| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 07/30/1997 | EP0786731A2 Method and apparatus for verifying an electrical configuration using a pseudo-element pattern |
| 07/29/1997 | US5652657 Inspection system for original with pellicle |
| 07/24/1997 | WO1997026755A1 Controlled asynchronous-motor drive designed for a rotating-drum scanner and with a hollow-shaft rotor for the internal illumination device |
| 07/24/1997 | DE19631401A1 Mask apparatus for electron beam exposure in manufacture of integrated circuit |
| 07/24/1997 | DE19601524A1 Einen gesteuerten Asynchronmotorantrieb für einen Trommelscanner, dessen Rotor als Hohlwelle zur Anordnung der Innenbeleuchtungseinrichtung ausgerichtet ist A controlled asynchronous motor for a drum scanner whose rotor is aligned as a hollow shaft for arranging the interior lighting device |
| 07/23/1997 | EP0785565A1 Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same |
| 07/23/1997 | EP0785469A2 A Process for making an x-ray mask |
| 07/23/1997 | EP0396768B1 Pattern correction method |
| 07/23/1997 | CN1155101A Rewinder |
| 07/23/1997 | CN1154910A Method for production of printing mould plate and apparatus thereof |
| 07/22/1997 | US5650854 Method of checking defects in patterns formed on photo masks |
| 07/22/1997 | US5650250 Light exposure mask for semiconductor devices |
| 07/22/1997 | US5650076 Laser plotter |
| 07/22/1997 | US5649486 Thin-metal lithographic printing members with visible tracking layers |
| 07/17/1997 | WO1997025206A1 Methods and apparatus for preparing relief image printing plates |
| 07/09/1997 | EP0782719A1 Protective mask for pellicle |
| 07/09/1997 | EP0542768B1 Process for producing microstructures with locally different structural heights |
| 07/03/1997 | DE19548807A1 Flexographic printing plates prepared by photopolymerising plate coating through negative |
| 07/02/1997 | EP0781977A2 Pattern shape inspection apparatus for forming specimen image on display apparatus |
| 07/02/1997 | CN1153320A Method and apparatus for engraving using magnetostrictive actuator |
| 07/01/1997 | US5644381 Method of exposure employing phase shift mask of attenuation type |
| 07/01/1997 | US5644144 Device and method for programming a logic level within an integrated circuit using multiple mask layers |
| 07/01/1997 | US5643698 Mask for manufacturing semiconductor device and method of manufacture thereof |
| 07/01/1997 | US5643654 Pellicle structure and process for preparation thereof with dissolution of coating layer |
| 06/24/1997 | US5641960 Circuit pattern inspecting device and method and circuit pattern arrangement suitable for the method |
| 06/24/1997 | US5641609 Method for manufacturing pattern layer having different minimum feature sizes |
| 06/24/1997 | US5641593 Lithographic mask and exposure apparatus using the same |
| 06/24/1997 | US5641592 Method for fabricating phase shift mask |
| 06/18/1997 | EP0779551A2 Frame-supported dustproof pellicle for photolithographic photomask |
| 06/18/1997 | EP0778804A1 Optical pellicle membrane to frame adhesion method |
| 06/18/1997 | CN1152186A Method for detecting phase error of phase shift mask |
| 06/18/1997 | CN1152157A Pattern forming method |
| 06/17/1997 | US5639699 For repairing a bump defect of a phase-shifting mask |
| 06/12/1997 | WO1997021146A1 Imaging a lithographic printing plate |
| 06/12/1997 | CA2238385A1 Imaging a lithographic printing plate |
| 06/10/1997 | US5637449 Emulsion layer consists of a photosensitive silver halide, a non-photosensitive, reducible silver source, a reducing agent system containing hindered phenol, co-developer, hydrogen atom doner compound, and a binder |
| 06/10/1997 | US5637426 Method and apparatus for forming resist pattern, and printed wiring board fabricated thereby |
| 06/10/1997 | US5637425 Method for fabricating phase shift mask comprising a polymethylmethacrylate phase shift film |
| 06/10/1997 | US5637424 Using phase shift mask, capable of improving contrast of pattern while suppressing sub peaks |
| 06/05/1997 | WO1997020252A1 Donor elements and processes for thermal dye transfer by laser |
| 06/04/1997 | EP0777147A1 Method of forming a pattern and projecting exposure apparatus |
| 06/04/1997 | EP0776763A1 Process for the production of lithographic printing plates |
| 06/03/1997 | US5636131 Geometric autogeneration of"hard"phase-shift designs for VLSI |
| 06/03/1997 | US5636007 Method of reproducing images of plurality of copy pages on single plate |
| 06/03/1997 | US5636002 Optical system |
| 06/03/1997 | US5635339 3-heteroaramatic-substituted acrylonitrile compounds as co-developers for black-and-white photothermographic and thermographic elements |
| 06/03/1997 | US5635316 Layout methodology, mask set, and patterning method for phase-shifting lithography |
| 06/03/1997 | US5635315 Phase shift mask and phase shift mask blank |
| 06/03/1997 | US5635314 Adjustment the reduction of resolution on the edges by increasing the light intensity distribution due to interference; photolithography; semiconductors; accuracy |
