| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 09/04/2001 | US6285783 Pattern data generating apparatus and method for inspecting defects in fine patterns in a photomask or semiconductor wafer |
| 09/04/2001 | US6285497 Diffractive element in extreme-UV lithography condenser |
| 09/04/2001 | US6285488 Pattern generator for avoiding stitching errors |
| 09/04/2001 | US6285020 Enhanced optical transmission apparatus with improved inter-surface coupling |
| 09/04/2001 | US6285002 Three dimensional micro machining with a modulated ultra-short laser pulse |
| 09/04/2001 | US6284443 Method and apparatus for image adjustment |
| 09/04/2001 | US6284432 Coat property, has not special color unevenness and contrast |
| 09/04/2001 | US6284431 Photosensitive element for flexographic printing |
| 09/04/2001 | US6284419 Methods of reducing proximity effects in lithographic processes |
| 09/04/2001 | US6284417 Reticle cleaning without damaging pellicle |
| 09/04/2001 | US6284416 Photo mask and exposure method using same |
| 09/04/2001 | US6284414 Preparing mask substrate having light-shielding film pattern over including integrated circuit pattern and alignment mark; forming resist film; aligning position of phase-shifting pattern; electron beam exposure to form phase-shifting pattern |
| 09/04/2001 | US6284413 Selecting reticle primitives containing patterns corresponding to portions of a layer to be created by semicustom reticle; exposing to create image; employing semicustom reticle to create an image of patterns on integrated circuit |
| 09/04/2001 | US6283030 Imaging a lithographic printing plate |
| 08/30/2001 | WO2001063864A2 Chromeless alternating phase-shift reticle for producing semiconductor device features |
| 08/30/2001 | WO2001063653A1 Semiconductor integrated circuit device and method of producing the same, and method of producing masks |
| 08/30/2001 | WO2001063364A1 Laser imaged printing plates comprising a multi-layer slip film |
| 08/30/2001 | WO2001063325A1 Method of making phase mask for machining optical fiber and optical fiber having bragg diffraction grating produced using the phase mask for machining optical fiber |
| 08/30/2001 | US20010018154 Sputtering uniform thin film on substrate |
| 08/30/2001 | US20010018153 Photolithography |
| 08/30/2001 | DE10006952A1 Mask set comprises a first chrome-less phase mask for producing exposed and non-exposed regions on a photolaquer, and a second mask for dividing the non-exposed regions |
| 08/29/2001 | EP1128211A1 Lithographic printing method using a low surface energy layer |
| 08/29/2001 | CN1310359A Producing method for lithographic printing plate originals |
| 08/28/2001 | US6281496 Observing/forming method with focused ion beam and apparatus therefor |
| 08/28/2001 | US6281491 Scanning probe microscope assembly and method for making confocal, spectrophotometric, near-field, and scanning probe measurements and associated images |
| 08/28/2001 | US6280906 Method of imaging a mask pattern on a substrate by means of EUV radiation, and apparatus and mask for performing the method |
| 08/28/2001 | US6280888 Photomask with films |
| 08/28/2001 | US6280887 Complementary and exchange mask design methodology for optical proximity correction in microlithography |
| 08/28/2001 | US6280886 Photolithography system with supports, reflective recticle, protective covering and windows |
| 08/28/2001 | US6280885 Preventing dust from contacting photomasks coupled to frames with film attached, inorganic reflective coatings formed in vacuum chambers |
| 08/28/2001 | US6280646 Use of a chemically active reticle carrier for photomask etching |
| 08/24/2001 | CA2336569A1 Photo mask pattern designing method, resist pattern fabricating method and semiconductor device manufacturing method |
| 08/23/2001 | WO2001061412A1 A method of improving photomask geometry |
| 08/23/2001 | WO2001061409A2 Apparatus and method of cleaning reticles for use in a lithography tool |
| 08/23/2001 | US20010016937 System and method for compressing LSI mask writing data |
| 08/23/2001 | US20010016292 Electron beam mask, production method thereof, and exposure method |
| 08/23/2001 | US20010015805 Inspection method, apparatus and system for circuit pattern |
| 08/22/2001 | EP1125167A1 Methods of reducing proximity effects in lithographic processes |
| 08/22/2001 | EP1125166A1 Fabrication of sub-micron etch-resistant metal/semiconductor structures using resistless electron beam lithography |
| 08/21/2001 | US6279147 Use of an existing product map as a background for making test masks |
| 08/21/2001 | US6277546 Coating substrate with polymer; heating; imagewise exposure;development |
| 08/21/2001 | US6277543 Method for forming features using frequency doubling hybrid resist and device formed thereby |
| 08/21/2001 | US6277542 Charged-particle-beam projection-exposure methods exhibiting more uniform beam-current density |
| 08/21/2001 | US6277532 Charged-particle-beam microlithographic methods for correction of reticle distortions |
| 08/21/2001 | US6277528 Overcoating a transparent substrate; applying aqueous solution of ammonium hydroxide and hydrogen peroxide |
