| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 02/20/2001 | US6190836 Methods for repair of photomasks |
| 02/20/2001 | US6190832 Preparation of photopolymeric gravure printing plates |
| 02/20/2001 | US6190823 Diazo-containing photosensitive material |
| 02/20/2001 | US6190809 Cost-effective method to fabricate a combined attenuated-alternating phase shift mask |
| 02/20/2001 | US6190808 X-ray mask and method of manufacturing the same |
| 02/20/2001 | US6190743 Photomask protection system |
| 02/15/2001 | WO2001011430A1 Transfer of a pattern with a high structural density by multiple exposure of less dense sub-patterns |
| 02/15/2001 | WO2001011427A2 Dust cover/pellicle for a photomask |
| 02/15/2001 | WO2001011426A1 Method of forming a masking pattern on a surface |
| 02/15/2001 | CA2375365A1 Method of forming a masking pattern on a surface |
| 02/14/2001 | EP1075672A1 Protection of lithographic components from particle contamination |
| 02/14/2001 | EP1075642A1 Device for measuring structures on a transparent substrate |
| 02/13/2001 | US6189136 Design level optical proximity correction methods |
| 02/13/2001 | US6189135 Method of generating electron-beam data for creating a mask |
| 02/13/2001 | US6189129 Figure operation of layout for high speed processing |
| 02/13/2001 | US6187484 Irradiation mask |
| 02/13/2001 | US6187483 Fabricating first mask pattern on mask using first mask fabrication process and second mask pattern on mask using second fabrication process; performing mathematical transform on patterns; obtaining metric for patterns; selecting pattern |
| 02/13/2001 | US6187482 For microcmachining; photolithography; semiconductors |
| 02/13/2001 | US6187480 Alternating phase-shifting mask |
| 02/13/2001 | US6187380 Images on printing plates, liquids and polymers |
| 02/13/2001 | CA2077952C Descrete phase shift mask writing |
| 02/08/2001 | WO2001009680A1 Structure for reflection lithography mask and method for making same |
| 02/08/2001 | WO2001009679A1 Method for producing photomasks |
| 02/08/2001 | DE19932488A1 Photographic illumination apparatus for biological matter has a perforated mask between the light source and the DNA chip with micro shutters operated by electronic control |
| 02/06/2001 | US6185727 Design verification for asymmetric phase shift mask layouts |
| 02/06/2001 | US6185473 Optical pattern transfer tool |
| 02/06/2001 | US6183920 Detecting diffusion layer corresponding concave shape; correcting by indenting inner bottom surface of diffusion layer to ensure projection of gate from inside of layer corresponding concave shape for preventing corner rounding |
| 02/06/2001 | US6183916 Method for proximity effect compensation on alternative phase-shift masks with bias and optical proximity correction |
| 02/06/2001 | US6183915 Method of forming a phase shifting reticle |
| 02/01/2001 | WO2001008163A1 Extreme ultraviolet soft x-ray projection lithographic method system and lithography elements |
| 02/01/2001 | WO2001007968A1 Mask for high resolution optical lithography |
| 02/01/2001 | WO2001007967A1 Extreme ultraviolet soft x-ray projection lithographic method and mask devices |
| 02/01/2001 | WO2000072090A3 A method for error reduction in lithography |
| 01/31/2001 | EP1072953A1 Flexographic printing plate precursor comprising an ink-jet receiving layer |
| 01/31/2001 | EP1071981A1 Method for producing large-surface membrane masks |
| 01/30/2001 | US6180953 Cut and blast defect to avoid chrome roll over annealing |
| 01/30/2001 | US6180512 Single-mask dual damascene processes by using phase-shifting mask |
| 01/30/2001 | US6180325 Method for masking and exposing photosensitive printing plates |
| 01/30/2001 | US6180293 Mask pattern preparing method and photomask |
| 01/30/2001 | US6180292 Structure and manufacture of X-ray mask pellicle with washer-shaped member |
| 01/30/2001 | US6180291 Static resistant reticle |
| 01/30/2001 | US6180290 Multi-phase mask using multi-layer thin films |
| 01/30/2001 | US6180289 Projection-microlithography mask with separate mask substrates |
| 01/25/2001 | WO2001006320A1 Generic phase shift mask |
| 01/25/2001 | WO2001006318A1 Phase shifter film and production method therefor |
| 01/24/2001 | EP1070989A1 Flexographic printing plate precursor comprising a (photo)thermographic recording layer |
| 01/24/2001 | CN1281554A Amplitude mask, and apparatus and method for manufacturing long period grating filter using same |
| 01/23/2001 | US6178221 Lithography reflective mask |
| 01/23/2001 | US6177233 Method of forming resist pattern |
| 01/23/2001 | US6177218 Lithographic process for device fabrication using electron beam imaging |
| 01/18/2001 | WO2001004682A1 Broad band ultraviolet catadioptric imaging system |
| 01/18/2001 | DE10028644A1 Half tone phase shift mask green body with transparent film producing a phase difference with respect to light passing directly through transparent substrate and weakens the light intensity on the substrate |
