| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 03/27/2002 | EP1190238A1 Method of and apparatus for inspection of articles by comparison with a master |
| 03/27/2002 | CN1341512A Seal-making equipment and its function change-over mechanism, exposition device and seal-making object detection device |
| 03/27/2002 | CN1081804C Phase shift mask and method for fabricating the same |
| 03/26/2002 | US6363296 System and method for automated defect inspection of photomasks |
| 03/26/2002 | US6363166 Automated photomask inspection apparatus |
| 03/26/2002 | US6362871 Lithographic apparatus |
| 03/26/2002 | US6361910 Straight line defect detection |
| 03/26/2002 | US6361908 Layout designing method of a display device |
| 03/26/2002 | US6361907 Exposing method in which different kinds of aligning and exposing apparatuses are used |
| 03/26/2002 | US6361904 Method for repairing the shifter layer of an alternating phase shift mask |
| 03/26/2002 | US6361903 Method for predicting pattern width on semiconductor wafer and method for correcting mask pattern therethrough |
| 03/26/2002 | CA2098844C Method of cloning printed wiring boards |
| 03/21/2002 | WO2002023581A1 Apparatus for inspecting mask |
| 03/21/2002 | WO2002023272A1 Dual layer reticle blank and manufacturing process |
| 03/21/2002 | WO2001095031A3 Imageable element and waterless printing plate |
| 03/21/2002 | WO2001063864A3 Chromeless alternating phase-shift reticle for producing semiconductor device features |
| 03/21/2002 | US20020035461 Visual analysis and verification system using advanced tools |
| 03/21/2002 | US20020034695 Manufacturing method of a phase shift mask, method of forming a resist pattern and manufacturing method of a semiconductor device |
| 03/21/2002 | US20020034694 Phaseshift mask and manufacturing the same |
| 03/21/2002 | US20020033936 Projection exposure method and apparatus |
| 03/21/2002 | DE10111709A1 Manufacturing method for semiconductor device involves transferring basic pattern to first process, measuring dimension of transfer pattern and correcting optical distortion for every region |
| 03/21/2002 | DE10042929A1 OPC-Verfahren zum Erzeugen von korrigierten Mustern für eine Phasensprungmaske und deren Trimmmaske sowie zugehörige Vorrichtung und integrierte Schaltungsstruktur OPC-procedures for generating corrected patterns for a phase shifting mask and the trim mask, and associated apparatus and integrated circuit structure |
| 03/20/2002 | EP1189242A2 X-ray exposure apparatus and method, semiconductor manufacturing apparatus and microstructure |
| 03/20/2002 | EP1189111A1 Production device for printed board, production method for printed board and printed board |
| 03/20/2002 | EP1189110A2 Method of making a multi-level reticle using bi-level photoresist, including a phase-shiffed multi-level reticle |
| 03/20/2002 | EP1188723A1 Synthetic quartz glass and method of production |
| 03/20/2002 | CN1340742A Pattern forming material and forming method, and manufacture method of mask for exposure |
| 03/19/2002 | US6360134 Method for creating and improved image on a photomask by negatively and positively overscanning the boundaries of an image pattern at inside corner locations |
| 03/19/2002 | US6358899 Linear fluoroalkylsulfonic acid (or salt) anionic surfactant; cleaning glass or chromium photomask substrates |
| 03/19/2002 | US6358668 Photopolymer layer, barrier layer and polymer |
| 03/14/2002 | WO2002021582A1 Transfer mask, method of dividing pattern of transfer mask, and method of manufacturing transfer mask |
| 03/14/2002 | WO2002021218A1 Phase-shift masks and methods of fabrication |
| 03/14/2002 | WO2002021217A1 Vacuum ultraviolet transmitting direct deposit vitrified silicon oxyfluoride lithography glass photomask blanks |
| 03/14/2002 | WO2002021210A1 Halftone phase shift photomask and blank for halftone phase shift photomask |
| 03/14/2002 | WO2001042964A3 Method and apparatus for structure prediction based on model curvature |
| 03/14/2002 | WO2001040869A3 Mask design and method for controlled profile fabrication |
| 03/14/2002 | WO2001027695A3 Removable cover for protecting a reticle, system including and method of using the same |
| 03/14/2002 | US20020032899 Method and apparatus for modifying flattened data of designed circuit pattern |
| 03/14/2002 | US20020031712 Photomask making method and alignment method |
| 03/14/2002 | US20020031711 Multi-level lithography masks |
| 03/14/2002 | US20020030800 Method of forming optical images, mask for use in this method, method of manufacturing a device using this method, and apparatus for carrying out this method |
| 03/14/2002 | US20020030796 Photolithographic process for producing etched patterns on the surface of fine tubes, wires, or other three dimensional structures |
| 03/14/2002 | US20020030236 A semiconductor device with an improved gate electrode pattern and a method of manufacturing the same |
| 03/14/2002 | US20020030034 Forming sequentially phase shifter layer and opaque shield layer, defining phase shifter layer and opaque shield layer, etching, etching substrate and exposing a portion of the substrate, etching |
| 03/14/2002 | US20020029956 Method and apparatus for removing minute particles from a surface |
| 03/14/2002 | DE10106430A1 Verfahren zum Ausbilden eines Halbleitervorrichtungsmusters, Verfahren zur Konstruktion eines Photomaskenmusters, Photomaske und Prozeß für eine Photomaske A method for forming a semiconductor device pattern, method of designing a photomask pattern for a photomask and photomask process |
| 03/13/2002 | EP1185903A1 Method of manufacturing a device by means of a mask and phase-shifting mask for use in said method |
| 03/13/2002 | EP1007362B1 Method for mounting printing plates on sleeves and for mounting the resultant sleeves on flexographic printing machine cylinders |
