| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 06/20/2002 | US20020076624 Determining proximity effect during patterning; integrated circuits; semiconductors; photolithography |
| 06/20/2002 | US20020076623 Photo mask to be used for photolithography, method of inspecting pattern defect, and method of manufacturing semiconductor device through use of the mask |
| 06/20/2002 | US20020076622 Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting mask |
| 06/20/2002 | US20020076621 Localized partial coherence control |
| 06/20/2002 | US20020076620 Structures and structure forming methods |
| 06/20/2002 | DE10064143A1 Reflexionsminderungsbeschichtung für Ultraviolettlicht bei großen Einfallswinkeln Antireflection coating for ultraviolet light at large angles of incidence |
| 06/19/2002 | EP1215512A2 Anti-reflection coating for ultraviolet light at large angles of incidence |
| 06/19/2002 | EP1214718A1 Extreme ultraviolet soft x-ray projection lithographic method system and lithography elements |
| 06/18/2002 | US6407385 Methods and apparatus for removing particulate foreign matter from the surface of a sample |
| 06/18/2002 | US6406819 Forming integrated circuits using phase shift mask |
| 06/18/2002 | US6406818 Adjusting tolerances |
| 06/18/2002 | US6406573 Pellicle frame and static bonding method for temporary and permanent attachment of pellicle frame to photomask substrate |
| 06/13/2002 | WO2002047172A1 A high frequency interconnect system using micromachined plugs and sockets |
| 06/13/2002 | WO2002047134A1 Stencil mask and manufacturing method thereof |
| 06/13/2002 | US20020073394 Methodology for increasing yield, manufacturability, and performance of integrated circuits through correction of photolithographic masks |
| 06/13/2002 | US20020073391 Semiconductor device having dummy pattern |
| 06/13/2002 | US20020071998 Forming a reticle by exposing a first portion of a photoresist layer to a first writing pattern, then exposing a second portion of the photoresist to a second writing pattern; photolithography |
| 06/13/2002 | US20020071997 OPC method for generating corrected patterns for a phase-shifting mask and its trimming mask and associated device and integrated circuit configuration |
| 06/13/2002 | US20020071996 Lithographic projection apparatus; includes beam shaping device, positioning device for moving the beam, and a sensor dependent on the number of charged particles impinging on a mark region of a mask |
| 06/13/2002 | US20020071994 Dividing the mask into partial areas, forming partial masks which have apertures with patterns identical with plurality of partial areas, exposing the patterns of masks on a mask substrate by electron beam proximity exposure method |
| 06/13/2002 | US20020071993 Improved resolution capability of photolithography machines |
| 06/13/2002 | US20020071107 Layout designing method of a dispaly device |
| 06/13/2002 | US20020070356 Electron beam proximity exposure apparatus and mask unit therefor |
| 06/13/2002 | US20020070354 Manufacturing method of mask for electron beam proximity exposure and mask |
| 06/13/2002 | US20020070345 Evacuation use sample chamber and circuit pattern forming apparatus using the same |
| 06/13/2002 | US20020070340 Apparatus for inspection of semiconductor wafers and masks using a low energy electron microscope with two illuminating beams |
| 06/13/2002 | US20020069777 Printing sleeves and cylinders applied with a photopolymer composition |
| 06/13/2002 | DE10061116A1 Fotoempfindliches flexographisches Druckelement mit mindestens zwei IR-ablativen Schichten A photosensitive flexographic printing element having at least two IR-ablative layers |
| 06/13/2002 | DE10061114A1 Fotoempfindliches flexographisches Druckelement mit Polyether-Polyurethane umfassender IR-ablativer Schicht A photosensitive flexographic printing element with polyether polyurethanes comprehensive IR-ablative layer |
| 06/12/2002 | EP1213618A1 Method and apparatus for detecting aberrations in an optical system |
