| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 05/13/2014 | US8722285 Pellicle for lithography |
| 05/13/2014 | US8720951 Method for producing a film element |
| 05/08/2014 | WO2014070005A1 Design rule checking |
| 05/08/2014 | WO2014067707A1 Pressure fluctuations in a projection exposure apparatus |
| 05/08/2014 | US20140127614 Photomask blank, method of manufacturing the same, photomask, and method of manufacturing the same |
| 05/08/2014 | US20140127613 Reflective mask and method for manufacturing the same |
| 05/08/2014 | US20140127612 Photomask for exposure and method of manufacturing pattern using the same |
| 05/08/2014 | US20140124898 Cvd-free, scalable processes for the production of silicon micro- and nanostructures |
| 05/07/2014 | CN203587963U 一种基板和掩模板 A substrate and mask |
| 05/07/2014 | CN103779266A 背面穿硅通孔与金属连线制法、和背面用的光掩模制法 The back of the through silicon via hole and metal wiring manufacturing method, and the back with a photomask manufacturing method |
| 05/07/2014 | CN103779190A 精细线条制备方法 Preparation of fine lines |
| 05/07/2014 | CN103777466A 降低线条粗糙度的光刻方法 Reduce the roughness of the line lithography method |
| 05/07/2014 | CN103777463A 一种掩膜版修复方法 One kind of mask repair method |
| 05/07/2014 | CN103777462A 显示装置制造用光掩模和图案转印方法 An apparatus for manufacturing a photomask and pattern transfer method shows |
| 05/07/2014 | CN103777461A 掩膜板及其制备方法 Mask and its preparation method |
| 05/07/2014 | CN103777460A 一种提高光学邻近效应修正模型精度的方法 Method for improving the accuracy of optical proximity correction model approach |
| 05/07/2014 | CN103777459A 一种opc验证方法以及掩膜版的制备方法 One kind of opc verification method and mask preparation |
| 05/07/2014 | CN103777458A 一种opc方法以及制备掩膜版的方法 One kind of opc methods and methods for preparing the mask |
| 05/07/2014 | CN103777457A 一种用于接触孔图形设计的光学邻近修正的方法 A contact hole pattern design method for optical proximity correction |
| 05/07/2014 | CN103777456A 平板式光刻板 Flatbed reticle |
| 05/07/2014 | CN102879997B 可调式固定装置 Adjustable fixtures |
| 05/07/2014 | CN102395923B 借助傅里叶滤光和图像比较的掩模检查 With the mask inspection and image comparison of the Fourier filter |
| 05/07/2014 | CN102262352B 制作掩膜版的方法、对布局图形进行光学邻近修正方法 The method of making the mask, the graphic layout of optical proximity correction method |
| 05/06/2014 | US8718972 Electron beam writing apparatus and position displacement amount correcting method |
| 05/06/2014 | US8716841 Photolithography mask and process |
| 05/06/2014 | US8715894 Integrated color mask |
| 05/06/2014 | US8715893 Masks for use in lithography including image reversal assist features, lithography systems including such masks, and methods of forming such masks |
| 05/06/2014 | US8715892 Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device |
| 05/06/2014 | US8715891 Mask and pattern forming method |
| 05/06/2014 | US8715890 Semiconductor mask blanks with a compatible stop layer |
| 05/01/2014 | WO2014065500A1 Hard mask composition and method for forming pattern using same |
| 05/01/2014 | WO2014064742A1 Exposure apparatus, mask, and optical film |
| 05/01/2014 | WO2014064224A1 Projection exposure system for euv lithography and method for operating the projection exposure system |
| 05/01/2014 | WO2014063532A1 Photolithography method and system based on high step slope |
| 05/01/2014 | US20140120461 Mask plate and manufacturing method thereof |
| 05/01/2014 | US20140120460 Photomask blank and manufacturing method thereof |
| 05/01/2014 | US20140120459 Method for improving resist pattern peeling |
| 04/30/2014 | EP2724197A1 Method and system for forming patterns with charged particle beam lithography |
| 04/30/2014 | DE10165081B4 Verfahren zur Herstellung einer Halbton-Phasenverschiebungsmaske A method for producing a halftone phase shift mask |
| 04/30/2014 | CN103760748A Mask plate and through hole forming method |
| 04/30/2014 | CN103760747A Mask plate, method for carrying out exposure on the mask plate and liquid crystal panel comprising mask plate |
| 04/30/2014 | CN101809709B Mask case, transfer apparatus, exposure apparatus, mask transfer method and device manufacturing method |
| 04/30/2014 | CN101054673B Light shield plasma etching method using protective cover |
| 04/29/2014 | US8713505 Pattern generation method and pattern generation program |
| 04/29/2014 | US8713484 Aware manufacturing of integrated circuits |
| 04/29/2014 | US8711346 Inspection systems and methods for detecting defects on extreme ultraviolet mask blanks |
| 04/29/2014 | US8709686 Photomask blank, process for production of photomask, and chromium-containing material film |
| 04/29/2014 | US8709685 Reflective mask blank and method of manufacturing a reflective mask |
| 04/29/2014 | US8709684 Automatic misalignment balancing scheme for multi-patterning technology |
| 04/29/2014 | US8709683 Photomask blank, photomask blank manufacturing method, and photomask manufacturing method |
