| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 04/23/2002 | US6377870 Device and method for delivering various transparent substrates into a high-precision measuring instrument |
| 04/23/2002 | US6376849 Charged particle beam exposure apparatus mask and charged particle beam exposure apparatus |
| 04/23/2002 | US6376264 Test photomask and method for investigating ESD-induced reticle defects |
| 04/23/2002 | US6376139 Exposure amount and a focus value are set in transferring a circuit pattern on a mask onto a resist formed on a wafer by the exposure apparatus |
| 04/23/2002 | US6376132 Mask for electron beam exposure, manufacturing method for the same, and manufacturing method for semiconductor device |
| 04/23/2002 | US6376131 Methods and structures for protecting reticles from ESD failure |
| 04/23/2002 | US6376130 Substrate with triangular light transmission zones |
| 04/23/2002 | US6376096 Nanochannel glass replica membranes |
| 04/23/2002 | US6375870 Replicating a nanoscale pattern |
| 04/18/2002 | WO2002031544A1 Method for forming color filter, method for forming light emitting element layer, method for manufacturing color display device comprising them, or color display device |
| 04/18/2002 | WO2001071426A3 Apparatus for generating a laser pattern on a photomask and associated methods |
| 04/18/2002 | WO2000066969A9 Interferometry system having a dynamic beam-steering assembly for measuring angle and distance |
| 04/18/2002 | US20020046392 Method for detecting and automatically eliminating phase conflicts on alternating phase masks |
| 04/18/2002 | US20020045136 Method of design and fabrication of integrated circuits using regular arrays and gratings |
| 04/18/2002 | US20020045134 Improve resolution of patterns; reduce size difference of patterns in the coarse region and fine region; improve size accuracy of patterns existing at the boundary of the coarse region and fine region. |
| 04/18/2002 | US20020045110 Photomask fabrication method, photomask, and exposure method thereof |
| 04/18/2002 | US20020045109 Mask for beam exposure having membrane structure and stencil structure and method for manufacturing the same |
| 04/18/2002 | US20020045108 Reflection photomasks including buffer layer comprising group VIII metal, and methods of fabricating and using the same |
| 04/18/2002 | US20020045106 Isolated areas that contrast with a background and represent features to be printed, arranged generally in an array; and a plurality of assist features smaller than said isolated areas and positioned so as to make said array more symmetric. |
| 04/18/2002 | US20020045105 Forming a mask by providing a photosensitive material; performing at least one pass to write a pattern onto the photosensitive material; and developing the photosensitive material. |
| 04/18/2002 | US20020044277 Image pickup apparatus and defect inspection system for photomask |
| 04/18/2002 | US20020043725 Manufacturing process for semiconductor device, photomask, and manufacturing apparatus for semiconductor device |
| 04/18/2002 | US20020043615 Optical proximity effect correcting method and mask data forming method in semiconductor manufacturing process, which can sufficiently correct optical proximity effect, even under various situations with regard to size and shape of design pattern, and space width and position relation between design patterns |
| 04/17/2002 | EP1197802A2 Optical proximity correction |
| 04/17/2002 | EP1196948A2 Process for designing a mask |
| 04/17/2002 | CN1345085A Monocrystalline silicon wafer crystal orientation calibrating method |
| 04/16/2002 | US6374396 Correction of field effects in photolithography |
| 04/16/2002 | US6373976 Method and apparatus to accurately correlate defect coordinates between photomask inspection and repair systems |
| 04/16/2002 | US6373619 Pattern generator with improved address resolution |
| 04/16/2002 | US6373071 Real-time prediction of proximity resist heating and correction of raster scan electron beam lithography |
