| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 08/29/2002 | US20020119378 Lithography; microelectronics |
| 08/29/2002 | US20020117618 Measurement technique for determining the width of a structure on a mask |
| 08/29/2002 | US20020117611 Object inspection and/or modification system and method |
| 08/29/2002 | US20020117105 Method of heat-treating fluoride crystal, method of producing optical part, and optical apparatus |
| 08/29/2002 | US20020117067 Method and multibeam scanning device for the ablation of flexo printing plates by laser engraving |
| 08/28/2002 | EP1235103A2 An optical proximity correction method utilizing gray bars as sub-resolution assist features |
| 08/28/2002 | EP1235102A2 Process and multibeam scanning device for laser ablation for making flexographic plates |
| 08/28/2002 | EP1234215A2 Exposure masks |
| 08/28/2002 | EP0778804B1 Optical pellicle membrane to frame adhesion method |
| 08/27/2002 | US6441885 Low thermal distortion extreme-UV lithography reticle |
| 08/27/2002 | US6441397 Evaluation of semiconductor chargeup damage and apparatus therefor |
| 08/27/2002 | US6441383 Charged particle beam lithography apparatus for forming pattern on semi-conductor |
| 08/27/2002 | US6440645 Production of microstructures for use in assays |
| 08/27/2002 | US6440637 Electron beam lithography method forming nanocrystal shadowmasks and nanometer etch masks |
| 08/27/2002 | US6440619 Heating from absorbed light produces displacements that compensate for overlay errors measured with a send-ahead wafer; distortion compensation in membrane lithography masks, wafers, or both. |
| 08/27/2002 | US6440617 Photomask structure |
| 08/27/2002 | US6440616 Suited for use in setting a focus condition of a projection aligner on the occasion of manufacturing a semiconductor device or a liquid crystal display device, etc. |
| 08/27/2002 | US6440615 A repair membrane is formed in the defective portion of the mask by irradiating a charged particle beam to said defect while a gas including substances having high scattering properties are supplied |
| 08/27/2002 | US6440614 Having drawn thereupon main pattern with specific arrangement that is transferred onto preset element formation area on wafer and additional pattern formed around main pattern to adjust exposure quantity; lithography |
| 08/27/2002 | US6440613 For the formation of integrated circuits on a semiconductor wafer; an attenuated phase shift mask having a circuitry pattern area and a no-circuitry area includes providing a transparent substrate with light shielding layers formed on it |
| 08/27/2002 | US6440612 Field correction of overlay error |
| 08/22/2002 | WO2002065482A2 Collector with an unused area for lighting systems having a wavelength of ≤ 193 nm |
| 08/22/2002 | WO2002065312A1 Data management method for reticle/mask writing |
| 08/22/2002 | WO2002065211A1 Method of manufacturing phase shift mask and phase shift mask |
| 08/22/2002 | US20020115309 Heat-resistant core and a core covering comprising a carbon based yarn. The knitted garment is heat treated to at least partially decompose the carbon based yarn to form activated charcoal |
| 08/22/2002 | US20020115019 Photosensitive flexographic printing element having at least two IR-ablative layers |
| 08/22/2002 | US20020115003 Seed layer is formed of a chromium material containing atleast one of oxygen, nitrogen and carbon, disposed between the transparent substrate and the light-shielding film or the antireflective film |
| 08/22/2002 | US20020115001 A chrome film deposited on the substrate to form a pattern of circuit, and a transparent, slightly conductive, polymer layer deposited on chrome film so as to prevent mask from being damaged due to elecatrostatic charge accumulation |
| 08/22/2002 | US20020115000 Method of extreme ultraviolet mask engineering |
| 08/22/2002 | US20020114999 Thin tantalum silicon composite film formation and annealing for use as electron projection scatterer |
