| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 04/19/2001 | DE19941399A1 Reinigung von Stencilmasken mit Hilfe einer durch Maskenöffnungen hindurchtretenden Gasströmung Cleaning of stencil masks using a light passing through the mask openings gas flow |
| 04/18/2001 | EP1093153A2 Device and method for introducing different transparent substrates in a high-precision measuring apparatus |
| 04/18/2001 | EP1093019A1 Process for forming a colored image having a dominant attribute |
| 04/18/2001 | EP1093018A2 Analog and digital proofing image |
| 04/18/2001 | EP1093017A2 Method and apparatus for reticle inspection using aerial imaging |
| 04/18/2001 | EP1092173A1 Silver based photomasks |
| 04/18/2001 | CN1292103A Improved pattern generator |
| 04/18/2001 | CN1292102A Pattern generator with EUV |
| 04/17/2001 | US6219130 Position detecting apparatus |
| 04/17/2001 | US6218086 In thin film, using tip; process control |
| 04/17/2001 | US6218073 Heat sensitive composition, original plate using the same for lithographic printing plate, and process for preparing printing plate |
| 04/17/2001 | US6218058 Charged particle beam transfer mask |
| 04/17/2001 | US6218057 Radiating a patterned mask; development |
| 04/12/2001 | WO2001025855A1 Photomask including hardened photoresist and a conductive layer |
| 04/12/2001 | WO2001025852A1 Trimming mask with semitransparent phase-shifting regions |
| 04/12/2001 | US20010000240 Shrinking integrated circuit designs using a two mask process: a phase shift mask and a single phase structure mask; prevention of erasure of phase shifting regions and the creation of undesirable artifact regions; minimization |
| 04/12/2001 | DE19946594A1 Mikroskop, vorzugsweise zur Inspektion bei der Halbleiterfertigung Microscope, preferably for inspection in semiconductor manufacturing |
| 04/11/2001 | EP1091252A2 Lithographic method and apparatus |
| 04/11/2001 | CN1291135A Direct write imaging medium |
| 04/11/2001 | CN1290960A Electronic beam writing method, electronic beam etching equipment and its mask thereof |
| 04/11/2001 | CN1290957A Die board mask and method for forming die board mask |
| 04/10/2001 | US6216253 Method and apparatus for verifying and electrical configuaration using a psuedo-element pattern |
| 04/10/2001 | US6215546 Method of optical correction for improving the pattern shrinkage caused by scattering of the light |
| 04/10/2001 | US6214498 Lithography mask and a fabricating method thereof |
| 04/10/2001 | US6214497 Method to eliminate side lobe printing of attenuated phase shift masks |
| 04/10/2001 | US6214496 Method for reducing corner rounding in mask fabrication utilizing elliptical energy beam |
| 04/10/2001 | US6214495 Phase mask for processing optical fibers and method of manufacturing the same |
| 04/10/2001 | US6214494 Serif mask design methodology based on enhancing high spatial frequency contribution for improved printability |
| 04/05/2001 | WO2001023961A1 Method and apparatus for determining phase shifts and trim masks for an integrated circuit |
| 04/05/2001 | WO2001023940A1 Microscope, especially microscope used for inspection in semiconductor manufacture |
| 04/04/2001 | EP1089128A2 Exposure mask, exposure mask manufacturing method, and semiconductor device manufacturing method using exposure mask |
| 04/04/2001 | EP1047552A4 Direct write imaging medium |
| 04/04/2001 | CN1290022A Color separating hood for cathode ray tube |
| 04/03/2001 | US6212252 X-ray mask provided with an alignment mark and method of manufacturing the same |
| 04/03/2001 | US6211944 Projection exposure method and apparatus |
| 04/03/2001 | US6211347 Inks, color filters |
| 04/03/2001 | US6210865 Collects radiation, here soft x-rays, from a small, incoherent source and couples it to the ringfield of a camera designed for projection lithography. mirrors |
| 04/03/2001 | US6210843 Modulation of peripheral critical dimension on photomask with differential electron beam dose |
| 04/03/2001 | US6210842 Method for fabricating stencil mask |
| 04/03/2001 | US6210841 Approach to increase the resolution of dense line/space patterns for 0.18 micron and below design rules using attenuating phase shifting masks |
| 04/03/2001 | US6209553 Method of and apparatus for washing photomask and washing solution for photomask |
| 03/29/2001 | WO2001022171A1 A photolithography mask having a subresolution alignment mark window |
| 03/29/2001 | WO2001022169A1 System to reduce heat-induced distortion of photomasks during lithography |
| 03/29/2001 | WO2001022164A1 Contact hole production by means of crossing sudden phase shift edges of a single phase mask |
| 03/28/2001 | EP1087418A1 Colour selection mask for cathode ray tube |
| 03/27/2001 | US6207333 Mask with attenuating phase-shift and opaque regions |
| 03/27/2001 | US6207330 Formation of punch inspection masks and other devices using a laser |
| 03/27/2001 | US6207328 Forming a multilayer element with masking a substrates, forming a photoresists layer, silylanizing, anisotropic etching and removing the shield |
| 03/22/2001 | WO2001020502A1 Optimal phase conflict removal for layout of alternating phase-shifting masks |
| 03/22/2001 | WO2001020401A1 Pellicle and method for manufacture thereof |
| 03/22/2001 | WO2001020400A1 Halftone phase shift photomask and blanks for halftone phase shift photomask for producing it |
| 03/22/2001 | WO2001020399A1 Shielding against external excitations while measuring oscillatory semiconductor membranes |
