| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 04/11/1995 | US5405734 Applying photoresist; exposure to light; solvent removal of exposured photoresist |
| 04/11/1995 | US5405721 Phase-shifting lithographic masks having phase-shifting layers of differing compositions |
| 04/06/1995 | DE4434060A1 Phase-shifting mask and method for repairing a defect in a phase-shifting mask |
| 04/04/1995 | US5404410 Method and system for generating a bit pattern |
| 04/04/1995 | US5404364 Optically pumped X-ray laser and applications thereof |
| 04/04/1995 | US5403685 Defining phase shifting edges in resist layer, irradiating to produce dark interference bands, developing exposed resist, hardening dark band sections, coating with second resist layer, projecting light pattern, developing |
| 04/04/1995 | US5403683 Photo-mask |
| 04/04/1995 | US5403682 Alternating rim phase-shifting mask |
| 04/04/1995 | US5403681 Shadow printing or projection printing by means of a reticle; photolithography; first layer of chip pattern does not overlie the edge |
| 03/28/1995 | US5401932 Method of producing a stencil mask |
| 03/23/1995 | DE4433879A1 Method and device for cutting out pictures |
| 03/22/1995 | EP0644502A1 Laser plotter |
| 03/22/1995 | EP0643645A1 A method and a device for retaining a thin medium between two bodies. |
| 03/22/1995 | EP0558555B1 Diffusion transfer receiver |
| 03/21/1995 | US5400118 Process and apparatus for printing periodicals and the like |
| 03/21/1995 | US5399448 Reflection mask for X ray |
| 03/21/1995 | US5399398 Photomask container |
| 03/16/1995 | WO1995007507A1 Method for the electronic assembly of printer's forms |
| 03/16/1995 | DE4401534C1 Checking device (matching device) for visually assessing flexible copies using reflected light |
| 03/15/1995 | EP0643331A2 Halftone phase shift photomask, halftone phase shift photomask blank, and method of producing the blank |
| 03/15/1995 | EP0643330A1 A method and device for creation of imposition data, original film making and platemaking |
| 03/15/1995 | EP0642423A1 A method and an apparatus for illuminating points on a medium. |
| 03/14/1995 | US5397665 Surface treatment with hexamethyldisilazane, storage stability |
| 03/14/1995 | US5397664 Phase mask for projection lithography and method for the manufacture thereof |
| 03/14/1995 | US5397663 Phase shift mask and method of manufacturing the same |
| 03/14/1995 | US5397634 Transferable protective cover layers |
| 03/14/1995 | US5397607 Input/output (I/O) thin film repair process |
| 03/08/1995 | EP0642254A1 Sheet fixing device for a drum of a scanner |
| 03/08/1995 | EP0641648A1 Method and apparatus for the production of photopolymeric printing plates |
| 03/07/1995 | US5396312 Apparatus for optically forming pattern |
| 03/07/1995 | US5395739 Photoresists |
| 03/07/1995 | US5395718 Conformal photolithographic method and mask for manufacturing parts with patterned curved surfaces |
| 03/07/1995 | US5395414 Display panel with a large realistic digitized high fidelity visual pattern and method for producing the same |
| 03/02/1995 | DE4430198A1 Device and method for investigating the performance of a phase-shift reticle |
| 02/28/1995 | US5394219 Exposure apparatus and method of exposure using the same |
| 02/28/1995 | US5393988 Mask and charged particle beam exposure method using the mask |
| 02/28/1995 | US5393623 Exposure apparatus employing a photomask |
| 02/28/1995 | US5393580 High resolution relief images |
| 02/23/1995 | WO1995005623A1 Ablation transfer onto intermediate receptors |
| 02/21/1995 | US5391441 Exposure mask and method of manufacture thereof |
| 02/14/1995 | US5389476 Method for producing life-sized decals |
| 02/14/1995 | US5389474 Vapor deposition of opaque metal film, pattering by etching, forming transparent stepped portion on substrate having inclined area |
| 02/08/1995 | EP0637393A1 Resolution-enhancing optical phase structure for a projection illumination system |
| 02/07/1995 | US5388192 Image layout processing method and apparatus |
| 02/07/1995 | US5387486 Radiation-polymerizable mixture and process for producing a solder resist mask |
| 02/07/1995 | US5387485 Phase shift photomask |
| 02/07/1995 | US5387484 For use with lasers for ablation of ceramics, polymers and metals; blocking, reflecting, transmission of beams |
| 02/02/1995 | DE4422038A1 Exposure method for the production of semiconductor components, and a diffraction mask used for this purpose |