| 08/22/2002 | US20020114068 Antireflection coating for ultraviolet light at large angles of incidence |
| 08/22/2002 | US20020113967 Inspection method, apparatus and system for circuit pattern |
| 08/22/2002 | US20020113277 Sub-critical-dimension integrated circuit features |
| 08/22/2002 | US20020112824 Pellicle mounting apparatus |
| 08/22/2002 | US20020112544 Methods and apparatus for measuring stress of membrane regions of segmented microlithographic mask blanks |
| 08/22/2002 | DE10104577A1 Verfahren zum Belacken eines Photomaskenrohlings für die Chipherstellung und Photomaske A method for lacquering a photomask blank for chip fabrication and photomask |
| 08/21/2002 | EP1233443A1 Transfer mask, method of dividing pattern of transfer mask, and method of manufacturing transfer mask |
| 08/21/2002 | EP1232526A1 Method and apparatus for personalization of semiconductor |
| 08/21/2002 | CN1365516A Semiconductor device and process for designing mask |
| 08/21/2002 | CN1365135A Optical mask, its producing method, image forming method and method for producing semicondcutor device |
| 08/21/2002 | CN1365010A Optical film |
| 08/20/2002 | US6437353 Particle-optical apparatus and process for the particle-optical production of microstructures |
| 08/20/2002 | US6437352 Charged particle beam projection lithography with variable beam shaping |
| 08/20/2002 | US6436608 Lithographic method utilizing a phase-shifting mask |
| 08/20/2002 | US6436607 Edges and scanning beam lithography with masking for semiconductors |
| 08/20/2002 | US6436606 Polymers and photoresists coating |
| 08/20/2002 | US6436605 Reactive ion etching resistance of radiation sensitive resist composition is enhanced by adding at least one organometallic compound to polymers with patterns |
| 08/20/2002 | US6436590 Phase shifting circuit manufacture method and apparatus |
| 08/20/2002 | US6436589 Reticle having an interleave kerf |
| 08/20/2002 | US6436588 Radiation transparent element with phase shifting |
| 08/20/2002 | US6436587 Method of making a multi-level reticle using bi-level photoresist, including a phase-shifted multi-level reticle |
| 08/20/2002 | US6436586 Pellicle with a filter and method for production thereof |
| 08/20/2002 | US6436482 Upper and lower heaters for the top and bottom surfaces of the substrate, and a thermoconductive heater block on whidch the substrate is placed for independently setting the temperatures of the upper and lower heaters |
| 08/15/2002 | WO2002063662A1 Method for making slit, slit, and electron beam exposure system |
| 08/15/2002 | WO2002063396A1 In-situ lithography mask cleaning |
| 08/15/2002 | WO2002063394A1 Fabrication of structures of metal/semiconductor compound by x-ray/euv projection lithography |
| 08/15/2002 | WO2002063392A1 Self-aligned aperture masks having high definition apertures |
| 08/15/2002 | WO2002049080A3 Method and apparatus for inspecting a substrate |
| 08/15/2002 | WO2002003141A3 Network-based photomask data entry interface and instruction generator for manufacturing photomasks |
| 08/15/2002 | WO2002003138A3 Transmission and phase balance for phase-shifting mask |
| 08/15/2002 | WO2002001293A3 Photomask and method for increasing image aspect ratio while relaxing mask fabrication requirements |
| 08/15/2002 | US20020112222 Method of producing masks for fabricating semiconductor structures |
| 08/15/2002 | US20020111028 Method of manufacturing semiconductor device as well as reticle and wafer used therein |
| 08/15/2002 | US20020110765 Photolithography process for producing gates and conductive lines |
| 08/15/2002 | US20020110762 Narrow width pattern; variations in light intensity |
| 08/15/2002 | US20020110753 Reducing interference during optical imaging; transferring pattern from structural carrier |
| 08/15/2002 | US20020110751 Photosensitive flexographic printing element having an IR-ablative layer comprising polyether-polyurethanes |
