| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 10/12/1993 | US5252434 Method for forming a sloped surface having a predetermined slope |
| 10/12/1993 | CA2066193C Method of producing a thin silicon-on-insulator layer |
| 10/06/1993 | EP0564348A1 Frame-supported pellicle |
| 10/06/1993 | EP0563257A1 A method of cloning printed wiring boards. |
| 10/06/1993 | EP0220233B1 Target keys for wafer probe alignment |
| 10/05/1993 | US5251140 E-beam control data compaction system and method |
| 10/05/1993 | US5250983 Photo reticle for fabricating a semiconductor device |
| 10/05/1993 | CA1322684C Mask repair |
| 09/30/1993 | WO1993018918A1 Non-film lithographic imaging |
| 09/28/1993 | US5248575 Photomask with phase shifter and method of fabricating semiconductor device by using the same |
| 09/28/1993 | US5248574 Photomask |
| 09/21/1993 | US5247557 X-ray mask structure, manufacturing method, x-ray exposure method using same, and device manufactured by using same |
| 09/21/1993 | US5247329 Projection type exposure method and apparatus |
| 09/21/1993 | US5246804 Method of retouching pattern |
| 09/21/1993 | US5246802 Sputtering thin film on target consisting of silicon carbide and carbon |
| 09/21/1993 | US5246801 Method of repairing indentations in phase-shifting lithographic masks |
| 09/21/1993 | US5246800 Photolithographically fabricating features on a very large scale integrated circuit wafer |
| 09/21/1993 | US5246799 Method of removing excess material, for repairing phase-shifting lithographic masks |
| 09/21/1993 | US5246767 Multilayer, perfluoroalkyl acrylate polymer |
| 09/14/1993 | US5245470 Polarizing exposure apparatus using a polarizer and method for fabrication of a polarizing mask by using a polarizing exposure apparatus |
| 09/14/1993 | US5244952 Casting solutions, projection printing in semiconductor industry |
| 09/14/1993 | US5244759 Single-alignment-level lithographic technique for achieving self-aligned features |
| 09/08/1993 | EP0558666A1 Topological image transfer method |
| 09/08/1993 | EP0558555A1 Diffusion transfer receiver. |
| 09/07/1993 | US5242770 Improved resolution, reduced proximity effects |
| 09/07/1993 | CA1321875C Use of a thermal transfer printer for producing a photomask |
| 09/02/1993 | WO1993017452A1 Laser generated i.c. mask |
| 09/02/1993 | WO1993017369A1 Multiple assembly register system |
| 08/31/1993 | US5240796 Polishing, patterning, planarizing, etching |
| 08/31/1993 | US5240780 Pressure sensitive adhesives |
| 08/26/1993 | DE4205301A1 Mehrfach-montage-registersystem Multiple-montage-register system |
| 08/25/1993 | EP0557008A2 Apparatus and method for electronic impositioning |
| 08/25/1993 | EP0557004A2 Apparatus and method for electronic impositioning |
| 08/25/1993 | EP0556669A1 Proximity mask alignment using a stored video image |
| 08/24/1993 | US5239625 Apparatus and method to merge images rasterized at different resolutions |
| 08/24/1993 | CA1321513C Lightsafe masking film |
| 08/17/1993 | US5237393 Reticle for a reduced projection exposure apparatus |
| 08/17/1993 | US5237368 Method and apparatus for forming an image with a reversible thermosensitive medium |
| 08/17/1993 | US5236794 Forming layer of compressible emulsionon support plate, selectively developing, placing spacers on top, placing spacers against layer of etchant resist, evacuating air, etching |
| 08/12/1993 | DE4203554A1 Flexible printing plate mechanical prodn. from light-sensitive plate - by cutting away sections of coloured covering film before exposure and development, for flexographic printing or varnishing |
| 08/10/1993 | US5235626 Segmented mask and exposure system for x-ray lithography |
| 08/10/1993 | US5234781 Mask for lithographic patterning and a method of manufacturing the same |
| 08/10/1993 | US5234780 Improved resolution |
| 08/10/1993 | US5234742 Pellicle for lithography |
| 08/10/1993 | US5234609 X-ray permeable membrane for X-ray lithographic mask |
| 08/04/1993 | EP0554150A1 Improvement in a frame-supported pellicle for protection of photolithographic mask |
| 08/04/1993 | EP0553543A1 Method for forming resist pattern |
| 07/27/1993 | US5231518 Image processing apparatus for preparing printing plates having lengthwise or crosswise patterns |
| 07/27/1993 | US5230971 Photomask blank and process for making a photomask blank using gradual compositional transition between strata |
| 07/27/1993 | US5230970 Radiation of an organometallic material on a substrate for reaction to form oxide |
| 07/22/1993 | WO1993014445A1 Improved mask for photolithography |
| 07/22/1993 | CA2124077A1 Improved mask for photolithography |
| 07/21/1993 | EP0551621A1 Self-aligned phase-shifting mask |
