| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 02/28/2002 | DE10039644A1 Lochmaske und Verfahren zur Herstellung einer Lochmaske Shadow mask and method of manufacturing a shadow mask |
| 02/28/2002 | DE10039337A1 Kombination von abtastenden und abbildenden Methoden bei der Überprüfung von Photomasken Combination of scanning and imaging methods in the review of photomasks |
| 02/28/2002 | DE10038928A1 Photolithographische Maske Photolithographic mask |
| 02/27/2002 | EP1182505A2 Device and process for exposing a radiation-sensitive coating using charged particles and mask therefor |
| 02/27/2002 | EP1182504A2 Phase shift mask blank, phase shift mask, and methods of manufacture |
| 02/27/2002 | EP1182133A1 Stern tube sealing apparatus |
| 02/27/2002 | CN1337600A Phase shifting mask etching process of producing T-shaped grid through one photo-etching step |
| 02/26/2002 | US6351515 High contrast ratio membrane mask |
| 02/26/2002 | US6350977 Pattern distortion detecting method and apparatus and recording medium for pattern distortion detection |
| 02/26/2002 | US6350555 Direct write imaging medium |
| 02/26/2002 | US6350549 Jig for producing pellicle and method for producing pellicle using the same |
| 02/26/2002 | US6350547 Oxide structure having a finely calibrated thickness |
| 02/26/2002 | CA2171472C Presensitized lithographic printing plate and method for preparing lithographic printing plate |
| 02/21/2002 | WO2002015242A1 Method of producing semiconductor integrated circuit device and method of producing multi-chip module |
| 02/21/2002 | WO2002014951A2 Shadow mask and method for producing a shadow mask |
| 02/21/2002 | WO2002014846A2 Multiple beam inspection apparatus and method |
| 02/21/2002 | WO2001067502A3 Method and apparatus for milling copper interconnects in a charged particle beam system |
| 02/21/2002 | WO2001061409A3 Apparatus and method of cleaning reticles for use in a lithography tool |
| 02/21/2002 | US20020022185 Shade pattern; photolithography |
| 02/21/2002 | US20020022184 Shade pattern; photolithography |
| 02/21/2002 | US20020021781 X-ray mask, and exposure method and apparatus using the same |
| 02/21/2002 | US20020021434 Evaluation mask, focus measuring method and aberration measuring method |
| 02/21/2002 | US20020020220 Apparatus and method for measuring internal stress of reticle membrane |
| 02/20/2002 | EP1180251A1 Wafer alignment |
| 02/20/2002 | CN1337012A Multilayer attenuating phase-shift masks |
| 02/20/2002 | CN1079548C Method for forming photoresist patterns |
| 02/19/2002 | US6348357 Exposure apparatus with a pulsed laser |
| 02/19/2002 | US6348298 Radiation sensitive composition |
| 02/19/2002 | US6348288 Resolution enhancement method for deep quarter micron technology |
| 02/19/2002 | US6348287 Multiphase phase shifting mask |
| 02/14/2002 | WO2002013277A1 Method of producing tft array |
| 02/14/2002 | WO2002013227A1 Sheet beam test apparatus |
| 02/14/2002 | WO2002012959A1 Photolithographic mask |
| 02/14/2002 | WO2001042996A3 Design of photomasks for semiconductor device fabrication |
| 02/14/2002 | WO2000046643A9 Masks for use in optical lithography below 180 nm |
| 02/14/2002 | US20020019968 Method and apparatus for verifying mask pattern data according to given rules |
| 02/14/2002 | US20020019729 Visual inspection and verification system |
| 02/14/2002 | US20020019305 Using electron beam radiation to produce high energy beam sensitive-glass that possesses essential properties of a true gray level |
| 02/14/2002 | US20020018964 Method of fabricating a suspended micro-structure with a sloped support and a suspended microstructure fabricated by the method |
| 02/14/2002 | US20020018963 Laser imaged printing plates |
| 02/14/2002 | US20020018946 Wherein lowering of brightness is suppressed in a plasma display panel |
| 02/14/2002 | US20020018942 Vacuum ultraviolet transmitting direct deposit vitrified silicon oxyfluoride lithography glass photomask blanks |
| 02/14/2002 | US20020018941 Lithography; thin film covering pattern of absorptive material |
| 02/14/2002 | US20020018857 Process and apparatus for coating on printing cylinders |
| 02/14/2002 | US20020018599 Mask data correction apparatus, fourier transformation apparatus, up sampling apparatus, down sampling apparatus, method of manufacturing transfer mask, and method of manufacturing device having pattern structure |
| 02/14/2002 | US20020017621 Device and method for combining scanning and imaging methods in checking photomasks |
| 02/14/2002 | DE10057438A1 Detecting ability to project images of integrated circuits onto alternating phase masks involves identifying phase conflict if contacts with degenerate regions is odd |
| 02/14/2002 | DE10057437A1 Detecting ability to project images of integrated circuits onto alternating phase masks involves identifying phase conflict if contacts with degenerate regions is odd |
| 02/13/2002 | EP1179748A2 Combination of imaging and scanning methods for checking reticles |
| 02/13/2002 | EP1178961A2 Apparatus and methods for collecting global data during a reticle inspection |
| 02/13/2002 | EP1178889A1 Gravure short run printing plate |
