| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 08/02/2000 | EP1024520A2 Reticle adapter for a reactive ion etch system |
| 08/02/2000 | EP1023641A1 Design rule checking system and method |
| 08/02/2000 | EP1023640A1 Data hierarchy layout correction and verification method and apparatus |
| 08/02/2000 | EP1023639A1 Method and apparatus for data hierarchy maintenance in a system for mask description |
| 08/02/2000 | EP1023638A1 Apparatus for a laser writer for complex microlithographic patterns with a delay circuit |
| 08/02/2000 | CN1261908A Pigment dispersion containing C. I. pigment red 222 |
| 08/01/2000 | US6097475 Method and apparatus for orienting a recording media sheet on a support surface |
| 08/01/2000 | US6097102 Reticle, semiconductor wafer, and semiconductor chip |
| 08/01/2000 | US6096460 Attenuating phase shift photomasks |
| 08/01/2000 | US6096459 Method for repairing alternating phase shifting masks |
| 08/01/2000 | US6096458 Utilizing at least two interfering beams of radiation to define a grid of dividing lines corresponding to an interference pattern produced by the interfering beams on a surface of a photolithograpy mask coated with a mask film |
| 08/01/2000 | US6096457 Simulating the image using varying off-axis illumination parameters, optimized parameters are selected to compensate for the phase shift error, once the off-axis illumination parameters are optimized, the image is shot |
| 07/27/2000 | DE19941408A1 Photomask used in the manufacture of liquid crystal displays comprises a recessed section in the surface of a transparent substrate, a shadow pattern, and reflection prevention sections |
| 07/26/2000 | EP1022614A1 Photomask blank, photomask, methods of manufacturing the same, and method of forming micropattern |
| 07/26/2000 | EP1021749A1 Techniques for fabricating and packaging multi-wavelength semiconductor laser array devices (chips) and their applications in system architectures |
| 07/26/2000 | EP1021748A1 Multiple image reticle for forming layers |
| 07/26/2000 | EP1021747A1 Optical lithography beyond conventional resolution limits |
| 07/26/2000 | CN1261458A Pattern film repair using a gas assisted focused particle beam system |
| 07/25/2000 | US6093511 Method of manufacturing semiconductor device |
| 07/25/2000 | US6093507 Forming phase shifting masks which require only one resist application which can be exposed by a single electron beam using different exposure doses |
| 07/25/2000 | US6093239 Hot melt ink |
| 07/20/2000 | WO2000042630A1 System for production of large area display panels with improved precision |
| 07/20/2000 | WO2000042473A1 Multilayer attenuating phase-shift masks |
| 07/20/2000 | WO2000042472A1 Method for patterning thin films |
| 07/20/2000 | WO2000003341A9 A method and system for generating a flat mask onto a three-dimensional surface |
| 07/20/2000 | DE19859049A1 Exposure arrangement for photo-lacquer coated circuit boards has recesses in mask carrier at edge of mask region on side facing mask filled with permanent magnetic or ferromagnetic material |
| 07/18/2000 | US6091845 Inspection technique of photomask |
| 07/18/2000 | US6090528 Generating electron beam; shaping by directing it through square aperture in lamina having serrated edge encircling aperture; projecting electron beam as square or rectangular spot onto potoresist layered on substrate |
| 07/18/2000 | US6090527 Forming latent images on electron beam resist by charged particles obtained by transmitting electron beam through electron beam exposure mask |
| 07/18/2000 | US6090507 Methods for repair of photomasks |
| 07/13/2000 | WO2000019247A3 Multilayer optical element |
| 07/12/2000 | EP0852027B1 Black-and-white photothermographic and thermographic elements comprising amine compounds as contrast enhancers |
| 07/12/2000 | CN1259760A Method for mfg. semiconductor crystal plate by making several zone masks having various scatter abilites |
| 07/11/2000 | US6088520 Method of producing highly precise charged beam drawing data divided into plurality of drawing fields |
| 07/11/2000 | US6087074 Forming semitransparent phase shifting mask having periphery of pattern element area, light shielding portion formed by semitransparent phase shifting portion and transparent portion with optimal size combination |
| 07/11/2000 | US6087049 A binary mask curve and a phase shift mask curve in relationship with critical dimensions of the photomask and original pattern; accuracy, resolution |
| 07/11/2000 | US6087048 Exposing the perimeter of a pattern shape through a mask having a fine aperture which delineates only the outline of the desired shape whereby the interior portion of the shape is cut-out upon development to form accurate pattern |
| 07/11/2000 | US6087047 Semi-transparent film comprising a nickel-silicon oxide, nitride, hydride or oxynitride, coated onto transparent substrate |
| 07/11/2000 | US6087046 Exposing to delineate mask substrate using an electron beam at a first exposure intensity, then exposing portions at a second intensity to elongate corner areas of mask pattern |
| 07/06/2000 | WO2000039638A1 Method and apparatus for producing mask |
| 07/06/2000 | WO2000038935A1 Local vectorial particle cleaning |
| 07/06/2000 | WO1999049346A9 High na system for multiple mode imaging |
| 07/05/2000 | CN1258862A Off-axis lighted mask |
| 07/04/2000 | US6084716 Optical substrate inspection apparatus |
| 07/04/2000 | US6084664 Method of and apparatus for inspecting reticle for defects |
| 07/04/2000 | US6083648 Microlithography reticle exhibiting reduced stresses and methods for manufacturing same |
| 07/04/2000 | US6083577 Mask protective device |
| 07/04/2000 | US6083275 Optimized phase shift design migration |
