| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 07/11/2002 | US20020089340 Method for measuring reticle leveling in stepper |
| 07/11/2002 | US20020088951 Method and apparatus for detecting aberrations in an optical system |
| 07/11/2002 | US20020088772 Chemical imaging of a lithographic printing plate |
| 07/11/2002 | DE10063819A1 Maskenerstellung zur Herstellung einer Druckform Mask creation of producing a printing forme |
| 07/10/2002 | EP1221495A2 Magnetron sputtering system and photomask blank production method based on the same |
| 07/10/2002 | EP1221073A1 A photolithography mask having a subresolution alignment mark window |
| 07/10/2002 | EP1221072A1 Contact hole production by means of crossing sudden phase shift edges of a single phase mask |
| 07/10/2002 | CN1358280A Mask manufacturing methods comprising patterns to control corner rounding |
| 07/09/2002 | US6418553 Circuit designing method for semiconductor device and computer-readable medium |
| 07/09/2002 | US6418187 X-ray mask structure, and X-ray exposure method and apparatus using the same |
| 07/09/2002 | US6417927 Method and apparatus for accurately compensating both long and short term fluctuations in the refractive index of air in an interferometer |
| 07/09/2002 | US6417677 Antistatic conductive pin mounting apparatus for a photomask |
| 07/09/2002 | US6417091 Mask has pattern of rectangular shapes arranged longitudinally in rows spaced evenly apart and offset from the rectangular shapes in neighboring rows to define t-shapes connected to and offset from each other; simplification |
| 07/09/2002 | US6416931 Wherein lowering of brightness is suppressed in a plasma display panel |
| 07/09/2002 | US6416909 Alternating phase shift mask and method for fabricating the alignment monitor |
| 07/09/2002 | US6416907 Phase shift masks that reliably print densely-packed circuit layouts with small circuit features; reduced variation between print and circuit layouts; computer used to automate conversion of layout to phase shift mask; improved efficiency |
| 07/04/2002 | WO2002052622A1 Exposure mask, method for manufacturing the mask, and exposure method |
| 07/04/2002 | WO2002052621A1 Transfer mask blank, transfer mask and exposure method |
| 07/04/2002 | WO2002052347A1 Mitigation of radiation induced surface contamination |
| 07/04/2002 | WO2002052345A1 Method and device for mask cleaning, and device manufacturing system |
| 07/04/2002 | WO2002052344A2 Manufacturing integrated circuits using phase-shifting masks |
| 07/04/2002 | US20020086248 Varible surface hot plate for improved bake uniformity of substrates |
| 07/04/2002 | US20020086245 Method and apparatus for the manufacturing of reticles |
| 07/04/2002 | US20020086225 Optical proximity correction of pattern on photoresist |
| 07/04/2002 | US20020086224 For use in photolithography for fabricating semiconductor devices, image pick-up devices, display devices such as liquid crystal panels, and magnetic heads |
| 07/04/2002 | US20020086223 Photomask, the manufacturing method, a patterning method, and a semiconductor device manufacturing method |
| 07/04/2002 | US20020086222 Photomask and manufacturing method of an electronic device therewith |
| 07/04/2002 | US20020086221 Efficiency |
| 07/04/2002 | US20020086220 Using sputtering to continuously form the phase shift film on transparent substrate |
| 07/04/2002 | US20020086219 For fabricating a liquid crystal display |
| 07/04/2002 | US20020086218 For use in semiconductor integrated circuit (IC) manufacturing |
| 07/04/2002 | US20020085271 Broad spectrum ultraviolet catadioptric imaging system |
| 07/04/2002 | US20020085183 Purging gas from a photolithography enclosure between a mask protective device and a patterned mask |
| 07/04/2002 | US20020084425 Self-cleaning optic for extreme ultraviolet lithography |
| 07/04/2002 | US20020084331 Mask revision ID code circuit |
| 07/04/2002 | US20020083957 Translating the reticle within the lithography system; directing an ionized gas (especially N2) onto a mask surface of the reticle; and removing contaminants from the mask surface of the reticle. |
| 07/04/2002 | DE10143239A1 Verfahren zur Herstellung einer Membranmaske A method for producing a membrane mask |
| 07/04/2002 | DE10063113A1 Verfahren zur Erstellung von Druckvorlagen für Klischees und zur Klischeeherstellung Method for creating templates for clichés and plate making |
| 07/03/2002 | EP1220035A2 Pellicle |
| 07/03/2002 | EP1220034A2 Photomask blank and photomask |
| 07/03/2002 | EP1219575A1 Silica glass substrates and their selection |
| 07/03/2002 | EP1219417A2 Production of masks for the production of printing forms |
| 07/03/2002 | EP1218799A1 Shielding against external excitations while measuring oscillatory semiconductor membranes |
| 07/03/2002 | EP1218798A1 Method and apparatus for determining phase shifts and trim masks for an integrated circuit |
| 07/03/2002 | EP1218796A1 Extreme ultraviolet soft x-ray projection lithographic method and mask devices |
| 07/03/2002 | EP0960347B1 Phase mask with spatially variable diffraction efficiency |
| 07/03/2002 | CN1356592A Process for preparing light mask |
| 07/02/2002 | US6415431 Repair of phase shift materials to enhance adhesion |
| 07/02/2002 | US6415421 Integrated verification and manufacturability tool |
| 07/02/2002 | US6414744 Mask handling apparatus for lithographic projection apparatus |
