| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 01/24/2002 | DE10030695C1 Verfahren und Vorrichtung zur Analyse von Strukturen einer Fotomaske Method and apparatus for the analysis of structures of a photomask |
| 01/23/2002 | EP1174764A2 Assist features for use in lithographic projection |
| 01/22/2002 | US6341009 Laser delivery system and method for photolithographic mask repair |
| 01/22/2002 | US6340631 Method for laying out wide metal lines with embedded contacts/vias |
| 01/22/2002 | US6340543 Photomask, manufacturing method thereof, and semiconductor device |
| 01/22/2002 | US6340542 Transferring the selected function-block patterns sequentially to the wafer, thereby forming a desired pattern thereon by photolithography |
| 01/22/2002 | US6340541 Mask for recycling and fabrication method thereof |
| 01/17/2002 | WO2002005147A1 Integrated circuit design correction using fragment correspondence |
| 01/17/2002 | WO2002005145A1 Convergence technique for model-based optical and proximity correction |
| 01/17/2002 | WO2002005032A1 Method of manufacturing integrated circuit |
| 01/17/2002 | US20020007481 Apparatus and method of correcting layout pattern data, method of manufacturing semiconductor devices and recording medium |
| 01/17/2002 | US20020006734 Manufacturing method of semiconductor integrated circuit device |
| 01/17/2002 | US20020006732 Semiconductor device and method for manufacturing the same |
| 01/17/2002 | US20020006583 Solution includes a photosensitive material and a plurality of masking particles within the photosenstive material; screen printing the solution over a substrate |
| 01/17/2002 | US20020006563 Calculating exposure dose at specified regions of the sensitive substrate to determine expected proximity effects at the specified regions; mathematical equations; making microelectronics |
| 01/17/2002 | US20020006562 Plate pattern forming method and its inspecting method |
| 01/17/2002 | US20020006557 Masking particles within photosensitive material |
| 01/17/2002 | US20020006556 Low thermal distortion extreme-UV lithography reticle |
| 01/17/2002 | US20020006555 Resist film patterns are partly formed over substrate in addition to metal patterns to shorten time required to change or correct mask pattern |
| 01/17/2002 | US20020006554 Semi-transparent dummy structure increases depth of focus |
| 01/17/2002 | US20020006553 Reducing line width difference due to pattern density without applying a load; lithographic process for multiplexing exposure |
| 01/17/2002 | US20020005937 Rotational mask scanning exposure method and apparatus |
| 01/17/2002 | US20020005542 Manufacturing method of semiconductor integrated circuit device, and semiconductor integrated circuit device |
| 01/17/2002 | US20020005051 Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same |
| 01/17/2002 | DE10032979A1 Inspection instrument for extreme UV lithographic masks and multi-layer mirrors, includes mirror deflecting primary EUV beam normally onto object |
| 01/16/2002 | EP1172692A2 Phase shift mask blank, phase shift mask, and methods of manufacture |
| 01/16/2002 | EP1171799A1 Projection lithography photomask blanks, preforms and method of making |
| 01/16/2002 | EP1171798A1 Method and apparatus for monitoring electrostatic discharge effects |
| 01/16/2002 | EP1171292A1 Process for direct digital printing of circuit boards |
| 01/15/2002 | US6339217 Scanning probe microscope assembly and method for making spectrophotometric, near-field, and scanning probe measurements |
| 01/15/2002 | US6338924 Transparent support with a mask, exposure to light, shading film, apertures and fillers |
| 01/15/2002 | US6338923 Photolithography mask having monitoring marks and manufacturing method thereof |
| 01/15/2002 | US6338922 Optimized alternating phase shifted mask design |
| 01/15/2002 | US6338921 Masking and image patterns, substrate radiation transparent, forming segments and layers |
| 01/10/2002 | WO2002003141A2 Network-based photomask data entry interface and instruction generator for manufacturing photomasks |
| 01/10/2002 | WO2002003140A1 Phase shift masking for complex patterns |
| 01/10/2002 | WO2002003139A2 Phase-shift lithography mapping method and apparatus |
| 01/10/2002 | WO2002003138A2 Transmission and phase balance for phase-shifting mask |
| 01/10/2002 | US20020004714 Method and apparatus for application of proximity correction with unitary segmentation |
| 01/10/2002 | US20020004181 Microminiaturization semiconductors, integrated circuits |
| 01/10/2002 | US20020004175 Generic phase shift masks |
| 01/10/2002 | US20020004174 Uniform integrated circuits |
| 01/10/2002 | US20020004173 Cutting, flattening silicon oxyfluoride glass tube |
| 01/10/2002 | US20020004100 Method of uniformly coating a substrate |
| 01/10/2002 | US20020003211 Nanometer scale data storage device and associated positioning system |
| 01/09/2002 | EP1170343A1 Infrared sensitive coating liquid |
| 01/09/2002 | EP1170121A1 Direct-to-plate flexographic printing plate precursor |
| 01/09/2002 | EP1169850A1 Narrow band, anisotropic stochastic halftone patterns and methods of creating and using the same |
| 01/08/2002 | US6337479 Object inspection and/or modification system and method |
| 01/08/2002 | US6337172 Applying photoresist to insulating layer of semiconductor device structure; exposing photoresists at differfent areas of the semiconductor device to radiation; removing photoresist and insulating layer |
