| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 08/11/1998 | US5793836 X-ray mask pellicle |
| 08/11/1998 | US5792596 Pattern forming method |
| 08/11/1998 | US5792591 Method of manufacturing a semiconductor device whereby photomasks comprising partial patterns are projected onto a photoresist layer so as to merge into one another |
| 08/11/1998 | US5792581 Method of correcting pattern data for drawing photomask to overcome proximity effects |
| 08/11/1998 | US5792578 Method of forming multiple layer attenuating phase shifting masks |
| 08/10/1998 | CA2221835A1 Optical pellicle adhesion system |
| 08/06/1998 | WO1998034092A2 Object inspection and/or modification system and method |
| 08/05/1998 | CN1189684A Method of manufacturing EB mask for electron beam image drawing and device for manufacturing EB mask |
| 08/05/1998 | CN1039465C 相移掩模 Phase shift mask |
| 08/04/1998 | US5789141 For improved resolution and increased density of integrated circuits; |
| 08/04/1998 | US5789120 Method for designing a reticle mask |
| 08/04/1998 | US5789119 Zones with different scattering or absorption |
| 08/04/1998 | US5789118 Method and apparatus for precision determination of phase-shift in a phase-shifted reticle |
| 08/04/1998 | US5789117 Direct transfer printing onto the pattern layer of a phase shift photomask |
| 08/04/1998 | US5789116 Half-tone phase shift masks and fabricating methods therefor including phase shifter pattern and phase shifting groove |
| 07/30/1998 | WO1998033096A1 Method and apparatus for the production of a structure by focused laser radiation on a photosensitively coated substrate |
| 07/30/1998 | DE19710798C1 Mask production from membrane-covered single crystal silicon@ |
| 07/29/1998 | EP0349633B1 Polysilicon thin film process |
| 07/28/1998 | US5786267 Method of making a semiconductor wafer with alignment marks |
| 07/28/1998 | US5786130 Applying an infrared material which is transparent to visible light; forming pattern not visible to the human eye; useful for positioning microscope platform or for locating objects without interference from visible light |
| 07/28/1998 | US5786116 Advanced tilted illumination on mask; improved accuracy, resolution, depth of focus |
| 07/28/1998 | US5786115 Improving photolithography using a formed phase shift layer to control amount light transmitting |
| 07/28/1998 | US5786114 Attenuated phase shift mask with halftone boundary regions |
| 07/28/1998 | US5786113 Photo-mask used in aligner for exactly transferring main pattern assisted by semi-transparent auxiliary pattern and process of fabrication thereof |
| 07/28/1998 | US5786112 Photomask manufacturing process and semiconductor integrated circuit device manufacturing process using the photomask |
| 07/28/1998 | US5786111 Phase shift mask and fabricating method thereof |
| 07/21/1998 | US5783337 Process to fabricate a double layer attenuated phase shift mask (APSM) with chrome border |
| 07/21/1998 | US5783336 Mask for exposure |
| 07/21/1998 | US5783309 Recovery of an anodically bonded glass device from a substrate by use of a metal interlayer |
| 07/21/1998 | US5783251 Method for suppressing electrification and for observing or inspecting an article |
| 07/21/1998 | US5782356 Container for storing and transporting fragile objects |
| 07/14/1998 | US5781657 Apparatus for inspecting pattern of photomask and method therefor |
| 07/14/1998 | US5781656 Method and apparatus for inspecting patterns composed of reticle data |
| 07/14/1998 | US5781607 For use in creating a pattern of mask features |
| 07/14/1998 | US5780861 Adjustable blade reticle assembly |
| 07/14/1998 | US5780208 Reducing light scatter while producing resist feature on circuit substrate by providing resist layer, blocking transmission of radiation to portion of resist layer defining resist feature, radiating |
| 07/14/1998 | US5780203 Process for forming colored partial picture element and light-shielding light-sensitive resin composition used therefor |
| 07/14/1998 | US5780187 Laser or ion beam assisted deposition of second material into the indentation characterizing the first defect, trimming excess of material, performing planarization |
| 07/08/1998 | EP0852028A1 Black-and-white photothermographic and thermographic elements comprising hydroxamic acid compounds as contrast enhancers |
| 07/08/1998 | EP0852027A2 Black-and-white photothermographic and thermographic elements comprising amine compounds as contrast enhancers |
| 07/08/1998 | EP0852026A1 Black-and-white photothermographic and thermographic elements comprising acrylonitrile compounds as co-developers |
| 07/08/1998 | EP0852025A1 Black-and-white photothermographic and thermographic elements comprising n-acyl-hydrazine compounds as contrast enhancers |
| 07/08/1998 | EP0852024A1 Black-and-white photothermographic and thermographic elements comprising hydrogen atom donor compounds as contrast enhancers |
| 07/07/1998 | US5778042 On a glass surface |
