| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 10/05/1999 | US5962174 Multilayer reflective mask |
| 10/05/1999 | US5962172 Method and apparatus for manufacturing photomask and method of manufacturing a semiconductor device |
| 09/30/1999 | WO1999049366A1 Photomask and projection exposure system |
| 09/30/1999 | WO1999049365A1 Method for producing large-surface membrane masks |
| 09/30/1999 | WO1999049346A1 High na system for multiple mode imaging |
| 09/29/1999 | EP0945761A1 Method of manufacturing pellicle and pellicle manufacturing jig |
| 09/29/1999 | EP0945281A2 Heat sensitive composition, lithographic printing plate using the same, and process for preparing a lithographic printing plate |
| 09/28/1999 | US5960106 Sample inspection apparatus and sample inspection method |
| 09/28/1999 | US5959721 Projection exposure apparatus and projection exposure method |
| 09/28/1999 | US5959606 Rasterizer for pattern generator |
| 09/28/1999 | US5958656 Pattern forming method using phase shift mask |
| 09/28/1999 | US5958636 Pattern drawing method using charged particle beams |
| 09/28/1999 | US5958635 Masking for integrated circuits |
| 09/28/1999 | US5958632 Method of making mask pattern utilizing sizing dependent on mask material and mask formed through the method |
| 09/28/1999 | US5958631 X-ray blocking and membrane stiffening layer is applied on at least one side of the wafer; resistance to warpage |
| 09/28/1999 | US5958630 Phase shifting mask and method of manufacturing the same |
| 09/28/1999 | US5958629 Using thin films as etch stop in EUV mask fabrication process |
| 09/28/1999 | US5958628 Pattern forming layer absorbs laser; etching |
| 09/28/1999 | US5958627 X-ray mask blank and method of manufacturing the same |
| 09/28/1999 | US5958626 Dividing pattern to be projected into plurality of blocks by parting lines including segments connected end-to-end so as to be non-linear |
| 09/23/1999 | WO1999048149A1 Stepper alignment mark formation with dual field oxide process |
| 09/23/1999 | WO1999047981A1 METHOD OF PATTERNING SUB-0.25μ LINE FEATURES WITH HIGH TRANSMISSION, 'ATTENUATED' PHASE SHIFT MASKS |
| 09/23/1999 | WO1999047977A1 Retaining device for photo blanks |
| 09/23/1999 | DE19828860A1 Printed lampshade producing by simply fitting pattern onto given lampshade whilst ensuring aesthetic relationship between external shape of pattern and edges of shade |
| 09/22/1999 | EP0943119A1 Reticle that compensates for lens error in a photolithographic system |
| 09/21/1999 | US5956174 Broad spectrum ultraviolet catadioptric imaging system |
| 09/21/1999 | US5955223 Phase-shift mask blank and process for the production thereof comprising a semi transparent film with silicon and nitrogen |
| 09/21/1999 | US5955222 Method of making a rim-type phase-shift mask and mask manufactured thereby |
| 09/21/1999 | US5954878 Apparatus for uniformly coating a substrate |
| 09/21/1999 | CA2159848C Masks with low stress multilayer films and a process for controlling the stress of multilayer films |
| 09/21/1999 | CA2140873C Process and element for making a relief image using an ir sensitive layer |
| 09/21/1999 | CA2140872C A flexographic printing element having an ir ablatable layer and process for making a flexographic printing plate |
| 09/15/1999 | EP0942325A2 Method and apparatus for removing a pellicle frame from a photomask plate |
| 09/15/1999 | EP0941865A1 Process film, process ink, and platemaking method and system using the film |
| 09/14/1999 | US5953492 Method of manufacturing X-ray mask and heating apparatus |
| 09/14/1999 | US5953107 Mask pellicle remove tool |
| 09/14/1999 | US5952160 Method and system for controlling the relative size of images formed in light-sensitive media |
| 09/14/1999 | US5952155 Creating exposure patterns with high accuracy |
| 09/14/1999 | US5952128 Phase-shifting photomask blank and method of manufacturing the same as well as phase-shifting photomask |
| 09/14/1999 | US5952127 Liquid phase epitaxial growth method to prevent the use of a high temperature treatment; thickness of the phase shifter is easily controlled due to a low growth rate of the silicon dioxide layer serving as the phase shifter; precision |
| 09/10/1999 | WO1999045441A1 Improved modulator design for pattern generator |
| 09/10/1999 | WO1999045440A1 Pattern generator with improved address resolution |
| 09/10/1999 | WO1999045439A1 Improved pattern generator |
| 09/10/1999 | WO1999045438A1 Method for pattern generation with improved image quality |
| 09/10/1999 | WO1999045437A1 Pattern generator using euv |
| 09/10/1999 | WO1999045436A1 Improved pattern generator for avoiding stitching errors |
| 09/10/1999 | WO1999045435A1 Pattern generator with improved precision |
| 09/08/1999 | EP0940721A2 Reticle library apparatus and method |
| 09/08/1999 | EP0940718A2 Reticle with crystalline substrate and pellicle |
| 09/08/1999 | EP0940714A2 Hydrazide compounds useful as co-developers for black-and-white thermographic elements |
| 09/08/1999 | EP0940695A1 Phase mask for machining optical fibers and method of manufacturing the same |
| 09/08/1999 | EP0815565A4 Method and apparatus for micromachining using hard x-rays |
| 09/08/1999 | CN1227928A Method for producing lithofilm or non-lithofilm x-ray examination film |