| 01/08/2002 | US6337164 Charged-particle-beam microlithography methods exhibiting improved pattern-feature accuracy, and device manufacturing methods comprising same |
| 01/08/2002 | US6337161 Semiconductor |
| 01/08/2002 | US6336965 Modified pigments having improved dispersing properties |
| 01/03/2002 | WO2002001294A1 Apparatus and method for compensating critical dimension deviations across photomask |
| 01/03/2002 | WO2002001293A2 Photomask and method for increasing image aspect ratio while relaxing mask fabrication requirements |
| 01/03/2002 | WO2002001292A1 Device and method for cleaning articles used in the production of semiconductor components |
| 01/03/2002 | WO2001075943A3 Methods and structures for protecting reticles from esd failure |
| 01/03/2002 | US20020001964 Method for fabricating a stencil mask |
| 01/03/2002 | US20020001764 Forming channels in photomask; scanning |
| 01/03/2002 | US20020001760 Preferential positioning of coating on reticle; adjusting emission; heat exchanging |
| 01/03/2002 | US20020001759 Generation laser beams; phase shifting |
| 01/03/2002 | US20020001758 Optical proximity correction |
| 01/03/2002 | US20020001086 Method and apparatus for accurately compensating both long and short term fluctuations in the refractive index of air in an interferometer |
| 01/03/2002 | US20020001071 Method of correcting projection optical system and method of manufacturing semiconductor device |
| 01/03/2002 | US20020000557 Method of deforming a pattern and semiconductor device formed by utilizing deformed pattern |
| 01/03/2002 | US20020000424 Method and device for removing an unnecessary film |
| 01/03/2002 | US20020000287 Protective film transfer sheet for photo masks and a method for transferring a protective film using the same |
| 01/03/2002 | DE10014919A1 Photolithographic mask e.g. for manufacturing DRAMs, comprises region with alternating phase mask and second region with trim mask for exposure of photosensitive layer |
| 01/02/2002 | EP1166183A1 Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
| 01/01/2002 | US6335981 Photomask pattern correcting method and photomask corrected by the same and photomask pattern correcting device |
| 01/01/2002 | US6335635 Programmable reticle stitching |
| 01/01/2002 | US6335260 Method for improving the dimple phenomena of a polysilicon film deposited on a trench |
| 01/01/2002 | US6335151 Micro-surface fabrication process |
| 01/01/2002 | US6335146 Exposure apparatus and method |
| 01/01/2002 | US6335130 Fabricating a phase shifting mask comprising at least one unattentuated, halftoned, phase-shift feature; off-axis illuminating mask such that light passes through mask onto material |
| 01/01/2002 | US6335129 Method for repairing pattern defect, photo mask using the method, and semiconductor device manufacturing method employing the photo mask |
| 01/01/2002 | US6335128 Generating a first mask/reticle to define a phase-shifting region to define boundaries of a structure in a first layer of the integrated circuit, generating second mask/reticle to define second region to define boundaries of structure |
| 01/01/2002 | US6335127 Charged beam mask having strut wider than charged beam, with shape that matches charged beam |
| 01/01/2002 | US6335126 Method of manufacturing a pellicle |
| 01/01/2002 | US6335125 Photomask and method of manufacturing same |
| 01/01/2002 | US6335124 Phase shift mask and phase shift mask blank |
| 12/27/2001 | WO2001098838A2 Method of forming optical images, mask for use in this method, method of manufacturing a device using this method, and apparatus for carrying out this method |
| 12/27/2001 | WO2001098831A1 Radiation-sensitive composition for black resist |
| 12/27/2001 | WO2001098830A2 Modification of mask layout data to improve mask fidelity |
| 12/27/2001 | WO2001042855A3 Lithography device which uses a source of radiation in the extreme ultraviolet range and multi-layered mirrors with a broad spectral band in this range |
| 12/27/2001 | WO2001001469A3 Process for designing a mask |
| 12/27/2001 | US20010055416 Defect inspection method and defect inspection apparatus |
| 12/27/2001 | US20010055104 Exposure method and apparatus |
| 12/27/2001 | US20010055033 Reduction processing method and computer readable storage medium having program stored thereon for causing computer to execute the method |
| 12/27/2001 | US20010054697 Test method of mask for electron-beam exposure and method of electron-beam exposure |
| 12/25/2001 | US6334209 Method for exposure-mask inspection and recording medium on which a program for searching for portions to be measured is recorded |
| 12/25/2001 | US6333961 Reflection masks, microlithography apparatus using same, and integrated circuit manufacturing methods employing same |
| 12/25/2001 | US6333485 Method for minimizing sample damage during the ablation of material using a focused ultrashort pulsed beam |
| 12/25/2001 | US6333284 As substrate for photomask |
| 12/25/2001 | US6333213 Method of forming photomask and method of manufacturing semiconductor device |
| 12/25/2001 | US6333130 Method and apparatus for correcting defects in photomask |
| 12/25/2001 | US6333129 Light shield film pattern |
| 12/20/2001 | WO2001097096A1 Integrated verification and manufacturability tool |
| 12/20/2001 | WO2001097048A1 Integrated verification and manufacturability tool |
| 12/20/2001 | WO2001096955A2 A method and apparatus for etching metal layers on substrates |