| 08/21/2001 | US6277527 Photolithographic mask; first and second image segments |
| 08/21/2001 | US6277526 Method for repairing MoSi attenuated phase shift masks |
| 08/21/2001 | US6277205 Cleaning surface of photomask to be used as master in photolithography step in production of semiconductor device with hot mixture of sulfuric acid and hydrogen peroxide to decompose organic objects, removing sulfuric acid, drying |
| 08/16/2001 | WO2001059576A1 Text grid creation tools |
| 08/16/2001 | WO2001059522A1 Method and apparatus for a reticle with purged pellicle-to-reticle gap |
| 08/16/2001 | WO2001059022A1 Infrared sensitive coating liquid |
| 08/16/2001 | US20010014426 Lithography; screen printing, curing |
| 08/16/2001 | US20010014425 Halftones |
| 08/16/2001 | US20010014424 Photomask substrates; photolithography |
| 08/16/2001 | US20010014375 Pellicle case having chemical traps |
| 08/16/2001 | US20010013658 Integrated circuit and method for its manufacture |
| 08/16/2001 | EP1123215A1 Three-dimensional microstructure |
| 08/16/2001 | DE10046911A1 Photo mask for manufacturing semiconductors has monitoring marking with coarse, high density and cross patterns on substrate for assuring dimensions of actual pattern and coincidence |
| 08/15/2001 | CN1308369A Design method, masks, manufacture and storage medium of integrated circuit |
| 08/14/2001 | US6275604 Method and apparatus for generating semiconductor exposure data |
| 08/14/2001 | US6274281 Using different transmittance with attenuate phase shift mask (APSM) to compensate ADI critical dimension proximity |
| 08/14/2001 | US6274280 Multilayer attenuating phase-shift masks |
| 08/09/2001 | WO2001057596A1 Active reticle, method for making and controlling same, ion projecting lithography using same and equipment therefor |
| 08/09/2001 | WO2001057595A1 Transparent phase shift mask for fabrication of small feature sizes |
| 08/09/2001 | WO2001057496A2 Straight line defect detection |
| 08/09/2001 | US20010012599 Dimensionally stable solid, partly hollow or hollow cylinder and a photopolymerizable crosslinkable cylinder layer applied in part-layers by means of coaxial coating apparatus; uniform layers |
| 08/09/2001 | US20010012391 Pattern inspection method and apparatus |
| 08/09/2001 | US20010011706 Inspection method, apparatus and system for circuit pattern |
| 08/09/2001 | DE10004573A1 Verfahren zur Herstellung eines Mehrfarbendruckes A method for producing a multi-color print |
| 08/08/2001 | EP1122603A1 Phase shifting mask |
| 08/08/2001 | EP1122082A2 Method for preparing multicolour prints |
| 08/08/2001 | EP1121622A1 Structure for reflection lithography mask and method for making same |
| 08/07/2001 | US6272236 Inspection technique of photomask |
| 08/07/2001 | US6272202 Exposure method and X-ray mask structure for use with the same |
| 08/07/2001 | US6271923 Interferometry system having a dynamic beam steering assembly for measuring angle and distance |
| 08/07/2001 | US6271574 Integrated circuit fuse with localized fusing point |
| 08/07/2001 | US6270947 Printing a pattern |
| 08/07/2001 | US6270945 Photosensitive compositions and elements comprising dyed photosensitive polyesters |
| 08/02/2001 | WO2001054853A2 Method and apparatus for repair of defects in materials with short laser pulses |
| 08/02/2001 | US20010011199 Method for patterning and fabricating wordlines |
| 08/02/2001 | US20010010886 High accuracy circuit pattern transferring |
| 08/02/2001 | US20010010883 Dust cover for use in semiconductor fabrication |
| 08/02/2001 | US20010010882 Dust cover for use during photolithography |
| 08/02/2001 | US20010010668 Nanometer scale data storage device and associated positioning system |
| 08/02/2001 | US20010010578 Scanning exposure photo-mask and method of scanning exposure and scanning exposure system |
| 08/02/2001 | US20010010292 Container for framed pellicle |
| 08/01/2001 | CN1306225A Method for checking exposure figure formed on optical mask |
| 07/31/2001 | US6269472 Optical proximity correction method and apparatus |
| 07/31/2001 | US6268093 Optical exposure system |
| 07/31/2001 | US6268091 Primary pattern; diffraction grating |
| 07/31/2001 | US6268090 Process for manufacturing semiconductor device and exposure mask |
| 07/31/2001 | US6266978 Irradiating highly homogeneous synthetic quartz glass containing 20 sodium (na) with ultraviolet radiation |
| 07/26/2001 | WO2001054046A1 Geometric aerial image simulation |
| 07/26/2001 | WO2001053892A1 Mask having an arbitrary complex transmission function |
| 07/26/2001 | US20010009745 Half tone phase shift mask having a stepped aperture |
| 07/26/2001 | US20010009281 Phase shift mask and fabrication method thereof |
| 07/26/2001 | DE19948570C2 Anordnung zur Verdrahtung von Leiterbahnen Arrangement for the wiring of traces |
| 07/26/2001 | DE10048646A1 Mask component used in electron beam lithography system, has electroconductive antioxidation layer which is formed on surface of base material with area irradiated by charged particle beam |
| 07/26/2001 | DE10001119A1 Phasenmaske Phase mask |
| 07/24/2001 | US6265711 Scanning probe microscope assembly and method for making spectrophotometric near-field optical and scanning measurements |