Patents
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
04/1999
04/20/1999US5895741 Using photomask with specific areas where semitransparent film is formed on transparent substrate allowing phase angle of light beam to be inverted in areas, and with auxillary patterns at certain distance; increases production yield
04/20/1999US5895736 Radiating beam uniform in current density through aperture plate to electron resist layer
04/20/1999US5895735 Phase shift masks including first and second radiation blocking layer patterns, and methods of fabricating and using the same
04/20/1999US5895581 Laser imaging of printed circuit patterns without using phototools
04/15/1999WO1999000706A9 Transferring a programmable pattern by photon lithography
04/14/1999EP0908782A1 Photolithographic processing method
04/14/1999EP0908781A2 Photolithographic processing method and apparatus
04/14/1999EP0908778A2 Photosensitive element for flexographic printing
04/14/1999EP0620931B1 Mask for photolithography
04/13/1999US5894058 Providing a target surface of the target object with a photoresist film defining a pattern of a specific width, generating a large diameter fast atomic beam from a source, radiating the beam through pattern towards target surface
04/13/1999US5894056 Mask substrate, projection exposure apparatus equipped with the mask substrate, and a pattern formation method utilizing the projection exposure apparatus
04/08/1999DE19805875C1 Photo mask carrier table for micro-chip manufacture
04/07/1999EP0907111A2 Exposure method and method of producing a photolithographic mask
04/07/1999EP0907106A1 Pellicle membrane for ultraviolet rays and pellicle
04/07/1999EP0907105A2 Method for fabricating photomasks having a phase shift layer
04/07/1999CN1042873C Method for fabricating half-tone type phase shift mask
04/06/1999US5892579 Optical inspection method and apparatus
04/06/1999US5892291 Registration accuracy measurement mark
04/06/1999US5891596 Multilayer mask with light shield, ultrasonic cleaning
04/06/1999US5890798 Computer-controlled master reproducer for depositing a master reproduction on a substrate, method for depositing the same, and master reproduction
04/01/1999WO1999015934A1 Techniques for fabricating and packaging multi-wavelength semiconductor laser array devices (chips) and their applications in system architectures
04/01/1999WO1999015933A1 Optical lithography beyond conventional resolution limits
04/01/1999CA2304795A1 Techniques for fabricating and packaging multi-wavelength semiconductor laser array devices (chips) and their applications in system architectures
03/1999
03/31/1999EP0905566A2 Exposure method and method of producing a photolithographic mask
03/30/1999US5889593 Optical system and method for angle-dependent reflection or transmission measurement
03/30/1999US5888701 Method for making a flexographic printing plate from a flexographic printing element having a powder layer
03/30/1999US5888697 Flexographic printing element having a powder layer
03/30/1999US5888682 Method of using a compensation mask to correct particle beam proximity-effect
03/30/1999US5888678 Transparent substrate; rim attenuating phase shifting pattern
03/30/1999US5888677 Exposure mask, method of fabricating same, and method of manufacturing semiconductor device
03/30/1999US5888676 Miniatuization using multiple reticle-subfield exposures per die
03/30/1999US5888675 Obtaining the lens error in terms of image displacement data, and structurally modifying a reticle using the image displacement data so that the reticle compensates for the lense error
03/30/1999US5888674 Method of manufacturing a halftone phase shift mask
03/30/1999US5888327 Pellicle pasting system and method
03/25/1999WO1999014706A2 Visual inspection and verification system
03/25/1999WO1999014638A1 Design rule checking system and method
03/25/1999WO1999014637A1 Data hierarchy layout correction and verification method and apparatus
03/25/1999WO1999014636A1 Method and apparatus for data hierarchy maintenance in a system for mask description
03/25/1999WO1999014634A1 Smart photolithography
03/25/1999WO1999001586A3 Device for transferring structures
03/25/1999CA2303857A1 Smart photolithography
03/24/1999EP0903635A2 Light exposure pattern mask and production method of the same
03/24/1999EP0902915A1 Photolithography mask using serifs and method thereof
03/24/1999EP0664015B1 Method and apparatus for converting image color values from a first to a second color space
03/24/1999CN1211818A Aperture apparatus used for photolithography and manufacturing method thereof
03/24/1999CN1211813A Light exposure pattern mask and production method of the same
03/23/1999US5887080 Method and apparatus for processing pattern image data by SEM
03/23/1999US5885748 Method of exposing, with correction of pattern data used to draw photomask to overcome proximity effects
03/23/1999US5885747 Providing charged beam pattern drawing method which can draw auxiliary pattern for compensating for optical proximity effect by use of charged beam pattern drawing apparatus provided with acceleration voltage and beam resolution
03/23/1999US5885735 Forming a light shielding film with a predetermined configuration on a substrate which is substantially transparent to exposure light; and forming a phase shifter at a side wall of said light shielding film
03/23/1999US5885734 A plurality of levels is modified to include optical proximity effect corrections or phase shifting layers.
