Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
04/2014
04/09/2014CN103713467A Mask set and method for detecting alignment precision by utilizing mask set
04/09/2014CN103713466A Mask plate and manufacturing method thereof
04/09/2014CN102569192B Method for manufacturing array substrate of semi-transmission and semi-reflection type liquid crystal display
04/09/2014CN101751502B Method and system for correcting window maximized optic proximity effect in photoetching process
04/08/2014US8694929 Method and apparatus for the position determination of structures on a mask for microlithography
04/08/2014US8694927 Method of designing pattern layouts
04/08/2014US8691479 Optical mask for forming pattern
04/08/2014US8691478 Attenuated phase shift mask for multi-patterning
04/08/2014US8691477 Reticle design for the reduction of lens heating phenomenon
04/08/2014US8691476 EUV mask and method for forming the same
04/03/2014WO2014051121A1 Light-exposure method and device, and device production method
04/03/2014WO2014050891A1 Reflective mask blank for euv-lithography and manufacturing method therefor, and reflective mask for euv-lithography and manufacturing method therefor
04/03/2014WO2014050831A1 Method for manufacturing substrate with multilayer reflective film
04/03/2014WO2014050700A1 Glass reprocessing method, remade glass substrate, and photo mask blank and photo mask employing same
04/03/2014WO2014047982A1 Colour filter substrate and related manufacturing method therefor
04/03/2014WO2014047740A1 Method for fabrication of nano-structures
04/03/2014US20140093814 Method for forming photomasks
04/02/2014CN103703418A Mask, and optical filter manufacturing apparatus comprising same
04/02/2014CN103703415A Method and apparatus for analyzing and for removing a defect of an euv photomask
04/02/2014CN103698973A Preparation method of flexible photoetching mask plate
04/02/2014CN103698972A Masking plate curing method and masking plate processing technology
04/02/2014CN103698971A Mask and manufacturing method thereof
04/02/2014CN103698970A Metal residue defect repairing method of mask plate for integrated circuit
04/02/2014CN103698969A Molding method of photoresist wall
04/02/2014CN103698968A Photoresistance wall forming method
04/02/2014CN103695842A Mask plate and production method thereof
04/02/2014CN102436138B Ultraviolet mask plate dry cleaning equipment
04/01/2014US8685633 Method for optimizing wafer edge patterning
04/01/2014US8685599 Method of intrinsic marking
04/01/2014US8685598 Pellicle and mask adhesive therefor
04/01/2014US8685597 Forming a bridging feature using chromeless phase-shift lithography
04/01/2014US8685596 Semi-transparent film grayscale mask
03/2014
03/27/2014WO2014046043A1 Substrate-case cleaning device
03/27/2014WO2014045990A1 PRODUCTION METHOD FOR SiO2-TiO2 GLASS AND PRODUCTION METHOD FOR PHOTOMASK SUBSTRATE COMPRISING SAID GLASS
03/27/2014US20140087292 Mask blank, transfer mask and method of manufacturing transfer mask
03/27/2014US20140087291 Method for forming pattern and method for producing original lithography mask
03/27/2014US20140087290 Manufacturing Method of Transparent Electrode and Mask Thereof
03/26/2014EP2711746A1 Diffraction grating manufacturing method, spectrophotometer, and semiconductor device manufacturing method
03/26/2014CN203502735U Device for producing graphic substrate
03/26/2014CN203502701U Substrate and mask panel
03/26/2014CN103688198A Diffraction grating manufacturing method, spectrophotometer, and semiconductor device manufacturing method
03/26/2014CN103681624A Overlay mark and method of forming the same
03/26/2014CN103676497A On-product focus offset metrology method and structure for use in semiconductor chip manufacturing
03/26/2014CN103676493A Mixed photolithography method capable of reducing line roughness
03/26/2014CN103676492A Electron beam photo-etching method
03/26/2014CN103676491A Method for reducing roughness of photoresist during electron beam lithography
03/26/2014CN103676490A Method for monitoring weak point forming reasons
03/26/2014CN103676469A Method for cleaning photomask and method for disassembling photomask protection film component
03/26/2014CN103676468A Photomask and manufacturing method thereof, transfer method and manufacturing method for flat-panel display
03/26/2014CN103676467A Metal-inlaid photo mask and manufacturing method therefor
