G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
12/1999
12/14/1999	US6001513 Method for forming a lithographic mask used for patterning semiconductor die
12/14/1999	US6001512 Method of blind border pattern layout for attenuated phase shifting masks
12/14/1999	US6001511 Exposure mask having a thickness profile for controlling the amount of charged particles per unit area passing through the mask; forms a uniform pattern on a semiconductor wafer by correcting a proximity effect
12/14/1999	US6001168 For pigmenting high molecular mass material, such as for inks, toners, coating materials, color filters and cosmetics, resins, caseins, cellulose ethers, celulose esters, polymers, polyolefins
12/09/1999	WO1999063536A2 Very-high-density memory device utilizing a scintillating data-storage medium
12/09/1999	WO1999063406A1 Silver based photomasks
12/08/1999	CN2352973Y Self-increasing definition type mask plate
12/08/1999	CN1237781A Mask manufacturing method
12/08/1999	CN1047258C Plate for shadow-mask developing and method for manufacture of plate
12/07/1999	US6000036 Logical steering to avoid hot spots on integrated circuits
12/07/1999	US5999590 X-ray mask blank and manufacturing method for the same, and manufacturing method for X-ray mask
12/07/1999	US5999310 Ultra-broadband UV microscope imaging system with wide range zoom capability
12/07/1999	US5998797 Mask for electron beam exposure and electron beam drawing method
12/07/1999	US5998088 Pigment dispersed in a polymeric binder, the polymeric binder having an infrared-absorbing material dissolved therein, wherein the polymeric binder is obtained from an aqueous latex dispersion of a polycyanoacrylate copolymer
12/07/1999	US5998070 Mask pattern
12/07/1999	US5998069 Electrically programmable photolithography mask
12/07/1999	US5998068 Reticle and pattern formation method
12/07/1999	US5998067 Mask for exposing flexographic plates
12/07/1999	US5998066 Gray scale mask and depth pattern transfer technique using inorganic chalcogenide glass
12/01/1999	EP0961168A1 Method for repair of photomasks
12/01/1999	EP0960347A1 Phase mask with spatially variable diffraction efficiency
12/01/1999	EP0602200B1 Method for forming an immage of a mask pattern
12/01/1999	CN1236988A System and method of manufacturing semicustom integrated circuits using reticle primitives
12/01/1999	CN1236976A Electron-beam cell projection aperture formation method
11/1999
11/30/1999	US5995719 Method for proofing imposed documents
11/30/1999	US5995200 Multiple image reticle for forming layers
11/30/1999	US5994032 Preparation of photopolymeric gravure printing plates
11/30/1999	US5994026 Developable relief image layer on support
11/30/1999	US5994004 Levenson type phase shift photomask and manufacture method of semiconductor device using such photomask
11/30/1999	US5994002 Formation of a fine pattern by a lithography process in the manufacturing of a semiconductor integrated circuit.
11/30/1999	US5994001 Phase shift mask and its manufacturing method and semiconductor device and its manufacturing method using the phase shift mask
11/30/1999	US5992322 Waterless lithographic printing plate having a cyanoacrylate image
11/30/1999	CA2188094C Film rewinder
11/25/1999	DE19913683A1 Large area membrane mask, especially a lithographic stencil mask, is produced from a multilayer semiconductor wafer
11/24/1999	EP0959501A2 System and method of manufacturing semicustom integrated circuits using reticle primitives and interconnect reticles
11/23/1999	US5991006 Method and apparatus for correcting exposure patterns, and exposure mask, method of exposing and semiconductor device
11/23/1999	US5989772 Thermal recording element's dye layer contains polymethine or cyanine stabilizing dye having an absorption wavelength maximum longer than the infrared laser light-absorbing dye, so the energy absorbed is transferred to stabilizing ir dye
11/23/1999	US5989756 Transparent substrate, and at least two light blocking regions, separated by a first opening and arranged at a first pitch, formed with second openings at smaller pitches which transmit exposure light of weaker intensity; depth of focus
11/23/1999	US5989755 Method of manufacturing x-ray mask blank and method of manufacturing x-ray membrane for x-ray mask
11/23/1999	US5989754 Metal shielding layers on a substrate spaced apart by a clear scribe line; metal lines formed on the clear scribe line to connect metal shielding layers, increasing the surface area of the reticle patterns
11/23/1999	US5989753 To suppress projection errors where patterns are connected together; includes irradiation amount reduction, where irradiation is reduced in the periphery of small regions corresponding to the distance from the center of small region
11/23/1999	US5989752 Reconfigurable mask
11/18/1999	DE4113968C2 Maskenstruktur und Verfahren zur Herstellung von Halbleiterbauelementen unter Verwendung der Maskenstruktur Mask structure and process for producing semiconductor devices by using the mask structure
11/17/1999	EP0957403A1 Fuse in integrated circuit with localized blowing point
11/17/1999	EP0956516A1 Method and apparatus for the production of a structure by focused laser radiation on a photosensitively coated substrate
11/16/1999	US5987092 Method of soft x-ray imaging
11/16/1999	US5986765 Apparatus including compensation mask to correct particle beam proximity-effect
11/16/1999	US5985493 Projecion electron beam lithography and membranes
11/16/1999	US5985492 Mask for imaging and multilayer
11/16/1999	US5985491 Radiation transparent substrates with phase shift layer and reflecting layer
11/16/1999	US5984505 Block exposure of semiconductor wafer
11/11/1999	WO1999057607A1 Protection of lithographic components from particle contamination
11/11/1999	WO1999057508A1 Device for measuring structures on a transparent substrate
