Patents
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
10/1992
10/27/1992US5159352 Dynamic focusing system for use with discontinuous medium
10/27/1992US5159201 Shape decompositon system and method
10/27/1992US5158862 Homopolymerizing 5,7-dodecadiyn-1,12-bis(isopropyl carbamate)
10/26/1992CA2066907A1 Method for producing color filter
10/21/1992EP0509514A1 Process for producing lithographic printing plate, photosensitive plate and aqueous ink composition therefor
10/20/1992US5156784 Heat treatment, vacuum; x-ray masks
10/18/1992CA2066389A1 Process for producing lithographic printing plate, photosensitive plate and aqueous ink composition therefor
10/13/1992US5155749 Variable magnification mask for X-ray lithography
10/13/1992US5154199 Semiconductor processor draining
10/13/1992CA1308666C High resolution halftone dot generator system including led array
10/13/1992CA1308611C Masking films
10/07/1992EP0478576A4 Perfluoropolymer coated pellicles
10/06/1992US5153916 Method and apparatus for detecting focal plane
10/06/1992US5153101 Photoresist
10/06/1992US5153084 Process for preparing a photo-mask for imaging three-dimensional objects
10/06/1992US5153083 Method of making phase-shifting lithographic masks
10/06/1992US5152225 Method of making a printing film and printing process using same
10/06/1992CA1308293C Thin film artwork compounds
10/01/1992DE4209873A1 Positive and negative photocopy prodn. - by exposure to change adhesion between light heat transformation coat and copying coat and image transfer
09/1992
09/29/1992US5151336 Material for photomechanical process for photosensitive color element for blocking transmission of light
09/29/1992CA1307981C Lightsafe masking film
09/29/1992CA1307892C Reflection-preventive pellicle film and process for preparation thereof
09/23/1992EP0505144A1 X-ray lithography mask, light exposure apparatus and process therefor
09/23/1992EP0505103A1 Sub-micron device fabrication
09/23/1992EP0505102A1 Sub-micron device fabrication
09/23/1992EP0505101A1 Sub-micron imaging
09/22/1992US5150392 For providing precise alignment
09/22/1992US5149616 5,7-Dodecadiyn-1,12-Bis/Isopropyl Carbamate/ Homopolymer
09/22/1992US5149608 Emulsion printing plate relief coatings
09/21/1992WO1992016822A2 Fluid cooled contact mask
09/21/1992CA2106477A1 Fluid cooled contact mask
09/17/1992WO1992015958A1 Apparatus and method to merge images rasterized at different resolutions
09/16/1992EP0503621A1 Direct lithographic plate making method and its apparatus using an ink jet system
09/16/1992EP0503472A2 Exposure apparatus and method
09/15/1992US5148024 Ion beam processing apparatus and gas gun therefor
09/15/1992US5147742 Photomask and fabrication of the same
09/13/1992CA2062650A1 Direct lithographic plate making method and its apparatus using and ink jet system
09/10/1992DE4107378A1 Multiple use copying masks for prodn. of printing plates - comprising transparent support film bearing the image to be copied, covered with protective layer of transparent film-forming polymer contg. transparent matting agent
09/08/1992US5146481 Diamond membranes for X-ray lithography
09/08/1992US5145757 By electron beam irradiation with at least one surface of article having continuous silver and hydration content
09/02/1992EP0501696A1 Single-alignment-level lithographic technique for achieving self-aligned features
09/02/1992EP0501278A1 Method to produce masking
09/01/1992US5143793 Image drawn from dots of inks
08/1992
08/26/1992EP0500456A1 Projection exposure method and an optical mask for use in projection exposure
08/26/1992EP0499998A2 Process and apparatus for layout with video means
08/26/1992EP0499944A1 Method for forming a sloped surface having a predetermined slope
08/25/1992US5142120 Contact cooling of a projection mask
08/25/1992US5141830 Writing patterns
08/25/1992US5141829 Method of preparing a photo-mask for imaging three-dimensional objects
08/18/1992US5139927 Permanent yellow imaged light modulating film
08/18/1992US5139926 10,12-Docosadiyndioic acid homopolymer
08/12/1992EP0498445A1 Case for photomask