| 01/18/2001 | DE10012803A1 Photomask cleaning in semiconductor device manufacture, involves removing foreign materials from photomask surface using hydrogen gas dissolved water, and allowing photomask to dry |
| 01/17/2001 | EP1069475A1 Flexographic printing element comprising an IR-ablatable layer with high sensitivity |
| 01/17/2001 | EP1068641A1 Stepper alignment mark formation with dual field oxide process |
| 01/17/2001 | CN1280384A Method and equipment for reducing non-uniform area influence in semiconductor device production |
| 01/17/2001 | CN1280314A Method for producing semiconductor device |
| 01/16/2001 | US6175953 Method and apparatus for general systematic application of proximity correction |
| 01/16/2001 | US6174633 Method for correcting photocontiguous effect during manufacture of semiconductor device |
| 01/16/2001 | US6174630 Method of proximity correction with relative segmentation |
| 01/11/2001 | WO2001002908A1 Method for manufacturing semiconductor integrated circuit device, optical mask used therefor, method for manufacturing the same, and mask blanks used therefor |
| 01/11/2001 | WO2000066549A3 Apparatus and methods for collecting global data during a reticle inspection |
| 01/11/2001 | WO2000052528A3 Monograin membrane mask |
| 01/10/2001 | EP1067436A1 Image forming composition, image recording material comprising the same, and process of image formation |
| 01/10/2001 | EP1067096A2 Quartz glass members for excimer laser, and their method of manufacture |
| 01/10/2001 | EP1066352A1 Modified pigments having improved dispersing properties |
| 01/10/2001 | CN1279776A Smart photolithography |
| 01/09/2001 | US6171736 Projection-microlithography alignment method utilizing mask with separate mask substrates |
| 01/09/2001 | US6171732 Method of manufacturing and application of dual alignment photomask |
| 01/09/2001 | US6171730 Transferring a pattern to substrate using an elastic mask pressed to substrate and irradiating with evanescent light; fine pattern resolution |
| 01/04/2001 | WO2001001469A2 Process for designing a mask |
| 01/04/2001 | WO2001001440A1 Real-time prediction of proximity resist heating and correction of raster scan electron beam lithography |
| 01/04/2001 | WO2001001198A1 Phase-shift photomask for patterning high density features |
| 01/03/2001 | EP1065566A2 Electron beam drawing mask blank, electron beam drawing mask, and method of manufacturing the same |
| 01/02/2001 | US6169603 Compact reticle inspection system capable of inspecting a reticle with high accuracy and method of inspecting the same |
| 01/02/2001 | US6168891 Correcting mask patterns for semiconductor integrated circuits comprising a sorting step of sorting patterns units composing a mask pattern based on their respective shape/and or positional relationship and a correction step |
| 01/02/2001 | US6168890 For forming a microlithographic mask having a thin membrane |
| 01/02/2001 | CA2088605C Formation of microstructures by multiple level deep x-ray lithography with sacrificial metal layers |
| 12/28/2000 | WO2000079343A1 Mask manufacturing methods comprising patterns to control corner rounding |
| 12/27/2000 | EP1063569A2 Method and apparatus for characterization of optical systems |
| 12/26/2000 | US6167355 High accuracy particle dimension measurement system |
| 12/26/2000 | US6165907 Plasma etching method and plasma etching apparatus |
| 12/26/2000 | US6165693 Method of designing an assist feature |
| 12/26/2000 | US6165692 Method for manufacturing a semiconductor device and an exposure mask used therefor |
| 12/26/2000 | US6165688 Construction of passivation layers on substrates in patterns |
| 12/26/2000 | US6165681 Black-pigmented structured high molecular weight material |
| 12/26/2000 | US6165656 Overlay error determination mark considering influence of aberration |
| 12/26/2000 | US6165654 Color thermal images or receivers |
| 12/26/2000 | US6165651 Apparatus for tuning an attenuating phase shift mask |
| 12/26/2000 | US6165650 Reticle cleaning without damaging pellicle |
| 12/26/2000 | US6165649 Methods for repair of photomasks |
| 12/24/2000 | CA2311053A1 Method and apparatus for characterization of optical systems |
| 12/21/2000 | WO2000077576A1 Method for producing a digitally imaged screen for use in a screen printing process |
| 12/21/2000 | CA2376514A1 Method for producing a digitally imaged screen for use in a screen printing process |
| 12/20/2000 | EP1061360A2 Pattern inspection method and pattern inspection apparatus |
| 12/20/2000 | EP1060443A1 Improved modulator design for pattern generator |
| 12/20/2000 | EP1060442A1 Pattern generator with improved address resolution |
| 12/20/2000 | EP1060441A1 Improved pattern generator |
| 12/20/2000 | EP1060440A1 Pattern generator using euv |
| 12/20/2000 | EP1060439A1 Improved pattern generator for avoiding stitching errors |