| 02/12/2002 | US6346986 Non-intrusive pellicle height measurement system |
| 02/12/2002 | US6346352 Quartz defect removal utilizing gallium staining and femtosecond ablation |
| 02/07/2002 | WO2002011175A1 Methods to predict and correct resist heating during lithography |
| 02/07/2002 | US20020016015 Microelectronic-device fabrication method |
| 02/07/2002 | US20020015900 Using actinic radiation |
| 02/07/2002 | US20020015899 Optically transferring lithography patterns |
| 02/07/2002 | US20020015187 Halftone phase shifting photomask and blanks for halftone phase shifting photomask therefor and a method for forming pattern by using the halftone phase shifting photomask |
| 02/07/2002 | US20020015164 Method for producing multicolor printing |
| 02/07/2002 | US20020015141 Exposure apparatus with a pulsed laser |
| 02/07/2002 | US20020014403 Method of fabricating reflective mask, and methods and apparatus of detecting wet etching end point and inspecting side etching amount |
| 02/06/2002 | EP1177911A1 Photosensitive recording element and method of preparation thereof |
| 02/06/2002 | EP1177479A1 Streamlined ic mask layout optical and process correction through correction reuse |
| 02/06/2002 | EP1177429A2 Reticle for use in photolithography and methods for making same and inspecting |
| 02/06/2002 | EP1177428A1 Inspection systems performing two-dimensional imaging with line light spot |
| 02/06/2002 | EP0664033B1 Rasterizer for a pattern generation apparatus |
| 02/05/2002 | US6344896 Method and apparatus for measuring positional shift/distortion by aberration |
| 02/05/2002 | US6344303 Subjecting at least one side of the support to a corona discharge treatment to modify the surface; dust removing treatment; image forming layer contains a resin containing a hydroxy, carboxylic or sulfonic acid group |
| 02/05/2002 | US6344298 Use of masks to write gratings in used in optical waveguides |
| 02/05/2002 | CA2182145C Thin-metal lithographic printing members with visible tracking layers |
| 01/31/2002 | WO2002009152A2 Method for determining the ability to project images of integrated semiconductor switching circuits onto alternating phase masks |
| 01/31/2002 | WO2002007926A1 Method and apparatus for removing minute particles from a surface |
| 01/31/2002 | WO2002007925A1 Method and apparatus for removal of minute particles from a surface using thermophoresis to prevent particle redeposition |
| 01/31/2002 | US20020013069 Reticle chuck in exposure apparatus and semiconductor device manufacturing method using the same |
| 01/31/2002 | US20020012885 Multi-level optical structure and method of manufacture |
| 01/31/2002 | US20020012859 Using both light beam exposure pattern and electron beam pattern |
| 01/31/2002 | US20020012855 Etching silicon layer; forming silicide |
| 01/31/2002 | US20020012854 Method to produce equal sized features in microlithography |
| 01/31/2002 | US20020012853 Electron beam writing pattern; transfer pattern high resolution |
| 01/31/2002 | US20020012852 Stencil mask for electron beam projection lithography and fabrication method |
| 01/31/2002 | US20020012851 Exposure of a photoresist coated semiconductor to three different intensity of light |
| 01/31/2002 | US20020011574 Charged beam exposure apparatus having blanking aperture and basic figure aperture |
| 01/31/2002 | DE10122678A1 Mask data correction device with graphic correction stage generates transfer mask pattern shape for use in manufacturing process so as to prevent faults anticipated during manufacture |
| 01/30/2002 | EP1176466A1 Halftone phase shift photomask and blanks for halftone phase shift photomask for producing it |
| 01/30/2002 | EP1176465A2 A ternary photomask and method of making the same |
| 01/30/2002 | EP1175660A1 Method and apparatus for inspecting reticles implementing parallel processing |
| 01/30/2002 | EP1175642A1 Improved method and apparatus for submicron ic design using edge fragment tagging |
| 01/29/2002 | US6343370 Apparatus and process for pattern distortion detection for semiconductor process and semiconductor device manufactured by use of the apparatus or process |
| 01/24/2002 | WO2002006899A2 Method for characterizing optical systems using holographic reticles |
| 01/24/2002 | WO2002006897A2 Dry multilayer inorganic alloy thermal resist film for lithographic processing and image creation |
| 01/24/2002 | US20020010904 Reduced disk access for complex mask generation |
| 01/24/2002 | US20020009890 Manufacturing method of active matrix substrate |
| 01/24/2002 | US20020009843 Method for repairing pattern by laser and laser-based pattern repair apparatus |
| 01/24/2002 | US20020009676 Patterning layer of negative photoresist; miniaturization |
| 01/24/2002 | US20020009675 Method for reducing photolithographic steps in a semiconductor interconnect process |
| 01/24/2002 | US20020009673 Laser imaged printing plates |
| 01/24/2002 | US20020009672 Direct-to-plate flexographic printing plate precursor |
| 01/24/2002 | US20020009653 Phase shifter film and process for the same |
| 01/24/2002 | US20020008860 Reticle system for measurement of effective coherence factors |
| 01/24/2002 | US20020007907 Pellicle and method of using the same |