| 04/16/2002 | US6372642 Method for patterning semiconductor devices with a resolution down to 0.12 μm on a silicon substrate using oxynitride film and deep UV lithography |
| 04/16/2002 | US6372405 Method, article and composition for limiting particle aggregation in a mask deposited by a colloidal suspension |
| 04/16/2002 | US6372404 For producing lithographic mask |
| 04/16/2002 | US6372393 Removable, reusable cover, mask does not etch in plasma environment which removes photoresist |
| 04/16/2002 | US6372392 Having porous layer on surface of substrate; higher transmissivity in deep ultraviolet radiation wavelength, without having to coat any foreign materials |
| 04/16/2002 | US6372391 Template mask lithography utilizing structured beam |
| 04/16/2002 | US6372390 Photo mask with an ESD protective function |
| 04/11/2002 | WO2002029491A1 Method for high yield reticle formation |
| 04/11/2002 | US20020042906 Apparatus for and method of preparing pattern data of electronic part |
| 04/11/2002 | US20020042470 Protective coatings; water and oil repellents |
| 04/11/2002 | US20020042025 Method of preparing barrier rib master pattern for barrier rib transfer and method of forming barrier ribs |
| 04/11/2002 | US20020042010 When critical dimension is reduced to first reference value, serif/hammerhead is added to pattern, when critical dimension is reduced to second reference value, assist feature is added, corrected pattern transferred to wafer with improved fidelity |
| 04/11/2002 | US20020042007 Fabrication method of semiconductor integrated circuit device |
| 04/11/2002 | US20020042006 Scattering-reticle assemblies for electron-beam microlithography including a scattering-stencil reticle portion and a scattering-membrane reticle portion |
| 04/11/2002 | US20020042005 Technique of exposing a resist using electron beams having different accelerating voltages, and method of manufacturing a photomask using the technique |
| 04/11/2002 | US20020040986 Semiconductor device having a dummy pattern |
| 04/11/2002 | DE10044257A1 Verfahren zum Erzeugen von Masken-Layout-Daten für die Lithografiesimulation und von optimierten Masken-Layout-Daten sowie zugehörige Vorrichtung und Programme A method for generating mask data for the layout and lithography simulation of the optimized mask layout data, and associated apparatus and programs |
| 04/10/2002 | EP1195645A1 Protective layers for photocurable elements |
| 04/10/2002 | EP1194816A1 Method for producing a digitally imaged screen for use in a screen printing process |
| 04/10/2002 | EP1194814A1 Mask manufacturing methods comprising patterns to control corner rounding |
| 04/10/2002 | EP1194813A1 Phase-shift photomask for patterning high density features |
| 04/10/2002 | EP1194803A1 Broad band ultraviolet catadioptric imaging system |
| 04/10/2002 | EP1194731A1 Interferometric apparatus and method that compensate refractive index fluctuations |
| 04/10/2002 | EP0956516B1 Method and apparatus for the production of a structure by focused laser radiation on a photosensitively coated substrate |
| 04/09/2002 | US6370441 Method and apparatus of correcting design-patterned data, method of electron beam and optical exposure, method of fabricating semiconductor and photomask devices |
| 04/09/2002 | US6369888 Method and apparatus for article inspection including speckle reduction |
| 04/09/2002 | US6369379 Scanning probe microscope assembly and method for making confocal, spectrophotometric, near-field, and scanning probe measurements and associated images |
| 04/09/2002 | US6368942 Method for fabricating an ultra-low expansion mask blank having a crystalline silicon layer |
| 04/09/2002 | US6368774 Radiation sensitive composition |
| 04/09/2002 | US6368756 Forming optic patterns |
| 04/09/2002 | US6368755 Masks for use in optical lithography below 180 nm |
| 04/09/2002 | US6368754 Overcoating wafer with photoresist; adjust mask |
| 04/09/2002 | US6368753 Lithography |
