| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 02/06/2003 | US20030027058 For producing integrated circuit |
| 02/06/2003 | US20030027057 Resolution enhancement for alternating phase shift masks |
| 02/06/2003 | US20030027056 Depositing a material in a pattern over the opaque material; and etching the mass while using the deposited material as an etch mask |
| 02/06/2003 | US20030027055 Method and feedstock for making photomask material |
| 02/06/2003 | US20030027054 Method for making photomask material by plasma induction |
| 02/06/2003 | US20030027053 Damascene extreme ultraviolet lithography ( EUVL) photomask and method of making |
| 02/06/2003 | US20030026472 Pattern forming method, mask manufacturing method, and LSI manufacturing method |
| 02/06/2003 | US20030025991 Ultraviolet and vacuum ultraviolet antireflection substrate |
| 02/06/2003 | US20030025893 Projection exposure apparatus and projection exposure method |
| 02/06/2003 | US20030025216 Phase shift mask blank, phase shift mask, and method of manufacture |
| 02/06/2003 | US20030024903 Method of preparing plastic materials to allow lamination of a pre-press color proof |
| 02/06/2003 | US20030024899 Exposure method utilizing optical proximity corrected exposure patterns, an apparatus for generating optical proximity corrected exposure data, and an exposure apparatus for optical proximity corrected exposure data |
| 02/06/2003 | US20030024555 Reticle cleaning without damaging pellicle |
| 02/06/2003 | DE10137398C1 Method for producing a punched multi-hole mask produces a desired pattern of holes for the projection of particle radiation by cutting holes in a flattened stretched blank subjected to distorting forces after cutting. |
| 02/05/2003 | EP1281680A2 Method for making glass by plasma deposition and so obtained photomask material |
| 02/05/2003 | EP1281679A2 Method for making glass by plasma deposition using silica powder, silica powder and photomask obtained by the method |
| 02/05/2003 | EP1280740A2 Glass preform and methods and apparatus for manufacture thereof |
| 02/05/2003 | EP1280664A1 Chemical imaging of a lithographic printing plate |
| 02/05/2003 | EP1025464A4 Composite relief image printing plates |
| 02/05/2003 | CN2534610Y Bearing element for photo-shade box |
| 02/05/2003 | CN1101057C Photo-mask used in paligner for exactly transferring main pattern assisted by semi-transparent auxiliary attern and process of fabrication thereof |
| 02/04/2003 | US6516459 Integrated circuit design correction using fragment correspondence |
| 02/04/2003 | US6516085 Apparatus and methods for collecting global data during a reticle inspection |
| 02/04/2003 | US6515736 Tapered fingers extend into recesses; self-centering; lithography, semiconductors |
| 02/04/2003 | US6515277 Scanning probe microscope assembly and method for making confocal, spectrophotometric, near-field, and scanning probe measurements and associated images |
| 02/04/2003 | US6514877 Method using sub-micron silicide structures formed by direct-write electron beam lithography for fabricating masks for extreme ultra-violet and deep ultra-violet lithography |
| 02/04/2003 | US6514780 Method for manufacturing an integrated circuit having a particular functionality required by a user of the circuit and having first structures to produce the particular functionality and second structures |
| 02/04/2003 | US6514661 Process for forming a colored image having a dominant attribute |
| 02/04/2003 | US6514648 Method to produce equal sized features in microlithography |
| 02/04/2003 | US6514647 Not penetrating resist film in after development section |
| 02/04/2003 | US6514642 Phase shift mask and method of manufacture |
| 01/30/2003 | WO2002069390A9 Grating test patterns and methods for overlay metrology |
| 01/30/2003 | US20030023401 Method and apparatus for allowing phase conflicts in phase shifting mask and chromeless phase edges |
| 01/30/2003 | US20030022496 Stencil mask and method of producing the same, semiconductor device produced using the stencil mask and method of producing the semiconductor device |
| 01/30/2003 | US20030022107 Laser imaged printing plates |
| 01/30/2003 | US20030022079 Field correction of overlay error |
| 01/30/2003 | US20030022078 A selected region(in which a gate electrode of transistor, a contact or via hole is formed) is selected from the pattern, and when a minute shape is present in selected region, the selected region is redivided into a pluralilty of ractangles |
| 01/30/2003 | US20030022076 Semiconductive substrate processing methods and methods of processing a semiconductive substrate |
| 01/30/2003 | US20030022075 Defining at least two zones within a field of a mask having similar overlay error values, modifying the coordinates of a feature of the mask in response to a correction for the zone to the feature is mapped |
| 01/30/2003 | US20030022074 Based on a combination of a half- tone phase mask and an alternating phase mask such that when radiation passes through some of the openings, a phase difference is in each case produced between adjacent openings and it's surrounding of the |
| 01/30/2003 | US20030022073 Fluoropolymer-coated photomasks for photolithography |
| 01/30/2003 | US20030022072 Binary and phase-shift photomasks |
| 01/30/2003 | US20030022071 A mask produced by making use of the pattern computing software program |
| 01/30/2003 | US20030022070 Method for fabricating continuous space variant attenuating lithography mask for fabrication of devices with three-dimensional structures and microelectronics |
| 01/30/2003 | US20030020894 Removable Optical pellicle |
| 01/30/2003 | US20030020890 Debris removing system for use in X-ray light source |
| 01/30/2003 | US20030020184 Substrate provided with an alignment mark, method of designing a mask, computer program, mask for exposing said mark, device manufacturing method, and device manufactured thereby |
