G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
12/2000
12/20/2000	CN1277681A Composite relief image printing plates
12/19/2000	US6163367 Apparatus and method for in-situ adjustment of light transmission in a photolithography process
12/19/2000	US6162590 Cutting glass substrate into separate heads; masking, etching
12/19/2000	US6162568 Processes for creating photomasks or reticles used in the fabrication of semiconductor devices
12/19/2000	US6162567 Process for producing halftone mask
12/19/2000	US6162566 Includes a thin-film portion having an aperture pattern forming region and a supporting frame portion; for use in electron-beam exposure, ion-beam exposure, x-ray exposure
12/19/2000	US6162565 Dilute acid rinse after develop for chrome etch
12/19/2000	US6162564 Comprising circular optically transparent substrate, light shielding film, resist
12/19/2000	US6162302 Method of cleaning quartz substrates using conductive solutions
12/19/2000	CA2171771C Flexographic element having an infrared ablatable layer and process for making a flexographic printing plate
12/14/2000	WO2000075727A2 Coatings on reflective mask substrates
12/12/2000	US6159643 Accommodates both optical flatness concerns and thermal expansion concerns during a lithography process
12/12/2000	US6159642 Exposure mask and method of manufacturing thereof, and pattern data generating method for an exposure mask
12/12/2000	US6159641 Repairing defect in transmissive nonprinting region of a phase-shifting mask comprising depositing opaque material on the defect from a gaseous precursor by beam-in0duced deposition
12/07/2000	WO2000073855A1 Production device for printed board, production method for printed board and printed board
12/07/2000	WO2000073851A1 Printing plate with relief coating and method of making the same
12/06/2000	EP1058154A1 Composition comprising photosensitive saponified poly(vinyl acetate) and pattern formation method making use of the composition
12/06/2000	EP1057078A1 Method of imaging a mask pattern on a substrate by means of euv radiation, and apparatus and mask for performing the method
12/06/2000	EP0886805B1 Black-and-white photothermographic and thermographic elements comprising 4-substituted isoxazole compounds as co-developers
12/06/2000	CN1276068A Optical lithography beyond conventional resolution limits
12/06/2000	CN1275797A Electronic beam explosure mask and method for making semiconductor device with same
12/05/2000	US6156463 One-step determination of minimum amount of the exposure for removing a photoresist film by irradiating light through a photomask having openings with varying transmittance values; determing etching rate; semiconductors; integrated circuits
12/05/2000	US6156461 Method for repair of photomasks
12/05/2000	US6156460 A quartz glass substrate having a clear area, a gray area of a deep uv-light-absorbing amorphous silicon layer through which incident light is partly transmitted and a dark area of light-blocking chromium film; interconnections and vias
12/05/2000	US6156445 A metallized ceramic substrate coated a film of an ablatively photodecomposable acrylate polymer modified by disperse red 1, a photoabsorber; circuit patterns; no phase separation or crystallization, even ablation and high resolution
12/05/2000	US6156393 Method of molecular-scale pattern imprinting at surfaces
12/05/2000	US6156217 Method for the purpose of producing a stencil mask
11/2000
11/30/2000	WO2000072090A2 A method for error reduction in lithography
11/29/2000	EP1055154A1 Photomask provided with an esd-precluding envelope
11/29/2000	EP1055153A1 Photomask with a mask edge provided with a ring-shaped esd protection area
11/28/2000	US6154563 Method of correcting mask pattern and mask, method of exposure, apparatus thereof, and photomask and semiconductor device using the same
11/28/2000	US6153743 Lithographic mask design and synthesis of diverse probes on a substrate
11/28/2000	US6153357 Exposure, forming pattern, phase shifting cycles
11/28/2000	US6153342 Selective spacer methodology for fabricating phase shift masks
11/28/2000	US6153341 Phase shift mask and phase shift mask blank
11/28/2000	US6153340 Charged-particle-beam microlithography methods and reticles for same exhibiting reduced space-charge and proximity effects
11/28/2000	US6153044 Protection of lithographic components from particle contamination
11/23/2000	WO2000070332A1 Method of and apparatus for inspection of articles by comparison with a master
11/22/2000	EP1053979A1 Synthetic quartz glass substrate for photomask and method of its production
11/21/2000	USRE36964 Device manufacture involving lithographic processing
11/21/2000	US6151103 Method and system for improved optical imaging in microlithography
11/21/2000	US6150840 Programmable reticle stitching
11/21/2000	US6150280 Electron-beam cell projection aperture formation method
11/21/2000	US6150277 Method of making an oxide structure having a finely calibrated thickness
11/21/2000	US6150060 Defect tolerant transmission lithography mask
11/21/2000	US6150059 Photomask having main holes opposite the positions at which pattern parts are to form, and further has minute auxiliary holes between main holes which pass light to a degree that it is not transferred onto the substrate at the time of exposure
11/21/2000	US6150058 Forming mask using exposure of a resist using more than one exposure dose so that only one layer of resist is required to form the two regions of the mask one using attenuating phase shifting material and one using a binary pattern
11/21/2000	US6149992 Pellicle
11/16/2000	WO2000068884A1 Method and apparatus for inspecting reticles implementing parallel processing
11/16/2000	WO2000068673A1 Inspection systems performing two-dimensional imaging with line light spot