| 03/22/2001 | DE10015698C1 Semiconductor device has additional marking detected for increasing overly alignment of photomask employed during exposure step of semiconductor manufacture |
| 03/20/2001 | US6204969 Amplitude mask, and apparatus and method for manufacturing long period grating filter using the same |
| 03/20/2001 | US6203952 Articles such as radio frequency identification tags; absence of heat distortion, debris, photoresis, undercut image |
| 03/15/2001 | WO2001018606A1 Data path for high performance pattern generator |
| 03/15/2001 | WO2001018605A1 Photosensitive resin printing plate and method for producing photosensitive printing plate having projection |
| 03/15/2001 | DE19937742A1 Übertragung eines Musters hoher Strukturdichte durch multiple Belichtung weniger dichter Teilmuster Transferring a pattern of high structural density by multiple exposure less dense partial pattern |
| 03/14/2001 | EP1083463A2 Patterning method and semiconductor device |
| 03/13/2001 | US6201609 Interferometers utilizing polarization preserving optical systems |
| 03/13/2001 | US6201598 Charged-particle-beam microlithographic exposure apparatus and reticles for use with same |
| 03/13/2001 | US6200711 Phase mask for manufacturing diffraction grating, and method of manufacture |
| 03/13/2001 | US6200710 Methods for producing segmented reticles |
| 03/13/2001 | US6200709 Photolithographic mask and apparatus and method of use thereof |
| 03/08/2001 | WO2001016790A1 Software based method for simultaneously associating multiple, ordered collections of pages with multiple impositions |
| 03/08/2001 | WO2001016653A1 Cleaning stencil masks with the aid of a gas flow that passes through mask openings |
| 03/08/2001 | WO2001016556A1 Interferometers utilizing polarization preserving optical systems |
| 03/08/2001 | CA2379303A1 Software based method for simultaneously associating multiple, ordered collections of pages with multiple impositions |
| 03/07/2001 | EP1081489A2 Method and system for reticle inspection by photolithography simulation |
| 03/07/2001 | EP1081106A1 Synthetic quartz glass optical member for ultraviolet light and reduction projection exposure system using the same |
| 03/07/2001 | EP1080394A1 Elastomeric mask and use in fabrication of devices, inlcuding pixelated electroluminescent displays |
| 03/07/2001 | EP1080393A1 Method for measuring the position of structures on a surface of a mask |
| 03/07/2001 | CN1286763A Diazo-contg. photosensitive meterial |
| 03/07/2001 | CN1286415A Calibration method for photoetching |
| 03/06/2001 | US6198109 Aperture apparatus used for photolithography and method of fabricating the same |
| 03/06/2001 | US6197457 X-ray mask and method of fabricating the same |
| 03/06/2001 | US6197456 For use in patterning an integrated circuit (ic) chip |
| 03/06/2001 | US6197455 Lithographic mask repair using a scanning tunneling microscope |
| 03/06/2001 | US6197454 Clean-enclosure window to protect photolithographic mask |
| 03/06/2001 | US6197452 Prevents an exposure failure in a wiring pattern element of small dimensions |
| 02/28/2001 | EP1079273A2 Mask repair |
| 02/28/2001 | EP1078301A1 Retaining device for photo blanks |
| 02/28/2001 | CN1285932A Method of molecular-scale pattern imprinting at surface |
| 02/28/2001 | CN1285612A Electronic Beam exposure mask, Exposure method and equipment and method for making semiconductor device |
| 02/27/2001 | US6194306 Mask and method for forming dynamic random access memory (DRAM) contacts |
| 02/27/2001 | US6194252 Semiconductor device and manufacturing method for the same, basic cell library and manufacturing method for the same, and mask |
| 02/27/2001 | US6194125 Preparation of photopolymeric letterpress printing plates |
| 02/27/2001 | US6194105 Forming a reticle having first size from a graphics file defining a reticle having a size larger than the first size, which includes steps of identifying windows in the graphics file, converting file into reticle files of second format |
| 02/27/2001 | US6194104 Optical proximity correction (OPC) method for improving lithography process window |
| 02/27/2001 | US6194103 E-beam double exposure method for manufacturing ASPM mask with chrome border |
| 02/27/2001 | US6194102 Mask for transferring a pattern to a substrate, comprising sub-fields including pattern lines and interconnection patterns which include transmitting pattern segments with widths that change monotonically in a longitudinal direction |
| 02/27/2001 | US6194101 Photomask, and process and apparatus for determining condition of photomask |
| 02/27/2001 | CA2316083A1 Mask repair |
| 02/22/2001 | WO2001013178A1 Halftone phase shift photomask and blanks for halftone phase shift photomask for it and pattern forming method using this |
| 02/22/2001 | WO2001013177A1 Photomask, method for manufacturing the same, projection aligner using the photomask, and projection exposing method |
| 02/22/2001 | WO2001013176A1 Methods of determining alignment in the forming of phase shift regions in the fabrication of a phase shift mask |
| 02/22/2001 | DE19939687A1 Large-area electron beam radiation exposure dose determination for microelectronics layout, involves dividing the total surface area into several disjunctive part-areas with different structural widths |
| 02/20/2001 | US6192290 System and method of manufacturing semicustom integrated circuits using reticle primitives from a library and interconnect reticles |
| 02/20/2001 | US6192100 X-ray mask pellicles and their attachment in semiconductor manufacturing |
| 02/20/2001 | US6190840 Resist pattern forming method |