G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
11/2002
11/28/2002	US20020177051 Phase shift mask, method of exposure, and method of producing semiconductor device
11/28/2002	US20020177050 Photoresists for semiconductor integrated circuit device; photolithography; miniaturization
11/28/2002	US20020177049 Phase-shifting mask and method of fabricating the same
11/28/2002	US20020177048 Exposure method and apparatus
11/28/2002	US20020177047 Includes chrome mask and phase shift mask; facilitates performing optical proximity correction on gate pattern regions; reduces size semiconductor chips
11/28/2002	US20020176096 Position detecting method and apparatus, exposure apparatus and device manufacturing method
11/28/2002	US20020176065 Multiple image reticle for forming layers
11/28/2002	US20020176062 Programmable photolithographic mask system and method
11/28/2002	US20020176060 Semiconductor exposure apparatus and method of driving the same
11/28/2002	US20020175298 Method of manufacturing semiconductor device
11/27/2002	EP1260871A2 Position detecting method and apparatus, exposure apparatus and device manufacturing method
11/27/2002	EP1260862A1 Lithographic apparatus, device manufacturing methods, method of manufacturing a reflector and phase shift mask
11/27/2002	EP1260861A1 Method of manufacturing a reflector, reflector manufactured thereby, phase shift mask and lithographic apparatus making use of them
11/27/2002	EP1259859A1 In-situ lithography mask cleaning
11/27/2002	CN1381871A High-contrast ratio diaphragm mask
11/27/2002	CN1381738A Self-aligning mask
11/27/2002	CN1095093C Exposure mask and method for forming photoetching rubber pattern using the exposure mask
11/26/2002	US6487712 Method of manufacturing mask for conductive wirings in semiconductor device
11/26/2002	US6487711 Method of analyzing factor responsible for errors in wafer pattern, and apparatus for producing photolithographic mask
11/26/2002	US6487018 Aperture and optical device using the same
11/26/2002	US6486939 Electronically controlled universal phase-shifting mask for stepper exposure system
11/26/2002	US6486558 Semiconductor device having a dummy pattern
11/26/2002	US6485891 Exposure apparatus and method
11/26/2002	US6485871 Method of producing phase masks in an automated layout generation for integrated circuits
11/26/2002	US6485870 Charged-particle-beam microlithography masks and methods for manufacturing same
11/26/2002	US6485869 Lithography technology
11/21/2002	WO2002093639A2 Arrangement and method for detecting defects on a substrate in a processing tool
11/21/2002	WO2002093261A1 Use of partially fluorinated polymers in applications requiring transparency in the ultraviolet and vacuum ultraviolet
11/21/2002	WO2002093260A1 Mask and production method therefor, optical element and production method therefor, and illuminating opticdal device provided with the optical element and exposure system
11/21/2002	WO2002093259A1 Rule base opc evaluating method, and simulation base opc model evaluating method
11/21/2002	WO2002093258A1 Method for producing stamping tools
11/21/2002	WO2002093200A2 Advanced phase shift inspection method
11/21/2002	WO2002092670A2 Fluoropolymer compositions comprising a fluor-containing liquid
11/21/2002	US20020173870 Substrate selector
11/21/2002	US20020172872 Photomask and method of fabricating semiconductor device by use of same
11/21/2002	US20020172761 Method for the production of optical components with increased stability, components obtained thereby and their use
11/21/2002	US20020171825 Efficient phase defect detection system and method
11/21/2002	US20020171817 Lithography device wich uses a source of radiation in the extreme ultraviolet range and multi-layered mirrors with a broad spectral band in this range
11/21/2002	DE10209594A1 Verfahren zum Bilden einer Maske für Ladungsteilchenstrahl- Belichtung und Programm zum Verarbeiten von Strukturdaten zum Bilden einer derartigen Maske A method for forming a mask for exposure and Ladungsteilchenstrahl- program for processing data structure for forming such a mask
11/21/2002	DE10119145C1 Verfahren zum Feststellen und Beheben von Phasenkonflikten auf alternierenden Phasenmasken und Maskendesign zur Verwendung bei einem solchen Verfahren A method for detecting and correcting phase conflicts on alternating phase masks and mask design for use in such a method
11/20/2002	EP1258915A1 Method of detecting defects on a semiconductor device in a processing tool and an arrangement therefore
11/20/2002	EP1257881A1 Laser imaged printing plates comprising a multi-layer slip film
11/20/2002	CN1381068A Substrate for transfer mask, transfer mask, and method of manufacture thereof
11/20/2002	CN1380992A Transfer sheet for transferring protective layer for photographic emulsion face and photomask with protective layer
11/20/2002	CN1380584A Exposure method for forming IC chip image in intermeidate mask using main mask
11/19/2002	US6483638 Ultra-broadband UV microscope imaging system with wide range zoom capability
11/19/2002	US6482662 Semiconductor device fabricating method
11/19/2002	US6482575 Method of preparing barrier rib master pattern for barrier rib transfer and method of forming barrier ribs
