| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
|---|
| 02/05/2014 | CN102736400B Dustproof pellicle film, manufacturing method thereof, and dustproof pellicle component with pellicle film attached |
| 02/05/2014 | CN102520576B Data split method and correction method of stepping photoetching mask plate for diagrammed substrate process |
| 02/05/2014 | CN101331431B Improved method for etching photolithograhic substrates |
| 02/04/2014 | US8642235 Method of optimizing a die size, method of designing a pattern device manufacturing method, and computer program product |
| 01/30/2014 | WO2014015826A1 Optical proximity correction device and correction method |
| 01/30/2014 | WO2014015613A1 Mask plate for manufacturing spacer, method for manufacturing spacer, and display device |
| 01/30/2014 | US20140033145 Pattern-dependent proximity matching/tuning including light manipulation by projection optics |
| 01/30/2014 | US20140030641 Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device |
| 01/30/2014 | US20140030640 Resist pattern forming method, resist pattern, crosslinkable negative chemical amplification resist composition for organic solvent development, resist film and resist-coated mask blanks |
| 01/30/2014 | US20140030639 Blank masks for extreme ultra violet lithography, methods of fabricating the same, and methods of correcting registration errors thereof |
| 01/30/2014 | US20140030638 Photomask processing techniques |
| 01/30/2014 | US20140030637 Reticles for use in forming implant masking layers and methods of forming implant masking layers |
| 01/29/2014 | CN103543600A Super-lens structure and imaging method thereof |
| 01/29/2014 | CN103543599A Optical proximity correcting (OPC) method capable of improving line-end shortening effect |
| 01/29/2014 | CN103543598A Optimization design method for lithographic mask |
| 01/28/2014 | US8640058 Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process |
| 01/28/2014 | US8637950 Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording medium |
| 01/28/2014 | US8637214 Photomask sets for fabricating semiconductor devices |
| 01/28/2014 | US8637213 Mask blank and transfer mask |
| 01/28/2014 | US8637212 Reticle set modification to produce multi-core dies |
| 01/28/2014 | US8637211 Method for integrated circuit manufacturing and mask data preparation using curvilinear patterns |
| 01/28/2014 | CA2761126C In-line holographic mask for micromachining |
| 01/23/2014 | WO2014013931A1 Method for manufacturing support frame for pellicle, support frame for pellicle, and pellicle |
| 01/23/2014 | WO2013174656A3 Lithographic apparatus |
| 01/22/2014 | CN1900819B Photomask blank, photomask and fabrication method thereof |
| 01/22/2014 | CN103529642A Blankmask and method for fabricating photomask using the same |
| 01/22/2014 | CN103529641A Extreme ultraviolet lithography process and mask |
| 01/22/2014 | CN103529640A Mask and method of forming the same |
| 01/22/2014 | CN102478761B Photomask manufacturing method and system |
| 01/22/2014 | CN102197340B Exposure apparatus and photomask |
| 01/21/2014 | US8635563 Mask data producing method and mask data producing program |
| 01/21/2014 | US8632943 Near-infrared sensitive, positive-working, image forming composition and photographic element containing a 1,1-di[(alkylphenoxy)ethoxy]cyclohexane |
| 01/21/2014 | US8632930 Method and apparatus for performing dark field double dipole lithography (DDL) |
| 01/16/2014 | WO2014010408A1 Mask blank and method for manufacturing phase-shift mask |
| 01/16/2014 | WO2014010274A1 Substrate treatment device and device manufacturing method |
| 01/16/2014 | US20140017603 Optical element, illumination device, measurement apparatus, photomask, exposure method, and device manufacturing method |
| 01/16/2014 | US20140017601 Reflective mask blank for euv lithography and process for its production, as well as substrate with reflective layer for such mask blank and process for its production |
| 01/16/2014 | DE102013213307A1 Ladungsträgerteilchenstrahl-Schreibvorrichtung und Bestrahlungszeit-Einteilungsverfahren von Ladungsträgerteilchenstrahlen zum mehrfachen Schreiben Charged particle-writer and irradiation time-division method of Ladungsträgerteilchenstrahlen for multiple writing |
| 01/15/2014 | CN103513516A Exposure method, exposure apparatus, and photomask |
| 01/15/2014 | CN103513509A Mask plate and substrate as well as manufacturing method of substrate |
| 01/15/2014 | CN103513508A Gray-scale photomask, making method and method for forming channel by use of gray-scale photomask |
| 01/15/2014 | CN103513507A Method for proximity correction |
| 01/15/2014 | CN103513506A Optical proximity effect correction method |
| 01/15/2014 | CN103513505A Photo mask, photo mask manufacturing method, pattern transfer method and flat panel display manufacturing method |
| 01/15/2014 | CN103019028B Mask plate and manufacturing method thereof |
| 01/14/2014 | US8629071 Titania and sulfur co-doped quartz glass member and making method |
| 01/14/2014 | US8628897 Extreme ultraviolet lithography process and mask |
