| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 11/22/1994 | US5367359 Plate-making method and plate-making apparatus for printing |
| 11/22/1994 | CA2124020A1 Fly's eye optics for raster output scanner in an electrophotographic printer |
| 11/15/1994 | US5364718 Method of exposing patttern of semiconductor devices and stencil mask for carrying out same |
| 11/15/1994 | US5364717 Method of manufacturing X-ray exposure mask |
| 11/15/1994 | US5364716 Pattern exposing method using phase shift and mask used therefor |
| 11/08/1994 | US5362591 Second phase shift layer formed on the first; precise control of phase of exposure light unaffected by light shielding film |
| 11/08/1994 | US5362584 Phase-shifting transparent lithographic mask for writing contiguous structures from noncontiguous mask areas |
| 11/08/1994 | US5362575 Free-standing tensile fims supported at its edge by annular, tapered skirt structure; integrated electronic devices |
| 11/08/1994 | US5361449 Cleaning apparatus for cleaning reverse surface of semiconductor wafer |
| 11/02/1994 | EP0622680A2 Frame-supported dustproof pellicle for photolithographic photomask |
| 11/01/1994 | US5360781 Heat mode recording material and method for obtaining color images |
| 10/27/1994 | WO1994024608A2 Method of preparation of mask for ion beam lithography |
| 10/26/1994 | EP0620931A1 Improved mask for photolithography |
| 10/25/1994 | US5359407 Optical scanning apparatus, surface-state inspection apparatus and exposure apparatus |
| 10/25/1994 | US5358827 Using an optical focusing system having a lateral magnification that focuses radiation |
| 10/25/1994 | US5358808 Radiation transparent substrate, light transferring and light shielding layer which are patterned; used for lithography; improved resolution |
| 10/25/1994 | US5358807 Improved resolution |
| 10/25/1994 | US5358806 Phase shift mask, method of correcting the same and apparatus for carrying out the method |
| 10/25/1994 | US5357899 Epitaxial silicon membranes |
| 10/19/1994 | EP0620498A1 Phase-shifting transparent lithographic mask for writing contiguous structures from noncontiguous mask areas |
| 10/19/1994 | EP0620497A2 Halftone phase shift photomask, halftone phase shift photomask blank, and methods of producing the same |
| 10/18/1994 | US5357116 Focused ion beam processing with charge control |
| 10/18/1994 | US5356739 Stainproof protector made from fluorine-containing aliphatic cyclic polymer for preventing staining of lithographic masks |
| 10/18/1994 | US5356738 Reticle comprising phase shifter with a tapered edge |
| 10/18/1994 | US5356686 X-ray mask structure |
| 10/18/1994 | US5356662 Method for repairing an optical element which includes a multilayer coating |
| 10/12/1994 | EP0619518A1 Substrate and pretreatment process for such substrates |
| 10/11/1994 | US5355194 Optical processing apparatus |
| 10/11/1994 | US5354633 Ignition layer, ignitable metal layer, and mechanically strong, durable, flexible third layer |
| 10/11/1994 | US5354632 Lithography using a phase-shifting reticle with reduced transmittance |
| 10/11/1994 | US5353934 Substrate holding case |
| 10/05/1994 | EP0618611A2 Method and apparatus for washing substrates |
| 10/04/1994 | US5353116 Defect inspection system for phase shift masks |
| 10/04/1994 | US5352562 Image forming process and light-sensitive image forming material |
| 10/04/1994 | US5352550 Mask for manufacturing semiconductor devices and method of manufacture thereof |
| 09/29/1994 | WO1994022056A1 A thin film mask for use in an x-ray lithographic process and its method of manufacture |
| 09/28/1994 | EP0617329A1 Method of forming a micro structure and an X-ray mask |
| 09/27/1994 | US5350649 Microminiaturization optical masking and supports, exposure to light and focusing ion beams |
| 09/27/1994 | CA1332131C Lightsafe masking film |
| 09/22/1994 | DE4308248A1 Method and device to produce a laser printed copy |
| 09/20/1994 | US5348826 Patterning radiation sensitive layers; optics; semiconductors |
| 09/20/1994 | US5348825 Method for manufacturing shadow mask and shadow mask manufactured by said method |
| 09/15/1994 | DE4407920A1 Mounting of transparencies |
| 09/13/1994 | US5347592 Pattern judging method and mask producing method using the pattern judging method |
| 09/13/1994 | US5347134 Apparatus for repairing defects in emulsion masks by passing laser light through a variable shaped aperture |
| 09/08/1994 | DE4407044A1 Maske und Verfahren zu deren Herstellung Mask and method for their preparation |
| 09/06/1994 | US5344729 Rigid shell, metal film, photoresist |
| 09/06/1994 | US5344677 Protective coverings, lithographic imaging of integrated circuits, fluoropolymer membranes |
| 09/06/1994 | US5344522 Pattern forming process and process for preparing semiconductor device utilizing said pattern forming process |
