| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 03/14/2000 | US6038018 Substrate inspecting apparatus, substrate inspecting system having the same apparatus and substrate inspecting method |
| 03/14/2000 | US6038015 Electron-beam-projection-exposure apparatus with integrated mask inspection and cleaning portions |
| 03/14/2000 | US6037102 Masking layer containing a developer-soluble film-forming binder and a compound having a high absorbance to structure imagewise the underlying photosensitive layer by means of an infrared-laser from a digital data set; no oxygen penetration |
| 03/14/2000 | US6037087 Writing a test pattern containing a first reference point on a non-productive area of a photomask, mounting the photomask on the first machine, initializing the coordinate system to the first reference point; determining the defects location |
| 03/14/2000 | US6037083 Metal film on a halftone material film laminated on a transparent substrate wherein the metal film is a plurality of metal films having different etching rates i.e. faster toward the substrate; acid resistance; high accuracy |
| 03/14/2000 | US6037082 Design of a new phase shift mask with alternating chrome/phase structures |
| 03/09/2000 | WO1999063536A3 Very-high-density memory device utilizing a scintillating data-storage medium |
| 03/08/2000 | EP0984328A2 A method of surface etching silica glass, for instance for fabricating phase masks |
| 03/08/2000 | EP0984327A2 Process for producing halftone mask |
| 03/07/2000 | US6033812 Mask manufacturing method for forming an electron beam drawing pattern |
| 03/07/2000 | US6033811 Optical proximity correction mask for semiconductor device fabrication |
| 03/07/2000 | US6033766 Coated with a thin layer of silver |
| 03/07/2000 | US6032683 System for cleaning residual paste from a mask |
| 03/04/2000 | CA2281291A1 A method of surface etching silica glass, for instance for fabricating phase masks |
| 03/02/2000 | WO2000011519A1 Low thermal distortion extreme-uv lithography reticle |
| 03/01/2000 | EP0982769A2 Microdevice and structural components of the same |
| 03/01/2000 | EP0852026B1 Black-and-white photothermographic and thermographic elements comprising acrylonitrile compounds as co-developers |
| 03/01/2000 | EP0852025B1 Black-and-white photothermographic and thermographic elements comprising n-acyl-hydrazine compounds as contrast enhancers |
| 02/29/2000 | US6030731 Directing focused ion beam to fill clear defect with carbon film and directing focused ion beam in the presence of a water containing gas to remove the carbon halo from around the clear defect repair area |
| 02/29/2000 | US6030730 Using energy source in form of energy beam to sever connected black dot defect from chrome pattern forming space between defect and chrome pattern, removing remaining severed black dot defect using same energy source |
| 02/29/2000 | US6030729 Comprising light transmitting substrate, light shielding film formed on substrate and being patterned to have plurality of openings, phase shifting means for defining phase difference; for use in lithography step of semiconductor manufacturing |
| 02/23/2000 | EP0980542A1 Method of patterning sub-0.25 lambda line features with high transmission, "attenuated" phase shift masks |
| 02/23/2000 | EP0980407A1 Hot melt ink |
| 02/23/2000 | CN1245565A Method and apparatus for production of structure by focused laser radiation on photosensitively coated substrate |
| 02/22/2000 | US6028953 Mask defect repair system and method which controls a dose of a particle beam |
| 02/22/2000 | US6027837 Comprising the utilization of a phase measurement and selective etching operation which reduces the challenge of making an exacting 180 degree phase shifting mask; mask structure which has phase measurement of 170 to 190 degrees |
| 02/17/2000 | WO2000008526A1 Diffractive element in extreme-uv lithography condenser |
| 02/16/2000 | EP0654151B1 Process and element for making a relief image using an ir sensitive layer |
| 02/15/2000 | US6025867 Method and a device for retaining a thin medium between two bodies |
| 02/15/2000 | US6025115 Selectively irradiating surface of substrate with light in gas atmosphere to form surface-modified layer, annealing to stabilize and make more etch resistant, dry etching non-modified portion |
| 02/10/2000 | WO2000007072A1 Photomask blank, photomask, methods of manufacturing the same, and method of forming micropattern |
| 02/10/2000 | WO2000007070A1 Diazo-containing photosensitive material |
| 02/10/2000 | WO2000005938A2 Laser imaging of printed circuit patterns without using phototools |
| 02/09/2000 | EP0978870A2 Dry-etching method and apparatus, photomasks and method for the preparation thereof, and semiconductor circuits and method for the fabrication thereof |
| 02/09/2000 | EP0978763A1 Lithographic process for device fabrication using electron beam imaging |
| 02/09/2000 | CN1244030A Phase-shift mask and manufacture thereof |
| 02/09/2000 | CN1049298C Light exposure mask for semiconductor devices and method for forming same |
| 02/08/2000 | US6022645 Double-sided photomask |
| 02/08/2000 | US6022644 Electroconductivity high density pattern surrounded by dummy pattern |
| 02/03/2000 | WO1999054786A9 Elastomeric mask and use in fabrication of devices, inlcuding pixelated electroluminescent displays |
| 02/02/2000 | EP0976152A1 Pattern film repair using a gas assisted focused particle beam system |
| 02/02/2000 | EP0976151A1 Methods and apparatus for removing photoresist mask defects-in a plasma reactor |
| 02/01/2000 | US6020109 Irradiating integrated circuit pattern; transferring onto photoresist |
