Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
11/1998
11/03/1998US5831280 Device and method for programming a logic level within an integrated circuit using multiple mask layers
11/03/1998US5830612 Masking; scanning, calibration; high density integrated circuits
11/03/1998US5830607 Detecting defects
11/03/1998US5830606 Mask for manufacturing semiconductor device and method of manufacture thereof
11/03/1998US5830605 Accuracy; desired distribution of exposure light intensity
11/03/1998US5830332 Sputter deposition of hydrogenated amorphous carbon film and applications thereof
10/1998
10/27/1998US5827775 Phase mask laser fabrication of fine pattern electronic interconnect structures
10/27/1998US5827625 Methods of designing a reticle and forming a semiconductor device therewith
10/27/1998US5827624 Mask modification for focal plane on contact photolithography tool
10/27/1998US5827623 Photolithography in forming semiconductors
10/27/1998US5827622 Reflective lithographic mask
10/27/1998US5826601 Treating liquid replacing method, substrate treating method and substrate treating apparatus
10/22/1998WO1998047172A1 Pattern film repair using a gas assisted focused particle beam system
10/22/1998CA2286638A1 Pattern film repair using a gas assisted focused particle beam system
10/21/1998EP0872767A2 Halftone phase shift photomask and halftone phase shift photomask blank
10/21/1998CN1196804A Black-and-white photothermographic and thermographic elements comprising acrylonitrile compounds as co-developers
10/20/1998US5825647 Correction method and correction apparatus of mask pattern
10/20/1998US5825463 Mask and mask supporting mechanism
10/20/1998US5824455 Processing method and apparatus
10/20/1998US5824454 Method of photolithographically metallizing at least the inside of holes arranged in accordance with a pattern in a plate of an electrically insulating material
10/20/1998US5824440 Method of fabricating X-ray mask
10/20/1998US5824439 Phase shifiting mask and method of manufacturing the same
10/20/1998US5824438 Structure of phase shifting mask and method of manufacturing the same comprising an adhesive layer between a phase shift layer and a light blocking layer
10/20/1998US5824437 Mask and method of creating mask as well as electron-beam exposure method and electron-beam exposure device
10/15/1998WO1998045757A1 Black-pigmented structured high molecular weight material
10/15/1998WO1998045756A1 Highly transparent, colour-pigmented high molecular weight material
10/14/1998EP0871072A2 Multiple detector alignment system for photolithography
10/13/1998US5821131 Method for inspecting process defects occurring in semiconductor devices
10/13/1998US5821017 Method of deposition
10/13/1998US5821015 Photolithography
10/13/1998US5821014 Optical proximity correction method for intermediate-pitch features using sub-resolution scattering bars on a mask
10/13/1998US5821013 Variable step height control of lithographic patterning through transmitted light intensity variation
10/13/1998US5820950 Optical pellicle and package
10/13/1998US5820932 Process for the production of lithographic printing plates
10/09/1998CA2234532A1 Multiple detector alignment system for photolithography
10/08/1998DE19736959A1 Intermediate mask for pattern transfer in semiconductor manufacture
10/07/1998EP0788435A4 Digital laser imagable lithographic printing plates
10/06/1998US5817439 Method of blind border pattern layout for attenuated phase shifting masks
10/06/1998US5817438 Masking technology for etching contacts
10/06/1998US5817437 Method for detecting phase error of a phase shift mask
10/01/1998WO1998042509A1 A method for proofing imposed documents
09/1998
09/29/1998US5815685 Apparatus and method for correcting light proximity effects by predicting mask performance
09/29/1998US5815607 Image reading device, and inspection apparatus and exposure apparatus using the device
09/29/1998US5814424 Microelectronic masks for integrated circuits, semiconductors
09/29/1998US5814414 High aspect ratio metal microstructures and method for preparing the same
09/29/1998US5814381 Pellicle assembly having a vented frame
09/29/1998US5813348 Print job allocation system
09/23/1998EP0866372A1 Membrane mask for short wavelength radiaton exposure process
09/23/1998EP0865631A1 Imaging a lithographic printing plate
09/23/1998EP0548312B1 Pressure relieving pellicle
09/22/1998US5812259 Method and apparatus for inspecting slight defects in a photomask pattern
09/22/1998US5812244 Reticle assembly having non-superposed position measurement patterns
