Patents
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
05/1998
05/28/1998CA2243501A1 Pellicle
05/27/1998EP0844533A2 Correction of exposure data, particularly in manufacturing of semiconductor devices
05/27/1998EP0843842A1 Lithography exposure mask derived from nanocrystal precursors and a method of manufacturing the same
05/27/1998CN1182890A Water bare female pattern pre-coating photosensitive plate and making method and usage thereof
05/26/1998US5757480 Method for laser alignment in mask repair
05/26/1998US5757019 Pattern drawing apparatus
05/26/1998US5756997 Scanning probe/optical microscope with modular objective/probe and drive/detector units
05/26/1998US5756259 With polymer having bound photoabsorber
05/26/1998US5756241 Self-aligned method for forming a color display screen
05/26/1998US5756237 Production of projection mask
05/26/1998US5756236 Fabrication of high resolution aluminum ablation masks
05/26/1998US5756235 Phase shift mask and method for fabricating the same
05/26/1998US5756234 High accuracy fabrication of X-ray masks with optical and E-beam lithography
05/22/1998CA2761346A1 In-line holographic mask for micromachining
05/22/1998CA2761126A1 In-line holographic mask for micromachining
05/22/1998CA2688799A1 In-line holographic mask for micromachining
05/20/1998EP0843217A2 Optical mask using phase shift and method of producing the same
05/20/1998CN1182280A Pattern drawing method using charged particle beams and apparatus therefor
05/19/1998US5754619 A titanium-germenium alloy is employed as x-ray absorber to form mask pattern on a silicon carbide membrane which transmits x-rays; sputtering, lithography, and etching
05/19/1998US5754443 Exposure data processing method and device
05/19/1998US5753416 Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process
05/19/1998US5753410 Containing dye and hydrazine compound
05/13/1998EP0841189A1 Laser-imageable element having a stablising infrared-absorbing dye
05/12/1998US5751780 X-ray mask structure, preparation thereof and X-ray exposure method
05/12/1998US5751683 Nanometer scale data storage device and associated positioning system
05/12/1998US5751577 Production data preparing system for producing a metal mask plate
05/12/1998US5750314 Method for selectively imaging a lithographic printing plate
05/12/1998US5750290 Forming an integrated circuit on a semiconductor wafer
05/12/1998US5750003 Chuck for holding semiconductor photolithography masks
05/07/1998WO1998019215A1 Direct write all-glass photomask blanks
05/07/1998DE19740948A1 Phase shifting mask for semiconductor device manufacture
05/06/1998EP0840169A1 Optical pellicle and package
05/06/1998EP0752157A4 Group iv semiconductor thin films formed at low temperature using nanocrystal precursors
05/05/1998US5748331 Process control strip and method for recording
05/05/1998US5747200 Radiation exposure of wafers, photoresists and positioning and forming patterns
05/05/1998US5747197 Method of preparing a phototool
05/05/1998US5747196 Method of fabricating a phase-shift photomask
04/1998
04/30/1998DE19747773A1 Method of correcting lighting patterns
04/30/1998DE19642001A1 Projektionsmaske Projection mask
04/30/1998CA2219562A1 Optical pellicle and package
04/29/1998EP0838726A1 Halftone phase shift mask, blank for the same, and methods of manufacturing these
04/29/1998CA2219630A1 Method and apparatus for correcting exposure patterns, and exposure mask, method of exposing, and semiconductor device
04/28/1998US5745222 Apparatus for making a stamp from an original picture
04/28/1998US5744381 Method of inspecting a pattern formed on a sample for a defect, and an apparatus thereof
04/28/1998US5744268 Phase shift mask, method of manufacturing a phase shift mask and method of forming a pattern with phase shift mask
04/23/1998WO1998016874A1 Process for imaging a flexo-graphic printing plate from liquid photopolymers and without using phototools
04/23/1998WO1998016872A1 Projection mask
04/22/1998EP0837365A1 Membrane mask structure, fabrication and use
04/21/1998US5742377 Cantilever for scanning probe microscope including piezoelectric element and method of using the same
04/21/1998US5742065 Heater for membrane mask in an electron-beam lithography system
04/21/1998US5741732 Method for detecting implantation mask misalignment
04/21/1998US5741625 Process for forming fine patterns in a semiconductor device utilizing multiple photosensitive film patterns and organic metal-coupled material