| 07/07/1998 | US5777327 Pattern shape inspection apparatus for forming specimen image on display apparatus |
| 07/07/1998 | US5776640 Photo mask for a process margin test and a method for performing a process margin test using the same |
| 07/07/1998 | US5776639 Exposure mask, method of producing the same, exposure mask producing apparatus, and method of forming surface profile on material using exposure mask |
| 07/07/1998 | US5776638 Projection exposure method and mask employed therein |
| 07/02/1998 | WO1998028755A1 X-ray lithography masking |
| 07/01/1998 | EP0851296A1 Thermally imageable material |
| 07/01/1998 | EP0851294A1 Mask protecting device |
| 06/30/1998 | US5774575 Inspection apparatus, and exposure apparatus and device manufacturing method using the inspection apparatus |
| 06/30/1998 | US5773188 Image protective overcoat comprising a clear polymer film |
| 06/30/1998 | US5773177 X-ray mask structure, and X-ray exposure process |
| 06/30/1998 | US5773171 Masking for forming contact apertures, substrates, shift and windows |
| 06/30/1998 | US5773170 UV-absorbing media bleachable by IR-radiation |
| 06/30/1998 | US5772842 Apparatus for stripping pellicle |
| 06/30/1998 | US5772817 Evaporation of solvent adhesive |
| 06/25/1998 | WO1998027460A1 Method of manufacturing pellicle and pellicle manufacturing jig |
| 06/25/1998 | WO1998027459A1 Method for providing micro-optics using gray level masks |
| 06/25/1998 | WO1998027430A1 Lithographic mask design and synthesis of diverse probes on a substrate |
| 06/25/1998 | DE19729600A1 Pattern comparison monitoring system using grey value raster, e.g. for electron beam lithography mask |
| 06/25/1998 | CA2274972A1 Method of manufacturing pellicle and pellicle manufacturing jig |
| 06/23/1998 | US5770338 Phase shifting overlay mark that measures exposure energy and focus |
| 06/23/1998 | US5770337 Focus, microscopes |
| 06/23/1998 | US5770336 Lithography mask and fabrication method thereof |
| 06/23/1998 | US5770335 Mask and exposure apparatus using the same |
| 06/23/1998 | US5769984 Fluoropolymer with cyclic ether monomer |
| 06/18/1998 | WO1998026331A1 Variable step height control of lithographic patterning |
| 06/17/1998 | EP0848296A1 System and method for providing photographic printing plates and the like |
| 06/17/1998 | EP0847869A1 Barrier layer for laser ablative imaging |
| 06/16/1998 | US5767974 Apparatus and method for identifying photomask pattern defects |
| 06/16/1998 | US5767962 Inspection system and device manufacturing method using the same |
| 06/16/1998 | US5767949 Exposure apparatus and method |
| 06/16/1998 | US5767523 Multiple detector alignment system for photolithography |
| 06/16/1998 | US5766829 Method of phase shift lithography |
| 06/16/1998 | US5766819 Donor elements, assemblages, and associated processes with flexible ejection layer(s) for laser-induced thermal transfer |
| 06/16/1998 | US5766806 Simplified production of integrated circuits |
| 06/16/1998 | US5766805 Forming conductive light shielding layer on transparent substrate, implanting oxygen ions, selectively etching to form phase shift film |
| 06/16/1998 | US5766804 Method of optical lithography using phase shift masking |
| 06/16/1998 | US5766802 Adjustment writing scan width; accuracy |
| 06/11/1998 | WO1998025182A1 Reticle that compensates for lens error in a photolithographic system |
| 06/09/1998 | US5765067 Film rewinder |
| 06/09/1998 | US5764390 Holographic method for generating three dimensional conformal photo-lithographic masks |
| 06/09/1998 | US5764342 Method and system for controlling the relative size of images formed in light-sensitive media |
| 06/09/1998 | US5763143 Depositing resist layer, masking, developing, baking, etching |
| 06/09/1998 | US5763121 Lithography |
| 06/04/1998 | WO1998023449A1 Process film, process ink, and platemaking method and system using the film |
| 06/04/1998 | DE19747775A1 X=ray absorber for x=ray lithography mask |
| 06/04/1998 | DE19743554A1 Smooth surfaced x=ray lithography mask production |
| 06/03/1998 | EP0594676B1 method for producing DIAMOND MEMBRANES FOR X-RAY LITHOGRAPHY |
| 06/03/1998 | CN1183579A Process of exactly patterning layer to target configuration by using photo-resist mask formed with dummy pattern |
| 06/02/1998 | US5761075 Apparatus for designing photomasks |
| 06/02/1998 | US5760880 For imagewise exposing an infrared sensitive layer |
| 06/02/1998 | US5760461 Vertical mask for defining a region on a wall of a semiconductor structure |
| 06/02/1998 | US5759742 Photosensitive element having integral thermally bleachable mask and method of use |
| 06/02/1998 | US5759724 Transparent substrate with opaque layer, patterns and photoresist and etching |
| 06/02/1998 | US5759723 Light exposure mask for semiconductor devices and method for forming the same |
| 06/02/1998 | US5759722 Electron beam aperture structure and method for fabricating the same |
| 05/28/1998 | WO1998022851A1 Pellicle |