| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 05/28/2002 | US6395433 Photomask for projection lithography at or below about 160 nm and a method thereof |
| 05/28/2002 | US6395432 Forming semiconductor using mask; detection radiation intensity profile |
| 05/28/2002 | US6395102 Applying a gas, exhaustion, measurement the particle count, placing the reticle in a stepper |
| 05/28/2002 | US6394109 Method and apparatus for removing carbon contamination in a sub-atmospheric charged particle beam lithography system |
| 05/23/2002 | WO2002041080A2 Process for reducing edge roughness in patterned photoresist |
| 05/23/2002 | WO2002041077A2 Attenuating extreme ultraviolet (euv) phase-shifting mask fabrication method |
| 05/23/2002 | WO2002041076A2 Photolithographic mask |
| 05/23/2002 | WO2002016517A3 Fluoroalkyl (meth)acrylate copolymer coating compositions |
| 05/23/2002 | US20020062206 Method and apparatus for fast aerial image simulation |
| 05/23/2002 | US20020061471 Exposing predetermined pattern through a phase-shift mask while moving at least one of said phase-shift mask and substrate by a constant distance along an optical axis |
| 05/23/2002 | US20020061452 Phase shift mask blank, phase shift mask, and method for manufacturing the same |
| 05/23/2002 | US20020060297 Substrate for a transfer mask, transfer mask, and method of manufacturing the transfer mask |
| 05/23/2002 | DE10144894A1 Half tone type phase shift mask blank manufacturing method for photolithography, involves implementing thermal treatment of translucent film at specified temperature |
| 05/22/2002 | EP1206743A1 Software based method for simultaneously associating multiple, ordered collections of pages with multiple impositions |
| 05/22/2002 | CN1350321A Method for manufacturing semiconductor integrated circuit device |
| 05/22/2002 | CN1085351C Water base female pattern pre-coating photosensitive plate and making method and usage thereof |
| 05/21/2002 | US6392793 High NA imaging system |
| 05/21/2002 | US6392792 Method of fabricating reflection-mode EUV diffraction elements |
| 05/21/2002 | US6392230 Focused ion beam forming method |
| 05/21/2002 | US6391791 Dry-etching method and apparatus, photomasks and method for the preparation thereof, and semiconductor circuits and methods for the fabrication thereof |
| 05/21/2002 | US6391790 Supplying radio frequency and biasing power; etching silicon based material with hydrogen-free fluorocarbon gas; semiconductors, integrated circuits |
| 05/21/2002 | US6391745 Method for forming overlay verniers for semiconductor devices |
| 05/21/2002 | US6391502 Photolithographic process for producing etched patterns on the surface of fine tubes, wires or other three dimensional structures |
| 05/21/2002 | US6391501 Pattern generating method and apparatus |
| 05/21/2002 | US6391500 Border portion between transparent and opaque portions includes some coated patterned structures; smoothness, roundness; photolithography |
| 05/21/2002 | US6391499 Incident light transmitting and shielding regions; multilayer semi-transmitting region comprised of indium tin oxide over chromium oxidel; liquid crystal displays; photolithography |
| 05/16/2002 | US20020058400 Method for manufacturing a semiconductor device, stencil mask and method for manufacturing the same |
| 05/16/2002 | US20020058348 Pattern formation method using two alternating phase shift masks |
| 05/16/2002 | US20020058196 Uv-absorbing support layers and flexographic printing elements comprising same |
| 05/16/2002 | US20020058188 Method for rescuing levenson phase shift mask from abnormal difference in transmittance and phase difference between phase shifter and non-phase shifter |
| 05/16/2002 | US20020058187 Method of correcting mask patterns |
| 05/16/2002 | US20020058186 Method for manufacturing phase shift mask blank and method for manufacturing phase shift mask |
| 05/16/2002 | US20020057427 Method and apparatus for article inspection including speckel reduction |
