Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
---|
05/28/1998 | CA2243501A1 Pellicle |
05/27/1998 | EP0844533A2 Correction of exposure data, particularly in manufacturing of semiconductor devices |
05/27/1998 | EP0843842A1 Lithography exposure mask derived from nanocrystal precursors and a method of manufacturing the same |
05/27/1998 | CN1182890A Water bare female pattern pre-coating photosensitive plate and making method and usage thereof |
05/26/1998 | US5757480 Method for laser alignment in mask repair |
05/26/1998 | US5757019 Pattern drawing apparatus |
05/26/1998 | US5756997 Scanning probe/optical microscope with modular objective/probe and drive/detector units |
05/26/1998 | US5756259 With polymer having bound photoabsorber |
05/26/1998 | US5756241 Self-aligned method for forming a color display screen |
05/26/1998 | US5756237 Production of projection mask |
05/26/1998 | US5756236 Fabrication of high resolution aluminum ablation masks |
05/26/1998 | US5756235 Phase shift mask and method for fabricating the same |
05/26/1998 | US5756234 High accuracy fabrication of X-ray masks with optical and E-beam lithography |
05/22/1998 | CA2761346A1 In-line holographic mask for micromachining |
05/22/1998 | CA2761126A1 In-line holographic mask for micromachining |
05/22/1998 | CA2688799A1 In-line holographic mask for micromachining |
05/20/1998 | EP0843217A2 Optical mask using phase shift and method of producing the same |
05/20/1998 | CN1182280A Pattern drawing method using charged particle beams and apparatus therefor |
05/19/1998 | US5754619 A titanium-germenium alloy is employed as x-ray absorber to form mask pattern on a silicon carbide membrane which transmits x-rays; sputtering, lithography, and etching |
05/19/1998 | US5754443 Exposure data processing method and device |
05/19/1998 | US5753416 Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process |
05/19/1998 | US5753410 Containing dye and hydrazine compound |
05/13/1998 | EP0841189A1 Laser-imageable element having a stablising infrared-absorbing dye |
05/12/1998 | US5751780 X-ray mask structure, preparation thereof and X-ray exposure method |
05/12/1998 | US5751683 Nanometer scale data storage device and associated positioning system |
05/12/1998 | US5751577 Production data preparing system for producing a metal mask plate |
05/12/1998 | US5750314 Method for selectively imaging a lithographic printing plate |
05/12/1998 | US5750290 Forming an integrated circuit on a semiconductor wafer |
05/12/1998 | US5750003 Chuck for holding semiconductor photolithography masks |
05/07/1998 | WO1998019215A1 Direct write all-glass photomask blanks |
05/07/1998 | DE19740948A1 Phase shifting mask for semiconductor device manufacture |
05/06/1998 | EP0840169A1 Optical pellicle and package |
05/06/1998 | EP0752157A4 Group iv semiconductor thin films formed at low temperature using nanocrystal precursors |
05/05/1998 | US5748331 Process control strip and method for recording |
05/05/1998 | US5747200 Radiation exposure of wafers, photoresists and positioning and forming patterns |
05/05/1998 | US5747197 Method of preparing a phototool |
05/05/1998 | US5747196 Method of fabricating a phase-shift photomask |
04/30/1998 | DE19747773A1 Method of correcting lighting patterns |
04/30/1998 | DE19642001A1 Projektionsmaske Projection mask |
04/30/1998 | CA2219562A1 Optical pellicle and package |
04/29/1998 | EP0838726A1 Halftone phase shift mask, blank for the same, and methods of manufacturing these |
04/29/1998 | CA2219630A1 Method and apparatus for correcting exposure patterns, and exposure mask, method of exposing, and semiconductor device |
04/28/1998 | US5745222 Apparatus for making a stamp from an original picture |
04/28/1998 | US5744381 Method of inspecting a pattern formed on a sample for a defect, and an apparatus thereof |
04/28/1998 | US5744268 Phase shift mask, method of manufacturing a phase shift mask and method of forming a pattern with phase shift mask |
04/23/1998 | WO1998016874A1 Process for imaging a flexo-graphic printing plate from liquid photopolymers and without using phototools |
04/23/1998 | WO1998016872A1 Projection mask |
04/22/1998 | EP0837365A1 Membrane mask structure, fabrication and use |
04/21/1998 | US5742377 Cantilever for scanning probe microscope including piezoelectric element and method of using the same |
04/21/1998 | US5742065 Heater for membrane mask in an electron-beam lithography system |
04/21/1998 | US5741732 Method for detecting implantation mask misalignment |
04/21/1998 | US5741625 Process for forming fine patterns in a semiconductor device utilizing multiple photosensitive film patterns and organic metal-coupled material |
