| 03/10/1992 | US5095511 Apparatus for verifying pattern data used in a step-and-repeat process for producing the same patterns regularly arranged on a substance |
| 03/10/1992 | US5095379 Color filter, liquid crystal display using same and method of repair thereof by using a negative photosensitive resin |
| 03/10/1992 | US5095330 Apparatus and method for forming an intermediate original sheet for printing a book |
| 03/04/1992 | EP0473332A1 X-Ray lithography mask and method for producing same |
| 03/04/1992 | CN2098055U Silver salt plate and plate-making machine |
| 03/04/1992 | CN1059209A Plate making technology for relief printing |
| 02/25/1992 | US5091979 Sub-micron imaging |
| 02/25/1992 | CA1296218C System for making covering masks for use in photoengraving |
| 02/20/1992 | WO1992002858A1 Process for producing microstructures with locally different structural heights |
| 02/18/1992 | US5089361 Mask making process |
| 02/18/1992 | US5089085 Silicon carbide membrane for x-ray lithography and method for the prepartion thereof |
| 02/12/1992 | EP0470386A2 Method for depositing an inorganic thin film on a substrate |
| 02/12/1992 | EP0470232A1 Three dimensional plating or etching process and masks therefor |
| 02/11/1992 | US5087537 Depositing photoresist on a substrate, preferential exposure of photoresist and analyzing for accuracy |
| 02/11/1992 | US5087535 Applying photoresist; light exposure and development; etching |
| 02/04/1992 | US5085957 Method of repairing a mask |
| 02/04/1992 | US5085908 Lightsafe masking film |
| 02/04/1992 | US5085899 Electroconductive tackifier paint coated on pellicle frame |
| 01/29/1992 | EP0468274A2 Method of forming an electrode on a mask for manufacturing semiconductor devices, spinner for applying resist to a semiconductor-manufacturing mask, and mask-housing case |
| 01/22/1992 | EP0467445A1 Apparatus for projecting a mask pattern on a substrate |
| 01/22/1992 | EP0467076A2 Method and apparatus for fabricating microstructures on a photosensitively layered substrate by means of focussed laser radiation |
| 01/21/1992 | US5082695 Doped silicon carbide |
| 01/15/1992 | EP0466189A2 X-ray mask structure, preparation thereof and X-ray exposure method |
| 01/15/1992 | EP0465949A2 Light sensitive registration element, fabrication and processing and apparatus for implementing said process |
| 01/15/1992 | EP0465727A1 Process for the production of linework and/or halftone pattern |
| 01/08/1992 | EP0464843A2 Patterning method using an inorganic masking layer |
| 01/08/1992 | EP0464492A1 A photomask used by photolithography and a process of producing the same |
| 01/07/1992 | US5079430 Ultraviolet radiation projector and optical image forming apparatus |
| 01/07/1992 | US5079113 For optical memory devices, protective coating of silicon dioxide for increased durability of metallic light shielding films |
| 01/02/1992 | EP0463319A1 Ablation mask and use thereof |
| 01/01/1992 | CN2091764U Dual-purpose plate-making machine for visiting card |
| 12/27/1991 | EP0462698A2 Masks for high quality images from total internal reflection holograms |
| 12/27/1991 | EP0462560A1 A reticle with phase-shifters and a method of fabricating the same |
| 12/26/1991 | WO1991020018A1 Mask for shifting phase |
| 12/18/1991 | EP0461885A2 Film for pellicle |
| 12/18/1991 | EP0461778A1 Method for producing a mask pattern |
| 12/12/1991 | DE4018608A1 Prodn. of offset printing plate - involves text applied to transparent paper by laser printer |
| 12/10/1991 | US5071671 Process for forming pattern films |
| 12/04/1991 | EP0459737A2 Reticle for a reduced projection exposure apparatus |
| 11/28/1991 | WO1991018312A1 Unit magnification optical system with improved reflective reticle |
| 11/27/1991 | EP0458539A2 X-ray exposure apparatus and a mask usable therewithin |
| 11/19/1991 | US5066533 Boron nitride membrane in wafer structure and process of forming the same |
| 11/14/1991 | WO1991017483A1 Illumination device |
| 11/13/1991 | EP0456479A2 Pattern forming process, apparatus for forming said pattern and process for preparing semiconductor device utilizing said pattern forming process |
| 11/12/1991 | CA1291893C Distortion resistant polyester support for use as a phototool |
| 10/31/1991 | DE4113968A1 Mask structure for semiconductor component prodn. - has transparent support plate on which are periodically set given groups of component structures with phase shift structures |
| 10/30/1991 | EP0454169A2 Photomask and method of treating the same |
| 10/30/1991 | EP0453753A2 Method and apparatus for enhancing the depth of focus in projection lithography |
| 10/30/1991 | EP0148238B1 High energy beam sensitive glasses |
| 10/29/1991 | US5061956 Optically imaging method and apparatus |
| 10/29/1991 | US5061851 Inspection method and device for an aperture in a focused ion beam generating apparatus |
| 10/29/1991 | US5061595 High-contrast, room-light-handleable black-and-white photographic film |
| 10/29/1991 | US5061024 Dust defocusing covers for photomasks; transmits high percentage of light in UV range |
| 10/23/1991 | EP0453310A1 Mask for photolithography |
| 10/23/1991 | EP0453133A2 Method and apparatus for manufacture of X-ray mask |
| 10/22/1991 | US5059451 Reflection-preventive pellicle film and process for preparation thereof |
| 10/19/1991 | CA2037705A1 Method and apparatus for enhancing the depth of focus in projection lithography |
| 10/16/1991 | EP0452043A1 X-ray mask structure |
| 10/16/1991 | EP0452027A2 Correction of defects in colour filters |
| 10/16/1991 | EP0451307A1 Phase mask for photolithographic projection and process for its preparation |