| 07/20/1993 | US5229255 Pattern delineation; destructive phase interference; integrated circuits |
| 07/20/1993 | US5229231 Method of integrated circuit manufacturing including cell assembly |
| 07/20/1993 | US5229230 Improved accuracy in transferring patterns to photoresist, interaction of diffraction light to increase intensity |
| 07/20/1993 | US5229229 Polyvinyl acetal and perfluoroalkyl acrylate |
| 07/14/1993 | CA2082869A1 Self-aligned phase-shifting mask |
| 07/13/1993 | US5227268 X-ray mask and its fabricating method-comprising a first and second alignment pattern |
| 07/13/1993 | CA1320070C2 Method of producing films and jig for producing the same |
| 07/08/1993 | DE4238441A1 Phase shift mask for submicron integrated circuit technology - has light-screening regions on opposite sides of each phase-shifting oxygen-ion implant region |
| 07/07/1993 | EP0550173A1 Integrated circuits |
| 07/06/1993 | US5225035 Method of fabricating a phase-shifting photolithographic mask reticle having identical light transmittance in all transparent regions |
| 06/30/1993 | EP0548312A1 Pressure relieving pellicle |
| 06/30/1993 | CN1073776A Preparation method of ferric oxide board |
| 06/29/1993 | US5224139 X-ray mask and semiconductor device manufacturing method using the same |
| 06/29/1993 | US5223693 Optical machining apparatus |
| 06/29/1993 | US5223372 Chemical mat film and a photosensitive film comprising an o-naphthoquinine diazide compound and a binder coated over the chemical mat film |
| 06/24/1993 | WO1993012467A1 A composition for peelable opaque film used in the preparation of printing plates, and for the varnish used to form such a film |
| 06/16/1993 | EP0546448A1 Emulsion printing plates and evacuation channels |
| 06/15/1993 | US5219686 Photomask |
| 06/15/1993 | CA1319043C Dust-proof film |
| 06/09/1993 | EP0545700A1 Method of compensating for non-uniform illumination in an X-ray lithography beamline |
| 06/08/1993 | US5218471 High-efficiency, multilevel, diffractive optical elements |
| 06/08/1993 | US5217831 Controlled heating, melting of material surrounding apertures in mask for backflow filling gives improved edge resolution, image quality |
| 06/08/1993 | US5217830 Method of fabricating phase shifting reticles using ion implantation |
| 06/08/1993 | US5217829 Method for producing photomasks |
| 06/01/1993 | US5215870 Inducing thermochromism by laser spectral emittance |
| 06/01/1993 | US5215869 Irradiation polymerization of 10,12-docosadiyndioc acid to blue homopolymer; further thermochromic induced color change |
| 05/26/1993 | EP0543569A1 Fabrication of phase-shifting lithographic masks |
| 05/26/1993 | EP0542768A1 Process for producing microstructures with locally different structural heights. |
| 05/25/1993 | US5214291 Pattern forming method |
| 05/25/1993 | US5213949 Uneven or irregular contact between masking film and substrate because of roughened surface |
| 05/25/1993 | US5213916 Photolithography, integrated circuits, layers with different optical transmissivities |
| 05/25/1993 | US5213043 Non-film lithographic imaging |
| 05/19/1993 | EP0542519A1 Undercut membrane mask for high energy photon patterning |
| 05/19/1993 | EP0542265A1 X-ray mask structure and x-ray exposing method, and semiconductor device manufactured by use of x-ray mask structure, and method for manufacturing x-ray mask structure |
| 05/19/1993 | EP0222787B1 Method and device for aligning, controlling and/or measuring bidimensional objects |
| 05/19/1993 | DE4235896A1 Repairing colour filter with blank spot in image or black matrix element - with coloured photosensitive transfer material by exposure through the filter |
| 05/19/1993 | CN1072273A Point-to-point photoetch method and system used for producing circular optical grating code disk |
| 05/18/1993 | US5212040 Carbonless paper for electrostatic imaging processes |
| 05/13/1993 | WO1993009469A1 Exposure device |
| 05/12/1993 | EP0541170A2 Method and device for tracking down a prespecified subcircuit in an electrical circuit, method for constructing integrated circuit masks using the method |
| 05/12/1993 | EP0540730A1 Soluble perfluoroelastomers and use in pellicles |
| 05/11/1993 | US5209996 Membrane consisting of silicon carbide and silicon nitride, method for the preparation thereof and mask for X-ray lithography utilizing the same |
| 05/05/1993 | EP0540169A1 Screen generation for halftone screening of images |
| 05/04/1993 | US5208680 Layout position designating sheet and method of mounting original using the same |
| 05/04/1993 | US5208125 Phase shifting reticle fabrication using ion implantation |
| 05/04/1993 | US5208124 Photolithography patterns |
| 04/28/1993 | EP0539006A1 Method of repairing phase shifting lithographic masks |