| 08/15/2002 | US20020110744 Reticle cleaning without damaging pellicle |
| 08/15/2002 | US20020110743 Transferring pattern onto semiconductor substrate using reflection mask |
| 08/15/2002 | US20020110742 Method for correcting design pattern of semiconductor circuit, a photomask fabricated using the corrected design pattern data, a method for inspecting the photomask and a method for generating pattern data for inspection of photomask |
| 08/15/2002 | US20020110741 Phase shift mask blank, photo mask blank and manufacturing apparatus and method of blanks |
| 08/15/2002 | US20020109828 Mask handling apparatus, lithographic projection apparatus, device manufacturing method and device manufactured thereby |
| 08/15/2002 | US20020109088 Inspection method, apparatus and system for circuit pattern |
| 08/15/2002 | CA2433076A1 Fabrication of structures of metal/semiconductor compound by x-ray/euv projection lithography |
| 08/14/2002 | EP0974075B1 Black-pigmented structured high molecular weight material |
| 08/14/2002 | DE10145151A1 Fotomaske mit einem Film, der aus einem Halbtonmaterial gebildet ist, Verfahren zur Herstellung einer Fotomaske, und Verfahren zur Herstellung einer Halbleitervorrichtung Photomask with a film which is formed from a halftone material, method for manufacturing a photomask, and method of manufacturing a semiconductor device |
| 08/14/2002 | DE10065537A1 Verfahren zur Identifikation einer auf einen Wafer projizierten Maske nach der Belichtung des Wafers A method for identifying a projected onto a wafer mask of the exposure of the wafer |
| 08/14/2002 | CN1364246A Method for manufacturing semiconductor integrated circuit device, optical mask used therefor, method for manufacturing the same, and mask blanks used therefor |
| 08/13/2002 | US6433878 Method and apparatus for the determination of mask rules using scatterometry |
| 08/13/2002 | US6433437 Manufacturing process for semiconductor device, photomask, and manufacturing apparatus for semiconductor device |
| 08/13/2002 | US6432790 Method of manufacturing photomask, photomask, and method of manufacturing semiconductor integrated circuit device |
| 08/13/2002 | US6432619 Forming photosensitive mask; simplification |
| 08/13/2002 | US6432588 By optimizing the first of two electron beam dosages. |
| 08/13/2002 | US6432317 Method to produce masking |
| 08/13/2002 | US6432194 Method of attaching a group to a pigment |
| 08/08/2002 | WO2002061504A2 Phase shift mask and system and method for making the same |
| 08/08/2002 | WO2002061489A2 Lithographic fabrication of phase mask for fiber bragg gratings |
| 08/08/2002 | WO2001027695A9 Removable cover for protecting a reticle, system including and method of using the same |
| 08/08/2002 | US20020108098 Method for correcting optical proximity effects |
| 08/08/2002 | US20020106587 Two mask via pattern to improve pattern definition |
| 08/08/2002 | US20020106567 Phase-shifting mask and method of forming pattern using the same |
| 08/08/2002 | US20020105648 Inspection method, apparatus and system for circuit pattern |
| 08/08/2002 | US20020105524 Method of efficiently converting-to-array and compressing data in a process for converting mask patterns of a LSI |
| 08/08/2002 | US20020104455 Chemical imaging of a lithographic printing plate |
| 08/08/2002 | DE10115294C1 Maske für die Projektion einer Struktur zur Herstellung einer integrierten Schaltung auf einen Wafer A mask for the projection of a structure for fabricating an integrated circuit on a wafer |
| 08/08/2002 | CA2431234A1 Lithographic fabrication of phase mask for fiber bragg gratings |
| 08/07/2002 | EP1229385A2 Method of correcting a photomask and method of manufacturing a semiconductor device |
| 08/07/2002 | EP1228402A1 Composite relief image printing elements |
| 08/07/2002 | CN1088856C Scale mask-plate for off-axis lighting |
| 08/06/2002 | US6430737 Convergence technique for model-based optical and process correction |