| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 08/06/2002 | US6430733 Contextual based groundrule compensation method of mask data set generation |
| 08/06/2002 | US6429931 Method and apparatus for article inspection including speckle reduction |
| 08/06/2002 | US6429058 Method of forming fully self-aligned TFT improved process window |
| 08/06/2002 | US6428943 Coating surface and agitating using mechanical vibration, ultrasonic or megasonic acoustic energy or standing wave |
| 08/06/2002 | US6428940 Method for pattern generation with improved image quality |
| 08/06/2002 | US6428939 Enhanced bright peak clear phase shifting mask and method of use |
| 08/06/2002 | US6428938 Phase-shift mask for printing high-resolution images and a method of fabrication |
| 08/06/2002 | US6428937 Methods for fabricating reticle blanks for use in making charged-particle-beam microlithography reticles, and reticle blanks and reticles formed using such methods |
| 08/06/2002 | US6428936 Method and apparatus that compensates for phase shift mask manufacturing defects |
| 08/06/2002 | US6427703 Oxidation of carbon deposits; semiconductors |
| 08/01/2002 | WO2002059694A1 A pellicle for use in small wavelength lithography and a method for making such a pellicule |
| 08/01/2002 | WO2002009152A3 Method for determining the ability to project images of integrated semiconductor switching circuits onto alternating phase masks |
| 08/01/2002 | WO2002003139A3 Phase-shift lithography mapping method and apparatus |
| 08/01/2002 | WO2001046706A3 Design-based reticle defect prioritization |
| 08/01/2002 | US20020103607 Method for inspecting defects on a mask |
| 08/01/2002 | US20020102750 Method for reducing borderless contact leakage by opc |
| 08/01/2002 | US20020102564 Photolithographic method and system for efficient mask usage in manufacturing DNA arrays |
| 08/01/2002 | US20020102479 Processor controls a display of an image on the electronically programmed mask, wherein the display replicates conventional type masks; optical contrast; characteristics easily changed or reprogrammed by the processor. |
| 08/01/2002 | US20020102478 Semitransparent phase shifting mask has, in the periphery of a pattern element area, a light shielding portion which is formed by a semitransparent phase shifting portion and a transparent portion with the optimal size combination. |
| 08/01/2002 | US20020102477 Semiconductor device manufacturing method |
| 08/01/2002 | US20020102476 Preparing a plurality of first photomasks including one or more resist masks; and transferring each pattern of said photomasks onto a second photomask by reduced projection exposure. |
| 08/01/2002 | US20020102474 Optical proximity correction method |
| 08/01/2002 | US20020102473 Completely-light-shielding Cr section of the scribe-line region assumes a light-shielding structure of self-aligned type; dicing mark section assumes a light-shielding structure of Cr setback type. |
| 08/01/2002 | US20020102472 Using an electrical test structure comprised of a cross resistor for van der Pauw sheet resistance measurements, a bridge resistor, and a split-bridge resistor |
| 08/01/2002 | US20020102471 Each of the active gate areas is associated with one of a number of active regions of a predefined circuit; includes a joined phase shifter defining two of the active gate areas, which extends between at least two of the active regions |
| 08/01/2002 | US20020102470 Information storage on masks for microlithographic tools |
| 08/01/2002 | US20020102469 Method for aligning a contact or a line to adjacent phase-shifter on a mask |
| 08/01/2002 | US20020102468 Method of forming an improved attenuated phase-shifting photomask |
| 08/01/2002 | US20020102015 Pellicle, identification system of the same, and method of identifying the same |
| 08/01/2002 | US20020101572 Projection exposure method and apparatus |
| 08/01/2002 | US20020100881 Charged particle beam lithography apparatus for forming pattern on semi-conductor |
| 08/01/2002 | US20020100164 Wiring substrate manufacturing method |
| 08/01/2002 | DE10164189A1 Halbton-Phasenverschiebungsmaske und -maskenrohling Halftone phase shift mask and -maskenrohling |
| 08/01/2002 | DE10100820A1 Verfahren zum Prüfen einer Belichtungsmaske A method of testing an exposure mask |
| 07/31/2002 | EP1227344A1 Antireflection base for ultraviolet and vacuum ultraviolet regions |
| 07/31/2002 | EP1226471A2 Removable cover for protecting a reticle, system including and method of using the same |
| 07/31/2002 | EP1226470A2 Method of forming optical images, mask for use in this method, method of manufacturing a device using this method, and apparatus for carrying out this method |
| 07/31/2002 | EP1226469A1 Trimming mask with semitransparent phase-shifting regions |
| 07/31/2002 | CN1361547A Thin film |
| 07/31/2002 | CN1361450A Optical proximity effect correcting method |
| 07/31/2002 | CN1361449A Thin film and producing method of thin film, and adhesive for thin film |
| 07/31/2002 | CN1088525C Photo mask and method for manufacturing the same |
| 07/30/2002 | US6427225 Method and apparatus for verification of a circuit layout |
| 07/30/2002 | US6426269 Dummy feature reduction using optical proximity effect correction |
| 07/25/2002 | WO2002057852A1 Fused silica pellicle |
| 07/25/2002 | WO2001098830A3 Modification of mask layout data to improve mask fidelity |
| 07/25/2002 | US20020100005 Integrated verification and manufacturability tool |
| 07/25/2002 | US20020100004 Selection of evaluation point locations based on proximity effects model amplitudes for correcting proximity effects in a fabrication layout |
| 07/25/2002 | US20020098427 Contact hole model-based optical proximity correction method |
| 07/25/2002 | US20020098424 Electrically programmable photolithography mask |