| 06/03/1997 | US5635285 Method and system for controlling the relative size of images formed in light-sensitive media |
| 06/03/1997 | US5634980 Method for washing substrates |
| 06/03/1997 | US5634230 Apparatus and method for cleaning photomasks |
| 05/28/1997 | EP0689686B1 A thin film mask for use in an x-ray lithographic process and its method of manufacture |
| 05/27/1997 | US5633807 System and method for generating mask layouts |
| 05/27/1997 | US5633105 Precision radome made using conformal photolithography to pattern curved surfaces |
| 05/27/1997 | US5633103 Photolithography, patterning integrated circuits |
| 05/27/1997 | US5633102 Lithography using a new phase-shifting reticle |
| 05/27/1997 | US5633101 Mask and projection exposure method |
| 05/27/1997 | US5632847 Injecting ozone into acid aqueous solution to form bubbles, contacting film with bubbles |
| 05/20/1997 | US5631110 Process of fabricating photo-mask used for modified illumination, projection aligner using the photo-mask and method of transferring pattern image from the photo-mask to photo-sensitive layer |
| 05/20/1997 | US5631109 Exposure mask comprising transparent and translucent phase shift patterns |
| 05/20/1997 | US5631108 Mask for manufacturing semiconductor device and method of manufacture thereof |
| 05/14/1997 | EP0773479A1 Method of polymer conversion and patterning of a PPV derivative |
| 05/14/1997 | EP0773477A1 Phase shift layer - containing photomask, and its production and correction |
| 05/14/1997 | EP0670055B1 Method of deposition |
| 05/13/1997 | US5629115 Radiation, heating, oxidation |
| 05/13/1997 | US5629114 Phase shift mask and manufacturing method thereof and exposure method using phase shift mask comprising a semitransparent region |
| 05/13/1997 | US5629113 Photomask used by photolithography and a process of producing same |
| 05/07/1997 | EP0771672A2 Laser recording element |
| 05/06/1997 | US5627624 Integrated circuit test reticle and alignment mark optimization method |
| 05/06/1997 | US5626784 In-situ sizing of photolithographic mask or the like, and frame therefore |
| 05/02/1997 | EP0770926A2 Method for forming fine pattern of semiconductor device |
| 05/02/1997 | EP0770918A2 Film winder |
| 05/01/1997 | WO1997015866A1 Phase shift mask and method of manufacturing the same |
| 04/30/1997 | DE19644287A1 Phasenschiebende Maske und Verfahren zu ihrer Herstellung Phase shift mask and end process for their preparation |
| 04/29/1997 | US5624791 Pattern forming method using mask |
| 04/29/1997 | US5624773 Resolution-enhancing optical phase structure for a projection illumination system |
| 04/24/1997 | WO1997011406A3 Black-and-white photothermografic and thermografic elements comprising amine compounds as contrast enhancers |
| 04/24/1997 | DE19642050A1 Exposition mask device for photolithographic manufacture of DRAM |
| 04/23/1997 | EP0769807A2 Reticle container with corner holding |
| 04/23/1997 | EP0769761A1 Method for generating patterns |
| 04/23/1997 | CN1148265A Light exposure mask for semiconductor devices and method for forming same |
| 04/22/1997 | US5623529 SOR exposure system and mask manufactured thereby |
| 04/22/1997 | US5622795 Laser ablation transfer; prints or proofs thus produced have durable protective overcoatings |
| 04/22/1997 | US5622787 Mask for transferring a pattern for use in a semiconductor device and method of manufacturing the same |
| 04/20/1997 | CA2188196A1 Reticle container with corner holding |
| 04/16/1997 | CN1147865A Light-sensitive material for photographic and reprographic applications |
| 04/15/1997 | US5620817 Exposing negative photoresist layer through second surface of transparent mask substrate having on first surface patterned layer of attenuating phase shifting material to form pedestal with sloping sides, depositing opaque layer, removing |
| 04/15/1997 | US5620816 Layout methodology, mask set, and patterning method for phase-shifting lithography |
| 04/15/1997 | US5620815 Exposure mask, exposure mask substrate, method for fabricating the same, and method for forming pattern based on exposure mask |
| 04/15/1997 | US5620573 Reduced stress tungsten deposition |
| 04/10/1997 | DE19536474A1 Cleaning of coated workpieces |
| 04/09/1997 | EP0767408A1 Process for the production of photopolymer intaglio printing plates |
| 04/09/1997 | EP0767407A1 Multilayer recording element suitable for the production of flexographic printing plates by digital information transmission |
| 04/09/1997 | EP0767406A1 Process for the production of photopolymer relief printing plates |
| 04/09/1997 | EP0766880A1 Holographic technique for extreme microcircuitry size reduction |
| 04/09/1997 | CN1147098A Phase shift mask |
| 04/08/1997 | US5618643 Embedded phase shifting mask with improved relative attenuated film transmission |
| 04/02/1997 | EP0766138A2 Spun-on glass layer as a dry etch-mask, for fabricating a metallic mask by means of a bi-level process |
| 04/02/1997 | CN1146634A Mask for detecting defect |