| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 06/12/2001 | US6245488 Method for forming features using frequency doubling hybrid resist and device formed thereby |
| 06/12/2001 | US6245486 In situ formation of negative image for lithography or flexography |
| 06/12/2001 | US6245481 On-press process of lithographic plates having a laser sensitive mask layer |
| 06/12/2001 | US6245470 Exposure, masking, transparent substrates, micro patterns and focusing |
| 06/12/2001 | US6245468 Optical proximity correction methods, and methods of forming radiation-patterning tools |
| 06/12/2001 | US6245467 Pattern to be transferred to a rectangle, shaping by denting |
| 06/12/2001 | US6245466 Mask pattern design method and a photomask |
| 06/07/2001 | WO2001041067A1 Method for extracting objective image |
| 06/07/2001 | WO2001040877A1 Photomask including hardened photoresist |
| 06/07/2001 | WO2001040871A1 Mitigation of substrate defects in reticles using multilayer buffer layers |
| 06/07/2001 | WO2001040870A1 Removable pellicle for lithographic mask protection and handling |
| 06/07/2001 | WO2001040869A2 Mask design and method for controlled profile fabrication |
| 06/07/2001 | WO2001040868A2 Alternating phase mask |
| 06/07/2001 | US20010003033 Method and apparatus for reducing non-uniformity area effects in the manufacture of semiconductor devices |
| 06/07/2001 | US20010003026 A dual trench structure is formed in the mask substrate by an additional etching step after the phase shift reaches 180 degree |
| 06/07/2001 | US20010003013 Substrate heating apparatus, substrate heating method, semiconductor integrated circuit device, photomask and liquid crystal device |
| 06/07/2001 | DE10056541A1 Verfahren zum Reinigen von Quarzsubstraten unter Verwendung von leitenden Lösungen A method for purifying quartz substrates using conductive solutions |
| 06/06/2001 | EP1104915A2 Defect detection using gray level signatures |
| 06/06/2001 | CN1298203A Mask detecting apparatus and method |
| 06/05/2001 | US6243855 Mask data design method |
| 06/05/2001 | US6243348 Very-high-density memory device utilizing a scintillating data-storage medium |
| 06/05/2001 | US6242734 Scanning probe microscope assembly and method for making confocal, spectrophotometric, near-field, and scanning probe measurements and associated images |
| 06/05/2001 | US6242138 Phase shift mask and phase shift mask blank |
| 06/05/2001 | US6242137 Optical masking system; diffraction light grating, mask, lens, filter |
| 06/05/2001 | US6242136 Photomask substrate |
| 05/31/2001 | WO2001039269A1 Method and apparatus for personalization of semiconductor |
| 05/31/2001 | US20010002332 Mask and method for forming dynamic random access memory (DRAM) contacts |
| 05/31/2001 | US20010002304 Methods of reducing proximity effects in lithographic processes |
| 05/31/2001 | US20010001958 Method of minimizing contaminating deposits using dilute acid rinse |
| 05/31/2001 | DE19944474A1 Abschirmung äußerer Anregungen bei der Vermessung schwingungsfähiger Halbleitermembranen Shielding from external excitations in the measurement of oscillatory semiconductor membranes |
| 05/31/2001 | DE10030143A1 Manufacturing method for photo mask, involves setting amount of correction offset so that size rate of change of resist pattern after transfer may be within permissible on device quality range |
| 05/30/2001 | EP1103858A2 Photolithographic method to make a fuse in integrated circuit with localised blowing point |
| 05/30/2001 | EP1103018A1 Diffractive element in extreme-uv lithography condenser |
| 05/30/2001 | CN2432610Y Phase-shift mask for x-ray photolithography |
| 05/29/2001 | US6239863 Removable cover for protecting a reticle, system including and method of using the same |
| 05/29/2001 | US6238837 Photosensitive printing plate element comprising a support coated with an actinic radiation-photopolymerizable binder/monomer mixture overcoated with a tack-free, radiopaque masking layer patterned by infrared ablation |
| 05/29/2001 | US6238826 Apparatus for transferring structures |
| 05/29/2001 | US6238825 Mask with alternating scattering bars |
| 05/29/2001 | US6238824 Method for designing and making photolithographic reticle, reticle, and photolithographic process |
| 05/29/2001 | US6238735 Using an enclosed substrate; controlled vapor deposition |
| 05/25/2001 | WO2001037053A1 Imaging method using phase boundary masking with modified illumination |
| 05/25/2001 | WO2001037052A1 Photolithography method, photolithography mask blanks, and method of making |
| 05/25/2001 | WO2001037046A1 Method for forming a relief on the surface of a functional layer |
| 05/25/2001 | WO2001037044A1 Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses |
| 05/25/2001 | WO2001037043A1 Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses |
| 05/25/2001 | WO2001037042A2 Exposure masks |
| 05/24/2001 | US20010001693 Process for forming features on a semiconductor wafer using a phase shifting mask that can be used with two different wavelengths of light |
| 05/23/2001 | EP1102182A2 Method of automatic layout design for LSI, mask set and semiconductor integrated circuit manufactured by the method, and recording medium storing the program |
| 05/23/2001 | EP1102125A1 Masks for lithographic patterning using off-axis illumination |
| 05/23/2001 | EP1102058A1 Method and apparatus for inspecting articles |
| 05/23/2001 | CN1296284A Checking method for figure drawing |
