| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 10/15/2002 | US6465139 Mask pattern that prevents the source polysilicon layer from being etched and damaged in the word line trim etch step, and prevents the formation of difficult to remove polymers, which facilitates the subsequent manufacturing processes |
| 10/15/2002 | US6465138 Which can be used to produce circuit designs having densely packed circuit features, the occurrence of printing errors is reduced or eliminated, and the variance between actual exposure pattern and desired exposure pattern is reduced |
| 10/10/2002 | WO2002079875A2 Extreme ultraviolet mask with improved absorber |
| 10/10/2002 | WO2002049082A3 Process of shaping a semiconductor substrate and/or a lithographic mask |
| 10/10/2002 | US20020146648 Providing multilayer mirror over integrated circuit substrate or mask blank and buffer layer and dual element material; selectively growing features on integrated circuit substrate or mask blank using photon assisted chemical vapor deposition |
| 10/10/2002 | US20020146627 Generating gray scale pattern on mask to form true gray scale mask by creating a layer having transmission varying acrossmask; positioning true gray scale mask between light source and a photoresist layer; exposing; transferring pattern |
| 10/10/2002 | US20020145720 Illumination device for projection system and method for fabricating |
| 10/10/2002 | US20020145714 Reticle chucks and methods for holding a lithographic reticle utilizing same |
| 10/10/2002 | US20020145712 Microdevice and structural components of the same |
| 10/10/2002 | DE10126575C1 Process for etching phase shift layers in half-tone phase masks used in the production of microchips comprises depositing a phase shift layer on a substrate, applying a mask, and plasma |
| 10/09/2002 | EP1248148A1 Lithographic patterning means with protective layer |
| 10/09/2002 | EP1248121A1 Method for forming color filter, method for forming light emitting element layer, method for manufacturing color display device comprising them, or color display device |
| 10/09/2002 | EP1247569A2 Photolithographic method and system for efficient mask usage in manufacturing DNA arrays |
| 10/09/2002 | CN1373862A Data path for high performance pattern generator |
| 10/09/2002 | CN1373861A Photomask, method of producing photomask, and method of making pattern using photomask |
| 10/09/2002 | CN1373501A Method for mfg. complementary mask pair |
| 10/08/2002 | US6463577 Method of manufacturing mask using independent pattern data files |
| 10/08/2002 | US6462346 Mask inspecting apparatus and mask inspecting method which can inspect mask by using electron beam exposure system without independently mounting another mask inspecting apparatus |
| 10/08/2002 | US6461777 Apparatus comprising unit dividing display device into multiple shot areas, unit setting suspected division area comprising layers of shot area, unit dividing all layers at once, unit creating light resistant coating on unincluded area |
| 10/08/2002 | US6461774 Apparatus and method for forming features on a substrate |
| 10/08/2002 | US6461677 Method of fabricating an electrical component |
| 10/08/2002 | US6460957 Use of an ink jet image as prepress intermediate |
| 10/03/2002 | WO2001088960A3 Method of molecular-scale pattern imprinting at surfaces |
| 10/03/2002 | US20020144232 Alleviating line end shortening in transistor endcaps by extending phase shifters |
| 10/03/2002 | US20020143424 Device and method of selecting photomask manufacturer based on received data |
| 10/03/2002 | US20020142620 Bag filter, resin impregnated, stiffness |
| 10/03/2002 | US20020142597 Mask for a photolithography process and method of fabricating the same |
| 10/03/2002 | US20020142235 Photo mask for fabricating semiconductor device having dual damascene structure |
| 10/03/2002 | US20020142234 Photomask |
| 10/03/2002 | US20020142233 Photomask manufacturing mehtod, photomask manufactured by said manufacturing mehtod, and semiconductor device method using said photomask |
| 10/03/2002 | US20020142232 Semiconductors; process control of masks |
| 10/03/2002 | US20020142231 Masking; undercutting etching |
| 10/03/2002 | US20020142230 Extreme ultraviolet mask with improved absorber |
| 10/03/2002 | US20020142228 Methods of patterning radiation , methods of forming radiation- patterning tools, and radiation-patterning tools |
| 10/03/2002 | US20020141634 Pattern defect inspection apparatus and method |
| 10/03/2002 | US20020141633 Pattern data converting method and apparatus |
| 10/03/2002 | US20020140920 System and method for printing semiconductor patterns using an optimized illumination and reticle |
| 10/03/2002 | US20020139770 Methods for fabricating segmented reticle blanks having uniformly machined grillage, and reticle blanks and reticles formed thereby |
| 10/03/2002 | US20020139476 Dry-etching a metal thin film with an etching gas, a mixed gas including of a reactive ion etching gas which contains oxygen and halogen containing gases, and a reducing gas |
| 10/02/2002 | EP1246011A2 Method of producing a pattern and photomask used in the same |
| 10/02/2002 | EP1246010A2 Photomask manufacturing method, photomask manufactured by said manufacturing method, and semiconductor device method using said photomask |
| 10/02/2002 | EP1244937A2 Alternating phase mask |
| 10/02/2002 | DE10205330A1 Verfahren zur Korrektur optischer Nachbarschaftseffekte A method for correcting optical proximity effects |
| 10/02/2002 | DE10112023A1 Verfahren zum Bilden eines Metallmusters auf einen dielektrischen Substrat A method of forming a metal pattern on a dielectric substrate |
| 10/01/2002 | US6459491 Non-intrusive pellicle height measurement system |
| 10/01/2002 | US6459090 Reticles for charged-particle-beam microlithography that exhibit reduced warp at pattern-defining regions, and semiconductor-device-fabrication methods using same |
