Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
01/1996
01/02/1996US5480764 Gray scale microfabrication for integrated optical devices
01/02/1996US5480747 Attenuated phase shifting mask with buried absorbers
01/02/1996US5480746 Photomask and method of forming resist pattern using the same
01/02/1996US5480529 Apparatus for depositing low stress films
01/02/1996US5480047 Method for forming a fine resist pattern
12/1995
12/27/1995EP0689094A1 Bleaching mask
12/26/1995US5478679 Half-tone self-aligning phase shifting mask
12/26/1995US5478678 A pattern multilayer of partial transmitting layer, phase shifting layer and opaque layer having pattern edges formed on each layer extending beyond
12/21/1995WO1995034608A1 Substrate coated with water-soluble salt
12/20/1995EP0687568A2 Image dye for laser ablative recording element
12/20/1995EP0687567A2 Barrier layer for laser ablative imaging
12/19/1995US5477466 Method of fabricating an integrated circuit
12/19/1995US5477344 Duplicating radiographic, medical or other black and white images using laser thermal digital halftone printing
12/19/1995US5477283 For projecting guide lines on a work surface
12/19/1995US5477058 Attenuated phase-shifting mask with opaque reticle alignment marks
12/19/1995US5476575 Flowing sodium nitrate between mask and cathode while applying voltage
12/13/1995EP0687102A2 Method of and apparatus for generating halftone image
12/13/1995EP0686999A2 Pattern formation in the fabrication of microelectronic devices
12/13/1995EP0686876A2 Attenuated phase shift mask and process for fabricating such a mask
12/12/1995US5475509 Method and apparatus for setting image processing conditions
12/12/1995US5474865 Globally planarized binary optical mask using buried absorbers
12/12/1995US5474864 Substrate transmitting exposure light, phase shift pattern formed on surface with first portion of exposed substrate, second portion of material having light phase converted by 180 degrees made of metal oxide, nitride oxide, silicide oxide
12/12/1995US5474807 Method for applying or removing coatings at a confined peripheral region of a substrate
12/05/1995US5473748 Method and apparatus for automatically selecting process information for execution during printing of a page
12/05/1995US5473413 Simplified process and apparatus for making plates used in printing
12/05/1995US5473407 Sheet fixing device for a drum of a scanner
12/05/1995US5472814 Orthogonally separated phase shifted and unphase shifted mask patterns for image improvement
12/05/1995US5472813 Exposing resist layer by use of phase shift of light transmitted through a reticle, developing, exposing corresponding pattern on resist layer using edge parts, patterns exposed to edge parts overlapping
12/05/1995US5472812 Forming a polysilicon and silicon nitride film on a substrate, patterning both layers by photolithography into desired shape, edge portion of silicon film is oxidized to silicon oxide transluscent region, while removing silicon nitride film
12/05/1995US5472811 Phase shifting mask structure with multilayer optical coating for improved transmission
12/05/1995US5472488 Coating solution for forming glassy layers
11/1995
11/28/1995US5470681 Phase shift mask using liquid phase oxide deposition
11/28/1995US5470661 Coating a diamond with a film of carbon for heat resistance
11/28/1995US5470621 Frames with coatings and transparent films
11/22/1995EP0627123A4 Laser generated i.c. mask.
11/21/1995US5469489 Production method of an x-ray mask structure, an x-ray mask structure produced thereby, and a device fabricated by using the x-ray mask structure
11/21/1995US5468591 Barrier layer for laser ablative imaging
11/21/1995US5468578 Method of making masks for phase shifting lithography to avoid phase conflicts
11/21/1995US5468577 Photomask having patterns to reduce power of a stepper
11/21/1995US5468576 Immersing substrate with resist layers in solution containing phase shifter by prescribed thickness by deposition from solution
11/21/1995US5468337 Method of mending a defect in a phase shift pattern
11/21/1995US5468324 Spin-on and peel polymer film method of data recording duplication and micro-structure fabrication
11/16/1995WO1995030932A1 High power phase masks for imaging systems
11/15/1995CN1111761A Laser imaged printing plate
11/14/1995US5465859 Dual phase and hybrid phase shifting mask fabrication using a surface etch monitoring technique
11/08/1995EP0680624A1 Phase shifting mask structure with absorbing/attenuating sidewalls for improved imaging and method of fabricating phase shifters with absorbing/attenuating sidewalls.
11/08/1995EP0664033A4 Rasterizer for a pattern generation apparatus.