| 05/22/2001 | US6236033 Enhanced optical transmission apparatus utilizing metal films having apertures and periodic surface topography |
| 05/22/2001 | US6235454 Process for forming an ablation image |
| 05/22/2001 | US6235435 Multilayer; transparent substrate, opaque structure, dichroic film |
| 05/22/2001 | US6235434 Method for mask repair using defect compensation |
| 05/17/2001 | WO2001035166A1 Photomask, method of producing photomask, and method of making pattern using photomask |
| 05/17/2001 | WO2001035125A1 Antireflection base for ultraviolet and vacuum ultraviolet regions |
| 05/17/2001 | WO2000075727A3 Coatings on reflective mask substrates |
| 05/15/2001 | US6232597 Scanning probe microscope assembly and method for making confocal, spectrophotometric, near-field, and scanning probe measurements and associated images |
| 05/10/2001 | DE19949005A1 Einrichtung und Verfahren zum Einbringen verschiedener transparenter Substrate in ein hochgenaues Messgerät Apparatus and method for introducing various transparent substrates in a highly accurate measuring device |
| 05/10/2001 | DE10042626A1 Electron beam photolithography device for IC manufacture uses block mask provided with matrix of rectangular aperture patterns and setting aperture pattern used for setting beam deflector |
| 05/09/2001 | EP1098210A2 Enhanced optical transmission apparatus utilizing metal films having apertures with or without periodic surface topography |
| 05/09/2001 | CN1294319A Method for coorecting optical approach effect |
| 05/08/2001 | US6229623 Digital color proofing system |
| 05/08/2001 | US6229138 Scanning probe microscope assembly and method for making confocal, spectrophotometric, near-field, and scanning probe measurements and associated images |
| 05/08/2001 | US6228542 Photomask method of manufacture method of test/repair and method of use therefor |
| 05/08/2001 | US6228541 Supplying reactive gas; forming thin film |
| 05/08/2001 | US6228540 Method of forming a photomask of high dimensional accuracy utilizing heat treatment equipment |
| 05/08/2001 | US6228539 Masking; calibration; shrinkage of integrated circuits |
| 05/08/2001 | US6228538 Using photosensitive material |
| 05/03/2001 | WO2001031403A1 Ionic lithography method, implementing equipment and reticle for such equipment |
| 05/03/2001 | DE10046067A1 Phasenschiebungsmaske sowie Verfahren zur Herstellung derselben Phase shift mask and method of manufacturing the same |
| 05/02/2001 | EP1096313A1 Active particle, photosensitive resin composition, and process for forming pattern |
| 05/02/2001 | EP1096312A1 Non absorbing reticle and method of making same |
| 05/02/2001 | EP1095346A1 Two-dimensional to three-dimensional vlsi design |
| 05/02/2001 | EP1034457A4 Method of fine feature edge tuning with optically-halftoned mask |
| 05/02/2001 | EP0968458A4 Optical proximity correction method for intermediate-pitch features using sub-resolution scattering bars |
| 05/02/2001 | CN1293450A Electron beam exposure method and mask used and electron beam exposure system |
| 05/02/2001 | CN1293449A Exposure mask, its manufacturing method and making method of semiconductor device using same |
| 05/01/2001 | US6226781 Modifying a design layer of an integrated circuit using overlying and underlying design layers |
| 05/01/2001 | US6226087 Method for measuring the positions of structures on a mask surface |
| 05/01/2001 | US6226074 Exposure monitor mask, exposure adjusting method and method of manufacturing semiconductor devices |
| 05/01/2001 | US6225013 Stitching design rules for forming interconnect layers |
| 04/27/2001 | CA2287671A1 Method for using sub-micron silicide structures formed by direct-write electron beam lithography for fabricating masks for extreme ultra-violet and deep ultra-violet lithography |
| 04/26/2001 | WO2001029618A1 Method for determining rotational error portion of total misali gnment error in a stepper |
| 04/26/2001 | WO2001029615A1 Photomask original form having layer for protecting film surface and method for preparing the same, and protective layer-forming liquid for photomask original form |
| 04/26/2001 | DE10028019A1 Photo mask for semiconductor device manufacture, has comparison-on mask and test-on mask patterns of same shape, arranged adjacently on mask top photoengraving process test mask area of photo mask substrate |
| 04/25/2001 | EP1094366A1 Method for optical proximity correction |
| 04/25/2001 | CA2322412A1 Non absorbing reticle and method of making same |
| 04/24/2001 | US6222195 Charged-particle-beam exposure device and charged-particle-beam exposure method |
| 04/24/2001 | US6221542 Method for patterning a substrate using a photomask with multiple absorption levels |
| 04/24/2001 | US6221540 Marking; illuminating grid with light source |
| 04/24/2001 | US6221539 Mask pattern correction method and a recording medium which records a mask pattern correction program |
| 04/24/2001 | US6221538 Transmiting layout data; calibration |
| 04/24/2001 | US6221537 Applying pattern to semiconductor |
| 04/19/2001 | WO2001027697A1 Composite relief image printing elements |
| 04/19/2001 | WO2001027696A1 Uv-absorbing support layers and flexographic printing elements comprising same |
| 04/19/2001 | WO2001027695A2 Removable cover for protecting a reticle, system including and method of using the same |
| 04/19/2001 | WO2000033121A9 Microlens structure having two anamorphic surfaces on opposing ends of a single high index substrate and method of fabricating the same |
| 04/19/2001 | DE19948570A1 Semiconductor body conductor-paths wiring arrangement |