| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 10/17/2000 | US6134049 Method to adjust multilayer film stress induced deformation of optics |
| 10/17/2000 | US6134014 Apparatus and method of inspecting phase shift masks using comparison of a mask die image to the mask image database |
| 10/17/2000 | US6134008 Aligner and patterning method using phase shift mask |
| 10/17/2000 | US6133576 Broad spectrum ultraviolet inspection methods employing catadioptric imaging |
| 10/17/2000 | US6132908 Photo mask and exposure method using the same |
| 10/12/2000 | WO2000060415A1 Method for correcting image faults |
| 10/12/2000 | WO2000059717A1 Process for direct digital printing of circuit boards |
| 10/12/2000 | CA2367870A1 Process for direct digital printing of circuit boards |
| 10/11/2000 | EP1043626A1 A method for improving the performance of photolithographic equipment and for increasing the lifetime of the optics thereof |
| 10/11/2000 | EP1043625A1 Method and apparatus for manufacturing photomask and method of fabricating device |
| 10/11/2000 | CN1269529A System and method for lightening corner of mask to become round in production of said mask |
| 10/10/2000 | US6130012 Removing portions of the interior and exterior corners to enlarge the gap and thereby reduce diffraction induced image rounding errors proximate the interior and exterior corners |
| 10/05/2000 | WO2000059209A1 Narrow band, anisotropic stochastic halftone patterns and methods of creating and using the same |
| 10/05/2000 | WO2000059013A1 Exposure apparatus, semiconductor device, and photomask |
| 10/05/2000 | CA2368983A1 Narrow band, anisotropic stochastic halftone patterns and methods of creating and using the same |
| 10/04/2000 | EP1041630A2 Method of accurately performing alignment of patterning in the manufaturing of a semiconductor device, and mask for exposure |
| 10/04/2000 | EP1041443A2 Lithographic process for device fabrication using dark-field illumination and apparatus therefor |
| 10/04/2000 | EP1041440A2 System and method for reducing corner rounding in mask fabrication |
| 10/03/2000 | US6128363 X-ray mask blank, x-ray mask, and pattern transfer method |
| 10/03/2000 | US6128067 Correcting method and correcting system for mask pattern |
| 10/03/2000 | US6127096 Method for reducing photolithographic steps in a semiconductor interconnect process |
| 10/03/2000 | US6127071 Designing photolithographic mask for conducting illumination from a light source onto a semiconductor surface during a microlithographic manufacturing process |
| 10/03/2000 | US6127069 Method of visually inspecting positioning of a pattern on a substrate |
| 10/03/2000 | US6127068 X-ray membrane for x-ray mask, x-ray mask blank, x-ray mask, manufacturing method thereof and method of polishing silicon carbide film |
| 10/03/2000 | CA2118753C Method of forming a micro structure and an x-ray mask |
| 09/30/2000 | CA2303019A1 Semiconductor device manufacturing method of accurately performing alignment of patterning, and mask for exposure |
| 09/28/2000 | WO2000056554A1 Gravure short run printing plate |
| 09/28/2000 | CA2367929A1 Gravure short run printing plate |
| 09/27/2000 | EP1038196A1 Amplitude mask, and apparatus and method for manufacturing long period grating filter using the same |
| 09/26/2000 | US6124083 An electrically-conductive layer comprising a sulfonated polyurethane film-forming binder and an electroconductive polymer comprising substituted or unsubstituted polypyrroles, polythiophenes and polyanilines |
| 09/26/2000 | US6124063 Method of forming a semiconductor device utilizing lithographic mask and mask therefor |
| 09/21/2000 | WO2000055689A1 Projection lithography photomask blanks, preforms and method of making |
| 09/21/2000 | WO2000055100A1 Projection lithography photomask substrate and method of making |
| 09/21/2000 | DE19909152A1 Photopolymerisierbares Aufzeichnungselement und Verfahren zur Herstellung von flexographischen Druckformen A photopolymerizable recording element and process for preparing flexographic printing forms |
| 09/20/2000 | EP1037109A2 Reticle having discriminative pattern narrower in pitch than the minimum pattern width but wider than minimum width in the pattern recognition |
| 09/20/2000 | CN1267083A Projective reinforced mask of improving technique window |
| 09/20/2000 | CN1267082A Graticule having new identifying pattern |
| 09/19/2000 | US6122056 Direct phase shift measurement between interference patterns using aerial image measurement tool |
| 09/19/2000 | US6122037 Reflective phaseshift lithography system |
| 09/19/2000 | US6121975 Pattern forming method and system providing compensated repeat |
| 09/19/2000 | US6121625 Charged particle beam lithography apparatus for forming pattern on semi-conductor |
| 09/19/2000 | US6121145 Method of fabricating via and interconnection |
| 09/19/2000 | US6120953 Reducing a critical dimension of the main pattern by adding a serif/hammerhead onto the main pattern and an assist feature is added onto the main pattern for further reduction; photolithography process |
| 09/19/2000 | US6120952 Achieving a desired transferred main feature dimension |
| 09/19/2000 | US6120944 An optical color filter comprising extremely fine organic pigment particles in multi-thin layers |
| 09/19/2000 | US6120942 Method for making a photomask with multiple absorption levels |
| 09/13/2000 | EP1035434A2 Photomask with unresolved auxiliary patterns |
| 09/13/2000 | EP1035084A2 Synthetic fused silica glass member |
| 09/13/2000 | EP1034457A1 Method of fine feature edge tuning with optically-halftoned mask |
| 09/13/2000 | CN1266281A Improved system and method for automatic photomask fault detection |
| 09/13/2000 | CN1056338C Print stamp making device |
