Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
03/2014
03/12/2014CN102621799B Calculation method for double absorption layer attenuation phase-shift mask diffractinonal field and degree of polarization
03/12/2014CN102445859B Method for testing shading baffle of photo-etching machine
03/12/2014CN102419510B Substrate to be processed, manufacturing method and forming method of resist pattern
03/12/2014CN102096322B Lithographic pellicle
03/12/2014CN102089860B Reflective mask blank for EUV lithography and reflective mask for EUV lithography
03/12/2014CN102073213B Pellicle
03/11/2014US8670640 Optical fiber, method of preparation thereof and device
03/11/2014US8669596 Semiconductor device
03/11/2014US8669023 Method for optical proximity correction of a reticle to be manufactured using shaped beam lithography
03/11/2014US8669022 Photomask
03/06/2014WO2014032887A1 Reticle cleaning by means of sticky surface
03/06/2014US20140065525 Pellicle for euv
03/06/2014US20140065524 Photomask and method for forming pattern of semiconductor device using the same
03/06/2014US20140065523 Pattern mask and method of manufacturing thin film pattern using pattern mask
03/06/2014US20140065521 Method for mask fabrication and repair
03/06/2014DE102013213785A1 Verfahren und System zur Bestimmung von Überlappungsprozessfenstern in Halbleitern durch Inspektionstechniken Method and system for determining overlapping process windows in semiconductors by inspection techniques
03/05/2014EP2703888A2 A pellicle for EUV
03/05/2014EP2702603A2 Method and apparatus for processing a substrate with a fo-cussed particle beam
03/05/2014CN103620497A Mask plate
03/05/2014CN103619770A Manufacturing method and apparatus therefor
03/05/2014CN103616804A Dynamic mask plate system for preparing monolithic integration capacitive touch screen by collage method
03/05/2014CN103616795A Strong acid resistant photomask and production method thereof
03/05/2014CN103616794A Photomask blank and preparation method thereof
03/04/2014USRE44792 Rapid scattering simulation of objects in imaging using edge domain decomposition
03/04/2014US8667432 Gate CD control using local design on both sides of neighboring dummy gate level features
03/04/2014US8667430 Methods for directed self-assembly process/proximity correction
03/04/2014US8667428 Methods for directed self-assembly process/proximity correction
03/04/2014US8663879 Gate CD control using local design on both sides of neighboring dummy gate level features
03/04/2014US8663878 Mask and method for forming the same
03/04/2014US8663876 Photomask blank, method of manufacturing the same, photomask, and method of manufacturing the same
03/04/2014US8663875 Method of manufacturing a photomask
03/04/2014US8663756 Pellicle kit for manufacturing a pellicle
02/2014
02/27/2014WO2014029603A1 Method of preparing a pattern, method of forming a mask set, device manufacturing method and computer program
02/27/2014US20140057199 Photomask blank, photomask, and method for manufacturing photomask blank
02/27/2014US20140057082 Mask Plate, Method For Fabricating Array Substrate Using The Same, And Array Substrate
02/27/2014US20140054702 Tft, mask for manufacturing the tft, array substrate and display device
02/26/2014EP2701005A2 Method for producing EUV masks minimising the impact of substrate defects
02/26/2014CN103605263A Method and masks for detecting splicing exposure error of color film substrate
02/26/2014CN103605260A Preparation method for nanoscale EUV mask
02/26/2014CN102650820B Mask frame and light curing method
02/26/2014CN102566254B Methods for arranging sub-resolution auxiliary feature in mask layout and method for determining one or more positions of features
02/26/2014CN102520593B Alignment verification method for exposure machine
02/25/2014US8661373 Method for the real-time monitoring of integrated circuit manufacture through localized monitoring structures in OPC model space
02/25/2014US8660336 Defect inspection system
02/25/2014US8658477 Method for manufacturing a semiconductor device
02/25/2014US8658335 Method of patterning NAND strings using perpendicular SRAF
02/25/2014US8658334 Transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device
02/25/2014US8658333 Reflective mask
02/20/2014WO2014028483A1 Optical characterization systems employing compact synchrotron radiation sources
