| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 11/14/2001 | EP1154320A1 Pellicle |
| 11/14/2001 | EP1152906A1 Local vectorial particle cleaning |
| 11/13/2001 | US6317866 Method of preparing charged particle beam drawing data and recording medium on which program thereof is recorded |
| 11/13/2001 | US6317480 Method of manufacturing X-ray mask and X-ray mask blank, and X-ray mask and X-ray mask blank manufactured thereby |
| 11/13/2001 | US6317479 X-ray mask, and exposure method and apparatus using the same |
| 11/13/2001 | US6317197 Mask pellicle remove tool |
| 11/13/2001 | US6316358 Method for fabricating an integrated circuit device |
| 11/13/2001 | US6316163 Patterns for data layer, light exposure, separation and performing patterns |
| 11/13/2001 | US6316152 OPC method to improve e-beam writing time |
| 11/13/2001 | US6316151 Exposure mask in nonoptical lithographic process using electron beams, x-rays or ion beams |
| 11/13/2001 | US6316150 Low thermal distortion extreme-UV lithography reticle |
| 11/13/2001 | US6315916 Chemical imaging of a lithographic printing plate |
| 11/08/2001 | WO2001084237A2 Semiconductor device fabrication using a photomask designed using modeling and empirical testing |
| 11/08/2001 | WO2001084236A2 Method for phase shift mask design, fabrication, and use |
| 11/08/2001 | WO2001084235A2 Multiple exposure process for formation of dense rectangular arrays |
| 11/08/2001 | WO2001083388A2 Glass preform and methods and apparatus for manufacture thereof |
| 11/08/2001 | US20010039554 Method of paginating printed material |
| 11/08/2001 | US20010038975 Laminating multilayer of peelable support, image recording layer, adhesive and ultraviolet sensitive material; image-wise exposure ; flood exposure and development |
| 11/08/2001 | US20010038954 Analyzing defect; supplying, controlling actinic radiation |
| 11/08/2001 | US20010038953 Multilayer |
| 11/08/2001 | US20010038952 Light shield film pattern |
| 11/08/2001 | US20010038951 Photomask and method of manufacturing same |
| 11/08/2001 | US20010038950 Semiconductor |
| 11/08/2001 | US20010038443 Rotational mask scanning exposure method and apparatus |
| 11/08/2001 | US20010037994 Method of etching an object, method of repairing pattern, nitride pattern and semiconductor device |
| 11/08/2001 | US20010037859 Use of a chemically active reticle carrier for photomask etching |
| 11/08/2001 | DE10112524A1 Zweistufiges Grobverfahren und gesteuerte Aufdampfraten zum Herstellen von Laserablationsmasken Two-stage coarse method and controlled deposition rates for the manufacture of Laserablationsmasken |
| 11/07/2001 | EP1152296A1 Photosensitive resin printing plate and method for producing photosensitive printing plate having projection |
| 11/07/2001 | EP1152292A2 Halftone phase shift photomask and blank for halftone phase shift photomask |
| 11/07/2001 | EP1152291A2 Photomask blank and photomask |
| 11/07/2001 | EP1152290A2 Method for fabricating a photolithographic mask |
| 11/07/2001 | EP1152289A2 Hybrid phase-shift mask |
| 11/07/2001 | EP1152288A1 Phase-shift mask |
| 11/06/2001 | US6314554 Method of generating mask pattern data for graphics and apparatus for the same |
| 11/06/2001 | US6313467 Broad spectrum ultraviolet inspection methods employing catadioptric imaging |
| 11/06/2001 | US6312872 Composite relief image printing plates |
| 11/06/2001 | US6312871 Composite relief image printing plates |
| 11/06/2001 | US6312857 Silver halide emulsion layer and a physical development center layer formed between the glass substrate and the silver halide emulsion layer; metal silver image having a maximum optical density of 1.0 or more. |
| 11/06/2001 | US6312856 Half-tone phase shift mask for fabrication of poly line |
| 11/06/2001 | US6312855 To resolve the corner round problem occurred in an unexposed edge area caused by diffraction or scattering of light. |
| 11/06/2001 | US6312854 Method of patterning sub-0.25 lambda line features with high transmission, “attenuated” phase shift masks |
| 11/01/2001 | WO2001081999A1 Active reticle, method for making same, ion projecting lithography method using same and equipment therefor |
| 11/01/2001 | WO2001081998A1 Ceramic supports and methods |
| 11/01/2001 | US20010036715 Method and apparatus for producing rectangular contact holes utilizing side lobe formation |
| 11/01/2001 | US20010036602 Controlling photoresist exposure to actinic radiation |
| 11/01/2001 | US20010036588 Mask carrier having masks having different aperture patterns to be imaged onto respective areas of the substrate, and mask assembly projects different patterns at different times; partitioning into sub-areas allows smaller exposure fields |
| 11/01/2001 | US20010036583 Semitransparent phase shifting (SPS) mask has in the periphery pattern element area, a light shielding portion formed by a SPS portion and a transparent portion with optimal size combination; prevents double exposure |
| 11/01/2001 | US20010036582 Comprising a rectangular portion, and band-shaped portions separated from opposite sides of the rectangular portion by an equal distance and parallel to the sides; overlay shift accurately obtained even when photoresist heat shrinks |
| 11/01/2001 | US20010036581 Photolithography; positioning an exposure mask and an object to be processed to locate the object in a region where near-field light is present, and controlling light intensity as a function of aperture density of the mask |
| 10/31/2001 | EP1150171A2 Group connection of reticle sub-shapes to reduce line shortening and improve pattern fidelity |