| 04/09/2002 | US6368752 Low stress hard mask formation method during refractory radiation mask fabrication |
| 04/09/2002 | US6368683 Pellicle for photolithography |
| 04/09/2002 | US6368516 Semiconductor manufacturing methods |
| 04/09/2002 | US6367381 Laser imaged printing plates comprising a multi-layer slip film |
| 04/04/2002 | WO2002027404A2 Mitigation of multilayer defects on a reticle |
| 04/04/2002 | WO2002027288A1 Improved system for scatterometric measurements and applications |
| 04/04/2002 | WO2002027073A1 Method for producing metal mask and metal mask |
| 04/04/2002 | WO2002006897A3 Dry multilayer inorganic alloy thermal resist film for lithographic processing and image creation |
| 04/04/2002 | WO2001065315A3 Method and apparatus for mixed-mode optical proximity correction |
| 04/04/2002 | US20020040468 Pattern correcting method and pattern verifying method |
| 04/04/2002 | US20020039841 Patterning method, thin film transistor matrix substrate manufacturing method, and exposure mask |
| 04/04/2002 | US20020039692 Photomask |
| 04/04/2002 | US20020039691 Production of a regular configuration of resist dots or holes; at least one photomask is a phase mask; useful for production of MRAM memories, having elliptically shaped magnetic memory elements of high density. |
| 04/04/2002 | US20020039690 Phase shift film is composed primarily of a metal and silicon and has a film stress of not more than 100 MPa. |
| 04/04/2002 | US20020039689 Light shielding film is a single layered or multiple layered film which has a layer of tantalum. |
| 04/04/2002 | US20020038557 Synthetic qurtz glass and method of production |
| 04/03/2002 | EP1193553A2 Exposure method, exposure apparatus, x-ray mask, semiconductor device and microstructure |
| 04/03/2002 | EP1193552A2 Process for establishing mask lay-out data for simulating a lithographic process and for defining an optimized mask lay-out data; corresponding equipment and programs |
| 04/02/2002 | US6366640 X-ray mask blank, X-ray mask and method for manufacturing the same |
| 04/02/2002 | US6366639 X-ray mask, method of manufacturing the same, and X-ray exposure method |
| 04/02/2002 | US6365326 Pattern density tailoring for etching of advanced lithographic mask |
| 04/02/2002 | US6365305 Polycaprolactone crystalline polymer and polyester thermoplastic polymer; vinyl acrylic copolymer deformable cushion layer; reduced mottle: lower lamination temperatures; better adhesion between colors |
| 04/02/2002 | US6365303 Electrostatic discharge damage prevention method on masks |
| 03/28/2002 | WO2002025373A2 Method of design and fabrication of integrated circuits using regular arrays and gratings |
| 03/28/2002 | WO2001065317A3 Method for evaluation of reticle image using aerial image simulator |
| 03/28/2002 | US20020038445 Method and program for processing design pattern of semiconductor intergrated circuit |
| 03/28/2002 | US20020037625 Method of producing exposure mask |
| 03/28/2002 | US20020037477 System and method of creating prism line patterns for a laser foil die |
| 03/28/2002 | US20020037459 Method of and apparatus for designing EB mask |
| 03/28/2002 | US20020037099 Pattern inspection apparatus and pattern inspection method |
| 03/28/2002 | US20020036772 Defect inspection apparatus for phase shift mask |
| 03/28/2002 | US20020036273 Methods for manufacturing reticles for charged-particle-beam microlithography exhibiting reduced proximity effects, and reticles produced using same |
| 03/28/2002 | US20020036264 Sheet beam-type inspection apparatus |
| 03/28/2002 | DE10039645A1 Mask for ion beams used during structuring substrates consists of a silicon wafer with a perforated pattern and a metal coating on the side facing the ion beams for stopping ion beams and deflecting heat |
| 03/27/2002 | EP1191399A2 Method of and apparatus for designing EB mask |
| 03/27/2002 | EP1190434A1 Real-time prediction of proximity resist heating and correction of raster scan electron beam lithography |
| 03/27/2002 | EP1190276A2 Coatings on reflective mask substrates |