02/20/2014WO2014028192A1 Methods for controlling defects for extreme ultraviolet lithography (euvl) photomask substrate
02/20/2014US20140051016 Method of preparing a pattern, method of forming a mask set, device manufacturing method and computer program
02/20/2014US20140051015 Reducing edge die reflectivity in extreme ultraviolet lithography
02/19/2014CN203444237U Plate box processing device
02/19/2014CN203444236U 掩膜板 Mask
02/19/2014CN103592817A Optical proximity correction method
02/19/2014CN103592816A Extreme ultraviolet lithography mask and method of manufacturing same
02/19/2014CN103592815A Mask plate, substrate and display device
02/19/2014CN102275641B Method for hermetically closing an air-tight bag for pellicle
02/19/2014CN101833201B Method for marking sequence number of scanning lines
02/18/2014US8656320 Method for creating a photolithography mask
02/18/2014US8654310 Exposure method, exposure apparatus, photomask and method for manufacturing photomask
02/18/2014US8653487 Lithography apparatus and lithography method
02/18/2014US8652767 Liquid ejection head and process for producing the same
02/18/2014US8652766 Manufacturing method of display device
02/18/2014US8652765 Making a microfluidic device with improved adhesion
02/18/2014US8652764 Method for manufacturing a piezoelectric membrane type device
02/18/2014US8652756 Positive resist composition and patterning process
02/18/2014US8652711 Pellicle for lithography
02/18/2014US8652710 Device manufacturing method, method of making a mask, and mask
02/18/2014US8652306 Method for manufacturing mask blank, method for manufacturing transfer mask, sputtering target for manufacturing mask blank
02/13/2014WO2014025047A1 Method for manufacturing optical element and exposure method using optical element
02/13/2014US20140045105 Semiconductor structure and method for fabricating semiconductor layout
02/13/2014US20140045104 LCD Panel Photolithography Process and Mask
02/13/2014US20140045103 Methods for controlling defects for extreme ultraviolet lithography (euvl) photomask substrate
02/12/2014CN103576444A Optical proximity correction method for mask
02/12/2014CN103576443A Optical proximity correction method
02/12/2014CN103576442A Optical proximity correction apparatus and correction method
02/12/2014CN103576441A Phase shift blankmask and photomask using the flat panel display
02/12/2014CN103576440A Quincuncial mask plate and method for making patterned substrate by utilizing same
02/12/2014CN102093282B 肟酯光敏引发剂 Oxime ester photoinitiator
02/11/2014US8647795 Sputtering target material, silicon-containing film forming method, and photomask blank
02/06/2014WO2014022077A1 Apparatus and methods for etching quartz substrate in photomask manufacturing applications
02/06/2014WO2014021235A1 Reflective mask blank and method for manufacturing same, method for manufacturing reflective mask, and method for manufacturing semiconductor device
02/06/2014WO2014020912A1 Pellicle
02/06/2014WO2014019870A1 Mask inspection method and mask inspection system for euv-masks
02/06/2014WO2014019544A1 Optical proximity correction method
02/06/2014WO2014019310A1 Gray scale mask and column spacer formed using same
02/06/2014US20140038091 Apparatus and methods for etching quartz substrate in photomask manufacturing applications
02/06/2014US20140038090 Extreme Ultraviolet Lithography Mask and Multilayer Deposition Method for Fabricating Same
02/06/2014US20140038089 Self-polarized mask and self-polarized mask application
02/06/2014US20140038088 Method of Fabricating a Lithography Mask
02/06/2014US20140038087 Extreme ultraviolet (euv) multilayer defect compensation and euv masks
02/06/2014US20140038086 Phase Shift Mask for Extreme Ultraviolet Lithography and Method of Fabricating Same
02/06/2014US20140038085 Automatic Misalignment Balancing Scheme for Multi-Patterning Technology
02/06/2014US20140036243 Method and apparatus for correcting errors on a wafer processed by a photolithographic mask
02/06/2014DE102013104390A1 Verfahren für die Herstellung einer Lithografiemaske A method for producing a lithography mask
02/05/2014EP2693458A1 Method for correcting mask for euv exposure, and mask for euv exposure
02/05/2014EP2691439A1 Antireflective coating composition and process thereof
02/05/2014CN203422555U Guiding piece removing machine for photomask plate
02/05/2014CN203422554U Device for sticking film to photomask plate
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