03/23/1999CA2005096C High light-transmissive dust-proof body and method of preparing same
03/17/1999EP0901649A1 Foam reservoir fluid transfer roller and method of making same
03/16/1999US5883813 Automatic generation of phase shift masks using net coloring
03/16/1999US5883705 Atomic force microscope for high speed imaging including integral actuator and sensor
03/16/1999US5882845 Method and device for the formation of holes in a layer of photosensitive material, in particular for the manufacture of electron sources
03/16/1999US5882827 Phase shift portions of both levenson type and halftone type
03/16/1999US5882826 The laminated film is obtained by continuously forming a sicn film on one of or each of sides of a sic film.
03/16/1999US5882825 Production method of a phase shift photomask having a phase shift layer comprising SOG
03/16/1999US5882824 Transparent substrates, light shields and phase shift portions
03/16/1999US5882823 Fib repair method
03/16/1999US5882534 Method for fabricating a multistage phase shift mask
03/11/1999WO1999012340A1 Mounting film transparencies in a rotary drum scanner
03/11/1999WO1999012075A1 Method of producing phase mask for fabricating optical fiber and optical fiber with bragg's diffraction grating produced by using the phase mask
03/11/1999CA2301638A1 Mounting film transparencies in a rotary drum scanner
03/11/1999CA2270525A1 Method of producing phase mask for fabricating optical fiber and optical fiber with bragg's diffraction grating produced by using the phase mask
03/10/1999EP0900411A1 Attenuating embedded phase shift photomask blanks
03/10/1999EP0900410A1 Attenuating embedded phase shift photomask blanks
03/09/1999US5881125 Attenuated phase-shifted reticle using sub-resolution pattern
03/09/1999US5879861 Method for making a lithographic printing plate wherein an imaging element is used that comprises a thermosensitive mask
03/09/1999US5879844 Optical proximity correction method
03/09/1999US5879841 Method for preparing multi-composed images without use of a photocomposer
03/09/1999US5879840 Film-forming method for X-ray mask
03/09/1999US5879839 Prevents light from being transmitted in undesired areas, and thus capable of obtaining desired fine patterns
03/04/1999WO1999010777A1 Arrangement for transferring structures
03/04/1999WO1999010186A1 Image forming material, image forming method, lithographic printing plate manufacturing method and apparatus, lithographic printing plate making method, and printed wiring board manufacturing method
03/04/1999DE19737916A1 Mask for the production of semiconductor wafers or other micro structures
03/03/1999EP0899117A1 Stamp making device
03/03/1999EP0898733A2 Method of producing a stencil mask
03/03/1999EP0898732A1 Black-and-white photothermographic and thermographic elements comprising 3-heteroaromatic-substituted acrylonitrile compounds as co-developers
03/03/1999EP0702806B1 Method of photolithographically metallizing at least the inside of holes arranged in accordance with a pattern in a plate of an electrically insulating material
03/03/1999CN1209641A Antistatic method for using conductive needle to photomask
03/03/1999CN1209590A Method and apparatus for making surface structure, in particular holographic surface structure on substrate
03/02/1999US5878105 X-ray mask
03/02/1999US5876885 Profile simulation method, dependent on curvature of processed surface, and mask design method utilizing simulation
03/02/1999US5876881 No pattern defects.
03/02/1999US5876880 Process for producing a structured mask
03/02/1999US5876878 Phase shifting mask and process for forming comprising a phase shift layer for shifting two wavelengths of light
03/02/1999US5876877 Patterned mask having a transparent etching stopper layer
02/1999
02/25/1999WO1999009456A1 Multiple image reticle for forming layers
02/24/1999EP0898411A2 Method and apparatus for automatically recording printing plates in an imaging system
02/24/1999CN1208948A Method of preparing charged particle beam drawing data and recording medium on which program thereof is recorded
02/18/1999WO1999008134A2 Ultra-broadband uv microscope imaging system with wide range zoom capability
02/17/1999EP0896694A1 Process and device for preparation of exposed typesetting films for phototypesetting
02/16/1999US5871889 Semiconductor integrated circuits and photolithographic manufacturing process foe elimination of defects
02/16/1999US5871874 Mask pattern forming method capable of correcting errors by proximity effect and developing process
02/16/1999US5871870 Mask for forming features on a semiconductor substrate and a method for forming the mask
02/16/1999US5871869 Phase shifting mask and method of manufacturing the same
02/16/1999CA2024618C Amorphous fluoropolymer pellicle films
02/11/1999WO1999006212A1 Method for mounting printing plates on sleeves and for mounting the resultant sleeves on flexographic printing machine cylinders