| 02/01/2000 | US6020108 Preparation of photopolymeric letterpress printing plates |
| 01/26/2000 | EP0974075A1 Black-pigmented structured high molecular weight material |
| 01/26/2000 | EP0974074A1 Highly transparent, colour-pigmented high molecular weight material |
| 01/26/2000 | EP0801769B1 Heat-developable, photothermographic elements comprising a hydrazide compound |
| 01/25/2000 | US6018392 Apparatus and method for inspecting phase shifting masks |
| 01/25/2000 | US6017659 Forming phase shifting photomask with minimal masking steps where the phase shifter comprises a transparent mask substrate and stepped, self-aligned phase transition portion |
| 01/25/2000 | US6017658 Forming mask having increased pattern resolution by providing dielectric layer between electron beam absorber layer and photoresist layer to prevent backscattered electrons from reentering photoresist |
| 01/25/2000 | US6016749 Stamp-making apparatus, as well as function changeover mechanism, exposure system and stamp-making object material-detecting device therefor |
| 01/20/2000 | WO2000003341A1 A method and system for generating a flat mask onto a three-dimensional surface |
| 01/20/2000 | WO2000003339A1 Two-dimensional to three-dimensional vlsi design |
| 01/18/2000 | US6016357 Feedback method to repair phase shift masks |
| 01/18/2000 | US6016187 Exposure apparatus and method |
| 01/18/2000 | US6015976 Fabrication apparatus employing energy beam |
| 01/18/2000 | US6015643 Mask used in charged particle beam projecting apparatus |
| 01/18/2000 | US6015642 Method for forming a photomask |
| 01/18/2000 | US6015641 Bitline mask pattern comprising plurality of bitlines having plurality of equally spaced apart contact pads, each having rectangular shape, but having rectangular corner and side portions removed |
| 01/18/2000 | US6015640 Mask fabrication process |
| 01/18/2000 | US6014931 Imaging a lithographic printing plate |
| 01/13/2000 | DE19930296A1 Layer topology masking technique for photolithography |
| 01/12/2000 | CN1241003A Bit line pattern in DRAM for reducing optical close effect |
| 01/11/2000 | US6014456 Method of correcting mask pattern and mask, method of exposure, apparatus thereof, and photomask and semiconductor device using the same |
| 01/11/2000 | US6013399 Reworkable EUV mask materials |
| 01/11/2000 | US6013398 Semitransparent phase shifting masking |
| 01/11/2000 | US6013397 Patterns for masking, shields of multilayer, etching and forming photoresists |
| 01/11/2000 | US6013396 Fabrication of chrome/phase grating phase shift mask by interferometric lithography |
| 01/11/2000 | US6013395 Photomask for use in exposure and method for producing same |
| 01/05/2000 | EP0969325A2 Lithographic projection apparatus |
| 01/05/2000 | EP0968458A1 Optical proximity correction method for intermediate-pitch features using sub-resolution scattering bars |
| 01/04/2000 | US6011269 Shaped shadow projection for an electron beam column |
| 01/04/2000 | US6010831 Ultra-fine microfabrication method using an energy beam |
| 01/04/2000 | US6010827 Electron beam exposure utilizing pre-processed mask pattern |
| 01/04/2000 | US6010807 Phase-shifting mask for photolithography in semiconductor fabrications |
| 01/04/2000 | US6010567 Black-pigmented structured high molecular weight material |
| 01/04/2000 | CA2082909C X-ray mask structure and x-ray exposing method, and semiconductor device manufactured by use of x-ray mask structure, and method for manufacturing x-ray mask structure |
| 12/29/1999 | EP0967524A2 Projection exposure method and apparatus |
| 12/28/1999 | US6008105 Method of planarizing an insulator film using multiple etching steps |
| 12/28/1999 | US6008101 Laser processing method of semiconductor device |
| 12/28/1999 | US6007969 Ultra-fine microfabrication method using an energy beam |
| 12/28/1999 | US6007968 Method for forming features using frequency doubling hybrid resist and device formed thereby |
| 12/28/1999 | US6007950 Structure of a phase shifting mask and method of fabricating the same |
| 12/28/1999 | US6007949 Method of extracting a mask pattern for an electron beam exposure |
| 12/28/1999 | US6007948 Method of fabricating X-ray masks with reduced errors |
| 12/28/1999 | US6007324 Double layer method for fabricating a rim type attenuating phase shifting mask |
| 12/28/1999 | CA2018988C Photoresist |
| 12/23/1999 | WO1999065803A1 Automated opening and closing of ultra clean storage containers |
| 12/23/1999 | DE19927995A1 Photographic mask material and mask, useful in printed circuit and liquid crystal display manufacture |
| 12/22/1999 | EP0965884A2 Phase shift mask and methods of manufacture |
| 12/22/1999 | EP0965823A2 Method for analyzing light intensity distribution |
| 12/21/1999 | US6004702 Phase-shifting mask structure and method of fabricating the same |
| 12/21/1999 | US6004701 Method for designing Levenson photomask |
| 12/21/1999 | US6004700 Membrane mask for electron beam lithography |
| 12/21/1999 | US6004699 Photomask used for projection exposure with phase shifted auxiliary pattern |
| 12/16/1999 | DE19924076A1 Photo mask production method for producing an electron beam or EB character pattern enables faster production of masks, even when layout data are to be combined |
| 12/15/1999 | CN1238723A Process film, process ink and platemaking method and system using the film |
| 12/14/1999 | US6002791 Photomask inspection apparatus |
| 12/14/1999 | US6002740 Method and apparatus for X-ray and extreme ultraviolet inspection of lithography masks and other objects |
| 12/14/1999 | US6001514 Membrane is protected from being etched and damaged during the etching process performed on the absorber |