| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 10/11/2001 | US20010028982 Fluorine doped molybdenum silicide film |
| 10/11/2001 | US20010028981 Data processing apparatus, method and program product for compensating for photo proximity effect with reduced data amount, and photomask fabricated using same |
| 10/11/2001 | US20010028056 Evaluation method of semiconductor chargeup damage and apparatus therefor |
| 10/11/2001 | US20010028045 Method for repairing MoSi attenuated phase shifting masks |
| 10/11/2001 | US20010028039 Method for directing an electron beam onto a target position on a substrate surface |
| 10/11/2001 | US20010027917 Ion milling chromium on a quartz substrate without causing defects in the quartz by moving the ion beam initially in a pattern that produces an uneven surface, followed by milling step where beam moves in a pattern of overlapping pixels |
| 10/10/2001 | EP1143295A2 Halftone phase shifting photomask and blanks for halftone phase shifting photomask therefor and a method for forming pattern by using said mask |
| 10/10/2001 | EP1141868A2 Mechanisms for making and inspecting reticles |
| 10/10/2001 | EP1141776A1 Method for patterning thin films |
| 10/10/2001 | EP1141775A1 Multilayer attenuating phase-shift masks |
| 10/10/2001 | EP0788027B1 Phase shift mask blank and production method therefor |
| 10/09/2001 | US6301698 Method for creating the sub-resolution phase shifting pattern for outrigger type phase shifting masks |
| 10/09/2001 | US6301697 Streamlined IC mask layout optical and process correction through correction reuse |
| 10/09/2001 | US6300042 Lithographic printing method using a low surface energy layer |
| 10/09/2001 | US6300020 Ball-shaped device exposure apparatus and ball-shaped device manufacturing method |
| 10/09/2001 | US6300019 Prevents particle from lying on mask used for exposing a wafer and defocusing second particle lying on pellicle; antislipping agents; semiconductors |
| 10/09/2001 | US6300018 Photolithography mask having a subresolution alignment mark window |
| 10/09/2001 | US6300017 Forming plurality of openings; doping in pattern; lithography; semiconductors |
| 10/04/2001 | WO2001073413A1 Methods for the automated testing of reticle feature geometries |
| 10/04/2001 | US20010027351 Stocker, exposure apparatus, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method |
| 10/04/2001 | US20010027027 Ferroelectric random access memory device and method for manufacture thereof |
| 10/04/2001 | US20010027025 Projection lithography photomask blanks, preforms and method of making |
| 10/04/2001 | US20010027021 Method for patterning semiconductor devices on a silicon substrate using oxynitride film |
| 10/04/2001 | US20010026906 Process for manufacturing semiconductor device and exposure mask |
| 10/04/2001 | US20010026895 Alkali-soluble resin, photoacid generator, and dissolution inhibiting groups, increasing the sensitivity of the pattern formation material |
| 10/04/2001 | US20010026448 Projection exposure apparatus |
| 10/04/2001 | US20010026355 Exposure apparatus, exposure method, and device manufacturing method |
| 10/04/2001 | EP1137969A1 Method of using a modulated exposure mask |
| 10/04/2001 | EP1137967A1 Method for mask repair using defect compensation |
| 10/02/2001 | US6298473 Apparatus and method for inhibiting pattern distortions to correct pattern data in a semiconductor device |
| 10/02/2001 | US6297169 Method for forming a semiconductor device using a mask having a self-assembled monolayer |
| 10/02/2001 | US6296991 Bi-focus exposure process |
| 10/02/2001 | US6296987 Method for forming different patterns using one mask |
| 10/02/2001 | US6296975 Photo mask of semiconductor device and method for manufacturing the same |
| 10/02/2001 | US6296974 Method of forming a multi-layer photo mask |
| 10/02/2001 | US6296925 Aperture for charged beam drawing machine and method for forming the same |
| 09/27/2001 | WO2001071427A1 Photo-lithographic method for semiconductors |
| 09/27/2001 | WO2001071426A2 Apparatus for generating a laser pattern on a photomask and associated methods |
| 09/27/2001 | WO2001070920A1 Cleaning compositions and use thereof |
| 09/27/2001 | WO2001070503A1 Method for centered screen printing and apparatus |
| 09/27/2001 | WO2001006318A8 Phase shifter film and production method therefor |
| 09/27/2001 | US20010024875 Method for patterning semiconductor devices on a silicon substrate using oxynitride film |
| 09/27/2001 | US20010024760 Method of optical proximity correction |
| 09/27/2001 | US20010024758 Photomask to design pattern |
| 09/27/2001 | US20010024701 Fluoropolymer for photolithography patterning |
| 09/27/2001 | CA2397692A1 Apparatus for generating a laser pattern on a photomask and associated methods |
| 09/26/2001 | EP1135789A2 Microfabricated template for multiple charged particle beam calibrations and shielded charged particle beam lithography |
| 09/25/2001 | US6294295 To the use of different transmittance phase shifting materials for pattern regions having different duty ratios. |
