| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 07/27/1999 | US5928813 Attenuated phase shift mask |
| 07/27/1999 | US5927308 Megasonic cleaning system |
| 07/27/1999 | US5927191 Apparatus for screen printing digitalized images |
| 07/22/1999 | WO1999036259A1 Direct write imaging medium |
| 07/22/1999 | DE19837037A1 Reticle for stepwise and repetition illumination in semiconductor manufacture |
| 07/21/1999 | EP0865631A4 Imaging a lithographic printing plate |
| 07/20/1999 | US5926733 Metal layer patterns of a semiconductor device and a method for forming the same |
| 07/20/1999 | US5925500 Thin polymer films on backings that are photocurable with ultraviolet radiation |
| 07/15/1999 | DE19815872C1 Photomask clear mask pattern drawer |
| 07/14/1999 | EP0928685A2 Printing and PCB members and methods for producing same |
| 07/13/1999 | US5923566 Phase shifted design verification routine |
| 07/13/1999 | US5923034 Pattern transfer mask, mask inspection method and a mask inspection apparatus |
| 07/13/1999 | US5922502 Imaging element for making a lithographic printing plate wherein that imaging element comprises a thermosensitive mask |
| 07/13/1999 | US5922497 Lithographic imaging system |
| 07/13/1999 | US5922495 Used in lithography of semiconductor, provides a mask in which the line width of light blocking patterns at the overlapping region is widened to block the excessive light from passing through the mask due to repeated exposure |
| 07/13/1999 | US5922217 Method for correcting defects in a phase shift mask |
| 07/08/1999 | WO1999034417A1 Exposure method and exposure apparatus |
| 07/08/1999 | WO1999034255A1 Method and apparatus for manufacturing photomask and method of fabricating device |
| 07/07/1999 | EP0928012A2 Optical proximity correction method and apparatus |
| 07/07/1999 | EP0927381A1 Phase shifting circuit manufacture method and apparatus |
| 07/06/1999 | US5920487 Two dimensional lithographic proximity correction using DRC shape functions |
| 07/06/1999 | US5919868 Acrylate monomeric units and a photoabsorber bound to the monomeric units which is: 1-(dimethylamino)-pyrene, 4-(12-hydroxyethyl)ethylamino)-4-(trifluoromethylsulfonyl)tola ne, or 7-hydroxy-4-methyl-2h-1-benzopyrene-2-one. |
| 06/30/1999 | EP0926554A2 Image defect detection apparatus and method |
| 06/29/1999 | US5917932 System and method for evaluating image placement on pre-distorted masks |
| 06/29/1999 | US5917579 Block exposure of semiconductor wafer |
| 06/29/1999 | US5916712 Halftone phase shift photomask, halftone phase shift photomask blank, and method of producing the same |
| 06/29/1999 | US5916711 Forming amplitude mask of selected photoresist, converting into phase mask, forming auxiliary transmissive phase feature; improved performance, reduced interference |
| 06/29/1999 | US5916374 Supporting vertically, simultaneously spraying front and back with aqueous alkaline cleaning solution |
| 06/23/1999 | EP0924567A1 Phase shift mask and phase shift mask blank |
| 06/23/1999 | CN1220742A Attenuating embedded phase shift photomask blanks |
| 06/22/1999 | US5914204 Phase shifting mask and a manufacturing method therefor |
| 06/22/1999 | US5914203 First pattern formed on substrate having zero light transmission, second pattern having partial transmission |
| 06/22/1999 | US5914202 Providing reticle substrate, depositing partially transmitting phase shift film, opaque film, photoresist, multilevel profile, etching |
| 06/17/1999 | WO1999030189A1 Amplitude mask, and apparatus and method for manufacturing long period grating filter using the same |
| 06/17/1999 | WO1999003684A8 The production of microstructures for use in assays |
| 06/17/1999 | DE19844443A1 Photomask is washed with anodic or cathodic water after cleaned with a hot sulfuric acid and hydrogen peroxide mixture for effective removal of residual sulfuric acid from the cleaned surface |
| 06/16/1999 | EP0922997A1 Phase shift mask and method of manufacturing phase shift mask |
| 06/16/1999 | EP0922996A1 A lithographic process for device fabrication using a multilayer mask |
| 06/16/1999 | CN1219754A Mask blank and method of producing mask |
| 06/15/1999 | US5912105 Thermally imageable material |
| 06/15/1999 | US5912095 Mask substrate manufacturing methods |
| 06/15/1999 | US5912094 Method and apparatus for making a micro device |
| 06/10/1999 | WO1999028786A1 Extreme ultraviolet lithography mask blank and manufacturing method therefor |
| 06/09/1999 | EP0671024B1 Method for fabricating microlenses |
| 06/09/1999 | CN1219248A Attenuating embedded phase shift photomask blanks |
| 06/03/1999 | WO1999027420A1 Method of fine feature edge tuning with optically-halftoned mask |
| 06/02/1999 | EP0919875A1 Mask blank and method of producing mask |
| 06/02/1999 | EP0919803A1 Method and compact system for inspecting a reticle with high accuracy |
| 06/01/1999 | US5908719 Radiation mask adapted to be aligned with a photoresist layer and method of making the same |