| 01/14/2014 | US8628896 Member for masking film, process for producing masking film using the same, and process for producing photosensitive resin printing plate |
| 01/09/2014 | US20140013288 Method and device for increasing fin device density for unaligned fins |
| 01/09/2014 | US20140011124 Method and system for stencil design for particle beam writing |
| 01/09/2014 | US20140011123 Multilayer substrate, manufacturing method for multilayer substrate, and quality control method for multilayer substrate |
| 01/09/2014 | US20140011122 Reflective mask blank and method of manufacturing a reflective mask |
| 01/09/2014 | US20140011121 Mask and method for forming the same |
| 01/09/2014 | US20140011120 Extreme ultraviolet lithography process and mask |
| 01/08/2014 | EP2681760A2 Method and system for forming patterns using charged particle beam lithography |
| 01/08/2014 | CN203385992U Manual wiping device for photomask |
| 01/08/2014 | CN102650821B Method for preparing high-temperature resistant hard photomask |
| 01/07/2014 | US8627239 Mask fabrication supporting method, mask blank providing method, and mask blank dealing system |
| 01/07/2014 | US8624345 Photomask and photomask substrate with reduced light scattering properties |
| 01/07/2014 | US8623583 Laser induced thermal imaging apparatus and fabricating method of organic light emitting diode using the same |
| 01/07/2014 | US8623576 Time differential reticle inspection |
| 01/03/2014 | WO2014000380A1 Mask plate |
| 01/02/2014 | US20140004449 Blankmask and method for fabricating photomask using the same |
| 01/02/2014 | US20140004325 Apparatus comprising substrate and conductive layer |
| 01/02/2014 | US20140004309 Photomask-forming glass substrate and making method |
| 01/01/2014 | EP2680072A1 Method and system for creation of binary spatial filters |
| 01/01/2014 | CN103488044A Mask pattern analysis apparatus and method for analyzing mask pattern |
| 01/01/2014 | CN103488043A Pattern generation method |
| 01/01/2014 | CN103488042A Method for high volume e-beam lithography |
| 01/01/2014 | CN103488041A Frequency doubling using spacer mask |
| 12/31/2013 | US8617797 Pattern forming method, semiconductor device manufacturing method and phase shift photomask having dummy gate patterns |
| 12/31/2013 | US8617775 Optimized mask design for fabricating periodic and quasi-periodic patterns |
| 12/31/2013 | US8617774 Method and calibration mask for calibrating a position measuring apparatus |
| 12/31/2013 | US8617773 Method of correcting mask pattern, computer program product, and method of manufacturing semiconductor device |
| 12/27/2013 | WO2013190786A1 Phase-shifting mask blank, and phase-shifting mask and process for producing same |
| 12/27/2013 | WO2013148299A3 Printing form precursor having elastomeric cap layer and a method of preparing a printing form from the precursor |
| 12/25/2013 | EP2677543A1 Thin film transistor, mask plate for manufacturing thereof, array substrate and display device |
| 12/25/2013 | CN103473384A Mask data generation method |
| 12/25/2013 | CN103472673A Mask plate and preparation method thereof |
| 12/25/2013 | CN103472672A Correction method of optical proximity correction model |
| 12/25/2013 | CN103472671A Reticle with composite polarizer and method of simultaneous optimization of imaging of a set of different patterns |
| 12/24/2013 | US8614052 Method for controlling the electronic beam exposure of wafers and masks using proximity correction |
| 12/24/2013 | US8614036 Method for manufacturing laser reflective mask |
| 12/24/2013 | US8614035 Phase shift mask blank, phase shift mask, and method for manufacturing phase shift mask blank |
| 12/24/2013 | US8614034 Method of manufacturing photo-mask |
| 12/24/2013 | US8614033 Resist film, resist coated mask blanks and method of forming resist pattern using the resist film, and chemical amplification type resist composition |
| 12/24/2013 | US8614032 Laser-reflective mask and method for manufacturing same |
| 12/19/2013 | WO2013188232A1 Apparatus and methods for inspecting extreme ultra violet reticles |
| 12/19/2013 | WO2013186929A1 Mask protection device, exposure apparatus, and method for manufacturing device |
| 12/19/2013 | WO2013185401A1 Mask and correction method thereof |
| 12/19/2013 | WO2013156328A3 Mask for lithographic apparatus and methods of inspection |
| 12/19/2013 | US20130339910 In-situ scanner exposure monitor |
| 12/19/2013 | US20130337371 Mask and repairing method therefor |
| 12/19/2013 | US20130337370 Photomask and method for forming the same |
| 12/19/2013 | US20130336572 Focus Monitoring Method Using Asymmetry Embedded Imaging Target |
| 12/19/2013 | US20130335718 Method for measuring distortion of projection objective |
| 12/19/2013 | US20130335552 Method for mask inspection, and mask inspection installation |
| 12/18/2013 | CN103454853A Methods for electron beam patterning |
| 12/18/2013 | CN103454852A Mask and overlay precision measuring method |
| 12/18/2013 | CN103454851A Photomask, method for manufacturing the photomask and pattern transfer method |