| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 12/20/2001 | US20010053964 Method of forming a pattern using proximity-effect-correction |
| 12/20/2001 | US20010053605 Apparatus and method for reducing differential sputter rates |
| 12/20/2001 | US20010053499 Laser-imageable and photocurable article comprising backing, photocurable layer on backing having low absorbance of radiation at selected wavelength in the range of 300-400 nm, initiator, ultra-violet radiation absorbing layer; flexography |
| 12/20/2001 | US20010053498 Substrate, photosensitive resinous layer having sensitivity to light excepting infrared light and comprising elastomeric binder resin, polymerizable monomeric compound and polymerization initiator, barrier, masking layer |
| 12/20/2001 | US20010053486 Stacking plurality of photoresist films differing in sensitivity on film formed on semiconductor substrate, exposing, etching, embedding metal material in formed spacings to form plurality of wiring elements |
| 12/20/2001 | US20010053414 Mitigation of radiation induced surface contamination |
| 12/20/2001 | DE10028790A1 Laser lithographic manufacture of circuit board by direct marking by exposing photoresist at different wavelength than that used to expose latent mask |
| 12/19/2001 | EP1164629A1 Exposure apparatus, semiconductor device, and photomask |
| 12/19/2001 | EP1164432A1 Optical proximity correction method utilizing serifs having variable dimensions |
| 12/19/2001 | EP1164431A1 Pellicle and method for manufacture thereof |
| 12/19/2001 | EP1163552A1 Method of forming a masking pattern on a surface |
| 12/18/2001 | US6331368 Test object for use in detecting aberrations of an optical imaging system |
| 12/18/2001 | US6331348 Substrate having repaired metallic pattern and method and device for repairing metallic pattern on substrate |
| 12/13/2001 | WO2001095031A2 Imageable element and waterless printing plate |
| 12/13/2001 | WO2001095029A1 Substrate selector |
| 12/13/2001 | US20010052107 Integrated verification and manufacturability tool |
| 12/13/2001 | US20010051304 Exposure to wavelengths; reflective mask |
| 12/13/2001 | US20010051303 Method of repairing an opaque defect in a photomask |
| 12/13/2001 | US20010051302 Preferential etching |
| 12/12/2001 | EP1161403A1 Projection lithography photomask substrate and method of making |
| 12/11/2001 | US6330053 Image alignment method in checking reticle pattern |
| 12/11/2001 | US6329665 Charged particle beam lithography apparatus for forming pattern on semi-conductor |
| 12/11/2001 | US6329111 Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same |
| 12/11/2001 | US6329106 To remove a bridge formed on a quartz substrate, implanting ga ions using focused ion beam then using blue laser |
| 12/06/2001 | WO2001092957A1 Transfer sheet for transferring protective layer for photographic emulsion face and photomask with protective layer |
| 12/06/2001 | WO2001040868A3 Alternating phase mask |
| 12/06/2001 | US20010049811 Pattern distortion correction device, pattern distortion correction method, and recording medium recording a pattern distortion correction program |
| 12/06/2001 | US20010049065 Covering, sealing during cleaning |
| 12/06/2001 | US20010049064 Radiation transparent substrate; sheild pattern |
| 12/06/2001 | US20010049063 Electrically programmable photolithography mask |
| 12/06/2001 | US20010049062 Photomask, fabrication method of photomask, and fabrication method of semiconductor integrated circuit |
| 12/06/2001 | US20010048478 Pattern distortion detecting method and apparatus and recording medium for pattern distortion detection |
| 12/06/2001 | DE10055280A1 Phasenverschiebungs-Photomaskenrohling, Phasenverschiebungs-Photomaske und Verfahren zur Herstellung von Halbleitervorrichtung Phase shift photomask blank and phase shift photomask process for producing semiconductor device |
| 12/05/2001 | EP1160626A1 Method of detecting aberrations of an optical imaging system |
| 12/05/2001 | EP1160624A2 Pellicle and method of using the same |
| 12/05/2001 | EP1160092A1 Material detecting device for stamp making |
| 12/05/2001 | EP0722581B1 Method for the electronic assembly of printer's forms |
| 12/04/2001 | US6327379 Pattern inspection method and apparatus |
| 12/04/2001 | US6327332 Exposure method |
| 12/04/2001 | US6327033 Detection of phase defects on photomasks by differential imaging |
| 12/04/2001 | US6327021 Mask inspection system and method of manufacturing semiconductor device |
| 12/04/2001 | US6326632 Particle-optical imaging system for lithography purposes |
| 12/04/2001 | US6326124 Flexographic printing form made by covering the edges of photopolymerizable printing plates for flexographic printing |
| 12/04/2001 | US6326107 Phase shift mask and process for manufacturing the same |
| 12/04/2001 | US6326106 Overlay measuring pattern, and photomask |
| 11/29/2001 | WO2001091167A1 Substrate for transfer mask, transfer mask, and method of manufacture thereof |
| 11/29/2001 | WO2001054853A3 Method and apparatus for repair of defects in materials with short laser pulses |
| 11/29/2001 | WO2001046680A3 Reticle for use in photolithography and methods for making same and inspecting |
| 11/29/2001 | US20010046776 Method for fabricating a stencil mask |
| 11/29/2001 | US20010046730 Method of designing/manufacturing semiconductor integrated circuit device using combined exposure pattern and semiconductor integrated circuit device |