04/21/1998US5741624 Connecting semiconductor layers
04/21/1998US5741614 Atomic force microscope measurement process for dense photoresist patterns
04/21/1998US5741613 Multilayer
04/21/1998US5741576 Optical pellicle with controlled transmission peaks and anti-reflective coatings
04/14/1998US5740068 Fidelity enhancement of lithographic and reactive-ion-etched images by optical proximity correction
04/14/1998US5738959 Halftone phase shift photomask, halftone phase shift photomask blank, and method of producing the same comprising fluorine in phase shift layer
04/09/1998WO1998014835A1 Method of preparing a phototool
04/09/1998DE19701966C1 Laser beam mask esp. for excimer laser beams
04/08/1998EP0834831A2 Image inspection apparatus and method in plate making process
04/07/1998US5737072 Automated photomask inspection apparatus and method
04/07/1998US5736300 Irradiating coherent ultraviolet light beam to surface of phase shift mask having enlarged mask pattern, projecting light transmitted to form reduced pattern image on photoresist film overlying integrated circuit wafer, transferring pattern
04/07/1998US5736277 Method of making mask pattern data and process for manufacturing the mask
04/07/1998US5736276 Forming shielding layer on transparent substrate, injecting oxygen ions into surface of layer, converting to oxidation layer
03/1998
03/31/1998US5734741 Platemaking process and system for printing abstract patterns on architectural materials
03/31/1998US5733691 One-step method for on-line lithographic pattern inspection
03/31/1998US5733688 Lithographic mask structure and method of producing the same comprising W and molybdenum alloy absorber
03/31/1998US5733687 Photomask, exposing method using photomask, and manufacturing method of photomask
03/31/1998US5733686 Phase-shifting mask
03/26/1998WO1998012605A1 Phase shifting circuit manufacture method and apparatus
03/26/1998WO1998012603A1 Photolithography masking arrangements
03/24/1998US5732403 Method and apparatus for transferring page construction data according to hierarchical page data
03/24/1998US5731884 Method of an apparatus for outputting halftone dot image
03/24/1998US5731109 Pattern structure of photomask comprising a sawtooth pattern
03/24/1998US5730888 Bragg gratings in waveguides
03/18/1998EP0829034A1 Process for producing a structured mask
03/17/1998US5729325 Pellicle for a mask or substrate
03/17/1998US5728494 Mask comprising a translucent film on a light transmitting substrate and a stabilized region formed on the boundary between substrate and translucent film
03/17/1998US5728493 Antireflection mask for contact hole opening
03/17/1998US5728492 Mask for projection system using charged particle beam
03/17/1998US5728491 Chrome film on silica substrate, integrated circuits
03/17/1998US5727685 Reticle container with corner holding
03/10/1998US5726741 Photolithographic projection systems including grating masks and related methods
03/10/1998US5725975 Gradation mask and process for producing the same
03/10/1998US5725974 Method and apparatus for producing scanning data used to produce a photomask
03/10/1998US5725973 Photo mask and method for manufacturing same
03/10/1998US5725972 Multilayer radiation transparent, opaque region, transition region and patterns
03/10/1998US5725971 Method of manufacturing phase shift masks and a method of manufacturing semiconductor integrated circuit devices
03/10/1998US5725969 Forming a phase-shifting and attenuating layer on a transparent substrate, selectively removing layer to form a halftone and forming a light shielding pattern on layer between transparent regions
03/05/1998DE19735165A1 X=ray lithography mask useful in semiconductor industry
03/05/1998DE19709470A1 Phase shifting mask with Levenson and half-tone type sections
03/05/1998DE19709246A1 High surface planarity phase shifting mask
03/03/1998US5723876 Device and method for programming a logic level within an intergrated circuit using multiple mask layers
03/03/1998US5723860 Frame-supported pellicle for photomask protection
03/03/1998US5723236 Photomasks and a manufacturing method thereof
03/03/1998US5723235 Method of producing photomask and exposing
03/03/1998US5723234 Phase shift photomask and phase shift photomask dry etching method
03/03/1998US5723233 Optical proximity correction method and apparatus
02/1998
02/26/1998DE19734486A1 Photomask test apparatus for integrated circuit manufacture