| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 02/11/1999 | CA2298500A1 Method for mounting printing plates on sleeves and for mounting the resultant sleeves on flexographic printing machine cylinders |
| 02/10/1999 | EP0896259A2 Method and device for producing a surface structure, in particular a holographic surface structure, on a substrate |
| 02/09/1999 | US5870448 X-ray mask and fabrication process using it |
| 02/09/1999 | US5869212 Improved image resolution and depth of focus, and a minimization of image shortening effects |
| 02/09/1999 | US5869211 Substrate having opaque film on central portion covered with coating film which has benn removed from peripheral portion by dissolving in processing solution |
| 02/09/1999 | US5868952 Fabrication method with energy beam |
| 02/09/1999 | US5868947 Si substrate and method of processing the same |
| 02/09/1999 | US5868560 Reticle, pattern transferred thereby, and correction method |
| 02/04/1999 | DE19802369A1 Phase-shift photomask production with accurate pattern |
| 02/04/1999 | CA2244324A1 A method and an apparatus for fabricating a surface structure, particularly a holographic surface structure, on a substrate |
| 02/03/1999 | CN1041974C Phase shift mask and method for fabricating same |
| 02/02/1999 | US5867401 Phase shifter arranging method and computer readable medium storing program for carrying out the method |
| 02/02/1999 | US5867253 Method of correcting light proximity effect |
| 02/02/1999 | US5867170 Composite digital images |
| 02/02/1999 | US5866281 Multi-layer microstructure fabrication; accurate adjustment between x-ray mask and substrate |
| 02/02/1999 | US5866280 Exposure mask and manufacturing method thereof |
| 02/02/1999 | CA2061624C Sub-micron device fabrication |
| 01/28/1999 | WO1999003684A2 The production of microstructures for use in assays |
| 01/28/1999 | DE19756518A1 Alternating phase-shift photomask production process |
| 01/28/1999 | CA2293597A1 The production of microstructures for use in assays |
| 01/27/1999 | EP0893737A2 Radiation sensitive composition |
| 01/27/1999 | EP0893736A1 Method for sticking a pellicle on an article to be protected, pellicle-protected articles obtained by the method, pellicle for ultraviolet rays, and case for pellicles |
| 01/26/1999 | US5863706 Processing method for patterning a film |
| 01/26/1999 | US5863677 Aligner and patterning method using phase shift mask |
| 01/21/1999 | WO1999003021A1 Method for producing active or passive components on a polymer basis for integrated optical devices |
| 01/21/1999 | CA2296569A1 Process for the fabrication of active and passive polymer-based components for integrated optics |
| 01/20/1999 | EP0891877A2 Laser-induced thermal transfer recording process |
| 01/19/1999 | US5862058 Optical proximity correction method and system |
| 01/19/1999 | US5861866 LSI mask pattern edit apparatus with contour line intensity distribution display method of resolution for lithography |
| 01/19/1999 | US5861603 Mask structure and method of making the same |
| 01/19/1999 | US5861233 Vapor depositing aluminum mask from alkylaluminum hydride to make trench; removing film; heating; burying inside with oxide; semiconductors |
| 01/14/1999 | WO1999001787A1 Phase mask for machining optical fibers and method of manufacturing the same |
| 01/14/1999 | WO1999001586A2 Device for transferring structures |
| 01/14/1999 | WO1999001512A1 Pigment dispersions containing c.i. pigment red 222 |
| 01/14/1999 | WO1999001511A1 Method for producing fine pigment dispersions |
| 01/13/1999 | CN1041665C Method for partition of aperture patterns profile |
| 01/12/1999 | US5858625 Projecting exposure light transmitted through phase shifting mask onto photoresist placed on film to be etched for photosensitizing photoresist |
| 01/12/1999 | US5858604 Presensitized lithographic printing plate and method for preparing lithographic printing plate |
| 01/12/1999 | US5858591 Improving the quality of photoresist images by separating cell descriptions (where line density is high) from peripheral areas (where line density is low) into two subfiles; applying a suitable bias and merging to one file |
| 01/12/1999 | US5858590 Method for forming photoresist patterns |
| 01/12/1999 | US5858582 Silicon, oxygen, metal |
| 01/12/1999 | US5858580 Phase shifting circuit manufacture method and apparatus |
| 01/12/1999 | US5858579 Masking films containing light shielding peelable layer utilizing nitrile resins |
| 01/12/1999 | US5858578 Photo masks for developing planar layers in a semiconductor device, and methods of forming the same |
| 01/12/1999 | US5858577 Comprises a light transmitting substrate; a light shielding layer comprising an inorganic material formed on the light transmitting substrate; and a phase transition layer formed on the light shielding layer |
| 01/12/1999 | US5858576 Mask comprising substrate having front and rear surfaces and window, self-supportive absorber film with pattern in region corresponding to window which can be transferred to object by photons irradiated through window |