08/12/1992EP0205571B1 Establishing and/or evaluating alignment by means of alignment marks
08/05/1992EP0497344A2 Image layout processing method and apparatus
08/04/1992US5135609 Precise patterning of thin films; identifying, removing microscopically sized tiles; chromium masks for integrated circuits
07/1992
07/29/1992CN2111184U Copying device for printing plate making
07/28/1992CA1305627C Pellicle
07/23/1992WO1992012466A1 Method of forming minute resist pattern
07/23/1992DE4200647A1 Chromium@ mask with phase-shirt coating for integrated circuit manufacture - formed by depositing layer on top of chromium@ which can be oxidised, using obtd mask during chromium@ etching and oxidising
07/22/1992EP0495158A1 Contact cooling of a projection mask
07/21/1992US5132186 Mask for x-ray lithography and method of manufacturing the same
07/15/1992EP0494744A1 Coating composition for forming insulating layers and masks
07/14/1992US5130223 Postive working image-forming material with surface roughened plastic film substrate, transparent resin layer, colored resin layer and photosensitive resin layer
07/14/1992US5130213 Device manufacture involving lithographic processing
07/09/1992WO1992011110A1 A method of cloning printed wiring boards
07/08/1992EP0493963A1 Patterned mask having a transparent etching stopper layer
07/08/1992EP0493655A2 Apparatus for and method of transverse position measurement in proximity lithographic systems
07/08/1992EP0493503A1 Method of producing a thin silicon-on-insulator layer
07/07/1992US5128224 Method of manufacturing an aperture pattern printing plate
07/01/1992EP0492630A2 Phase shifting mask
06/1992
06/30/1992US5127029 X-ray exposure apparatus
06/30/1992US5126220 Phase shift pattern to cancel diffraction of optical beam passed through transparent pattern
06/30/1992US5126006 Plural level chip masking
06/24/1992EP0491059A1 Chip construction with DNA technology
06/23/1992US5125040 Inspection method of photomask reticle for semiconductor device fabrication
06/23/1992US5124561 Process for X-ray mask warpage reduction
06/23/1992US5123743 Lithography mask inspection
06/20/1992CA2057964A1 Method of thermal wax transfer as a mask for digital color proofing
06/17/1992EP0490547A1 Method of manufacturing a photomask for an optical memory
06/16/1992US5122439 Forming a pattern on a substrate
06/11/1992WO1992010049A1 Optical printing system with discontinuous print medium
06/11/1992WO1992009929A1 Diffusion transfer receiver
06/10/1992EP0489582A2 Platemaking process and system for printing of abstract patterns
06/10/1992EP0489542A2 Lithographic techniques
06/10/1992EP0489540A2 Phase-shifting lithographic masks with improved resolution
06/10/1992EP0489539A2 Method of making phase-shifting lithographic masks
06/09/1992US5120925 Methods for device transplantation
06/09/1992US5120396 Drawing a figure on a sheet of paper, transferring the figure to a film, then to a silk screen, brushing a protective coating onto a plate covered by the silk screen, removing the silk screen and etching
06/04/1992DE4139484A1 Printing control system - allows data to be organised in sets that can be organised in different layout forms
06/03/1992EP0488788A1 Pellicle structure and process for preparation thereof
06/03/1992EP0488530A2 Ink composition and process for producing a lithographic printing plate using the same
06/03/1992EP0488245A1 Phase-shifting mask and process for its production
06/02/1992US5119439 Method of and apparatus for extracting image contour data
06/02/1992US5118952 Layer of silver and layer of alkali(earth) metal; reducing work function
05/1992
05/29/1992WO1992009012A1 Topological image transfer method
05/27/1992EP0486581A1 Device for automatically clamping and releasing data supports and its operation.
05/27/1992EP0479791A4 Index marking article for superposed sheets
05/27/1992DE4037926A1 Electron beam working arrangement e.g. for X=ray mask prodn. - uses gas which is concentrated at impact point of beam to avoid influencing beam
05/26/1992US5116782 Method and apparatus for processing a fine pattern
05/20/1992EP0486316A2 Projection exposure method and apparatus