| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 06/29/1994 | EP0603743A2 Method for preparing negative-working wash-off relief images and elements for use therein |
| 06/29/1994 | EP0603714A1 Method of and apparatus for automatically outputting the image of a page |
| 06/28/1994 | US5325471 Method of and apparatus for modifying image by adjusting modification coefficients |
| 06/28/1994 | US5324600 Method of forming resist pattern and photomask therefor |
| 06/22/1994 | EP0602634A1 Large die photolithography |
| 06/22/1994 | EP0602605A2 Method of and apparatus for allocating data to the pages of a book |
| 06/22/1994 | EP0602547A2 Method of executing a reproduction process and apparatus used therefor |
| 06/22/1994 | EP0602200A1 System for detecting a latent image using an alignment apparatus |
| 06/21/1994 | US5323440 Semiconductor device manufacturing exposure method |
| 06/21/1994 | US5323207 Projection exposure apparatus |
| 06/21/1994 | US5322749 Phase shift mask and method of making the same |
| 06/21/1994 | US5322748 Photomask and a method of manufacturing thereof comprising trapezoidal shaped light blockers covered by a transparent layer |
| 06/16/1994 | DE4241611A1 High contrast copy prodn. by electrophotographic on blue print film - by fixing toner image, exposure and development of azo dyestuff and use as original in photolithographic printing plate prodn. |
| 06/14/1994 | US5321495 Optical detecting system for determining particle position on a substrate |
| 06/09/1994 | WO1994012912A1 Metal ion reduction in bottom anti-reflective coatings for photoresists |
| 06/09/1994 | WO1994012911A1 Method and apparatus for fabricating microlenses |
| 06/08/1994 | EP0600708A1 Reflection type mask and manufacture of microdevices using the same |
| 06/08/1994 | EP0600472A2 Method and apparatus for automatically selecting process information for execution during printing of a page |
| 06/08/1994 | EP0599989A1 Infra-red direct write imaging media. |
| 06/07/1994 | US5318869 Method and apparatus for repairing defects in emulsion masks and the like |
| 06/07/1994 | US5318868 Photomask and method for manufacturing semiconductor device using photomask |
| 06/07/1994 | US5318687 Controlling grain size of gold layer by inclusion of arsenic |
| 06/07/1994 | CA2020237C Device manufacture involving lithographic processing |
| 06/01/1994 | EP0599720A2 Photosensitive article and process for transferring an image thereto |
| 06/01/1994 | EP0599367A1 Focused ion beam processing with charge control |
| 06/01/1994 | EP0599361A1 Method of inspecting phase shift masks employing phase-error enhancing |
| 06/01/1994 | EP0598926A1 Process and apparatus for the manufacturing of flexographic printing plates |
| 05/31/1994 | US5316966 Method of providing mask alignment marks |
| 05/31/1994 | US5316896 Method of forming a pattern |
| 05/31/1994 | US5316878 Pattern forming method and photomasks used therefor |
| 05/26/1994 | WO1994011787A1 Method of deposition |
| 05/26/1994 | WO1994011786A1 Photomask blanks |
| 05/26/1994 | DE4339481A1 Phase-shift mask for semiconductor device mfr. - has pattern contg. two transparent sections and phase reversal introduced by one section of pattern deposited as metal silicide, nitride or oxide film |
| 05/26/1994 | CA2149645A1 Method of deposition |
| 05/25/1994 | EP0598672A1 Method of making a rim-type phase-shift mask |
| 05/25/1994 | EP0598406A1 Method of and apparatus for producing register mark pattern |
| 05/24/1994 | US5314769 Method for producing color filter |
| 05/24/1994 | US5314768 Thin film mask for use in an x-ray lithographic process and its method of manufacture by forming opaque pattern of ions in a diamond layer |
| 05/24/1994 | US5314728 Capture layer and method for delayed entrapment of contaminant particles |
| 05/24/1994 | US5314709 Unzippable polymer mask for screening operations |
| 05/17/1994 | US5312671 Polymer matrix containing quaternary ammonium compound |
| 05/17/1994 | US5312654 Method for directly making printing plates using ink-jet system |
| 05/11/1994 | WO1994010633A1 Rasterizer for a pattern generation apparatus |
| 05/11/1994 | EP0596668A2 Process for imaging of photoresist |
| 05/11/1994 | DE4237767A1 Cleaning of particulate-contaminated surfaces e.g. of masks or wafers for semiconductor device mfr. - exploits pressure gradient set up over length of workpiece by flow of gas through ducts along its opposite faces |
| 05/11/1994 | CA2148121A1 Rasterizer for a pattern generation apparatus |
| 05/10/1994 | US5311275 Apparatus and method for detecting particles on a substrate |
| 05/10/1994 | US5311252 Method of proximity imaging photolithographic structures for ink jet printers |
| 05/10/1994 | US5311250 Pellicle mounting apparatus |
| 05/10/1994 | US5310623 As a replica in a photoresist material which is used to reproduce directly in a substrate |