| 01/07/1999 | WO1999000706A1 Transferring a programmable pattern by photon lithography |
| 01/07/1999 | EP0889359A2 Etching method for manufacture of a phase-shift mask |
| 01/07/1999 | CA2295635A1 Transferring a programmable pattern by photon lithography |
| 01/05/1999 | US5856101 Dna sequences |
| 01/05/1999 | US5856049 Phase shift mask and method for manufacturing same |
| 12/30/1998 | EP0886806A1 2-substituted malondialdehyde compounds as co-developers for black-and-white photothermographic and thermographic elements |
| 12/30/1998 | EP0886805A1 Black-and-white photothermographic and thermographic elements comprising 4-substituted isoxazole compounds as co-developers |
| 12/29/1998 | US5853959 Method of fabricating a contoured slider surface feature with a single mask |
| 12/29/1998 | US5853927 Method of aligning a mask in photolithographic process |
| 12/29/1998 | US5853923 Double layer method for fabricating a rim type attenuating phase shifting mask |
| 12/29/1998 | US5853922 Phase shifting mask, manufacturing method thereof, and exposure method using such a phase shifting mask |
| 12/29/1998 | US5853921 Methods of fabricating phase shift masks by controlling exposure doses |
| 12/22/1998 | US5851734 Process for defining resist patterns |
| 12/22/1998 | US5851708 Method for fabricating phase shifting mask and a phase shifting mask |
| 12/22/1998 | US5851707 Microlithography projection-exposure masks, and methods and apparatus employing same |
| 12/22/1998 | US5851706 Phase shift masks including chromium oxide and alumina phase shifter patterns, and methods of manufacturing and using the same |
| 12/22/1998 | US5851705 Method for manufacturing a self-aligned type out-rigger phase shift mask |
| 12/22/1998 | US5851704 Method and apparatus for the fabrication of semiconductor photomask |
| 12/22/1998 | US5851703 Photomask and pattern forming method employing the same |
| 12/22/1998 | US5851702 Method for producing a photomask |
| 12/22/1998 | US5851701 Atom lithographic mask having diffraction grating and attenuated phase shifters |
| 12/22/1998 | CA2154600C Mask protective device |
| 12/16/1998 | EP0884894A2 Method and apparatus for converting image color values from a first to a second color space |
| 12/15/1998 | US5850467 Image data inspecting method and apparatus providing for equal sizing of first and second image data to be compared |
| 12/15/1998 | US5849440 Process for producing and inspecting a lithographic reticle and fabricating semiconductor devices using same |
| 12/15/1998 | US5849439 Method for preparing phase shift mask blank, and phase mask |
| 12/15/1998 | US5849438 Phase shift mask and method for fabricating the same |
| 12/15/1998 | US5849437 Electron beam exposure mask and method of manufacturing the same and electron beam exposure method |
| 12/08/1998 | US5848315 Development monitoring apparatus and method adopting the same |
| 12/08/1998 | US5848120 X-ray mask blank, X-ray mask and pattern transfer method |
| 12/08/1998 | US5847813 Mask holder for microlithography exposure |
| 12/08/1998 | US5847421 Logic cell having efficient optical proximity effect correction |
| 12/08/1998 | US5846691 Composite relief image printing plates and methods for preparing same |
| 12/08/1998 | US5846676 Mask structure and exposure method and apparatus using the same |
| 12/01/1998 | US5843600 Use of sub divided pattern for alignment mark recovery after inter-level dielectric planarization |
| 12/01/1998 | US5842397 Punching apparatus and punching method for cylindrical inner surface scanner |
| 11/25/1998 | EP0880077A2 Method and apparatus for making a micro device |
| 11/24/1998 | US5840622 Phase mask laser fabrication of fine pattern electronic interconnect structures |
| 11/24/1998 | US5840448 Phase shifting mask having a phase shift that minimizes critical dimension sensitivity to manufacturing and process variance |
| 11/24/1998 | US5840447 Multi-phase photo mask using sub-wavelength structures |
| 11/24/1998 | US5840446 Semiconductors |
| 11/24/1998 | US5840445 Method of manufacturing a self-aligned phase-shifting mask |
| 11/19/1998 | WO1998052101A1 Gray scale mask and depth pattern transfer technique using inorganic chalcogenide glass |
| 11/19/1998 | WO1998051750A1 Hot melt ink |
| 11/17/1998 | US5837405 Reticle |
| 11/17/1998 | US5837403 Photomask for removing the notching phenomenon |
| 11/17/1998 | CA2061623C Sub-micron imaging |
| 11/11/1998 | EP0877292A1 Pellicle |
| 11/10/1998 | US5835274 Mask for patterning a microlens |
| 11/10/1998 | US5834143 Frame-supported dustproof pellicle for photolithographic photomask |
| 11/10/1998 | US5834142 X-ray mask for forming accurate lithography patterns, reducing stress of x-ray absorber to zero, heat treatment, annealing |
| 11/05/1998 | WO1998049601A1 Positive resist composition for photomask preparation |
| 11/05/1998 | WO1998034092A3 Object inspection and/or modification system and method |
| 11/04/1998 | EP0875113A1 Controlled asynchronous-motor drive designed for a rotating-drum scanner and with a hollow-shaft rotor for the internal illumination device |