11/11/1999	DE19819492A1 Meßgerät zur Vermessung von Strukturen auf einem transparenten Substrat Measuring device for measuring structures on a transparent substrate
11/09/1999	US5981149 Exposing resist film by radiation coated on a substrate to be etched via a photomask on which atleast a first and a second opening pattern are formed, developing to obtain pattern, etching the substrate to obtain predermined pattern
11/09/1999	US5981110 Method for repairing photomasks
11/09/1999	US5981109 Forming an attenuating phase shifting material using a composite of a first material with a high extinction coefficient and a second material with a high index of refraction to achieve desired optical properties
11/09/1999	US5981001 Processing method for selectively irradiating a surface in presence of a reactive gas to cause etching
11/09/1999	US5980768 Introducing substrate having thereon photoresist mask into plasma reactor; flowing into plasma reactor an etchant oxygen-free source gas comprising nitrogen; removing defects by employing plasma struck with etchant source gas
11/04/1999	DE19817714A1 Verfahren zur Messung der Lage von Strukturen auf einer Maskenoberfläche Method for measuring the position of structures on a mask surface
11/03/1999	EP0953876A2 Process for fabricating a lithographic mask
11/02/1999	US5978441 Extreme ultraviolet lithography mask blank and manufacturing method therefor
11/02/1999	US5978138 Projection exposure systems
11/02/1999	US5976968 Coating a metal over quartz substrate; then photoresist; patterning; etching; removal; phase shifting
11/02/1999	US5976733 Integrated circuit photofabrication masks and methods for making same
11/02/1999	US5976732 Transparent substrate; patterned opaque layer; phase shifting layer
11/02/1999	US5976444 Nanochannel glass replica membranes
11/02/1999	US5976307 Method and apparatus for removing a pellicle frame from a photomask plate
10/1999
10/28/1999	WO1999054786A1 Elastomeric mask and use in fabrication of devices, inlcuding pixelated electroluminescent displays
10/28/1999	WO1999054785A1 Method for measuring the position of structures on a surface of a mask
10/28/1999	DE19811081C1 Haltevorrichtung für Photoblanks Holding device for Blanks Photo
10/27/1999	EP0952488A2 Reticle inspecting apparatus capable of shortening an inspecting time
10/26/1999	USRE36352 High-efficiency, multilevel, diffractive optical elements
10/26/1999	US5973316 Sub-wavelength aperture arrays with enhanced light transmission
10/26/1999	US5972794 Silicon stencil mask manufacturing method
10/26/1999	US5972570 Method of photolithographically defining three regions with one mask step and self aligned isolation structure formed thereby
10/26/1999	US5972569 Applying photoresist, exposing phtotoresist area, developing exposed photoresist, performing contact etch, performing reisist etch
10/26/1999	US5972543 Phase shift mask and method of producing the same
10/26/1999	US5972540 Formed by thermal deformation of an organic photoresist followed by a chemical mechanical polishing process to prevent occurrence of pattern errors at an 180 degrees/0 degrees phase boundary.
10/21/1999	WO1999053519A1 Shaped shadow projection for an electron beam column
10/21/1999	CA2291697A1 Shaped shadow projection for an electron beam column
10/20/1999	EP0951015A2 An optical or magneto-optic head and method of making the same
10/19/1999	US5970114 X-ray mask and its fabrication method
10/19/1999	US5969801 Correction method and correction apparatus of mask pattern
10/19/1999	US5969799 Exposure apparatus with a pulsed laser
10/19/1999	US5969798 Image inspection apparatus in plate making process and image inspection method in plate making process
10/19/1999	US5968336 Forming a mask pattern of recesses in a membrane area defined by doping substrate to selected depth, then opening the recesses of membrane by back side etching while applying an inert liquid to front side
10/19/1999	US5967048 Method and apparatus for the multiple imaging of a continuous web
10/14/1999	WO1999051690A1 Modified pigments having improved dispersing properties
10/13/1999	EP0949538A2 Membrane mask for projection lithography
10/13/1999	CN1045665C Light exposure mask for semiconductor device
10/12/1999	US5966677 High accuracy particle dimension measurement system
10/12/1999	US5965306 Analyzing process conditions causing features close to the defects to be printed fall within a critical dimension tolerance, assigning a critical dimension error to defects, comparing two values to determine if repair will be necessary
10/12/1999	US5965303 Method of fabricating a phase shift mask utilizing a defect repair machine
10/12/1999	US5965302 Photomask includes a light blocking region forming a boundary between a first region and a second region on the substrate, light blocking region is narrow enough that it is not projected on the resist; making memory cells
10/12/1999	US5965301 Physically removing the defect by applying actinic radiation except to a predetermined width of the edge; removing the edge by chemical etching which doesn't extend to other layers fineness; accuracy; semiconductors; integrated circuits
10/07/1999	DE19913560A1 Flexographic imaging element having an integral mask to give continuous tone image
10/07/1999	DE19841528A1 Irradiation data production device for semiconductor production using layout templates and electron beam irradiation of surfaces
10/05/1999	US5963316 Method and apparatus for inspecting a surface state
10/05/1999	US5962194 Selectively irradiating a selected region of the deposited first film to be etched with light to modify a portion of the thickness of the first film to be etched to thereby form a first protective film; photoetching

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