| 09/12/2000 | US6118577 Diffractive element in extreme-UV lithography condenser |
| 09/12/2000 | US6118517 Mask pattern for alignment |
| 09/12/2000 | US6118468 Image recording apparatus |
| 09/12/2000 | US6117597 Utilizing three of the four (111) families of crystallographic planes of single crystal silicon as etch barrier for anisotropic etchants, etching to form planar surface |
| 09/08/2000 | WO2000052528A2 Monograin membrane mask |
| 09/07/2000 | DE10002316A1 Photomask has transparent base and shading structure contg. polygonal circuit structure with inclined line printed out as series of steps with number of rectangles of defined width |
| 09/06/2000 | EP1033626A1 Radiation sensitive composition |
| 09/06/2000 | EP1033625A1 Radiation sensitive composition |
| 09/06/2000 | EP1033622A2 Photopolymerizable recording element and process for the preparation of flexographic printing forms |
| 09/05/2000 | US6114096 Method for fabricating an electronic component which component had an asymmetric resist pattern formed on the component during the manufacturing process; manufacture of electronic components such as integrated circuit wafers using |
| 09/05/2000 | US6114095 Formation of contact holes arranged at a high density in manufacturing a semiconductor integrated circuit device |
| 09/05/2000 | US6114074 Extrusion enhanced mask for improving process window |
| 09/05/2000 | US6114073 Method for repairing phase shifting masks |
| 09/05/2000 | US6114072 Reticle which can prevent degradation in registration accuracy caused by shot rotation error or shot magnification error without increasing area of the dicing region |
| 09/05/2000 | US6114071 Photolithography mask for optically transferring a lithographic pattern corresponding to an integrated circuit from said mask onto a semiconductor substrate by use of an optical exposure tool |
| 08/30/2000 | EP1032025A2 Process for patterning a semiconductor wafer and lithography exposure masks |
| 08/30/2000 | EP1031877A1 Photomask, aberration correcting plate, exposure device and method of producing microdevice |
| 08/30/2000 | EP1031876A2 System and method for automated defect inspection of photomasks |
| 08/29/2000 | US6111981 Method and apparatus for processing pattern image data by SEM |
| 08/29/2000 | US6111655 Method and system for managing component data of the design process and prepress process of a printing operation |
| 08/29/2000 | US6110647 Method of manufacturing semiconductor device |
| 08/29/2000 | US6110626 Microlithography using an energy beam such as a charged particle beam. |
| 08/29/2000 | US6110623 Surface coating method to highlight transparent mask defects |
| 08/29/2000 | US6110331 Apparatus and system for fabricating lithographic stencil masks |
| 08/24/2000 | WO2000020928A9 Photomask for projection lithography at or below about 160 nm and a method |
| 08/24/2000 | DE19859623A1 Photopolymerisierbare Druckformen mit Oberschicht zur Herstellung von Reliefdruckformen Photopolymerizable printing plates with topsheet for the preparation of relief printing plates |
| 08/23/2000 | EP1029257A1 Method of molecular-scale pattern imprinting at surfaces |
| 08/22/2000 | US6107013 Exposure method and exposure apparatus using it |
| 08/22/2000 | US6107000 Exposing gray scale mask body having resposive surface layer to electron beam over grid of discrete locations on mask to provide predetermined pattern; exposing photoresist layer to radiation transmitted through mask; removing from photoreist |
| 08/22/2000 | US6106981 Forming resist film over surface of mask substrate having light shielding film; exposing to electron beam for forming integrated circuit pattern and alignment mask; removing resist film; repeating procedure with aligned second resist film |
| 08/22/2000 | US6106980 Having test pattern which is used to calibrate the coordinate system of each processing machine on which the photomask is mounted and is also used as a reference for other metrology measurements |
| 08/22/2000 | US6106979 Depositing attenuating phase-shifting material on transparent plate in transmission areas; forming subresolution openings in one or more transmission areas |
| 08/17/2000 | WO2000048046A1 Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
| 08/17/2000 | WO2000048043A1 Extreme-uv lithography condenser |
| 08/16/2000 | EP0864118B1 Donor elements and processes for thermal dye transfer by laser |
| 08/15/2000 | US6103430 Method for repairing bump and divot defects in a phase shifting mask |
| 08/15/2000 | US6103429 Technique for fabricating phase shift masks using self-aligned spacer formation |
| 08/15/2000 | US6103428 Photomask utilizing auxiliary pattern that is not transferred with the resist pattern |
| 08/15/2000 | US6103427 Pressure relieving pellicle |
| 08/10/2000 | WO2000046643A1 Masks for use in optical lithography below 180 nm |
| 08/10/2000 | WO2000019247B1 Multilayer optical element |
| 08/10/2000 | DE19903200A1 Wafer surface structure production, in IC manufacture, comprises modification of a primary layout to correct manufacturing or technology related faults |
| 08/09/2000 | EP1025464A1 Composite relief image printing plates |
| 08/09/2000 | CN1262460A Technique for making X-ray mask |
| 08/08/2000 | US6101237 X-ray mask and X-ray exposure method using the same |
| 08/08/2000 | US6100987 Position detecting apparatus |
| 08/08/2000 | US6100970 Apparatus for inspecting slight defects on a photomask pattern |
| 08/08/2000 | US6099992 Generating main pattern and first dummy patterns separated with spacings, dividing the dummy patterns into plurality of spaced apart second dummy patterns and measuring to find third pattern having specific value, connecting with second |
| 08/03/2000 | WO2000045222A1 Photolithography mask and method of manufacturing thereof |