| 05/04/1994 | EP0595750A1 An alternating RIM phase-shifting mask. |
| 05/04/1994 | EP0595196A1 Optical focus test pattern monitoring system and process |
| 05/04/1994 | EP0594676A1 method for producing DIAMOND MEMBRANES FOR X-RAY LITHOGRAPHY |
| 05/03/1994 | US5308991 Method and apparatus for making a predistorted reticle to compensate for lens distortions |
| 05/03/1994 | US5308741 Radiation; semiconductors |
| 05/03/1994 | US5308722 Voting technique for the manufacture of defect-free printing phase shift lithography |
| 05/03/1994 | US5308721 Self-aligned method of making phase-shifting lithograhic masks having three or more phase-shifts |
| 04/28/1994 | WO1994008795A1 35 mm format transparencies |
| 04/26/1994 | US5307181 Screen generation for halftone screening of images using scan line segments of oversized screen scan lines |
| 04/26/1994 | US5306585 Mask for manufacturing semiconductor device and method of manufacture thereof |
| 04/26/1994 | US5306584 Scanning grid pattern to obtain information on its location; transparent to exposing radiation |
| 04/19/1994 | US5304437 Barrier to reduce damage to reflector during patterning |
| 04/19/1994 | CA2013245C X-ray lithography mask and devices made therewith |
| 04/14/1994 | WO1994008274A1 Method and apparatus for converting image color values from a first to a second color space |
| 04/12/1994 | US5302477 Plurality of rim phase-shifted opening patterns in closely spaced array |
| 04/12/1994 | US5302198 Coating solution for forming glassy layers |
| 04/06/1994 | EP0590755A1 A process for the manufacture of printing reticles |
| 04/06/1994 | EP0590668A1 Method and apparatus for producing overlapping image area |
| 04/06/1994 | EP0590627A2 Improved photomask for semiconductor fabrication |
| 04/05/1994 | US5300786 Optical focus phase shift test pattern, monitoring system and process |
| 04/05/1994 | US5300379 Patterning, etching, removing thickness from substrate |
| 04/05/1994 | US5300378 Method of producing a phase shifting mask |
| 04/05/1994 | US5300377 Preventing the occurance of bridge pattern film by forming light shielded chrome film on silicone substrates |
| 04/05/1994 | US5300348 Frame-supported pellicle for photolithography, comprising a fluorocarbon containing organopolysiloxane based adhesive |
| 03/31/1994 | WO1994007179A1 Method and apparatus for the photolithographic exposure of excess photoresist on a substrate |
| 03/31/1994 | DE4232844A1 Exposure method for optical projection lithography used in integrated circuit mfr. - applying imaged structure to non-planar surface of exposure mask to increase image sharpness |
| 03/30/1994 | CN1084458A Needle drawing membrane and its making method |
| 03/29/1994 | US5298365 Size-reducing projection exposure optical system |
| 03/29/1994 | US5298352 Emulsion printing plates and evacuation channels |
| 03/29/1994 | US5298351 Patterned multilayer structure |
| 03/23/1994 | EP0588580A2 Method for making stencil master plates, and original paper sheet for stencil printing, stencil master plate sheet assembly, and stencil printing device suitable for use with the method |
| 03/23/1994 | EP0588283A1 Method of and apparatus for producing a unit pattern on a printing cylinder for printing an endless pattern |
| 03/22/1994 | US5297243 Cutout mask production apparatus and method |
| 03/22/1994 | US5296891 Illumination device |
| 03/22/1994 | US5296729 Semiconductor memory device having static random access memory |
| 03/22/1994 | US5295434 Process for making preliminarily printed formed body |
| 03/17/1994 | WO1994006060A1 Image-transfer process |
| 03/16/1994 | CN1083779A Pattern formation in photohardenable dielectric layers |
| 03/15/1994 | US5294506 Photomask |
| 03/10/1994 | DE4329803A1 Projection exposure method for ultra large scale integration chip mfr. - diffracting exposure light beam to eliminate perpendicular incidence angle component |
| 03/09/1994 | EP0585872A2 Phase shift photomask, phase shift photomask blank, and process for fabricating them |
| 03/08/1994 | US5292623 Method for forming integrated circuit devices using a phase shifting mask |
| 03/08/1994 | US5292556 Method for preparing negative-working wash-off relief images |
| 03/02/1994 | EP0585017A1 Scanning apparatus |
| 03/01/1994 | US5291536 X-ray mask, method for fabricating the same, and pattern formation method |
| 03/01/1994 | US5290647 Transparent substrate, phase shifting member, light blocking member |
| 02/23/1994 | EP0583942A2 Phase-shifting lithographic masks having phase-shifting layers of differing compositions |
| 02/23/1994 | EP0583714A2 Method for preparing high-resolution wash-off images and non-photosensitive elements for use therein |
| 02/22/1994 | US5288569 Phase-shifting masks for photolithography |
| 02/22/1994 | US5288568 Optical spacer method for preventing null formation in phase shifted photomasks |