| 10/31/2001 | EP1150164A2 Method and apparatus for producing rectangular contact holes utilizing side lobe formation |
| 10/31/2001 | EP1150163A2 Mask for optical projection system and process for making it |
| 10/31/2001 | EP1150162A2 Exposure method and exposure apparatus using near-field light and exposure mask |
| 10/31/2001 | DE10021096A1 Mask for optical projection system used to fabricate semiconductor devices - has dummy structure spaced apart from all image structures and of differing transparency and phase rotation |
| 10/31/2001 | CN1319783A Method for isolating raster from electrostatic discharge |
| 10/31/2001 | CN1074165C Optical mask with vernier |
| 10/31/2001 | CN1074139C Half-tone type phase shift mask and method for fabricating the same |
| 10/30/2001 | US6311319 Solving line-end shortening and corner rounding problems by using a simple checking rule |
| 10/30/2001 | US6309976 Critical dimension controlled method of plasma descum for conventional quarter micron and smaller dimension binary mask manufacture |
| 10/30/2001 | US6309808 Heat mode recording element |
| 10/30/2001 | US6309800 Irradiating a mask to enlarge circuit pattern |
| 10/30/2001 | US6309799 Process for producing a printing form |
| 10/30/2001 | US6309781 Photomask provided with an ESD-precluding envelope |
| 10/30/2001 | US6309780 Attenuated phase shift mask and a method for making the mask |
| 10/25/2001 | US20010034877 Photomask pattern shape correction method and corrected photomask |
| 10/25/2001 | US20010033996 Electronically controlled universal phase-shifting mask for stepper exposure method and system |
| 10/25/2001 | US20010033995 Electron device manufacturing method, a pattern forming method, and a photomask used for those methods |
| 10/25/2001 | US20010033979 Intensity is alterred using subresolution assist which transmits radiation |
| 10/25/2001 | US20010033977 Useful in photolithography, capable of forming rectangular mask pattern with high accuracy |
| 10/25/2001 | US20010033976 Mask used in reduction projection exposure in photolithography |
| 10/25/2001 | US20010033975 Transforming a pattern of multi-project mask to semiconductor wafer by photolithography, then chemical mechanical polishing and etching; dies are separated into dummy and main patterns by scribing lines, edges protected from damage |
| 10/25/2001 | US20010033634 High contrast ratio membrane mask |
| 10/24/2001 | CN1073719C Point-to-point photoetch method and system used for producing circular optical grating code disk |
| 10/23/2001 | US6306558 Method of forming small contact holes using alternative phase shift masks and negative photoresist |
| 10/23/2001 | US6306549 Method for manufacturing EAPSM-type masks used to produce integrated circuits |
| 10/23/2001 | US6306547 Photomask and manufacturing method thereof, and exposure method using the photomask |
| 10/18/2001 | WO2001076872A1 A method and an apparatus for controlling light intensity in connection with the exposure of photosensitive material |
| 10/18/2001 | US20010031426 Lithographic printing method using a low surface energy layer |
| 10/18/2001 | US20010031406 Enables multiple device patterns to be arranged on photsensitive substrate with high accuracy; thin film magnetic heads |
| 10/18/2001 | US20010031404 Removable, reusable cover, mask does not etch in plasma environment which removes photoresist |
| 10/18/2001 | DE10017767A1 Verfahren zur Herstellung von Masken für die Fertigung von Halbleiterstrukturen A process for the production of masks for the fabrication of semiconductor structures |
| 10/17/2001 | EP1146393A2 Process for producing photomasks for making semi-conductor patterns |
| 10/17/2001 | EP1146392A1 Method for on-site preparation of a relief image |
| 10/17/2001 | EP1145081A1 Method for determining rotational error portion of total misalignment error in a stepper |
| 10/17/2001 | CN1318157A Fabrication of sub-micron etch-resistant metal/semiconductor structures using resistless electron beam lithography |
| 10/16/2001 | US6303277 Pattern forming method and method of manufacturing device having fine pattern |
| 10/16/2001 | US6303262 Photomask material, photomask and methods for the production thereof |
| 10/16/2001 | US6303253 Defining hierarchy of inner bands adjacent and inside edges and ends of mask structure within photolithographic mask, defining hierarchy of outer bands adjacent and outside edges and ends of mask structure changing a transparency; altering |
| 10/16/2001 | US6303252 Reticle having assist feature between semi-dense lines |
| 10/16/2001 | US6303251 At shape selection step, rectangular shapes are divided into a dense rectangular shape group and a non-dense rectangular shape group; at correction process selection step, a correction process suited for selected shape group is selected |
| 10/16/2001 | US6303196 Pellicle |
| 10/11/2001 | WO2001075943A2 Methods and structures for protecting reticles from esd failure |
| 10/11/2001 | WO2001075522A1 Fabrication of ultra-low expansion silicon mask blanks |
| 10/11/2001 | WO2001020502A9 Optimal phase conflict removal for layout of alternating phase-shifting masks |
| 10/11/2001 | WO2001011427A3 Dust cover/pellicle for a photomask |
| 10/11/2001 | US20010028991 Semiconductors; integrated circuits; lasers |
| 10/11/2001 | US20010028986 Forming image segments in a mask transfer layer on a substrate, inspecting for defects, repairing defects, removing mask transfer layer |
| 10/11/2001 | US20010028985 Masking |
| 10/11/2001 | US20010028984 Electron beam exposure mask and pattern designing method thereof |
| 10/11/2001 | US20010028983 Radiation transparent substrate; forming pattern |