| 03/13/2002 | CN1080896C Masks for lithographic patterning using off-axis illumination |
| 03/12/2002 | US6356340 Piezo programmable reticle for EUV lithography |
| 03/12/2002 | US6355503 Method for producing square contact holes utilizing side lobe formation |
| 03/12/2002 | US6355395 Tack-free and exhibits outstanding ink acceptace; flexography |
| 03/12/2002 | US6355387 Method of making a mask pattern |
| 03/12/2002 | US6355385 Providing a silicon substrate comprising an active silicon layer on silicon support portion; forming a wet-etching mask; wet-etching the silicon support portion, exposed in the openings; forming protective film; annealing, removing film |
| 03/12/2002 | US6355384 Lithographic mask |
| 03/12/2002 | US6355383 Electron-beam exposure system, a mask for electron-beam exposure and a method for electron-beam exposure |
| 03/12/2002 | US6355382 Photomask and exposure method using a photomask |
| 03/12/2002 | US6355381 Forming etch stop layer on a substrate; forming a silicon layer; forming silicon members from silicon layer and a plurality of reflective regions between silicon members, converting to absorption members by forming nickel silicide |
| 03/07/2002 | US20020028523 Process for making photomask pattern data and photomask |
| 03/07/2002 | US20020028396 X-rays absorber as etching barrier |
| 03/07/2002 | US20020028395 Method of manufacturing a photomask |
| 03/07/2002 | US20020028394 Method for manufacturing a membrane mask |
| 03/07/2002 | US20020028393 Optical proximity correction method utilizing serifs having variable dimensions |
| 03/07/2002 | US20020028392 Lithography |
| 03/07/2002 | US20020028391 Method for formation of semiconductor device pattern, method for designing photo mask pattern, photo mask and process for photo mask |
| 03/07/2002 | US20020028390 Techniques for fabricating and packaging multi-wavelength semiconductor laser array devices (chips) and their applications in system architectures |
| 03/07/2002 | US20020028322 Mask for the selective growth of a solid, a manufacturing method for the mask, and a method for selectively growing a solid using the mask |
| 03/07/2002 | US20020027974 X-ray exposure method including M-shell and/or L-shell absorption edges at predetermined wavelengths |
| 03/07/2002 | US20020027662 Method and apparatus for optical system coherence testing |
| 03/07/2002 | US20020027647 Photolithographic system for exposing a wafer using a programmable mask |
| 03/07/2002 | DE10132435A1 Mask formation method for micro-lenses such as anamorphic lens, involves exposing photosensitive material using ultraviolet/electron beam to write pattern onto photosensitive material |
| 03/07/2002 | DE10041040A1 Vorrichtung und Verfahren zur Belichtung einer strahlungsempfindlichen Schicht mittels geladener Teilchen sowie Maske hierfür Apparatus and method for exposing a radiation-sensitive layer by means of charged particles as well as mask for this |
| 03/06/2002 | EP1184722A2 OPC-process for patterns of a phase shifting mask and a trim mask, corresponding apparatus and integrated circuit device |
| 03/06/2002 | EP1183722A1 Apparatus and method for reducing differential sputter rates |
| 03/06/2002 | CN1080458C Mask for detecting defect |
| 03/05/2002 | US6353219 Object inspection and/or modification system and method |
| 03/05/2002 | US6352816 Printing and PCB members and methods for producing same |
| 03/05/2002 | US6352803 Mask substrate including single layer substrate composed of low thermal expansion material, at least one layer of material on front side of substrate, at least one layer of material on back side of substrate |
| 03/05/2002 | US6352802 Mask for electron beam exposure and method of manufacturing semiconductor device using the same |
| 03/05/2002 | US6352801 Mask comprising phase shifter constructed of gadolinium gallium garnet serving as second light transmissive region formed on substrate which is transmissive to exposure light |
| 03/05/2002 | US6352800 Reticle for use in exposing semiconductor, method of producing the reticle, and semiconductor device |
| 02/28/2002 | WO2002016517A2 Fluoroalkyl (meth)acrylate copolymer coating compositions |
| 02/28/2002 | WO2002016306A2 Degradable, amorphous, fluoroacrylate polymers |
| 02/28/2002 | US20020026628 Pattern defect checking method and device |
| 02/28/2002 | US20020026627 Streamlined IC mask layout optical and process correction through correction reuse |
| 02/28/2002 | US20020026626 Optical proximity correction |
| 02/28/2002 | US20020026624 Correction of layout pattern data during semiconductor patterning process |
| 02/28/2002 | US20020026621 Method of layout compaction |
| 02/28/2002 | US20020025496 Plate making film, plate making ink, plate making method using the film, and plate making system using the film |
| 02/28/2002 | US20020025492 Composite relief image printing elements |
| 02/28/2002 | US20020025480 Calibration pattern |
| 02/28/2002 | US20020025479 Resolution |
| 02/28/2002 | US20020025478 Phase shift mask blank, phase shift mask, and methods of manufacture |
| 02/28/2002 | US20020025019 Exposure method |
| 02/28/2002 | US20020024643 Projection exposure apparatus having aberration measurement device |
| 02/28/2002 | US20020024019 Mask defect checking method and device for electron beam exposure |
| 02/28/2002 | US20020024011 Method for correcting opaque defects in reticles for charged-particle-beam microlithography, and reticles produced using same |
| 02/28/2002 | US20020023907 Laser correction method and apparatus |
| 02/28/2002 | US20020023903 Ultrashort pulsed laser micromachining/submicromachining using an acoustooptic scanning device with dispersion compensation |
| 02/28/2002 | US20020023902 Method and apparatus for removal of minute particles from a surface using thermophoresis to prevent particle redeposition |