| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 02/25/1998 | EP0825022A1 Digital control strip for imageable media |
| 02/25/1998 | CN2275254Y Aluminium plate base lithoprint precoated double-faced sensitive plate |
| 02/25/1998 | CN1174613A Phase shift mask and method of manufacturing the same |
| 02/24/1998 | US5721619 Misregistration detecting marks for pattern formed on semiconductor substrate |
| 02/24/1998 | US5721075 Forming phase shift layer such that its transmittance with respect to exposure light has a specific value, changing transmittance of halftone layer material to desired transmittance value |
| 02/24/1998 | US5721074 Method for fabricating a light exposure mask comprising the use of a process defect inspection system |
| 02/17/1998 | US5719009 Laser ablatable photosensitive elements utilized to make flexographic printing plates |
| 02/17/1998 | US5718991 Method for making photomasks having regions of different light transmissivities |
| 02/17/1998 | US5718990 Semiconductor mask and method of manufacturing the same |
| 02/17/1998 | US5718829 Phase shift lithography for forming semiconductors |
| 02/10/1998 | US5717518 Broad spectrum ultraviolet catadioptric imaging system |
| 02/10/1998 | US5716758 Process for forming fine pattern for semiconductor device utilizing multiple interlaced exposure masks |
| 02/10/1998 | US5716738 Dark rims for attenuated phase shift mask |
| 02/10/1998 | US5716458 Method of washing and drying an article |
| 02/05/1998 | DE19708766A1 Lithographic mask production without need for SOI wafer |
| 02/05/1998 | DE19708512A1 Phase shift mask with adhesion promoting layer |
| 02/04/1998 | EP0822452A2 Optical proximity correction method and apparatus |
| 02/03/1998 | US5715039 Projection exposure apparatus and method which uses multiple diffraction gratings in order to produce a solid state device with fine patterns |
| 02/03/1998 | US5714306 Processing method and apparatus |
| 02/03/1998 | US5714285 Using (LaNiO3)X (TiO2)1-x oxide absorption composite for attenuating phase shifting blanks and masks |
| 02/03/1998 | US5714195 Color filter repair method and apparatus, color filter, liquid crystal display device, and apparatus having liquid crystal display device |
| 02/03/1998 | CA2079725C X-ray mask structure, manufacturing method, x-ray exposure method using same, and device manufactured by using same |
| 01/29/1998 | DE19727247A1 Semiconductor device production using lithographic mask replica |
| 01/28/1998 | CN1171846A Hydrazide compounds useful as co-developers for black-and -white photothermographic elements |
| 01/27/1998 | US5712613 Computer-aided method for producing resistive tapers and resistive taper produced thereby |
| 01/27/1998 | US5712079 Aqueous latex dispersion of polycyanoacrylate copolymer |
| 01/27/1998 | US5712063 Phase shift mask comprising light shielding regions having a multiple box structure |
| 01/22/1998 | WO1998002784A1 Method of phase shift lithography |
| 01/22/1998 | WO1998002783A1 Mask protecting device |
| 01/22/1998 | WO1998002782A1 Sidelobe suppressing attenuated phase-shifting mask |
| 01/22/1998 | DE19704709A1 Phase-shift mask |
| 01/22/1998 | CA2231175A1 Mask protective device |
| 01/21/1998 | EP0820100A2 Semiconductor device and manufacturing method for the same, basic cell library and manufacturing method for the same, and mask |
| 01/21/1998 | EP0819933A2 Optical inspection method and apparatus |
| 01/20/1998 | US5709970 Mask having a pattern for detecting illuminance nonuniformity |
| 01/15/1998 | WO1998001903A1 Method of manufacturing semiconductor integrated circuit device |
| 01/15/1998 | WO1998001792A1 Composite relief image printing plates and methods for preparing same |
| 01/14/1998 | EP0818711A2 Process and apparatus for the manufacturing of flexographic printing plates |
| 01/13/1998 | US5707765 Photolithography mask using serifs and method thereof |
| 01/13/1998 | US5707704 Masking films |
| 01/08/1998 | WO1998000758A1 Photomask blanks |
| 01/08/1998 | DE19725808A1 Phase shift mask formation method for transparent substrate |
| 01/08/1998 | DE19627170A1 Masked ion beam lithography arrangement |
| 01/07/1998 | EP0816920A2 A flexographic printing element having a powder layer and a method for making a flexographic printing plate therefrom |
| 01/07/1998 | EP0815565A1 Method and apparatus for micromachining using hard x-rays |
| 01/07/1998 | EP0782719A4 Protective mask for pellicle |
| 01/07/1998 | EP0778804A4 Optical pellicle membrane to frame adhesion method |
| 01/07/1998 | CN1169546A Phase shift mask and method for fabricating same |
| 01/07/1998 | CN1169369A Seal making device, its function changing-over mechanism, exposure device and device for detecting object of seal-making thereof |
| 01/06/1998 | US5705570 Acrylate polymers |