03/26/2014CN103676466A Metallic-plastic multi-layered photomask and manufacturing method thereof
03/26/2014CN103676465A Mask board and method for forming via hole in organic insulating film
03/26/2014CN103676464A Photolithographic pattern for modeling and measurement method thereof
03/26/2014CN103676463A Design and OPC (optical proximity correction) optimization method of test patterns
03/26/2014CN103676462A Method of generating assistant feature
03/26/2014CN103676461A Beam shapers, annealing systems employing the same, methods of heat treating substrates and methods of fabricating semiconductor devices
03/26/2014CN103676460A Pellicle for EUV
03/26/2014CN103676459A Photomask device
03/26/2014CN102692831B Counterpoint mark and method for using same to manufacture workpieces in exposure process
03/26/2014CN102203907B Reflection-type mask blank for EUV lithography
03/26/2014CN101968605B Etching method and photomask blank processing method
03/25/2014US8683406 Method of defining shape and position of dummy active region by processing data using a patterning apparatus
03/25/2014US8679731 Semiconductor device manufacturing method
03/25/2014US8679707 Method of fabricating a lithography mask
03/25/2014US8679706 Photomask processing techniques
03/20/2014WO2014043120A1 Methods of manufacture of continuous resonant trap structures, supporting structures thereof, and devices using same
03/20/2014WO2014040304A1 Mask and manufacturing method therefor
03/20/2014US20140080042 Printable Laminates for Flexo Plates, Methods of Making, and Methods of Using
03/20/2014US20140078804 Mask Design With Optically Isolated Via and Proximity Correction Features
03/20/2014US20140076615 Array substrate and mask plate
03/19/2014EP2708921A1 Fuorite having excellent laser durability
03/19/2014CN103646854A Method for improving Cr mask based etching technology
03/19/2014CN103645603A Device and method for cleaning light mask plate
03/19/2014CN103645602A Porection thin film set for photolithography
03/19/2014CN103645601A Mask
03/19/2014CN102809896B Mask and photolithography method thereof
03/19/2014CN102519521B Phase displacement focal length detecting photomask, manufacture method and method for detecting focal length difference
03/19/2014CN102376606B Mask box provided with sensor
03/19/2014CN101278233B Process margin using discrete assist features
03/18/2014US8677290 Method of forming and using photolithography mask having a scattering bar structure
03/18/2014US8674329 Method and apparatus for analyzing and/or repairing of an EUV mask defect
03/18/2014US8673522 Method for manufacturing photomask and photomask manufactured using the same
03/18/2014US8673521 Blank substrates for extreme ultra violet photo masks and methods of fabricating an extreme ultra violet photo mask using the same
03/18/2014US8673520 Intensity selective exposure photomask
03/18/2014US8672563 Development method, method of manufacturing photomask, method of manufacturing semiconductor device and development device
03/13/2014WO2014038181A1 Mask data generating method, program and information processing apparatus for execution of the same
03/13/2014US20140072905 Positive resist composition, and resist film, resist-coated mask blank, resist pattern forming method and photomask each using the composition
03/13/2014US20140072904 Photomask, photomask set, exposure apparatus and exposure method
03/13/2014US20140072903 Technique for Repairing a Reflective Photo-Mask
03/13/2014US20140072902 Attenuated phase shift mask for multi-patterning
03/13/2014US20140069457 Apparatus And Method For Indirect Surface Cleaning
03/12/2014EP2706410A1 Semiconductor device and method of manufacturing the same
03/12/2014CN103631096A Source mask polarization optimization method based on Abbe vector imaging model
03/12/2014CN103631095A Dynamic electronic mask plate system used for preparing monolithic integration capacitive touch screen through collage method
03/12/2014CN103631094A Method of forming tight-pitched pattern
03/12/2014CN103631092A Formation method for semiconductor structure
03/12/2014CN103631085A Correction method for optical proximity correction model
03/12/2014CN103631084A Optical proximity correction method
03/12/2014CN103631083A Optical proximity correction focal plane selecting method
03/12/2014CN102866575B Manufacture method of phase-shift optical mask
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