Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
11/1996
11/27/1996EP0744044A1 Masks for lithographic patterning using off-axis illumination
11/26/1996US5579240 Method and an apparatus for illuminating points on a medium
11/26/1996US5578821 Electron beam inspection system and method
11/26/1996US5578422 Reduced projection exposure method using phase shift mask
11/26/1996US5578421 Photomask and pattern forming method employing the same
11/26/1996US5578416 Cinnamal-nitrile dyes for laser recording element
11/26/1996US5578402 Photomask used by photolithography and a process of producing same
11/26/1996US5578401 Photomask for the measurement of resolution of exposure equipment
11/26/1996US5577610 Casing for frame-supported pellicles
11/20/1996CN1033345C Pattern printing board of shadow mask and manufacturing method for same
11/19/1996US5576829 Method and apparatus for inspecting a phase-shifted mask
11/19/1996US5576248 Group IV semiconductor thin films formed at low temperature using nanocrystal precursors
11/19/1996US5576144 Vinyl polymer binder for laser ablative imaging
11/19/1996US5576142 Forming a dye image in the absence of receivers, by heating with lasers, recording element of support with dye layer of infrared absorber, multilayer element and hydroxybenzophenone dye
11/19/1996US5576141 Single sheet
11/19/1996US5576135 Processing method based on resist pattern formation, and resist pattern forming apparatus
11/19/1996US5576126 Phase shifting mask
11/19/1996US5576125 Photolithography
11/19/1996US5576124 Phase shift mask and method for fabricating the same
11/19/1996US5576123 Overlying shifter type phase shift photomask blank, overlying shifter type phase shift photomask and methods of producing them
11/19/1996US5576122 Phase shift mask and manufacturing method thereof
11/12/1996US5574578 Method and apparatus for holding a film transparency in a rotary drum scanner
11/12/1996US5574276 Apparatus and method for detecting a dust particle having high purity inert gas atmosphere
11/12/1996US5573890 Method of optical lithography using phase shift masking
11/12/1996US5573875 Laser ablation mask and method of fabrication
11/07/1996WO1996035145A1 Method for generating proximity correction features for a lithographic mask pattern
11/06/1996EP0741365A1 A system and method for generating mask layouts
11/06/1996EP0741335A1 Laser apparatus and process of use
11/06/1996EP0741330A1 Flexographic element having an infrared ablatable layer and process for making a flexographic printing plate
11/06/1996EP0741329A2 A process for making a flexographic printing plate
11/06/1996CN1135049A Polyester precoated photosensitive plate and mfg. method thereof
11/05/1996US5572598 Automated photomask inspection apparatus
11/05/1996US5572564 Reflecting photo mask for x-ray exposure and method for manufacturing the same
11/05/1996US5572562 Image mask substrate for X-ray semiconductor lithography
11/05/1996US5571641 Diffraction mask for the fabrication of semiconductor devices
11/05/1996US5571639 Computer-aided engineering system for design of sequence arrays and lithographic masks
11/02/1996CA2171770A1 Process for making a flexographic printing plate
10/1996
10/30/1996EP0740207A1 Reduced stress tungsten deposition
10/30/1996EP0659287B1 Image-transfer process
10/29/1996US5570405 Registration and alignment technique for X-ray mask fabrication
10/29/1996US5569569 Absorber film for absorbing or reflecting photons, patterns, path supplying reactive medium and discharging exhaust medium
10/29/1996US5569501 Plasma-enhanced chemical vapor deposition from a mixture of a hydrocarbon and helium
10/29/1996US5569392 Method and apparatus for repairing defect on plane surface of phase shift mask
10/23/1996EP0738930A2 UV-absorbable media bleachable IR-radiation
10/23/1996EP0738925A2 Mask for adjusting line width of photoresist pattern
10/22/1996US5567555 Forming an etching hole
10/22/1996US5567554 Mask for producing radomes to high precision
10/22/1996US5567553 Method to suppress subthreshold leakage due to sharp isolation corners in submicron FET structures
10/22/1996US5567552 Method for fabricating a phase shift mask
10/22/1996US5567551 Method for preparation of mask for ion beam lithography
10/22/1996US5567550 Method of making a mask for making integrated circuits
10/22/1996CA2083112C Device manufacturing involving step-and-scan delineation