| 11/29/2001 | US20010046719 Pattern-forming method using photomask, and pattern-forming apparatus |
| 11/29/2001 | US20010046646 Stencil mask and method for manufacturing same |
| 11/29/2001 | US20010046631 Divided reticles for charged-particle-beam microlithography apparatus, and methods for using same |
| 11/28/2001 | EP1158365A1 Process and apparatus for coating on printing cylinders |
| 11/28/2001 | EP1158361A1 Photomask, method for manufacturing the same, projection aligner using the photomask, and projection exposing method |
| 11/28/2001 | EP1157308A2 Monograin membrane mask |
| 11/28/2001 | EP0898733B1 Method of producing a stencil mask |
| 11/27/2001 | US6323953 Method and device for measuring structures on a transparent substrate |
| 11/27/2001 | US6323560 Registration accuracy measurement mark, method of repairing defect of the mark, photomask having the mark, method of manufacturing the photo mask and method of exposure thereof |
| 11/27/2001 | US6322957 Light exposure method |
| 11/27/2001 | US6322935 Method and apparatus for repairing an alternating phase shift mask |
| 11/27/2001 | US6322934 Designing a reticle including pattern features having a critical dimension to form corresponding circuit features based upon overlap areas defined by a plurality of exposure steps. |
| 11/27/2001 | US6322672 Method and apparatus for milling copper interconnects in a charged particle beam system |
| 11/22/2001 | WO2001089196A2 Method for controlling calibration and image sharpening of printing plates having integral photomask layer |
| 11/22/2001 | WO2001088960A2 Method of molecular-scale pattern imprinting at surfaces |
| 11/22/2001 | WO2001088611A1 Amplitude mask for writing long-period gratings |
| 11/22/2001 | WO2001088589A1 Ultra-broadband uv microscope imaging system with wide range zoom capability |
| 11/22/2001 | WO2001088514A1 Apparatus for inspection of semiconductor wafers and masks using a low energy electron micoscope with two illuminating beams |
| 11/22/2001 | US20010044058 For patterns formed by lithography or etching to manufacturing semiconductor or optical devices. |
| 11/22/2001 | US20010044057 Subresolution grating for attenuated phase shifting mask fabrication |
| 11/22/2001 | US20010044056 To eliminate defects encountered in prior art. |
| 11/22/2001 | US20010044055 Substrate for damping the beam; metallic filme for interrupting the beam; main patern with openings bored through the supstrate; auxiliary pattern with at least one window partion |
| 11/22/2001 | US20010044054 Photomask blank and photomask |
| 11/22/2001 | US20010044053 Substrate with a first transmittance; first pattern having a second transmittance lower than the first; and a second pattern having a transmittance greater than the second and less than the first |
| 11/22/2001 | US20010044052 Selected based upon a predetermined reference set value using a method for detecting a defect in accordance with optical change of an inspecting light beam; defect has no dependency for a moving direction of the light beam |
| 11/22/2001 | US20010042921 Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording medium |
| 11/21/2001 | EP1156369A1 Photosensitive resin print plate material and production method for photosensitive resin print plate |
| 11/21/2001 | EP1156368A2 Multilayered photosensitive material for flexographic printing plate |
| 11/21/2001 | EP0909406B1 Photomask blanks |
| 11/21/2001 | CN1074992C Seal making device |
| 11/21/2001 | CN1074990C Method for producing printing mould plate and apparatus thereof |
| 11/20/2001 | US6320198 Charged particle beam lithography apparatus for forming pattern on semi-conductor |
| 11/20/2001 | US6319644 Methods of reducing proximity effects in lithographic processes |
| 11/20/2001 | US6319639 Method for making a photomask with multiple absorption levels |
| 11/20/2001 | US6319638 Semiconductor device manufacturing method of accurately performing alignment of patterning, mask for exposure |
| 11/20/2001 | US6319637 Forming patterns and masking to form opaque films |
| 11/20/2001 | US6319636 Frames with membranes over them, absorbers and electron beams |
| 11/20/2001 | US6319635 Mitigation of substrate defects in reticles using multilayer buffer layers |
| 11/20/2001 | US6319634 Projection lithography photomasks and methods of making |
| 11/20/2001 | US6319568 Formation of silicon nitride film for a phase shift mask at 193 nm |
| 11/20/2001 | US6319566 Method of molecular-scale pattern imprinting at surfaces |
| 11/20/2001 | CA2025831C Radiation-polymerizable mixture and process for producing a solder resist mask |
| 11/15/2001 | WO2001085453A1 Chemical imaging of a lithographic printing plate |
| 11/15/2001 | US20010041378 Test photomask and method for invertigating esd-induced reticle defects |
| 11/15/2001 | US20010041310 Semiconductor; masking substrate with photoresist; patterning; exposure; development |
| 11/15/2001 | US20010041307 Embossing |
| 11/15/2001 | US20010040722 Broad band deep ultraviolet/vacuum ultraviolet catadioptric imaging system |
| 11/15/2001 | CA2408600A1 Chemical imaging of a lithographic printing plate |
| 11/14/2001 | EP1154326A1 Process and apparatus for the production of printing plates |
| 11/14/2001 | EP1154322A1 Flexographic printing cylinders and sleeves with cylindrical, seamless photopolymer printing layer, photopolymer composition therefor, and method of making said cylinders and sleeves from said composition. |