11/14/2000	US6147394 Method of photolithographically defining three regions with one mask step and self aligned isolation structure formed thereby
11/14/2000	US6146794 Electron beam antistatic method using conductive pins for charge disipation
11/14/2000	US6146792 Method of making a color filter with high speed and durable image-transfer characteristics for laser-induced thermal transfer
11/09/2000	WO2000067291A2 Microfabricated template for multiple charged particle beam calibrations and shielded charged particle beam lithography
11/09/2000	WO2000067076A1 Improved method and apparatus for submicron ic design using edge fragment tagging to correct edge placement distortion
11/09/2000	WO2000067075A1 Improved method and apparatus for submicron ic design using edge fragment tagging
11/09/2000	WO2000067074A1 Streamlined ic mask layout optical and process correction through correction reuse
11/09/2000	WO2000066969A2 Interferometry system having a dynamic beam-steering assembly for measuring angle and distance
11/09/2000	WO2000066549A2 Apparatus and methods for collecting global data during a reticle inspection
11/09/2000	CA2336557A1 Microfabricated template for multiple charged particle beam calibrations and shielded charged particle beam lithography
11/08/2000	EP1049960A1 Method of detecting aberrations of an optical imaging system
11/08/2000	EP1049953A1 Microlens structure having two anamorphic surfaces on opposing ends of a single high index substrate and method of fabricating the same
11/08/2000	CN1272621A Method for measuring position movement and/or distortion resulted from quadrantal deviation and its device
11/07/2000	US6144760 Exposure data correction method, exposing method, photomask, semiconductor device, exposure data correction apparatus, exposure apparatus, and manufacturing apparatus of semiconductor device
11/07/2000	US6144081 Method to suppress subthreshold leakage due to sharp isolation corners in submicron FET structures
11/07/2000	US6144028 Scanning probe microscope assembly and method for making confocal, spectrophotometric, Near-Field, and Scanning probe measurements and associated images
11/07/2000	US6143473 Film patterning method utilizing post-development residue remover
11/07/2000	US6143470 Digital laser imagable lithographic printing plates
11/07/2000	US6143451 Improved processes which operate effectively at high speeds and which afford high image densities and good durability of images present on receiver elements upon thermal imaging
11/07/2000	US6142722 Automated opening and closing of ultra clean storage containers
11/02/2000	WO2000065407A1 Photomask correction device
11/02/2000	WO2000065406A1 Method of correcting phase shift mask and focused ion beam device
11/02/2000	WO2000065302A1 Interferometric apparatus and method that compensate refractive index fluctuations
11/02/2000	EP1048984A2 Method and apparatus for reducing non-uniformities in the manufacture of semiconductive devices
11/02/2000	EP1047552A1 Direct write imaging medium
11/02/2000	DE19918795A1 Dry film for ablative exposure, useful for reproduction e.g. in internal drum exposer, has film base with cohesive adhesive and carbon layers
11/02/2000	DE10020526A1 Photomask material, used to produce printed circuit boards, liquid crystal displays or large scale integrated circuits, has glass substrate with physical development center layer covered by silver halide emulsion
11/01/2000	CN1271870A Mask used in electron beam exposure and manufacturing method and manufacturing method of semi-conductor device
10/2000
10/31/2000	US6140020 Method for manufacturing a semiconductor wafer using a mask that has several regions with different scattering ability
10/31/2000	US6140019 Photosensitive quinacridone pigment, binders, developers and photopolymerization initiators
10/31/2000	US6140005 Lithographic images and printing plates
10/31/2000	US6139994 Photomasking attenuator and substrate for images with patterns
10/31/2000	US6139993 Substrate with patterns and shields, irradiation of body with ion beam to remove part of body from substrate and radiation body and light transmission area for removal of body of material from substrate
10/31/2000	US6139992 Computers
10/26/2000	WO2000063946A1 Black defect correction method and black defect correction device for photomask
10/26/2000	DE19909187C1 Monokornmembranmaske Mono-particle membrane mask
10/25/2000	EP0980407A4 Hot melt ink
10/24/2000	US6137901 Photomask pattern correcting method and photomask corrected by the same and photomask pattern correcting device
10/24/2000	US6137111 Charged particle-beam exposure device and charged-particle-beam exposure method
10/24/2000	US6136480 Method for fabrication of and apparatus for use as a semiconductor photomask
10/24/2000	US6136479 A portion of interconnection and/or contact hole pattern is covered with an absorption layer, exposing interconnection pattern and contact hole pattern to rays of different wavelength, wherein one ray is absorb by the absorption layer
10/24/2000	US6136478 Mask pattern correction method and exposure mask to be used for such a method
10/24/2000	US6136096 Method and apparatus for correcting defects in photomask
10/19/2000	WO2000062126A1 Method and apparatus for monitoring electrostatic discharge effects
10/19/2000	WO2000036525A3 Mechanisms for making and inspecting reticles
10/18/2000	EP1045422A2 Method and apparatus for removing carbon contamination in a sub-atmospheric charged particle beam lithography system
10/18/2000	EP1045289A2 A lithographic process having sub-wavelength resolution
10/18/2000	EP1045288A2 Mask structure and method of manufacturing the same
10/18/2000	EP1044077A1 Apparatus for cleaning surfaces with a cleaning roller assembly
10/18/2000	EP0670054B1 Photomask blanks

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