11/19/2002	US6482559 Method of optical proximity correction
11/19/2002	US6482558 Conducting electron beam resist thin film layer for patterning of mask plates
11/19/2002	US6482557 Method and apparatus for evaluating the runability of a photomask inspection tool
11/19/2002	US6482555 For making a mask for optically transferring a lithographic pattern corresponding to an integrated circuit from the mask onto semiconductor substrate, using an optical exposure tool
11/19/2002	US6482554 Method for manufacturing a semiconductor device, photolithography mask and method for manufacturing the same
11/19/2002	US6482553 Graphite mask for x-ray or deep x-ray lithography
11/19/2002	US6481720 Stern tube sealing apparatus
11/14/2002	WO2002091080A1 Organic bottom antireflective coating for high performance mask making optical imaging
11/14/2002	WO2002091079A1 Photo mask, production method of the same, pattern forming method using the photo mask
11/14/2002	WO2002091026A2 Efficient phase defect detection system and method
11/14/2002	US20020170031 Method for manufacturing a pair of complementary masks
11/14/2002	US20020168578 Adjustment windows; accuracy design; preventing erasing
11/14/2002	US20020167666 Method of measuring oscillatory semiconductor membranes and shielding for external excitations in the measurement
11/14/2002	US20020166468 Patterning mask and method
11/14/2002	DE10215759A1 Reinigungsprozeß für eine Photomaske Cleaning process for a photomask
11/14/2002	DE10162213A1 Verfahren des Herstellens von Masken und Verfahren des Auftragsverteilens von Masken Method of making masks and process the order distributing masks
11/14/2002	DE10148630A1 Vorrichtung und Verfahren zum Auswählen eines Photomaskenherstellers anhand von Empfangsdaten Apparatus and method for selecting a photomask manufacturer based on the received data
11/13/2002	EP1256846A2 Optical proximity correction
11/13/2002	EP1256842A2 Film rewinder
11/13/2002	EP1256031A2 Apparatus and method of cleaning reticles for use in a lithography tool
11/13/2002	EP1137969A4 Method of using a modulated exposure mask
11/13/2002	CN1379443A Manufacturing method of mask, manufacturing method of mask and semiconductor device using said mask
11/13/2002	CN1379284A Manufacturing method of pattern form and photomask membrane used in said method
11/12/2002	US6481002 System and method for compressing LSI mask writing data
11/12/2002	US6480279 Inspection method, apparatus and system for circuit pattern
11/12/2002	US6480263 Apparatus and method for phase shift photomasking
11/12/2002	US6480261 Photolithographic system for exposing a wafer using a programmable mask
11/12/2002	US6479196 Lithography; fine images projected using topography pattern and aperture pattern
11/12/2002	US6479195 Mask absorber for extreme ultraviolet lithography
11/12/2002	US6479194 Transparent phase shift mask for fabrication of small feature sizes
11/12/2002	US6478863 Modified pigments having improved dispersing properties
11/12/2002	US6477898 Membrane mask stress measurement apparatus and method therefor
11/07/2002	WO2002089149A1 Euvl multilayer structures
11/07/2002	WO2002088844A2 Alternating phase shift mask
11/07/2002	WO2002088843A2 Exposure method and apparatus
11/07/2002	WO2002088036A1 Method for producing titania-doped fused silica extreme ultraviolet lithography substrates glass
11/07/2002	US20020166107 Method and apparatus for generating masks utilized in conjunction with dipole illumination techniques
11/07/2002	US20020164534 Method for producing metal mask and metal mask
11/07/2002	US20020164533 Method and apparatus for reducing color conflicts during trim generation for phase shifters
11/07/2002	US20020164532 Method and apparatus for using phase shifter cutbacks to resolve phase shifter conflicts
11/07/2002	US20020164495 Polymeric matrix having a carbon pigment to absorb relatively long wavelengths of light to cause ablation of the medium and an ultraviolet absorbing dye to give high optical density in ultraviolet portions of the spectrum.
11/07/2002	US20020164065 System and method of providing mask defect printability analysis
11/07/2002	US20020164064 System and method of providing mask quality control
11/07/2002	DE10118409A1 Process for structuring a resist for a field effect transistor gate uses base and trimming masks having transparent auxiliary structures
11/06/2002	EP0852024B1 Black-and-white photothermographic and thermographic elements comprising hydrogen atom donor compounds as contrast enhancers
11/06/2002	CN1378662A Composite relief image printing elements
11/06/2002	CN1378102A Method for reducing optical proximity effect
11/05/2002	US6477700 Reticle having discriminative pattern narrower in pitch than the minimum pattern width but wider than minimum width in the pattern recognition
11/05/2002	US6476913 Inspection method, apparatus and system for circuit pattern
11/05/2002	US6475684 Method of correcting line width variation due to loading effect caused during etching of a photomask and recording medium formed according to the method
11/05/2002	US6475682 Photolithography method, photolithography mask blanks, and method of making
11/05/2002	US6475681 Halftones

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