| 05/16/2002 | US20020056403 Having attached groups, such as polymeric groups, onto the pigment by means other than adsorption. |
| 05/16/2002 | US20020056205 Alignment marks |
| 05/15/2002 | EP1204902A1 Apparatus and method for compensating critical dimension deviations across photomask |
| 05/15/2002 | CN1349246A Semiconductor integrated circuit device mfg. method, and its mask making method |
| 05/15/2002 | CN1349131A Mask used for beam exposing, and mfg. method therefor |
| 05/15/2002 | CN1084680C Device for making seal |
| 05/14/2002 | US6388747 Inspection method, apparatus and system for circuit pattern |
| 05/14/2002 | US6388736 Imaging method using phase boundary masking with modified illumination |
| 05/14/2002 | US6387602 Apparatus and method of cleaning reticles for use in a lithography tool |
| 05/14/2002 | US6387594 Radiation transparent substrate overcoated with polymer |
| 05/14/2002 | US6387574 Substrate for transfer mask and method for manufacturing transfer mask by use of substrate |
| 05/14/2002 | US6387573 Phase shift mask using CrAION as phase shifter material and manufacturing method thereof |
| 05/14/2002 | US6387572 Low CTE substrate for reflective EUV lithography |
| 05/10/2002 | WO2002037537A2 Phase transition design to maintain constant line length through focus |
| 05/10/2002 | WO2002037182A2 Method and apparatus for creating photolithographic masks |
| 05/10/2002 | WO2001037042A3 Exposure masks |
| 05/09/2002 | US20020056074 System and method for generating a flat mask design for projecting a circuit pattern to a spherical semiconductor device |
| 05/09/2002 | US20020055048 For transferring a pattern onto a photosensitive layer by a photolithography process |
| 05/09/2002 | US20020054981 Applying imagewise an insolubilizing chemical to the coating for imaging a printing plate having a coating comprising diazo compounds |
| 05/09/2002 | US20020054702 Automated photomask inspection apparatus |
| 05/09/2002 | US20020053748 Phaseshift mask and manufacturing the same |
| 05/08/2002 | EP1203223A1 Methods for the automated testing of reticle feature geometries |
| 05/08/2002 | DE10141423A1 Verfahren und Gerät zur Prüfung auf Musterfehler Method and apparatus for testing for pattern defects |
| 05/08/2002 | DE10141422A1 Verfahren zur Prüfung auf Maskenfehler und Gerät zur Elektronenstrahlbelichtung Method to check for errors and mask device for electron beam exposure |
| 05/08/2002 | CN1348553A Method for patterning thin films |
| 05/08/2002 | CN1084485C Optical mask with developing rate measuring pattern and method for measuring development rate uniformity |
| 05/07/2002 | US6383847 Partitioned mask layout |
| 05/07/2002 | US6383718 Photomask and pattern forming method employing the same |
| 05/07/2002 | US6383692 Flexographic printing plate precursor comprising a (photo)thermographic recording layer |
| 05/07/2002 | US6383691 Dimensioned to provide individual images separate from all others; lithography; semiconductors; line extends and intersects all features |
| 05/07/2002 | US6383690 Platemaking system and method using an imaging mask made from photochromic film |
| 05/07/2002 | US6383689 Fine resist pattern comprising plurality of opaque patterns and transparent opening pattern; uniform thickness; semiconductors |
| 05/02/2002 | US20020052122 Polypropylene and a triclosan sodium salt physically trapped within the fibers |
| 05/02/2002 | US20020052100 Photomask and method for manufacturing the same |
| 05/02/2002 | US20020052088 Method of manufacturing photomask, photomask, and method of manufacturing semiconductor integrated circuit device |
| 05/02/2002 | US20020051943 Method of manufacturing an electronic device and a semiconductor integrated circuit device |
| 05/02/2002 | US20020051916 Using a dose corresponding to the loading effect due to a desired pattern which is calculated from a relationship represented as the convolution of a Gaussian distribution and a loading density |
| 05/02/2002 | US20020051915 Manufacturing apparatus for printed boards, manufacturing method of printed boards and the printed board |
