| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 04/23/1996 | US5510230 Device fabrication using DUV/EUV pattern delineation |
| 04/23/1996 | US5510228 2-cyano-3,3-diarylacrylate UV dyes for laser recording process |
| 04/23/1996 | US5510227 Heating by laser; curcumin yellow dye |
| 04/23/1996 | US5510214 Eliminating ghlost lines, improving focus depth, edge definition |
| 04/17/1996 | EP0707236A2 Masks with low stress multilayer films and a process for controlling the stress of multilayer films |
| 04/17/1996 | CN1120732A 相移掩模 Phase shift mask |
| 04/16/1996 | US5509041 X-ray lithography method for irradiating an object to form a pattern thereon |
| 04/16/1996 | US5508803 For imaging a gray scale feature |
| 04/16/1996 | US5508133 For preventing damage to photoresist films caused by irregular reflections of light from inclines adjacent to depressions |
| 04/16/1996 | US5508132 Phase-shifted, easily inspected for defects; transparent portion for light of given wavelength |
| 04/11/1996 | DE19534132A1 Light proximity-correction system for integrated circuit mfr. |
| 04/10/1996 | EP0706088A1 Photomask for use in etching patterns |
| 04/10/1996 | EP0643645B1 A method and a device for retaining a thin medium between two bodies |
| 04/09/1996 | US5506086 Selectively removing an infrared ablatable layer by a laser beam |
| 04/09/1996 | US5506080 Lithographic mask repair and fabrication method |
| 04/03/1996 | EP0705024A2 Method of generating color separation images and apparatus for the same |
| 04/02/1996 | US5504793 Magnification correction for 1-X proximity X-Ray lithography |
| 04/02/1996 | US5504691 Method and device for tracking down a prespecified subcircuit in an electrical circuit, method for constructing integrated circuit masks using the method |
| 04/02/1996 | US5504339 Method of repairing a pattern using a photomask pattern repair device |
| 04/02/1996 | US5503951 Photolithographic mask for semiconductor |
| 04/02/1996 | US5503950 Reflection type mask and manufacture of microdevices using the same |
| 04/02/1996 | US5503902 Light control material |
| 03/28/1996 | WO1996009571A1 Protective mask for pellicle |
| 03/28/1996 | WO1996009183A1 Optical pellicle membrane to frame adhesion method |
| 03/28/1996 | DE4435022A1 Grey tone mask for lithographic micro-structuring of optical device |
| 03/27/1996 | EP0702806A1 Method of photolithographically metallizing at least the inside of holes arranged in accordance with a pattern in a plate of an electrically insulating material |
| 03/26/1996 | US5502306 Electron beam inspection system and method |
| 03/26/1996 | US5501926 Dichromatic photomask and a method for its fabrication |
| 03/26/1996 | US5501925 High power masks and methods for manufacturing same |
| 03/19/1996 | US5500312 Alternating layers with compressive and tensile stress, patterning semiconductor wafers |
| 03/13/1996 | EP0700761A1 Punch apparatus for an image recording device |
| 03/13/1996 | CN1118457A Photo mask, method for producing the same, pattern forming method, method of manufacturing semiconductor device and mask pattern design system |
| 03/13/1996 | CN1118456A Photo mask |
| 03/12/1996 | US5499304 Light mask |
| 03/12/1996 | US5499076 For projecting a pattern |
| 03/12/1996 | US5498923 Fluoresence imaging |
| 03/12/1996 | US5498579 Method of producing semiconductor device layer layout |
| 03/12/1996 | US5498497 Glass with mask and chromium pattern, photoresists layers |
| 03/05/1996 | US5496695 Medical diagnostic and graphic arts films exposed by lasers and light emitting diodes |
| 03/05/1996 | US5496669 System for detecting a latent image using an alignment apparatus |
| 03/05/1996 | US5496667 Forming film of x-ray absorber by sputtering in inert gas containing nitrogen using a target of tungsten with or without added titanium; lithography; low internal stress, high dimensional accuracy |
| 03/05/1996 | US5496666 Contact hole mask for semiconductor fabrication |
| 03/05/1996 | US5495959 Method of making substractive rim phase shifting masks |
| 03/05/1996 | US5495803 Method of forming a photomask for a printing plate with an ink jet |
| 03/05/1996 | CA2032413C Fabrication of complementary patterns for exposing semiconductor chips with self-supporting masks |
| 02/28/1996 | EP0698916A2 Method of optical lithography using phase shift masking |
| 02/28/1996 | EP0698821A1 High resolution phase edge lithography without the need for a trim mask |
| 02/28/1996 | EP0698498A2 Device for making stamps |
| 02/28/1996 | CN1117652A Vernier |
| 02/24/1996 | CA2156781A1 Print making device |
| 02/22/1996 | DE19527314A1 Fabrication of silicon membrane with predefined parameters |