| 09/20/2001 | WO2001069316A1 Exposure controlling photomask and production method therefor |
| 09/20/2001 | WO2001068938A1 Method and apparatus for repairing lithography masks using a charged particle beam system |
| 09/20/2001 | US20010023045 Transferring integrated circuit pattern from amask to semiconductor substarte |
| 09/20/2001 | US20010023043 Dynamic random access memory |
| 09/20/2001 | US20010023042 Test object for detecting aberrations of an optical imaging system |
| 09/20/2001 | US20010022405 Stepper alignment mark formation with dual field oxide process |
| 09/20/2001 | US20010022216 Reticle adapter for a reactive ion etch system |
| 09/19/2001 | EP1133440A1 Automated opening and closing of ultra clean storage containers |
| 09/18/2001 | US6292250 Substrate process apparatus |
| 09/18/2001 | US6291115 Method for repairing bump and divot defects in a phase shifting mask |
| 09/18/2001 | US6291114 Photomask with a mask edge provided with a ring-shaped ESD protection area |
| 09/18/2001 | US6291113 Design a phase shift mask for illumination a ciruits |
| 09/18/2001 | US6291112 Substrate with binding layer and shifting layer with pattern, defining layers |
| 09/18/2001 | US6291111 Patterns with reverse treatment |
| 09/18/2001 | US6291110 Exposing wafers, masking with programmable photolithography, controlling active electron distribution |
| 09/13/2001 | WO2001067502A2 Method and apparatus for milling copper interconnects in a charged particle beam system |
| 09/13/2001 | WO2001067501A1 Apparatus and method for reducing differential sputter rates |
| 09/13/2001 | WO2001067181A1 Wafer alignment |
| 09/13/2001 | US20010021546 Mask, exposure method, line width measuring method, and method for manufacturing semiconductor devices |
| 09/13/2001 | US20010021490 Photomask having small pitch images of openings for fabricating openings in a semiconductor memory device and a photolithographic method for fabricating the same |
| 09/13/2001 | US20010021477 Method of manufacturing a device by means of a mask phase-shifiting mask for use in said method |
| 09/13/2001 | US20010021476 Illuminating a photosensitive layer; photolithography |
| 09/13/2001 | US20010021475 Patterned layers; integraed circuits |
| 09/13/2001 | US20010021020 Inspection method, apparatus and system for circuit pattern |
| 09/13/2001 | US20010021019 Inspection method, apparatus and system for circuit pattern |
| 09/13/2001 | US20010020643 Substrate for device manufacture |
| 09/13/2001 | DE10011202A1 Verfahren zur Ausrichtung eines Elektronenstrahls auf eine Zielposition an einer Substratoberfläche A method for aligning an electron beam to a target position on a substrate surface |
| 09/12/2001 | EP1132944A2 Method of aligning an electron beam with a target position on a substrate surface |
| 09/12/2001 | EP1132772A1 Halftone phase shift photomask and blanks for halftone phase shift photomask for it and pattern forming method using this |
| 09/12/2001 | EP1131679A1 System to reduce heat-induced distortion of photomasks during lithography |
| 09/12/2001 | EP1131665A1 Microscope, especially microscope used for inspection in semiconductor manufacture |
| 09/11/2001 | US6289499 Proximity correction software for wafer lithography |
| 09/11/2001 | US6287732 Generic phase shift masks |
| 09/11/2001 | US6287731 Methods for making microlithography masks utilizing temperature control |
| 09/11/2001 | US6287699 Mask for the selective growth of a solid |
| 09/07/2001 | WO2001065317A2 Method for evaluation of reticle image using aerial image simulator |
| 09/07/2001 | WO2001065316A1 Method of manufacturing a device by means of a mask and phase-shifting mask for use in said method |
| 09/07/2001 | WO2001065315A2 Method and apparatus for mixed-mode optical proximity correction |
| 09/06/2001 | US20010019803 Buffer layer |
| 09/06/2001 | US20010019802 Forming light shield on substrate |
| 09/06/2001 | US20010019801 Photomask blank, photomask and method of manufacture |
| 09/06/2001 | US20010019625 Method and apparatus for reticle inspection using aerial imaging |
| 09/06/2001 | US20010019411 Inspection method, apparatus and system for circuit pattern |
| 09/06/2001 | US20010019401 Exposure apparatus, microdevice, photomask, and exposure method |
| 09/06/2001 | US20010019100 Focusing method |
| 09/05/2001 | EP1130472A2 Exposure method, method of production of density filter, and exposure apparatus |
| 09/05/2001 | EP1130467A2 Photo mask pattern designing method, resist pattern fabricating method and semiconductor device manufacturing method |
| 09/05/2001 | EP1130466A2 Photomask blank, photomask and method of manufacture |
| 09/05/2001 | EP1130465A2 Laser delivery system and method for photolithographic mask repair |
| 09/05/2001 | EP1129860A1 Process for forming an ablation image |
| 09/05/2001 | EP0674342B1 Method for evaluating focal point |
| 09/05/2001 | CN1311525A Exposure mask and its mfg. method |