| 01/06/1998 | US5705324 4-Substituted isoxazole compounds as co-developers for black-and-white photothermographic and thermographic elements |
| 01/06/1998 | US5705319 Process for forming fine patterns for a semiconductor device utilizing three photosensitive layers |
| 01/06/1998 | US5705310 Flexographic printing plate |
| 01/06/1998 | US5705300 Quartz substrate with grooves, chromium pattern coating and phase shift material |
| 01/06/1998 | US5705299 Large die photolithography |
| 01/06/1998 | US5705298 Holographic method for generating three dimensional conformal photo lithographic masks |
| 01/03/1998 | CA2204074A1 A flexographic printing element having a powder layer and a method for making a flexographic printing plate therefrom |
| 01/02/1998 | DE19727261A1 Phase-shift mask |
| 01/02/1998 | DE19724889A1 Image recording device for providing textile printing design foil |
| 01/02/1998 | DE19636751A1 Correcting error in phase-shift mask |
| 12/31/1997 | WO1997050111A1 Semiconducteur chip and reticle for manufacturing semiconductor |
| 12/30/1997 | US5703675 Projection-exposing apparatus with deflecting grating member |
| 12/30/1997 | US5702849 Mask for transferring a pattern for use in a semiconductor device and method of manufacturing the same |
| 12/30/1997 | US5702848 Mask for optical lithography using phase shift masking and integrated circuit produced therefrom |
| 12/30/1997 | US5702847 Phase shift photomask, phase shift photomask blank, and process for fabricating them |
| 12/29/1997 | EP0749593B1 Light-sensitive material for photographic and reprographic applications |
| 12/29/1997 | EP0540730B1 Soluble perfluoroelastomers and use in pellicles |
| 12/24/1997 | CN1168318A Electronic instrument |
| 12/23/1997 | US5700628 Dry microlithography process |
| 12/23/1997 | US5700606 Prevents copying of unwanted patterns while maintaining high light contrast |
| 12/23/1997 | US5700605 Mask for light exposure and process for production of the same |
| 12/23/1997 | US5700604 For transferring images or patterns onto a radiation sensitive substrate, for printing integrated circuits, accuracy |
| 12/23/1997 | US5700603 Semiconductor device having X-ray lithographic mask and method for manufacturing the same |
| 12/23/1997 | US5700602 Method and apparatus for precision determination of phase-shift in a phase-shifted reticle |
| 12/23/1997 | US5700601 Formed of a semitransparent film and a phase shifter; phase angles of light beams passing through respective areas are different from each other substantially by 180 degrees |
| 12/18/1997 | WO1997048019A1 Method of manufacturing photomask, method of manufacturing phase-shifting mask, and method of manufacturing semiconductor device |
| 12/18/1997 | WO1997043694A3 Method of producing a stencil mask |
| 12/16/1997 | US5698859 Method and device for proximity-effect correction |
| 12/16/1997 | US5698377 Method of forming a resist pattern |
| 12/16/1997 | US5698350 Forming ultra-fine pattern by diffracting incident light while controlling components vertically incident on a photomask to increase depth of focus and improve resolution |
| 12/16/1997 | US5698349 Sub-resolution phase shift mask |
| 12/16/1997 | US5698348 Phase shifting mask, manufacturing method thereof, and exposure method using such a phase shifting mask |
| 12/16/1997 | US5698347 Light screening patterns defining spaces having differing widths |
| 12/16/1997 | US5698346 Photomask-pattern-shape evaluation method, photomask, photomask manufacturing method, photomask-pattern forming method, and exposure method |
| 12/16/1997 | US5698069 Technique for detecting particles on a wafer support surface |
| 12/11/1997 | WO1997046914A1 Method of manufacturing semiconductor integrated circuit device, photomask, and methods of manufacturing photomask |
| 12/11/1997 | WO1997046385A1 A recording film for producing a printing plate therefrom |
| 12/11/1997 | DE19723618A1 Image region illuminating mask for flexographic print plate e.g. volcano film |
| 12/09/1997 | US5696587 Metal target for laser repair of dies |
| 12/09/1997 | US5695896 Process for fabricating a phase shifting mask |
| 12/09/1997 | US5695895 Randomised mask for a diffusing screen |
| 12/09/1997 | US5695854 Light mask |
| 12/04/1997 | WO1997045772A1 Photolithography mask using serifs and method thereof |
| 12/04/1997 | WO1997045770A1 Reconfigurable mask |
| 12/04/1997 | CA2257089A1 Foam reservoir fluid transfer roller and method of making same |
| 12/03/1997 | EP0810475A2 Pattern exposing method using phase shift and mask used therefor |
| 12/03/1997 | EP0810474A2 Pattern exposing method using phase shift and mask used therefor |
| 12/02/1997 | US5693382 Frame-supported pellicle for dustproof protection of photomask in photolithography |
| 11/27/1997 | WO1997044711A1 Thermal ablation transfer lithographic printing plates |
| 11/27/1997 | WO1997044710A1 Attenuating embedded phase shift photomask blanks |