| 02/21/1996 | EP0697630A1 X-ray mask support |
| 02/21/1996 | EP0563257B1 A method of cloning printed wiring boards |
| 02/20/1996 | US5493509 Method of and apparatus for generating mask layouts |
| 02/20/1996 | US5492587 Method for using glass substrate surface modifiers in the fabrication of photochemically stable deep ultraviolet pellicles |
| 02/15/1996 | DE19529170A1 Photolithography mask prodn. system |
| 02/14/1996 | EP0696760A1 Mask protective device |
| 02/14/1996 | CN1116731A 曝光掩模 Exposure mask |
| 02/13/1996 | US5491045 Image dye combination for laser ablative recording element |
| 02/13/1996 | US5490896 Etching resistance; semiconductor devices |
| 02/08/1996 | WO1996003641A1 Scanning probe microscope assembly |
| 02/08/1996 | DE19527681A1 Irradiation projection method for mask exposure in e.g. DRAM chip prodn. |
| 02/07/1996 | EP0486581B1 Device for automatically clamping and releasing a recording medium and its operation |
| 02/06/1996 | US5489621 Process for forming colored partial picture element and light-shielding light-sensitive resin composition used therefor |
| 02/06/1996 | US5489509 Mask, mask producing method and pattern forming method using mask |
| 02/01/1996 | WO1996002825A1 Automated photomask inspection apparatus and method |
| 02/01/1996 | DE19527683A1 Verfahren zur Herstellung einer Fotomaske für die Fertigung einer Halbleitervorrichtung A process for the manufacture of a photomask for manufacturing a semiconductor device |
| 01/31/1996 | CN1115876A Method of optical lithography using phase shift masking |
| 01/30/1996 | US5487963 Phase shifting mask wherein light transmitted through second transmission areas intensifies light through first transmission areas |
| 01/30/1996 | US5487962 Forming on transparent substrate raised transparent phase shifters including verticle and tapered edges which are etched into substrate |
| 01/30/1996 | CA2070257C Optical pellicle holder |
| 01/25/1996 | WO1996002021A1 Original form for lithographic plate and process for preparing lithographic plate |
| 01/24/1996 | CN1115418A Phase shift mask and method for fabricating the same |
| 01/24/1996 | CN1115417A Phase shift mask |
| 01/24/1996 | CN1115414A Photomask for the measurement of resolution of exposure equipment |
| 01/24/1996 | CN1115412A Method for fabricating a phase shift mask |
| 01/24/1996 | CN1115411A Half-tone type phase shift mask and method for fabrication thereof |
| 01/24/1996 | CN1115410A Photo mask provided with development rate measuring pattern and method for measuring development rate uniformity |
| 01/24/1996 | CN1115409A Method for forming photoresist patterns |
| 01/24/1996 | CN1115408A Half-tone type phase shift mask and method for fabricating the same |
| 01/23/1996 | US5486851 Illumination device using a pulsed laser source a Schlieren optical system and a matrix addressable surface light modulator for producing images with undifracted light |
| 01/23/1996 | US5486449 Photomask, photoresist and photolithography for a monolithic IC |
| 01/17/1996 | EP0692826A2 Method to suppress subthreshold leakage due to sharp isolation corners in submicron FET structures |
| 01/17/1996 | CN1115044A Phase shift mask and method for fabricating the same |
| 01/16/1996 | US5485495 X-ray mask, and exposure apparatus and device production using the mask |
| 01/16/1996 | US5484684 Photochemical or mechanical production of flexible printing plates |
| 01/16/1996 | US5484672 Method of making a rim-type phase-shift mask |
| 01/16/1996 | US5484671 Mask for manufacturing semiconductor device and method of manufacture thereof |
| 01/09/1996 | US5483447 Apparatus for tripping a system for the protection of occupants of a vehicle |
| 01/09/1996 | US5482802 Material removal with focused particle beams |
| 01/09/1996 | US5482801 High power phase masks for imaging systems |
| 01/09/1996 | US5482800 Mulitlayer element for photoresists masking with apertures |
| 01/09/1996 | US5482799 Defect detection; homogenous monolayer and transmitting films |
| 01/04/1996 | DE19519017A1 Method of improving structure with different component elements |
| 01/03/1996 | EP0690347A1 X-ray lithography method for irradiating an object to form a pattern thereon |
| 01/03/1996 | EP0689686A1 A thin film mask for use in an x-ray lithographic process and its method of manufacture |
| 01/02/1996 | US5481662 Method of and apparatus for modifying base separation figure |
| 01/02/1996 | US5481624 Mask inspecting method and mask detector |
| 01/02/1996 | US5481366 Method of and apparatus for producing a unit pattern on a printing cylinder for printing an endless pattern |
| 01/02/1996 | US5481362 Apparatus for projecting a mask pattern on a substrate |