| 06/12/2002 | EP1213616A2 Photosensitive flexographic printing element having an infrared ablatable layer comprising a polyether-polyurethane |
| 06/12/2002 | EP1213615A2 Photosensitive flexographic printing element having at least two infrared ablatable layers |
| 06/11/2002 | US6405153 Microscopic feature opacity measurement system |
| 06/11/2002 | US6404483 Substrate handler for use in lithographic projection apparatus |
| 06/11/2002 | US6403477 Method for correcting an optical proximity effect in an interconnect pattern by shortening the legs of cutout patterns to avoid linewidth reduction |
| 06/11/2002 | US6403413 Manufacturing method of semiconductor integrated circuit device having a capacitor |
| 06/11/2002 | US6403277 Diazo dyes and methods for their use |
| 06/11/2002 | US6403268 Reticles for charged-particle beam microlithography |
| 06/11/2002 | US6403267 Etching tranparent substrate to form trenches; treating with aqueous solution of ammonium hydroxide and hydrogen peroxide; photolithograpy; microminiaturized semiconductors and integrated circuits |
| 06/11/2002 | US6402886 Use of a chemically active reticle carrier for photomask etching |
| 06/06/2002 | WO2002045144A1 Wet-etching agent composition |
| 06/06/2002 | WO2002045014A2 Method and device for determining the properties of an integrated circuit |
| 06/06/2002 | WO2002044817A2 Making an integrated circuit using polarized light |
| 06/06/2002 | WO2002044812A2 Embedded attenuated phase shift mask and method of making embedded attenuated phase shift mask |
| 06/06/2002 | WO2002044699A2 Method and device for determining the properties of an integrated circuit |
| 06/06/2002 | WO2000068884A9 Method and apparatus for inspecting reticles implementing parallel processing |
| 06/06/2002 | US20020069398 Correcting method of mask and mask manufactured by said method |
| 06/06/2002 | US20020068462 Forming a carbon layer on at least a part of the material layer to prevent the part of the material layer from being etched; and wet-etching the material layer using an alkali solution. |
| 06/06/2002 | US20020068234 Recording material having a pigment-coloured radiation-sensitive layer |
| 06/06/2002 | US20020068229 Embedded attenuated phase shift mask and method of making embedded attenuated phase shift mask |
| 06/06/2002 | US20020068228 Irradiating opaque or semi-transmission film on a transparent substrate with an ion source to reduce stress |
| 06/06/2002 | US20020068227 Method and apparatus for making an integrated circuit using polarization properties of light |
| 06/06/2002 | US20020068226 Method for improving the performance of photolithographic equipment and for increasing the lifetime of the optics thereof |
| 06/06/2002 | US20020067478 Method of and apparatus for article inspection including speckle reduction |
| 06/06/2002 | US20020066870 Mask for electron beam projection lithography and method of fabricating the same |
| 06/06/2002 | US20020066463 Ultrasonic cleaner tank that the plane of the reticle membrane is oriented perpendicularly to the propagation direction of the waves from the transducer; stencil used in charged-particle-beam microlithography |
| 06/06/2002 | DE10151724A1 Verfahren und Vorrichtung zum Korrigieren eines Musterfilms auf einem Halbleitersubstrat Method and apparatus for correcting a pattern film on a semiconductor substrate |
| 06/06/2002 | DE10058216C1 Periodic structure spacing measuring method for semiconductor wafer or photomask uses distance between detected maxima in Fourier transformation of image of periodic structure |
| 06/06/2002 | DE10051577A1 Aufzeichnungsmaterial mit pigmentgefärbter strahlungsempfindlicher Schicht Recording material with pigment dyed radiation-sensitive layer |
| 06/05/2002 | EP1211558A1 Substrate selector |
| 06/05/2002 | CN1352855A Narrow band, anisotropic stochastic halftone patterns and methods for creating and using the same |
| 06/04/2002 | US6401236 Method to eliminate side lobe printing of attenuated phase shift |
| 06/04/2002 | US6401235 Method of and apparatus for producing exposure mask |