| 09/07/1999 | US5948574 Mask for manufacturing semiconductor device and method of manufacture thereof |
| 09/07/1999 | US5948573 Method of designing mask pattern to be formed in mask and method of manufacturing integrated circuit |
| 09/07/1999 | US5948572 Alignment marks |
| 09/07/1999 | US5948571 An exposure mask for use in a photoresist imaging system. |
| 09/07/1999 | US5948570 Process for dry lithographic etching |
| 08/31/1999 | US5945238 Method of making a reusable photolithography mask |
| 08/31/1999 | US5945237 Halftone phase-shift mask and halftone phase-shift mask defect correction method |
| 08/25/1999 | EP0801767B1 Method of manufacturing a randomised mask for use in making a diffusion screen |
| 08/24/1999 | US5942760 Method of forming a semiconductor device utilizing scalpel mask, and mask therefor |
| 08/24/1999 | US5942374 Transistors made with undoped and doped radiation sensitive polymer layers to form source/drain regions, channels and gates of common material so temperature cycle reliablility is eliminated; cost efficiency, simplification |
| 08/24/1999 | US5942356 Phase shift mask and phase shift mask blank |
| 08/24/1999 | US5942355 Buffer regions created in between areas of phase transitions preventing formation of null intensity areas; buffer regions are patterned with opaque regions, which act as etch masks for adjoining phase-shifting layers; varying phase angles |
| 08/18/1999 | EP0936505A1 Method of producing phase mask for fabricating optical fiber and optical fiber with bragg's diffraction grating produced by using the phase mask |
| 08/17/1999 | US5939227 Multi-layered attenuated phase shift mask and a method for making the mask |
| 08/17/1999 | US5939226 Multilayer element with patterns |
| 08/17/1999 | US5939225 Multilayer element with substrate and silicon, nitrogen withmetal layer |
| 08/17/1999 | US5938897 Sputtering molybdenum silicide target in atmosphere containing nitrogen monoxide gas to form coating of molybdenum silicide oxynitride film on transparent substrate |
| 08/17/1999 | US5938860 System for cleaning reticle including lid encasing pellicle membrane and frame, sealing from external environment during cleaning |
| 08/17/1999 | US5938826 Hot melt ink |
| 08/13/1999 | CA2260351A1 Cylindrical printing plate |
| 08/10/1999 | US5936738 For use with a lithographic system and a substrate |
| 08/10/1999 | US5936707 Multi-level reticle system and method for forming multi-level resist profiles |
| 08/10/1999 | US5935740 Forming resist layer on substrate, patterning using photolithographic techniques |
| 08/10/1999 | US5935739 Mask for apertures of subfields separated by reinforcing struts of crystalline structure oriented such that the (100) direction is perpendicular to the membrane to avoid damage; thin support walls; anisotropic plasma etchiine |
| 08/10/1999 | US5935738 Phase-shifting mask, exposure method and method for measuring amount of spherical aberration |
| 08/10/1999 | US5935737 Method for eliminating final euv mask repairs in the reflector region |
| 08/10/1999 | US5935736 Mask and method to eliminate side-lobe effects in attenuated phase shifting masks |
| 08/10/1999 | US5935735 A zirconium compound giving a phase shift of 180 degrees between light transmitted and not transmitted through the halftone film and having a reflectance of not more than 30% to an exposure light; accuracy; durability; reproduction |
| 08/10/1999 | US5935734 Defects such as pinholes within the resist layer are reduced. |
| 08/10/1999 | US5935733 Photolithography mask and method of fabrication |
| 08/10/1999 | US5934191 Stamp making apparatus |
| 08/03/1999 | US5933724 Method of manufacturing a semiconductor integrated circuit device using a photomask in which transmitted light beam intensities are controlled |
| 08/03/1999 | US5932489 Precise control of size and shape of interference regions; reactive ion etching of photolithographic pattern |
| 08/03/1999 | US5932395 Prevent positional shift during exposure using multilayer mask |
| 08/03/1999 | US5932378 Forming recesses in transparent substrate; then opacity layer; patterning |
| 08/03/1999 | US5932377 Exact transmission balanced alternating phase-shifting mask for photolithography |
| 08/03/1999 | US5932376 Phase-shifting mask structure |
| 07/29/1999 | WO1999038040A1 Phase mask for manufacturing diffraction grating, and method of manufacture |
| 07/28/1999 | EP0932080A1 An imaging element for producing a lithographic plate therewith |
| 07/28/1999 | CN1224513A Photomask blanks |
| 07/28/1999 | CN1224233A Multi-phase mask |
| 07/27/1999 | US5929529 Reticle semiconductor wafer, and semiconductor chip |
| 07/27/1999 | US5928838 Process for manufacturing a printed circuit board using a mask with gradual increase in transmittance from opaque to transparent region |
| 07/27/1999 | US5928817 Method of protecting an EUV mask from damage and contamination |
| 07/27/1999 | US5928816 Lithography technique in semiconductor industry; bilayer structure |
| 07/27/1999 | US5928815 Cylinderical block made of material transparent to, and manifesting a relatively high index of refraction for, the wavelengths of light to be used in conjunction with it; high resolution based lithography used in integrated circuit |
| 07/27/1999 | US5928814 Photomask controlling transmissivity by using an impurity-containing film formed on a transparent substrate |