| 06/01/1999 | US5908718 Phase shifting photomask with two different transparent regions |
| 05/27/1999 | WO1999026113A1 Device and method for flat holding of a substrate in microlithography |
| 05/25/1999 | US5907393 Exposure mask and method and apparatus for manufacturing the same |
| 05/25/1999 | US5906910 Multi-level photoresist profile method |
| 05/25/1999 | CA2131669C Reticle having a number of subfields |
| 05/20/1999 | WO1999024869A1 Photomask, aberration correcting plate, exposure device and method of producing microdevice |
| 05/20/1999 | WO1999024868A1 Method of molecular-scale pattern imprinting at surfaces |
| 05/20/1999 | WO1999024178A1 Apparatus for cleaning surfaces with a cleaning roller assembly |
| 05/18/1999 | US5905572 Sample inspection using interference and/or correlation of scattered superbroad radiation |
| 05/14/1999 | WO1999003684A3 The production of microstructures for use in assays |
| 05/12/1999 | EP0914629A1 Gray scale mask and depth pattern transfer technique using inorganic chalcogenide glass |
| 05/12/1999 | CN1216396A Photomask and method of exposure using same |
| 05/11/1999 | US5902717 Method of fabricating semiconductor device using half-tone phase shift mask |
| 05/11/1999 | US5902712 Substrate having circuits disposed thereon, coated with ablatively photodecomposable polymer comprising acrylic polymer with bound photoabsorber |
| 05/11/1999 | US5902707 Mask containing alignment mark protection pattern |
| 05/11/1999 | US5902706 Frame having an opening therein, membrane film formed over frame, patterned interlayer formed on membrane film, patterned light shield formed on interlayer such that interlayer is formed between light shield and membrane film, support |
| 05/11/1999 | US5902705 Making phase shifting mask for transferring circuit pattern onto semiconductor wafer by optical reduction projection exposure with ultraviolet light |
| 05/11/1999 | US5902702 Photolithography |
| 05/11/1999 | US5902701 Forming groove in transparent substrate |
| 05/06/1999 | WO1999022273A1 Composite relief image printing plates |
| 05/06/1999 | WO1999014706A3 Visual inspection and verification system |
| 05/06/1999 | EP0913730A1 Process for making a printing form |
| 05/06/1999 | EP0745235B1 Photomask blanks |
| 05/04/1999 | US5900349 Forming dummy pattern |
| 05/04/1999 | US5900340 One dimensional lithographic proximity correction using DRC shape functions |
| 05/04/1999 | US5900337 Phase shift mask and method for fabricating the same |
| 05/04/1999 | US5899746 Method of forming pattern |
| 05/04/1999 | US5899728 Method of forming a lithographic mask |
| 04/29/1999 | WO1999008134A3 Ultra-broadband uv microscope imaging system with wide range zoom capability |
| 04/28/1999 | EP0911117A2 Hand tool for manipulating recticle plate |
| 04/28/1999 | EP0910816A1 Composite relief image printing plates and methods for preparing same |
| 04/27/1999 | US5898478 Method of using a test reticle to optimize alignment of integrated circuit process layers |
| 04/27/1999 | US5898182 Exposure mask contamination inspect method and system therefor |
| 04/27/1999 | US5897979 Method of forming multiple layer attenuating phase shifting masks |
| 04/27/1999 | US5897978 Mask data generating method and mask for an electron beam exposure system |
| 04/27/1999 | US5897977 Attenuating embedded phase shift photomask blanks |
| 04/27/1999 | US5897976 Physical vapor depositing atleast one layer of aluminum compound and atleast one component that is more optically absorbing than aluminum compound at selected lithographic wavelength on a substrate |
| 04/27/1999 | US5897975 Phase shift mask for formation of contact holes having micro dimension |
| 04/27/1999 | US5897260 Print job allocation system |
| 04/22/1999 | WO1999019772A1 Apparatus for a laser writer for complex microlithographic patterns with a delay circuit |
| 04/22/1999 | WO1999019770A1 Light negative photographic films and preparation method |
| 04/22/1999 | DE19825043A1 Mask pattern for manufacturing integrated circuits |
| 04/21/1999 | EP0909989A1 Photolithographic processing method and apparatus |
| 04/21/1999 | EP0909988A1 Photolithographic processing method |
| 04/21/1999 | EP0909987A1 Photolithographic processing method and apparatus |
| 04/21/1999 | EP0909986A1 Photolithographic processing method and apparatus |
| 04/21/1999 | EP0909985A1 Photolithographic processing method and apparatus |
| 04/21/1999 | EP0909406A1 Photomask blanks |
| 04/21/1999 | EP0637393B1 Resolution-enhancing optical phase structure for a projection illumination system |
| 04/21/1999 | CN1214532A Photo-mask used in aligner for exactly transferring main pattern assisted by semi-transparent auxiliary pattern and process of fabrication thereof |
| 04/20/1999 | US5895925 Mask used in charged particle beam projecting apparatus and method for dividing pattern |