09/22/1998US5811208 Phase shift mask and method of producing the same
09/22/1998CA2061622C Sub-micron device fabrication
09/16/1998EP0864118A1 Donor elements and processes for thermal dye transfer by laser
09/16/1998CN1193127A Mask including transmission-rate-variable shade layer
09/15/1998US5809218 Method for the electronic assembly of printer's forms
09/15/1998US5809103 X-ray lithography masking
09/15/1998US5808796 Projection method and projection system and mask therefor
09/15/1998US5808312 System and process for inspecting and repairing an original
09/15/1998US5807650 Irradiating with focused ion beam; supplying xenon fluoride; etching
09/15/1998US5807649 Lithographic patterning method and mask set therefor with light field trim mask
09/15/1998US5807648 Photo-Mask having optical filtering layer on transparent substrate uncovered with photo-shield pattern and process of fabrication
09/15/1998US5807647 Method for determining phase variance and shifter stability of phase shift masks
09/15/1998CA2103411C Electron beam lithography with reduced charging effects
09/11/1998WO1998039798A1 Methods and apparatus for removing photoresist mask defects_in a plasma reactor
09/09/1998EP0863435A1 Material and process for covering the edges of photopolymerizable printing plates for flexographic printing
09/09/1998EP0843842A4 Lithography exposure mask derived from nanocrystal precursors and a method of manufacturing the same
09/09/1998CN1192543A Photomask for use in exposure and method for producing same
09/08/1998US5804340 Photomask inspection method and inspection tape therefor
09/08/1998US5804339 Exposing a photoresist with an activating agent utilizing a predetermined exposure pattern with a first exposure dosage followed by exposure using a correction exposure pattern
09/08/1998US5804338 Irradiating a microelectronic wafer
09/08/1998US5804337 Phase shift mask and phase shift mask blank
09/08/1998US5804336 Method of forming opaque border on semiconductor photomask
09/03/1998WO1998038549A1 Optical proximity correction method for intermediate-pitch features using sub-resolution scattering bars
09/01/1998US5801954 Process for designing and checking a mask layout
09/01/1998US5800949 Mask, method of producing a device using the mask and aligner with the mask
08/1998
08/27/1998DE4447646C2 Phase shift mask used in photolithography
08/25/1998US5799104 Mask defect repair system and method
08/25/1998US5798203 Phase shift mask includes an attenuator; changing an exposed portion of positive resist layer to be resistant to developer
08/25/1998US5798194 Masks for charged-particle beam microlithography
08/25/1998US5798193 Test pattern is used to calibrate the coordinate system of each processing machine on which the photomask is mounted
08/25/1998US5798192 Structure of a mask for use in a lithography process of a semiconductor fabrication
08/20/1998WO1998036324A1 Pellicle membrane for ultraviolet rays and pellicle
08/20/1998WO1998036297A1 Phase mask with spatially variable diffraction efficiency
08/20/1998CA2251638A1 Pellicle membrane for ultraviolet rays and pellicle
08/19/1998EP0652920B1 Antistatic agent and method for suppressing electrification
08/18/1998US5796804 X-ray mask structure for reducing the distortion of a mask
08/18/1998US5796114 Exposure apparatus and method for positioning with a high accuracy
08/18/1998US5795688 Automatic detection of advance design photomasks
08/18/1998US5795686 Thin films transistors
08/18/1998US5795685 Simple repair method for phase shifting masks
08/18/1998US5795684 First transmissive layer on substrate with trench portion witin which is an absorbing layer
08/18/1998US5795683 Method and a system for designing a photomask for use in manufacture of a semiconductor device
08/18/1998US5795682 Guard rings to compensate for side lobe ringing in attenuated phase shift reticles
08/14/1998CA2197706A1 Method of fabricating apodized phase mask
08/13/1998WO1998035270A1 Method for sticking a pellicle on an article to be protected, pellicle-protected articles obtained by the method, pellicle for ultraviolet rays, and case for pellicles
08/13/1998CA2251550A1 Method for sticking a pellicle on an article to be protected, pellicle-protected articles obtained by the method, pellicle for ultraviolet rays, and case for pellicles
08/12/1998EP0858003A2 Optical pellicle mounting system
08/12/1998EP0858002A1 Optical pellicle adhesion system
1 ... 203 204 205 206 207 208 209 210 211 212 213 214 215 216 217 218 219 220 221 222 223 ... 249