04/21/1998 | US5741624 Connecting semiconductor layers |
04/21/1998 | US5741614 Atomic force microscope measurement process for dense photoresist patterns |
04/21/1998 | US5741613 Multilayer |
04/21/1998 | US5741576 Optical pellicle with controlled transmission peaks and anti-reflective coatings |
04/14/1998 | US5740068 Fidelity enhancement of lithographic and reactive-ion-etched images by optical proximity correction |
04/14/1998 | US5738959 Halftone phase shift photomask, halftone phase shift photomask blank, and method of producing the same comprising fluorine in phase shift layer |
04/09/1998 | WO1998014835A1 Method of preparing a phototool |
04/09/1998 | DE19701966C1 Laser beam mask esp. for excimer laser beams |
04/08/1998 | EP0834831A2 Image inspection apparatus and method in plate making process |
04/07/1998 | US5737072 Automated photomask inspection apparatus and method |
04/07/1998 | US5736300 Irradiating coherent ultraviolet light beam to surface of phase shift mask having enlarged mask pattern, projecting light transmitted to form reduced pattern image on photoresist film overlying integrated circuit wafer, transferring pattern |
04/07/1998 | US5736277 Method of making mask pattern data and process for manufacturing the mask |
04/07/1998 | US5736276 Forming shielding layer on transparent substrate, injecting oxygen ions into surface of layer, converting to oxidation layer |
03/31/1998 | US5734741 Platemaking process and system for printing abstract patterns on architectural materials |
03/31/1998 | US5733691 One-step method for on-line lithographic pattern inspection |
03/31/1998 | US5733688 Lithographic mask structure and method of producing the same comprising W and molybdenum alloy absorber |
03/31/1998 | US5733687 Photomask, exposing method using photomask, and manufacturing method of photomask |
03/31/1998 | US5733686 Phase-shifting mask |
03/26/1998 | WO1998012605A1 Phase shifting circuit manufacture method and apparatus |
03/26/1998 | WO1998012603A1 Photolithography masking arrangements |
03/24/1998 | US5732403 Method and apparatus for transferring page construction data according to hierarchical page data |
03/24/1998 | US5731884 Method of an apparatus for outputting halftone dot image |
03/24/1998 | US5731109 Pattern structure of photomask comprising a sawtooth pattern |
03/24/1998 | US5730888 Bragg gratings in waveguides |
03/18/1998 | EP0829034A1 Process for producing a structured mask |
03/17/1998 | US5729325 Pellicle for a mask or substrate |
03/17/1998 | US5728494 Mask comprising a translucent film on a light transmitting substrate and a stabilized region formed on the boundary between substrate and translucent film |
03/17/1998 | US5728493 Antireflection mask for contact hole opening |
03/17/1998 | US5728492 Mask for projection system using charged particle beam |
03/17/1998 | US5728491 Chrome film on silica substrate, integrated circuits |
03/17/1998 | US5727685 Reticle container with corner holding |
03/10/1998 | US5726741 Photolithographic projection systems including grating masks and related methods |
03/10/1998 | US5725975 Gradation mask and process for producing the same |
03/10/1998 | US5725974 Method and apparatus for producing scanning data used to produce a photomask |
03/10/1998 | US5725973 Photo mask and method for manufacturing same |
03/10/1998 | US5725972 Multilayer radiation transparent, opaque region, transition region and patterns |
03/10/1998 | US5725971 Method of manufacturing phase shift masks and a method of manufacturing semiconductor integrated circuit devices |
03/10/1998 | US5725969 Forming a phase-shifting and attenuating layer on a transparent substrate, selectively removing layer to form a halftone and forming a light shielding pattern on layer between transparent regions |
03/05/1998 | DE19735165A1 X=ray lithography mask useful in semiconductor industry |
03/05/1998 | DE19709470A1 Phase shifting mask with Levenson and half-tone type sections |
03/05/1998 | DE19709246A1 High surface planarity phase shifting mask |
03/03/1998 | US5723876 Device and method for programming a logic level within an intergrated circuit using multiple mask layers |
03/03/1998 | US5723860 Frame-supported pellicle for photomask protection |
03/03/1998 | US5723236 Photomasks and a manufacturing method thereof |
03/03/1998 | US5723235 Method of producing photomask and exposing |
03/03/1998 | US5723234 Phase shift photomask and phase shift photomask dry etching method |
03/03/1998 | US5723233 Optical proximity correction method and apparatus |
02/26/1998 | DE19734486A1 Photomask test apparatus for integrated circuit manufacture |