| 06/04/2002 | US6400839 Reticle inspecting apparatus capable of shortening an inspecting time |
| 06/04/2002 | US6399281 Composite relief image printing plates |
| 06/04/2002 | US6399261 Pattern generator with improved precision |
| 06/04/2002 | US6399258 Focusing laser beams |
| 06/04/2002 | US6399256 Reticle having accessory pattern divided into sub-patterns |
| 05/30/2002 | WO2002043139A2 Two mask via pattern to improve pattern definition |
| 05/30/2002 | WO2002042846A2 Fabrication of integrated circuit |
| 05/30/2002 | WO2001098838A3 Method of forming optical images, mask for use in this method, method of manufacturing a device using this method, and apparatus for carrying out this method |
| 05/30/2002 | WO2001046489A9 Ion beam modification of residual stress gradients in thin film polycrystalline silicon membranes |
| 05/30/2002 | WO2001009679B1 Method for producing photomasks |
| 05/30/2002 | US20020066069 Method for mask data verification and computer readable record medium recording the verification program |
| 05/30/2002 | US20020064716 For use in mixed mode photomask wherein binary mask curve and phase shift mask curve which reflect the relationship between critical dimensions of the photomask and original pattern are combined to create optical characteristic curve |
| 05/30/2002 | US20020064715 Increasing integration of semiconductor devices via narrowing the width of the pattern formed in the mask pattern and the distance between; photolithography; semiconductors; integrated circuits |
| 05/30/2002 | US20020064714 Mask for manufacturing semiconductor device and method of manufacture thereof |
| 05/30/2002 | US20020064713 Strong phase shift mask substrates |
| 05/29/2002 | EP1208349A1 Interferometers utilizing polarization preserving optical systems |
| 05/29/2002 | DE10144893A1 Phasenverschiebungsmaskenvorform, Phasenverschiebungsmaske und Verfahren zu ihrer Herstellung Phase shift mask blank, the phase shift mask and process for their preparation |
| 05/29/2002 | DE10144646A1 Phasenverschiebungsmaskenrohling, Photomaskenrohling, und Vorrichtung und Verfahren zum Herstellen von Rohlingen Phase shift mask blank, photomask blank, and apparatus and methods for the manufacture of blanks |
| 05/29/2002 | DE10133846A1 Method for determining the relative surface area of a serif of a characteristic of a photo-mask or pattern for producing integrated circuits resulting in improved quality control of integrated circuit photo-mask production |
| 05/29/2002 | DE10103958C1 Defect detection method for semiconductor exposure mask uses comparison of actual mask image with reference mask image |
| 05/29/2002 | CN1351721A Method for error reduction in lithography |
| 05/29/2002 | CN1085850C Half-tone type phase shift mask and method for fabrication thereof |
| 05/29/2002 | CN1085849C Method for producing optical mask |
| 05/28/2002 | US6397377 Method of performing optical proximity corrections of a photo mask pattern by using a computer |
| 05/28/2002 | US6397165 Microscopic corner radius measurement system |
| 05/28/2002 | US6396945 Image defect detection apparatus and method |
| 05/28/2002 | US6396944 Inspection method for Levenson PSM mask |
| 05/28/2002 | US6396943 Defect inspection method and defect inspection apparatus |
| 05/28/2002 | US6396900 Multilayer films with sharp, stable interfaces for use in EUV and soft X-ray application |
| 05/28/2002 | US6396158 Semiconductor device and a process for designing a mask |
| 05/28/2002 | US6396054 Scanning probe microscope assembly and method for making confocal, spectrophotometric, near-field, and scanning probe measurements and associated images |
| 05/28/2002 | US6395457 Method for manufacturing a semiconductor device |
| 05/28/2002 | US6395455 Low thermal distortion Extreme-UV lithography reticle and method |
| 05/28/2002 | US6395438 Masking design data; phase shifting; using computers |
| 05/28/2002 | US6395436 Covering, sealing during cleaning |
| 05/28/2002 | US6395435 Flexible optical transparent body; multilayer; surface with grooves |
| 05/28/2002 | US6395434 Phase shift mask and phase shift mask blank |