| 05/02/2002 | US20020051913 Method and apparatus for making photomasks with improved inside corner resolution |
| 05/02/2002 | US20020051566 Defect inspection apparatus and method |
| 05/02/2002 | US20020050655 Method for adding features to a design layout and process for designing a mask |
| 05/02/2002 | EP1202119A1 Method and apparatus for fast aerial image simulation |
| 05/02/2002 | EP1200988A2 Method and apparatus for milling copper interconnects in a charged particle beam system |
| 05/02/2002 | EP1010316B1 Mounting film transparencies in a rotary drum scanner |
| 05/02/2002 | DE10144347A1 Vorrichtung und Verfahren zum Herstellen von Phasenverschiebungsmaskenrohlingen Apparatus and method for manufacturing the phase shift mask blanks |
| 05/02/2002 | DE10051134A1 Verfahren zur Feststellung und automatischen Behebung von Phasenkonflikten auf alternierenden Phasenmasken A method for detection and automatic correction of phase conflicts on alternating phase masks |
| 05/02/2002 | DE10048151A1 Photomaske und ihre Verwendung zum lithographischen Strukturieren einer Photoresistschicht und zum Herstellen von magnetischen Speicherelementen Photomask, and their use for the lithographic patterning of a photoresist layer and for the manufacture of magnetic memory elements |
| 05/01/2002 | CN1347012A Method and device for designing electron beam mask |
| 04/30/2002 | US6381300 Exposure mask, exposure mask manufacturing method, and semiconductor device manufacturing method using exposure mask |
| 04/30/2002 | US6379871 Method for fabricating a mask for a LIGA process |
| 04/30/2002 | US6379868 Lithographic process for device fabrication using dark-field illumination |
| 04/30/2002 | US6379851 Agglomerating flashes during energy beam lithography; defining cell upon impact of flash; writing subsequent flash; determination if termination; constructing library of standard cells; integrated circuits |
| 04/30/2002 | US6379849 Method for forming binary intensity masks |
| 04/30/2002 | US6379848 Generating photomask; cell includes test pattern and reference marker positioned to orient crosshair in microscope to evaluate degree of corner rounding; determination of pass/fail; semiconductors |
| 04/30/2002 | US6379847 Photolithography; computer controlled |
| 04/30/2002 | US6378433 Method for mounting printing plates on sleeves and for mounting the resultant sleeves on flexographic printing machine cylinders |
| 04/25/2002 | US20020048902 Method for forming overlay verniers for semiconductor devices |
| 04/25/2002 | US20020048708 For making a mask for optically transferring a lithographic pattern corresponding to an integrated circuit from the mask onto semiconductor substrate, using an optical exposure tool |
| 04/25/2002 | US20020048707 Controlled annular illumination |
| 04/25/2002 | US20020048341 X-ray exposure apparatus and method, semiconductor manufacturing apparatus, and microstructure |
| 04/25/2002 | US20020048018 Method for measuring coma aberration in optical system |
| 04/25/2002 | US20020047095 Method and device for correcting pattern film on a semiconductor substrate |
| 04/25/2002 | US20020047089 Optical proximity effect correcting method and mask data forming method in semiconductor manufacturing process, which can sufficiently correct optical proximity effect, even under various situations with regard to size and shape of design pattern, and space width and position relation between design patterns |
| 04/25/2002 | DE10051466A1 Mask arrangement for lithography, esp. EUV lithography, includes device for applying a potential difference between each electrode plate electrode and membrane mask |
| 04/24/2002 | EP1199651A2 Method for mask data verification and computer readable record medium recording the verification program |
| 04/24/2002 | EP1199605A1 Recording material having a pigment-coloured radiation-sensitive layer |
| 04/24/2002 | EP1199601A2 Photomask fabrication method, photomask, and exposure method thereof |