| 10/01/2002 | US6458515 Solution includes a photosensitive material and a plurality of masking particles within the photosenstive material; screen printing the solution over a substrate |
| 10/01/2002 | US6458497 Mask for manufacturing semiconductor device and method of manufacture thereof |
| 10/01/2002 | US6458496 Blank for halftone phase shift photomask and halftone phase shift photomask |
| 10/01/2002 | US6458495 Transmission and phase balance for phase-shifting mask |
| 10/01/2002 | US6458493 Substrate with a first transmittance; first pattern having a second transmittance lower than the first; and a second pattern having a transmittance greater than the second and less than the first |
| 10/01/2002 | US6458216 Reticle cleaning without damaging pellicle |
| 09/26/2002 | WO2002075793A2 System and method of providing mask defect printability analysis |
| 09/26/2002 | WO2002075456A1 Enchanced bright peak clear phase shifting mask and method of use |
| 09/26/2002 | WO2002075454A2 Self-aligned fabrication technique for tri-tone attenuated phase-shifting masks |
| 09/26/2002 | US20020138810 Optical proximity correction (OPC) using automated shape and edge pre-sorting |
| 09/26/2002 | US20020138404 Mas trading system and method |
| 09/26/2002 | US20020138219 Quality assurance automatic display system |
| 09/26/2002 | US20020137361 Phase shifting mask for manufacturing semiconductor device and method of fabricating the same |
| 09/26/2002 | US20020137353 Method and device for delacquering an area on a mask substrate |
| 09/26/2002 | US20020136983 Method of coating an image-recording layer by valve-jet |
| 09/26/2002 | US20020136967 Reactive ion etching using a mixed gas including an oxygen containing gas and a halogen containing gas, and a reducing gas for dry etching a metal film; high precision pattern-etched product; dry etching apparatus |
| 09/26/2002 | US20020136966 Photomask blank, photomask and method of manufacture |
| 09/26/2002 | US20020136965 Pellicle |
| 09/26/2002 | US20020136964 Blank for alternating PSM photomask with charge dissipation layer |
| 09/26/2002 | US20020136963 Alternating phase shifting masks |
| 09/26/2002 | US20020136962 Method for improving process window in semi-dense area by using phase shifter |
| 09/26/2002 | US20020135875 Grating test patterns and methods for overlay metrology |
| 09/26/2002 | US20020135847 Manufacturing method of microstructure, manufacturing method and manufacturing device of electronic device |
| 09/26/2002 | US20020135755 Scanning probe microscope assembly |
| 09/26/2002 | US20020135073 Manufacturing process for semiconductor device, photomask, and manufacturing apparatus for semiconductor device |
| 09/26/2002 | US20020134111 Oxygen doping of silicon oxyfluoride glass |
| 09/26/2002 | DE10206188A1 Alternating phase mask manufacturing method for patterning semiconductor component, involves etching carrier to different etching depths with respect to thickness of exposure structure covering the carrier |
| 09/26/2002 | DE10129202C1 Alternating phase mask to suppress T-phase conflicts is used when illuminating photosensitive layer used in photolithographic process for manufacture of highly-integrated semiconductor switches |
| 09/25/2002 | EP1243411A1 Method of coating an image-recording layer by ink-jet |
| 09/24/2002 | US6457168 Method for producing structures on the surface of a semiconductor wafer |
| 09/24/2002 | US6455821 System and method to control temperature of an article |
| 09/24/2002 | US6455429 Method of producing large-area membrane masks |
| 09/24/2002 | US6455206 Image forming method, image forming apparatus and image recording material |
| 09/24/2002 | US6455205 Method and apparatus for determining phase shifts and trim masks for an integrated circuit |
| 09/24/2002 | US6455204 X-ray mask and method of fabricating the same |
| 09/24/2002 | US6455203 Performing multiple exposure process on coated substrate so that latent images are superimposed on substrate, developing and etching exposed substrate to produce actual mask patterns |
| 09/22/2002 | CA2377420A1 Method of coating an image-recording layer by valve-jet |
| 09/19/2002 | WO2002073506A1 Method of compensating for etch effects in photolithographic processing |
| 09/19/2002 | WO2002073313A1 Structured organic materials and devices using low-energy particle beams |
| 09/19/2002 | WO2002073312A1 Alternating phase shift masking for multiple levels of masking resolution |
| 09/19/2002 | WO2002073310A2 Binary and phase-shift photomasks |
| 09/19/2002 | WO2002072353A2 Photosensitive flexographic device with associated thermally addressable mask |
| 09/19/2002 | WO2002044699A3 Method and device for determining the properties of an integrated circuit |
| 09/19/2002 | WO2002014951A3 Shadow mask and method for producing a shadow mask |
| 09/19/2002 | US20020133801 Method of compensating for etch effects in photolithographic processing |
| 09/19/2002 | US20020132174 Self-aligned fabrication technique for tri-tone attenuated phase-shifting masks |
| 09/19/2002 | US20020132173 Providing substrate including: attenuating material layers and opaque layer; etching substrate to form completely transmissive region; etching substrate to form at least one slightly attenuated region and highly attenuated region |
| 09/19/2002 | US20020132171 Method of and system for improving stability of photomasks |
| 09/19/2002 | US20020132170 Lithography technology |
| 09/19/2002 | US20020131055 Method and apparatus for the determination of mask rules using scatterometry |
| 09/19/2002 | US20020131052 Advanced phase shift inspection method |
| 09/19/2002 | US20020131040 System and method for characterizing macro-grating test patterns in advanced lithography and etch processes |
| 09/19/2002 | US20020131036 Devices and methods for measuring residual stress in a membrane region of a segmented reticle blank |
| 09/19/2002 | US20020130425 Mask-making member and its production method, mask and its making method, exposure process, and fabrication method of semiconductor device |