| 07/02/2002 | US6413885 Method for patterning semiconductor devices on a silicon substrate using oxynitride film |
| 07/02/2002 | US6413700 Masked presensitized printing plate intermediates and method of imaging same |
| 07/02/2002 | US6413699 Layer of solid photocurable material comprises a phosphine compound as an oxygen scavenger |
| 07/02/2002 | US6413688 In which a detection ratio of pseudo defects in a pattern inspection process is lowered, so that the number of steps in the inspection process is lessened; semiconductors |
| 07/02/2002 | US6413684 Computer readable storage media; attenuation phase shifting |
| 07/02/2002 | US6413683 Developing a photomask layouts |
| 07/02/2002 | US6413682 Synthetic quartz glass substrate for photomask and making method |
| 07/02/2002 | US6413681 Microwave plasma vapor deposition |
| 06/27/2002 | WO2002050614A2 Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting mask |
| 06/27/2002 | WO2002050612A2 Method and system for improving stability of photomasks |
| 06/27/2002 | WO2002049841A2 Method for producing models for printing blocks and for producing said printing blocks |
| 06/27/2002 | WO2001084237A3 Semiconductor device fabrication using a photomask designed using modeling and empirical testing |
| 06/27/2002 | WO2001083388A8 Glass preform and methods and apparatus for manufacture thereof |
| 06/27/2002 | US20020083410 Resolving phase-shift conflicts in layouts using weighted links between phase shifters |
| 06/27/2002 | US20020083408 Generating mask layout data for simulation of lithographic processes |
| 06/27/2002 | US20020082789 Calibration plate having accurately defined calibration pattern |
| 06/27/2002 | US20020081943 Semiconductor substrate and lithographic mask processing |
| 06/27/2002 | US20020081532 Methodology to introduce metal and via openings |
| 06/27/2002 | US20020081531 Methodology to introduce metal and via openings |
| 06/27/2002 | US20020081507 Method for forming a vertical edge submicron through-hole and a thin film sample with this kind of through-hole |
| 06/27/2002 | US20020081506 Method for producing a semiconductor device |
| 06/27/2002 | US20020081502 Method of manufacturing photomask and method of manufacturing semiconductor integrated circuit device |
| 06/27/2002 | US20020081501 A photomask having a pattern formed with a resist on at least one face of a transparent plate, and the resist is not provided on the face atleast at a contact point with a photomask equipment |
| 06/27/2002 | US20020081500 First mask and the second mask define a transistor gate |
| 06/27/2002 | US20020081498 Lithography mask configuration |
| 06/27/2002 | US20020080348 Method of and apparatus for article inspection including speckle reduction |
| 06/27/2002 | US20020079467 Alignment-mark patterns defined on a stencil reticle and detectable, after lithographic transfer to a substrate, using an optical-based detector |
| 06/27/2002 | US20020078710 Silica glass substrates and their selection |
| 06/26/2002 | EP1066352B1 Modified pigments having improved dispersing properties |
| 06/26/2002 | CN1086811C Photomask for the measurement of resolution of exposure equipment |
| 06/25/2002 | US6411642 Techniques for fabricating and packaging multi-wavelength semiconductor laser array devices (chips) and their applications in system architectures |
| 06/25/2002 | US6411362 Rotational mask scanning exposure method and apparatus |
| 06/25/2002 | US6410211 Semiconductor; masking substrate with photoresist; patterning; exposure; development |
| 06/25/2002 | US6410208 Lithographic printing plates having a thermo-deactivatable photosensitive layer |
| 06/25/2002 | US6410193 Image contrast |
| 06/25/2002 | US6410192 Forming pattern |
| 06/25/2002 | US6410191 Phase-shift photomask for patterning high density features |
| 06/20/2002 | WO2002049082A2 Process of shaping a semiconductor substrate and/or a lithographic mask |
| 06/20/2002 | WO2002049080A2 Method and apparatus for inspecting a substrate |
| 06/20/2002 | WO2002048798A1 Self-compensating mark arangement for stepper alignment |
| 06/20/2002 | WO2002007926A8 Method and apparatus for removing minute particles from a surface |
| 06/20/2002 | WO2002006899A3 Method for characterizing optical systems using holographic reticles |
| 06/20/2002 | WO2000067074A9 Streamlined ic mask layout optical and process correction through correction reuse |
| 06/20/2002 | US20020078430 Manufacturing method of semiconductor device |
| 06/20/2002 | US20020078428 Optical proximity correction method |
| 06/20/2002 | US20020078427 Integrated circuit layout and verification method |
| 06/20/2002 | US20020076840 Test wafer and method for investigating electrostatic discharge induced wafer defects |
| 06/20/2002 | US20020076654 Pattern in chip areas of a photomask is transferred onto an internal area of a semiconductor wafer as ship areas including defects among the chip areas of the photomask are shielded with a light shielding body; shortens time |
| 06/20/2002 | US20020076626 Method of extending the stability of a photoresist during direct writing of an image upon the photoresist |
| 06/20/2002 | US20020076625 Substrate with multilayer film, reflection type mask blank for exposure, reflection type mask for exposure and production method thereof as well as production method of semiconductor device |