| 07/04/2000 | CA2056299C Pellicle structure and process for preparation thereof |
| 06/29/2000 | WO2000038015A1 Method of imaging a mask pattern on a substrate by means of euv radiation, and apparatus and mask for performing the method |
| 06/29/2000 | WO2000038014A1 Photo mask production method and device thereof |
| 06/28/2000 | EP1014194A1 Photopolymerisable printing plates with top layer for the production of relief printing plates |
| 06/28/2000 | EP1012584A2 Object inspection and/or modification system and method |
| 06/27/2000 | US6081658 Proximity correction system for wafer lithography |
| 06/27/2000 | US6081335 Phase difference measuring device with visible light source for providing easy alignment of optical axes and method therefor |
| 06/27/2000 | US6081318 Installation for fabricating double-sided photomask |
| 06/27/2000 | US6080527 Optical proximity correction of L and T shaped patterns on negative photoresist |
| 06/27/2000 | US6080523 Imaging element for producing a lithographic plate therewith |
| 06/27/2000 | US6080514 Fabrication method of mask for semiconductor device |
| 06/27/2000 | US6080513 Mask and method for modification of a surface |
| 06/27/2000 | US6080512 Semiconductor exposure method and apparatus, and a reticle therefor |
| 06/22/2000 | WO2000036525A2 Mechanisms for making and inspecting reticles |
| 06/22/2000 | WO2000036468A1 Photomask with a mask edge provided with a ring-shaped esd protection area |
| 06/22/2000 | WO2000036467A1 Photomask provided with an esd-precluding envelope |
| 06/22/2000 | WO2000036466A1 Semiconductor integrated circuit device and method of manufacturing the same |
| 06/21/2000 | EP1010316A1 Mounting film transparencies in a rotary drum scanner |
| 06/21/2000 | DE19960368A1 Microlithographic method e.g. for manufacture of photomask for semiconductors, display panel, integrated optical device or electronic connection structure, uses feedback position correction for incident light fleck |
| 06/20/2000 | US6078393 Phase shift mask inspection apparatus |
| 06/20/2000 | US6077633 Mask and method of forming a mask for avoiding side lobe problems in forming contact holes |
| 06/20/2000 | US6077632 Mask and device for managing the same |
| 06/20/2000 | US6077630 Subresolution grating for attenuated phase shifting mask fabrication |
| 06/20/2000 | US6077310 Optical proximity correction system |
| 06/15/2000 | WO2000034828A1 Method for mask repair using defect compensation |
| 06/14/2000 | EP1008870A1 Enhanced optical transmission apparatus utilizing metal films having apertures and periodic surface topography |
| 06/14/2000 | EP1007969A1 Lithographic mask design and synthesis of diverse probes on a substrate |
| 06/14/2000 | EP1007362A1 Method for mounting printing plates on sleeves and for mounting the resultant sleeves on flexographic printing machine cylinders |
| 06/13/2000 | US6075585 Vibrating probe for a scanning probe microscope |
| 06/13/2000 | US6074787 Method of making mask pattern utilizing auxiliary pattern forbidden region |
| 06/13/2000 | US6074786 Reticle for alignment and pitch determination |
| 06/13/2000 | US6074571 Cut and blast defect to avoid chrome roll over annealing |
| 06/08/2000 | WO2000033121A1 Microlens structure having two anamorphic surfaces on opposing ends of a single high index substrate and method of fabricating the same |
| 06/08/2000 | DE19855629A1 Teilchenoptische Anordnung und Verfahren zur teilchenoptischen Erzeugung von Mikrostrukturen A particle-particle arrangement and method for producing microstructures |
| 06/07/2000 | EP1006556A1 Particle-optical device and method for producing microstructures |
| 06/07/2000 | EP1006409A2 Method for patterning a semiconductor wafer using a mask that has several regions with different scattering ability |
| 06/07/2000 | EP0910816A4 Composite relief image printing plates and methods for preparing same |
| 06/07/2000 | EP0852028B1 Black-and-white photothermographic and thermographic elements comprising hydroxamic acid compounds as contrast enhancers |
| 06/06/2000 | US6071989 Process for preparing fine pigment dispersions |
| 06/06/2000 | US6071676 Integrated circuit formed by exposing to radiation or particle beam through mask an organometallic fluoride compound coated onto substrate, removing residue and unexposed compound to leave submicron patterned deposit |
| 06/06/2000 | US6071658 Forming a pattern on the mask, dividing the mask into patches and calculating the light intensity then exposure to electron beams |
| 06/06/2000 | US6071653 Photomasking a transparent substrate, forming a bar layer covering, forming a opaque layer and removal of bar layer |
| 06/06/2000 | US6071652 Fabricating optical elements using a photoresist formed from contact printing of a gray level mask |
| 06/06/2000 | US6071376 Method and apparatus for cleaning photomask |
| 06/06/2000 | US6071315 Two-dimensional to three-dimensional VLSI design |
| 06/02/2000 | WO2000031592A1 Method of detecting aberrations of an optical imaging system |
| 06/02/2000 | WO2000031589A1 Method of collecting photomask |
| 05/30/2000 | US6069971 Pattern comparison inspection system and method employing gray level bit map |
| 05/30/2000 | US6069931 Mask structure and mask holding mechanism for exposure apparatus |
| 05/30/2000 | US6068955 Methods of inspecting for mask-defined, feature dimensional conformity between multiple masks |
| 05/30/2000 | US6068952 Second pattern consists of a plurality of said first patterns so that it receives the same influence of aberration as said first pattern when irradiated with light. |
| 05/30/2000 | US6068951 Phase shifting mask and process for forming |