| 04/29/2014 | US8709682 Mask and method for forming the mask |
| 04/29/2014 | US8709681 Mask blank, transfer mask, and film denseness evaluation method |
| 04/29/2014 | US8709340 Method for radiation sterilization of medical devices |
| 04/29/2014 | US8709163 Method of descaling a mask |
| 04/24/2014 | WO2014062956A1 Reticle pod with cover to baseplate alignment system |
| 04/24/2014 | WO2014062294A1 Loading/unloading system for printing plates |
| 04/24/2014 | US20140113222 Mask for Use in Lithography |
| 04/24/2014 | US20140113221 Photomask and method of forming the same |
| 04/24/2014 | US20140113220 Apparatus and Method for Lithography Patterning |
| 04/24/2014 | US20140110853 Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording medium |
| 04/23/2014 | EP2722712A2 A pellicle |
| 04/23/2014 | CN103748660A Reflective mask and method for manufacturing same |
| 04/23/2014 | CN103744265A Optical proximity correction method for improving process window |
| 04/23/2014 | CN103744214A Exposure method of glass substrate of LCD (Liquid Crystal Display) |
| 04/23/2014 | CN102479279B Method for dielectric window patterning mask distribution for dielectric window |
| 04/22/2014 | US8707231 Method and system for derived layer checking for semiconductor device design |
| 04/22/2014 | US8707222 Lithography mask functional optimization and spatial frequency analysis |
| 04/22/2014 | US8705838 Method for mask inspection for mask design and mask production |
| 04/22/2014 | US8703389 Method and system for forming patterns with charged particle beam lithography |
| 04/22/2014 | US8703387 Resist composition, method of forming resist pattern, novel compound, and acid generator |
| 04/22/2014 | US8703365 UV mask with anti-reflection coating and UV absorption material |
| 04/22/2014 | US8703364 Method for repairing photomask |
| 04/17/2014 | WO2014058629A1 Method of and apparatus for in-situ repair of reflective optic |
| 04/17/2014 | US20140106266 Mask blank and photomask |
| 04/17/2014 | US20140106265 Pellicle |
| 04/17/2014 | US20140106264 Photolithography mask, photolithography mask arrangement, and method for exposing a wafer |
| 04/17/2014 | US20140106263 Euv mask set and methods of manufacturing euv masks and integrated circuits |
| 04/17/2014 | US20140106262 Image Mask Film Scheme and Method |
| 04/17/2014 | US20140103480 Mask, TFT Glass Substrate and the Manufacturing Method Thereof |
| 04/17/2014 | DE102013111192A1 Photolithography mask for use during manufacturing of semiconductor devices, has mask substrate provided with three-dimensional pattern, and wafer arranged on inverted three-dimensional pattern and mask |
| 04/16/2014 | CN103733023A Method for estimating shape before shrink, and CD-SEM apparatus |
| 04/16/2014 | CN103728832A Electronic device manufacturing method, display device manufacturing method, photomask manufacturing method and photomask |
| 04/16/2014 | CN103728831A Method for forming Llight resistance wall molding method by adopting silicon mold |
| 04/16/2014 | CN103728830A Modular molding method for light resistance wall structure |
| 04/16/2014 | CN103728829A Pellicle |
| 04/16/2014 | CN103728828A Mask having optical-isolation channel holes and proximity correction characteristic, and making method thereof |
| 04/16/2014 | CN103728827A Photomask, thin film transistor element and method of preparing thin film transistor element |
| 04/16/2014 | CN102486605B Optical proximity correction method of covered shape |
| 04/16/2014 | CN102150218B Method for smoothing optical member for EUVL and optical member for EUVL having smoothed optical surface |
| 04/16/2014 | CN101946208B Optical component for euvl and smoothing method thereof |
| 04/16/2014 | CN101799433B Pattern inspection method, pattern inspection device, photomask manufacturing method and pattern transfer method |
| 04/15/2014 | US8697318 Method of forming photomasks and photomasks formed by the same |
| 04/15/2014 | US8697317 Exposure apparatus for forming a reticle and method of forming a reticle using the same |
| 04/15/2014 | US8697316 Hard mask spacer structure and fabrication method thereof |
| 04/15/2014 | US8697315 Photomask blank and production method thereof, and photomask production method, and semiconductor device production method |
| 04/10/2014 | US20140099572 Actinic-ray- or radiation sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern |
| 04/09/2014 | CN103718105A Pellicle for lithography, photomask fitted with pellicle and exposure method |
| 04/09/2014 | CN103715095A Mask set, thin film transistor, manufacturing method of thin film transistor, array substrate and display device |
| 04/09/2014 | CN103713471A Calibration unit and method for critical dimension testing |
| 04/09/2014 | CN103713468A Mask case |