| 02/01/1995 | EP0636586A1 Photomask substrate plate of synthetic fused silica glass for photolithography |
| 01/31/1995 | US5386267 Light integrating cavity for a film scanner |
| 01/25/1995 | EP0634973A1 Lithographic mask, comprising a membrane having improved strength |
| 01/24/1995 | US5384463 Pattern inspection apparatus and electron beam apparatus |
| 01/24/1995 | US5384219 Reticle with structurally identical inverted phase-shifted features |
| 01/24/1995 | US5384218 Photomask and pattern transfer method for transferring a pattern onto a substrate having different levels |
| 01/19/1995 | WO1995001874A1 Improved method of setting printing plates |
| 01/18/1995 | EP0634695A1 Laser imaged printing plate |
| 01/17/1995 | US5382999 Optical pattern projecting apparatus |
| 01/17/1995 | US5382495 Cellulose ester, hydroxylated resin, crosslinking agent, silica and acid catalyst |
| 01/17/1995 | US5382484 Method of correcting defects in the pattern of phase shift mask |
| 01/17/1995 | US5382483 Exposure to patterns, masking, radiation and forming spacer of phase shifting material |
| 01/17/1995 | US5382340 Measurement, adjustment during deposition |
| 01/17/1995 | CA2037063C Optical machining apparatus |
| 01/10/1995 | US5381225 Surface-condition inspection apparatus |
| 01/10/1995 | US5380609 Method for fabricating photomasks having a phase shift layer comprising the use of a positive to negative resist, substrate imaging and heating |
| 01/10/1995 | US5380608 Substrate with patterns and etch stopping layer |
| 01/10/1995 | US5380584 High speed laser printing, vanadium pentoxide gel |
| 01/03/1995 | US5379368 Printing control method and apparatus |
| 01/03/1995 | US5379348 Pattern defects inspection system |
| 01/03/1995 | US5379233 Circuit chip |
| 01/03/1995 | US5378514 Frame-supported pellicle for photolithography |
| 12/27/1994 | US5376802 Stencil mask and charge particle beam exposure method and apparatus using the stencil mask |
| 12/27/1994 | US5376483 Method of making masks for phase shifting lithography |
| 12/22/1994 | WO1994029768A1 Randomised mask for a diffusing screen |
| 12/22/1994 | DE4420683A1 Method for producing a phase-shift mask |
| 12/20/1994 | US5375157 X-ray mask structure and a production method thereof, an exposure method using the X-ray mask structure, and a device fabricated by using the X-ray mask structure |
| 12/15/1994 | DE4420417A1 Method of manufacturing a mask for producing a pattern on a semiconductor component |
| 12/15/1994 | DE4420409A1 Photomask (mask) with patterns for the reduction of the performance of a stepper |
| 12/15/1994 | DE4420408A1 Photomask (mask) for measuring the line width of a semiconductor device |
| 12/14/1994 | EP0628806A2 Image measurement system and method |
| 12/13/1994 | US5373373 Scanning apparatus |
| 12/13/1994 | US5372916 X-ray exposure method with an X-ray mask comprising phase shifter sidewalls |
| 12/13/1994 | US5372901 Removable bandpass filter for microlithographic aligners |
| 12/13/1994 | US5372651 Making glass surface hydrophilic by uv rad generation of ozone ; for semiconductors |
| 12/08/1994 | WO1994028083A1 Antistatic agent and method for suppressing electrification |
| 12/08/1994 | WO1994024608A3 Method of preparation of mask for ion beam lithography |
| 12/07/1994 | EP0627846A1 Digital color proofing system |
| 12/07/1994 | EP0627664A1 Method for the repair of phase shifting masks |
| 12/07/1994 | EP0627123A1 Laser generated i.c. mask |
| 12/07/1994 | EP0627097A1 Multiple assembly register system |
| 12/06/1994 | US5370975 Phase shift mask having phase shifter with edge angle frfo 70 to 85 degrees or 95 to 110 degrees |
| 12/06/1994 | US5370951 Fluorocarbon-containing polysiloxane as adhesive; having silicon-bonded hydrogen atoms and vinyl groups for catalytic hydrosilation, crosslinking |
| 11/29/1994 | US5369425 Device for automatically clamping and releasing recording material and operation of said device |
| 11/29/1994 | US5368963 Photomask and method of fabricating the same |
| 11/29/1994 | US5368962 Lightsafe |
| 11/29/1994 | US5368675 Method for the preparation of a frame-supported pellicle for photolithography |
| 11/24/1994 | WO1994027188A1 Device for masking substrates to be processed |
| 11/24/1994 | WO1994027187A1 Fabrication of microcomponents |
| 11/24/1994 | DE4317081A1 Liquid-crystalline medium |
| 11/23/1994 | EP0625727A1 Improved tone rendition of halftone images by projection exposure |
| 11/22/1994 | US5367613 Abstract pattern plate making system and printed matter printed thereby |