11/08/1995CN1111292A Method for fabricating a half-tone type phase shift mask
11/07/1995US5464729 Trannsferring images and washing
11/07/1995US5464713 Light transmitting portion exposing a surface, phase shifting and repairing a member
11/07/1995US5464712 Method for fabricating a phase shifting mask
11/07/1995US5464711 Semiconductors with silicon substrates, membranes, x-ray absorber layers of hafnium or rhenium or iron alloys
11/07/1995CA1337512C Chemical mat film and photosensitive film using same
11/02/1995WO1995029505A1 Method and device for ion implantation
11/02/1995EP0679948A2 Dual phase and hybrid phase shifting mask fabrication using a surface etch monitoring technique
10/1995
10/31/1995US5463730 Method and apparatus for selecting and displaying a process during prepress processing of an image
10/31/1995US5462841 Tone rendition of halfstone images by projection exposure
10/26/1995DE19510564A1 Attenuation type phase shifting mask
10/24/1995US5460920 Photochemical or mechanical production of flexible printing plates
10/24/1995US5460908 Semiconductors
10/24/1995US5460693 Dry microlithography process
10/19/1995WO1995027924A1 Method of photolithographically metallizing at least the inside of holes arranged in accordance with a pattern in a plate of an electrically insulating material
10/19/1995WO1995022083A3 Photomask blanks
10/18/1995EP0677787A2 Mask and mask supporting mechanism
10/17/1995US5459013 Identifying defective area, applying an image reversal photoresist,exposing photoresist, removing portions of photoresist, depositing material on photoresist and defective area and removing photoresist
10/17/1995US5459002 Gradients
10/17/1995US5459001 X-ray lithography of integrated circuits
10/17/1995US5458999 Interferometric phase shifting method for high resolution microlithography
10/17/1995US5458998 Method of making mask pattern data and process for manufacturing the mask
10/17/1995US5458084 X-ray wave diffraction optics constructed by atomic layer epitaxy
10/11/1995EP0664015A4 Method and apparatus for converting image color values from a first to a second color space.
10/10/1995US5457006 Adhesion of non-light transmitting thin film
10/10/1995US5456798 Methods and apparatus for processing curved surface
10/05/1995DE19512245A1 Illuminating device resolution measuring photomask for semiconductor process
10/05/1995DE19511533A1 Fine measuring appts. for properties in semiconductor mfr
10/04/1995EP0675384A1 Color filter repair method and apparatus
10/04/1995EP0517923B1 Method of forming minute resist pattern
10/03/1995US5455144 Reduction projection exposure of pattern onto positive photosensitive resist film, then transferring second pattern onto negative resist film, for improving resolution of fine patterns
10/03/1995US5455131 Depositing phase shifting and opaque layer on transparent substrate; selective removal
10/03/1995US5455130 Photomask comprising an optical path adjusting film
09/1995
09/28/1995WO1995026043A1 Group iv semiconductor thin films formed at low temperature using nanocrystal precursors
09/27/1995EP0674342A1 Pattern and method for evaluating focal point
09/27/1995EP0674223A2 An attenuating phase-shift mask structure and fabrication method
09/26/1995US5454050 Cut mask preparation method and apparatus
09/26/1995US5453816 Protective mask for pellicle
09/19/1995US5451111 Method of and apparatus for automatically outputting the image of a page
09/14/1995WO1995024672A1 Light-sensitive material for photographic and reprographic applications
09/14/1995DE4407622A1 Lichtempfindliches Material für reprographische Anwendungen The light-sensitive material for reprographic applications
09/14/1995DE4407539A1 Printing plate prodn.
09/14/1995DE19508749A1 Phase shift mask fabrication
09/14/1995DE19508497A1 Aperture for use in optical appts. e.g. for semiconductor mfr.
09/13/1995EP0671658A2 Exposure apparatus and reflection type mask to be used in the same
09/13/1995EP0671025A1 Metal ion reduction in bottom anti-reflective coatings for photoresists.
09/13/1995EP0671024A1 Method and apparatus for fabricating microlenses
09/12/1995US5450533 Method and apparatus for printing continuous pattern
09/12/1995US5449578 Method of manufacturing a mask for forming a pattern in a semiconductor device
09/12/1995US5449545 Ceramic device
09/08/1995WO1995023710A1 Light control material and method for making same
09/06/1995EP0670055A1 Method of deposition.
09/06/1995EP0670054A1 Photomask blanks
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