| 09/01/1994 | WO1994019723A1 Resolution-enhancing optical phase structure for a projection illumination system |
| 08/31/1994 | EP0613056A1 Screen printing origination film |
| 08/30/1994 | US5342737 Forming photoresist layer on substrate, expoosing to actinic radiation, developing and metallization |
| 08/30/1994 | US5342713 Phase shifting mask |
| 08/27/1994 | CA2116250A1 Screen printing origination film |
| 08/25/1994 | DE4404453A1 Attenuation (reduction) phase-shift mask and method for its production |
| 08/24/1994 | EP0612181A1 Method and appartus for converting grey scale values into binary values |
| 08/24/1994 | EP0611996A2 Phase shift mask and its inspection method |
| 08/24/1994 | CN1091210A Photomask Blanks |
| 08/23/1994 | US5340702 Coating photoresist with light shielding film; exposure and development |
| 08/23/1994 | US5340637 Optical device diffraction gratings and a photomask for use in the same |
| 08/17/1994 | EP0610183A1 Exposure device. |
| 08/16/1994 | US5338647 Reflection type photomask and reflection type photolithography method comprising a concavo-convex surface |
| 08/16/1994 | US5338626 Covering transparent substrate with opaque patterned layer and resist layer, then exposure to various actinic radiations, development, anisotropic etching |
| 08/16/1994 | US5338424 Masks for applying dots on semiconductor wafers |
| 08/16/1994 | US5337668 Method of and apparatus for producing register mark pattern |
| 08/09/1994 | US5337140 Optical detecting system wtih self-correction |
| 08/09/1994 | US5336587 Method of manufacturing main plates for exposure printing |
| 08/04/1994 | WO1994017450A1 Phase shifting mask structure with absorbing/attenuating sidewalls for improved imaging and method of fabricating phase shifters with absorbing/attenuating sidewalls |
| 08/04/1994 | WO1994017449A1 Phase shifting mask structure with multilayer optical coating for improved transmission |
| 08/04/1994 | DE4303144A1 Mfg. printing plate for offset printing |
| 08/02/1994 | US5335256 Semiconductor substrate including a single or multi-layer film having different densities in the thickness direction |
| 08/02/1994 | US5335089 Electronic high-fidelity screenless conversion system and method using a separable filter |
| 08/02/1994 | US5334483 Support being overlayed on each side by three layer composite includine gelatin underlayer, tone controlling compound, a nuclei layer comprising silver iodide modified nickel sulfide first tone controlling compound and gelatin supercoat |
| 08/02/1994 | US5334467 Gray level mask |
| 08/02/1994 | US5334466 X-ray mask and process comprising convex-concave alignment mark with alignment reflection film |
| 08/02/1994 | CA2010480C Method and apparatus for facilitating loading of a panel processing machine and positioning of artwork on a work surface thereon |
| 07/26/1994 | US5332681 Method of making a semiconductor device by forming a nanochannel mask |
| 07/26/1994 | US5332604 Adhesive system for reducing the likelihood of particulate |
| 07/26/1994 | CA1330860C Dust-proof film |
| 07/21/1994 | WO1994015777A1 Lithographic mask, comprising a membrane having improved strength |
| 07/21/1994 | DE4310976C1 Vitreous carbon@ used as carrier for x=ray resist material and mask for deep lithography |
| 07/19/1994 | US5331396 Foreign matter detection device |
| 07/19/1994 | US5330862 Method for forming resist mask pattern by light exposure having a phase shifter pattern comprising convex forms in the resist |
| 07/19/1994 | US5330053 Case for photomask |
| 07/13/1994 | EP0605961A1 Method for repairing an optical element which includes a multilayer coating |
| 07/13/1994 | EP0605814A1 Diamond-like carbon films from a hydrocarbon helium plasma |
| 07/12/1994 | US5329333 Exposure apparatus and method |
| 07/12/1994 | US5328807 Photoresists films, radiation transparent plates, phase shift, and patterns |
| 07/12/1994 | US5328786 Radiation transparent layer with light blocking regions on substrates |
| 07/12/1994 | US5328785 High power phase masks for imaging systems |
| 07/12/1994 | US5328784 Reflection mask, method of producing mask and method of forming pattern using the mask |
| 07/12/1994 | US5327808 Method for the preparation of a frame-supported pellicle for photolithography |
| 07/07/1994 | WO1994015261A1 Method of generating lines on semiconductor wafer |
| 07/06/1994 | CN1025379C Method of mfg. mask for radiation lithography |
| 07/05/1994 | US5326659 For optical lithography, focusing |
| 07/05/1994 | US5326649 X-ray transmitting membrane for mask in x-ray lithography and method for preparing the same |
| 07/05/1994 | US5326426 Undercut membrane mask for high energy photon patterning |
| 07/05/1994 | CA2040306C Color filter and method of repairing thereof, and liquid crystal display |
| 06/29/1994 | EP0604054A1 Electron beam lithography with reduced charging effects |
| 06/29/1994 | EP0603806A1 Apparatus and method for reproducing an image |