| 01/29/2003 | CN1393906A Process for preparing lower storage junctions of DRAM |
| 01/28/2003 | US6512631 Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system |
| 01/28/2003 | US6512535 Laser drawing apparatus and laser drawing method |
| 01/28/2003 | US6511897 Method of manufacturing semiconductor device as well as reticle and wafer used therein |
| 01/28/2003 | US6511791 Exposure through reticle mask; repositioning; semiconductors, integrated circuits |
| 01/28/2003 | US6511778 Phase shift mask blank, phase shift mask and method of manufacture |
| 01/28/2003 | US6511777 Etching in correspondance to light transmission pattern; monitoring |
| 01/28/2003 | US6510793 Imaging apparatus and printing plate mounting surface for use in an imaging apparatus having printing plate registration detection |
| 01/28/2003 | US6510730 System and method for facilitating selection of optimized optical proximity correction |
| 01/23/2003 | WO2003007352A1 Apparatus for pellicle remove |
| 01/23/2003 | US20030018943 Method of and device for detecting pattern, method of and device for checking pattern, method of and device for correcting and processing pattern, and computer product |
| 01/23/2003 | US20030017644 Compound semiconductor device and manufacturing method thereof |
| 01/23/2003 | US20030017631 Method of arranging exposed areas including a limited number of TEG regions on a semiconductor wafer |
| 01/23/2003 | US20030017402 Extreme ultraviolet soft x-ray projection lithographic method and mask devices |
| 01/23/2003 | US20030017401 Stencil reticles for use in charged-particle-beam microlithography, and pattern-determination methods for such reticles |
| 01/23/2003 | US20030016780 Soft X-ray reduction projection exposure system, soft X-ray reduction projection exposure method and pattern formation method |
| 01/23/2003 | US20030016341 Exposure method and method of manufacturing semiconductor device |
| 01/22/2003 | EP1278236A1 Method of dicing a compound semiconductor wafer and compound semiconductor substrate thereby formed |
| 01/22/2003 | CN1392960A Method for forming color filter, method for forming light lkight emitting element layer, method for manufacturing color display device comprising them, or color dispaly device |
| 01/22/2003 | CN1392905A Method for producing metal mask and metal mask |
| 01/22/2003 | CN1392453A Optical nearing correcting method |
| 01/22/2003 | CN1392452A Phase error detection pattern and its use |
| 01/22/2003 | CN1392443A Mask, substrate with optical reflective film and forming method of optical reflective film |
| 01/22/2003 | CN1099696C Metal layer patterns of semiconductor device and method for forming the same |
| 01/22/2003 | CN1099613C Photomask blanks |
| 01/21/2003 | US6509572 Charged particle beam lithography apparatus for forming pattern on semi-conductor |
| 01/21/2003 | US6509251 Method of forming a resist pattern for blocking implantation of an impurity into a semiconductor substrate |
| 01/21/2003 | US6509127 Method of electron-beam exposure |
| 01/21/2003 | US6509124 Method of producing diamond film for lithography |
| 01/21/2003 | US6508949 Method for correcting characteristics of attenuated phase-shift mask |
| 01/16/2003 | WO2003004719A1 Mask and substrate holder arrangement |
| 01/16/2003 | WO2002041080A3 Process for reducing edge roughness in patterned photoresist |
| 01/16/2003 | WO2002027404A3 Mitigation of multilayer defects on a reticle |
| 01/16/2003 | WO2001070920A9 Cleaning compositions and use thereof |
| 01/16/2003 | US20030014732 Alternating phase shift mask design conflict resolution |
| 01/16/2003 | US20030014731 Space classification for resolution enhancement techniques |
| 01/16/2003 | US20030014730 Transfer mask blank, transfer mask and exposure method |
| 01/16/2003 | US20030013258 Photomask esd protection and an anti-esd pod with such protection |
| 01/16/2003 | US20030013216 EUV reflection mask |
| 01/16/2003 | US20030013024 Phase shift mask including sub-resolution assist features for isolated spaces |
| 01/16/2003 | US20030013023 Disposable hard mask for photomask plasma etching |
| 01/16/2003 | US20030013022 Method for experimentally verifying imaging errors in photomasks |
| 01/16/2003 | US20030011870 Mask, substrate with light reflection film, manufacturing method for light reflection film, manufacturing method for electro-optical device and electro-optical device, and electronic apparatus |
| 01/16/2003 | US20030011762 Method and measuring arrangement for detecting an object |
| 01/16/2003 | US20030010937 Pattern generation method and apparatus using cached cells of hierarchical data |
| 01/16/2003 | US20030010936 Optically detectable alignment marks producing an enhanced signal-amplitude change from scanning of a detection light over the alignment mark, and associated alighment-detection methods |
| 01/16/2003 | US20030010749 Mask for fabrication of semiconductor devices, process for production of the same, and process for fabrication of semiconductor devices |
| 01/16/2003 | US20030010239 Imaging apparatus and printing plate mounting surface for use in an imaging apparatus having printing plate registration detection |
| 01/15/2003 | EP1274581A1 A method and an apparatus for controlling light intensity in connection with the exposure of photosensitive material |
| 01/15/2003 | CN1391664A Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses |
| 01/15/2003 | CN1099041C Color filter, its repairing method and equipment, liquid crystal displayer using |
| 01/14/2003 | US6507944 Data processing method and apparatus, reticle mask, exposing method and apparatus, and recording medium |
| 01/14/2003 | US6507553 Nanometer scale data storage device and associated positioning system |