| 07/25/2002 | US20020098423 Electron beam projection mask |
| 07/25/2002 | US20020098422 Lithography mask blank and method of manufacturing the same |
| 07/25/2002 | US20020098421 Photolithography; photomask and integrated circuit development within same clean room |
| 07/25/2002 | US20020098420 Semiconductor photomask having increased durability, improved transmission uniformity, and birefringence properties |
| 07/25/2002 | US20020098283 Mounting a substrate inside an enclosed housing, passing a control gas through an inlet, depositing the polymer, spinning the substrate, and exhausting the control gas and any solvent vapor |
| 07/25/2002 | US20020096651 Charged particle beam lithography apparatus for forming pattern on semi-conductor |
| 07/25/2002 | US20020096647 Mask handling apparatus, lithographic projection apparatus, device manufacturing method and device manufactured thereby |
| 07/25/2002 | US20020096635 Mask defect repair method |
| 07/25/2002 | US20020096195 Pump for gas flow into tube or slot in juxtaposition with first end and surface to be cleaned, so gas flow forms shock wave to dislodge particles from surface of semiconductor wafers, reticles |
| 07/24/2002 | EP1225481A2 Collector for an illumination system with wavelength of 193 nm |
| 07/23/2002 | US6425117 System and method for performing optical proximity correction on the interface between optical proximity corrected cells |
| 07/23/2002 | US6425113 Integrated verification and manufacturability tool |
| 07/23/2002 | US6425112 Auto correction of error checked simulated printed images |
| 07/23/2002 | US6424882 Method for patterning and fabricating wordlines |
| 07/23/2002 | US6423479 Cleaning carbon contamination on mask using gaseous phase |
| 07/23/2002 | US6423455 Method for fabricating a multiple masking layer photomask |
| 07/18/2002 | WO2002056354A1 Method for forming a pattern and a semiconductor device |
| 07/18/2002 | WO2002056072A1 Method and system for manufacturing optical elements and optical element |
| 07/18/2002 | WO2001084236A3 Method for phase shift mask design, fabrication, and use |
| 07/18/2002 | US20020094680 Unlanded process in semiconductor manufacture |
| 07/18/2002 | US20020094495 Method for manufacture of fresnel lens sheet and method for manufacture of molding die for fresnel lens sheet |
| 07/18/2002 | US20020094492 Binary photomask with chrome regions that define non-critical dimension features and also protect for phase shift exposure of critical dimensions |
| 07/18/2002 | US20020094483 Pattern is transferred to photoresist on semiconductor wafer via reduction projection exposure to variety of waverlengths using photomask; photolithography |
| 07/18/2002 | US20020094482 Method and apparatus for lithographically printing tightly nested and isolated device features using multiple mask exposures |
| 07/18/2002 | US20020093719 Optical reticle substrate inspection apparatus and beam scanning method of the same |
| 07/18/2002 | US20020093110 Reticle and method of fabricating semiconductor device |
| 07/18/2002 | US20020092843 Variable surface hot plate for improved bake uniformity of substrates |
| 07/18/2002 | US20020092825 Creating a mask for producing a printing plate |
| 07/18/2002 | DE10100822A1 Plasma etching process used in manufacture of half tone phase masks comprises etching a pattern in a molybdenum-silicon compound layer using a chlorine compound |
| 07/17/2002 | EP1223607A1 Substrate for transfer mask, transfer mask, and method of manufacture thereof |
| 07/17/2002 | EP1222497A1 Uv-absorbing support layers and flexographic printing elements comprising same |
| 07/16/2002 | US6421820 Semiconductor device fabrication using a photomask with assist features |
| 07/16/2002 | US6421180 Apparatus for generating a laser pattern on a photomask and associated methods |
| 07/16/2002 | US6421122 Inspection method, apparatus and system for circuit pattern |
| 07/16/2002 | US6421111 Multiple image reticle for forming layers |
| 07/16/2002 | US6420224 Stepper alignment mark formation with dual field oxide process |
| 07/16/2002 | US6420077 Line width offsets due to proximity effect are eliminated by referring to the contact hole model. |
| 07/16/2002 | US6420075 Mask for manufacturing semiconductor device and method of manufacture thereof |
| 07/16/2002 | US6420074 Shrinking integrated circuit designs using a two mask process: a phase shift mask and a single phase structure mask; prevention of erasure of phase shifting regions and the creation of undesirable artifact regions; minimization |
| 07/16/2002 | US6420073 Fabricating optical elements using a photoresist formed from proximity printing of a gray level mask |
| 07/11/2002 | WO2002054461A1 Photomask unit, photomask device, projection exposure device, projection exposure method and semiconductor device |
| 07/11/2002 | WO2002054455A2 Variable surface hot plate for improved bake uniformity of substrates |
| 07/11/2002 | WO2002054151A2 A method for fabricating reticles |
| 07/11/2002 | WO2002054150A2 Optical assist feature for two-mask exposure lithography |
| 07/11/2002 | WO2002054115A2 A self-cleaning optic for extreme ultraviolet lithography |
| 07/11/2002 | WO2002053300A1 Method and apparatus for critical flow particle removal |
| 07/11/2002 | WO2002044817A3 Making an integrated circuit using polarized light |
| 07/11/2002 | US20020090558 For protecting a reticle, on which a circuit pattern is formed for manufacturing a semiconductor device, from an attachment of a foreign matter |
| 07/11/2002 | US20020090557 Mask and method of manufacturing semiconductor device |
| 07/11/2002 | US20020090518 Inhibiting polarization mode dispersion of lithography light utilizing low birefringence mask blanks and photomasks; for manufacturing integrated circuits with deep ultraviolet wavelengths; semiconductors |