10/16/1996EP0737893A2 Self-aligned alignment marks for phase-shifting masks
10/16/1996CN1033001C Laser shaping with area patterning mask
10/15/1996US5566199 Holographic technique for extreme microcircuitry size reduction
10/15/1996US5565286 Combined attenuated-alternating phase shifting mask structure and fabrication methods therefor
10/15/1996US5565285 Method of making mask pattern data and process for manufacturing the mask
10/10/1996WO1996021174A3 Hydrazide compounds useful as co-developers for black-and-white photothermographic elements
10/09/1996EP0642423B1 A method and an apparatus for illuminating points on a medium
10/08/1996US5563702 Automated photomask inspection apparatus and method
10/08/1996US5563012 Printing composite pattern into photoresist
10/08/1996US5563010 Plurality of light screen patterns on substrate prevents necking effect; achieves accurate dimension in film pattern
10/08/1996US5563009 Photomask for forming a micropattern of a semiconductor device
10/01/1996US5561071 DNA and DNA technology for the construction of networks to be used in chip construction and chip production (DNA-chips)
10/01/1996US5561010 Phase shift optical mask and method of correcting defects in optical mask
10/01/1996US5561009 Blanks for phase shift photomasks, and phase shift photomasks
09/1996
09/25/1996EP0733951A2 Process and apparatus for the fabrication of a printing screen
09/25/1996EP0664744B1 35 mm format transparencies
09/24/1996US5558983 Graphic arts applications
09/24/1996US5558963 Method of producing photomask and exposing
09/19/1996WO1996028829A1 Method and apparatus for micromachining using hard x-rays
09/19/1996DE19609652A1 Correcting photo-mask patterns for use in photolithography for semiconductor mfr.
09/19/1996DE19609297A1 Photolithographic etching of semiconductors by projected light
09/18/1996EP0732624A2 Fabrication method with energy beam and fabrication apparatus therewith
09/17/1996US5556725 Forming chrome patterns by exposure of masked area, etching and removal
09/17/1996US5556724 Phase shift photomask and method of producing same
09/17/1996CA2056308C Method for manufacturing a photomask for an optical memory
09/12/1996WO1996027821A1 Process control strip and a method of recording
09/11/1996EP0731490A2 Ultra-fine microfabrication method using an energy beam
09/11/1996EP0731387A2 Gray-tone mask and pattern formation and ion implantation methods using the same
09/11/1996EP0731377A1 Original holder
09/10/1996US5555475 Method and apparatus for generating an output device control signal
09/05/1996DE19507665A1 Verfahren zur Kalibrierung und Kontrolle einer Belichtung und Belichtungs-Kontrollstreifen Methods for the calibration and control of exposure and exposure control strip
09/04/1996EP0730200A2 Phase shifting masks and methods of manufacture
09/04/1996EP0713586A4 Ablation transfer onto intermediate receptors
09/03/1996US5553274 Vertex minimization in a smart optical proximity correction system
09/03/1996US5553273 Vertex minimization in a smart optical proximity correction system
09/03/1996US5553110 X-ray mask structure, process for production thereof, apparatus and method for X-ray exposure with the X-ray mask structure, and semiconductor device produced by the X-ray exposure method
09/03/1996US5552820 Fly's eye optics for a raster output scanner in an electrophotographic printer
09/03/1996US5552611 Pseudo-random registration masks for projection lithography tool
09/03/1996US5552250 Used in a photolithography step of manufacturing a semiconductor integrated circuit device, electron resist
09/03/1996US5552249 Method for making a mask useful in the conformal photolithographic manufacture of patterned curved surfaces
09/03/1996US5552247 Method for patterning an X-ray master mask
08/1996
08/28/1996CN1129852A Light exposure mask for semiconductor devices
08/27/1996US5549995 Optically transparent substrate; plurality of recesses transmitting exposure light; opaque material
08/27/1996US5549994 Non-reflective portion formed by destroying regularity of periodic structure of multilayer film
08/21/1996EP0727320A1 2-Hydroxybenzophenone UV dyes for laser recording element
08/21/1996EP0727319A1 Benzotriazole UV dyes for laser recording element
08/21/1996EP0727317A1 2-Cyano-3,3-diarylacrylate UV dyes for laser recording element
08/20/1996USRE35315 Microminiaturization
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